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61. 发明授权

US07968276B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07968276B2
公开(公告)日：2011-06-28
申请号：US12351759
申请日：2009-01-09
申请人： Masaru Takeshita
发明人： Masaru Takeshita
IPC分类号： G03F7/20 , G03F7/30 , G03F7/039
CPC分类号： G03F7/0397
摘要： A positive resist composition used to form a second resist film in a method of forming a positive resist pattern, including: applying a positive resist composition on the substrate on which a first resist pattern formed of a first resist film is formed to form a second resist film; and selectively exposing the second resist film and alkali-developing the second resist film to form a resist pattern; whereinthe positive resist composition includes a resin component (A) having a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) represented by general formula (a0-2), which exhibits increased solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and an organic solvent (S) which does not dissolve the first resist film, and the resin component (A) and the acid-generator component (B) are dissolved in the organic solvent (S).
摘要翻译：一种正性抗蚀剂组合物，用于在形成正性抗蚀剂图案的方法中形成第二抗蚀剂膜，包括：在其上形成由第一抗蚀剂膜形成的第一抗蚀剂图案的基板上施加正性抗蚀剂组合物，以形成第二抗蚀剂电影; 并且选择性地暴露第二抗蚀剂膜并对第二抗蚀剂膜进行碱显影以形成抗蚀剂图案; 其中正型抗蚀剂组合物包括具有由通式（a0-1）表示的结构单元（a0-1）和由通式（a0-2）表示的结构单元（a0-2））的树脂组分（A），其中在酸的作用下在碱性显影液中的溶解度增加，暴露时产生酸的酸发生剂组分（B）和不溶解第一抗蚀剂膜的有机溶剂（S），树脂组分（A）和酸发生剂组分（B）溶解在有机溶剂（S）中。

62. 发明授权

US07939243B2 Resin, resist composition and method of forming resist pattern 有权
标题翻译：树脂，抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07939243B2
公开(公告)日：2011-05-10
申请号：US12160742
申请日：2006-12-26
申请人： Masaru Takeshita , Jun Iwashita , Takeshi Iwai , Yuji Ohgomori
发明人： Masaru Takeshita , Jun Iwashita , Takeshi Iwai , Yuji Ohgomori
IPC分类号： G03F7/039 , G03F7/038 , G03F7/20 , G03F7/30 , C08F24/00
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/0382 , Y10S430/111
摘要： A resist composition including a base resin component (A) and an acid-generator component (B) which generates acid upon exposure, the component (A) including a resin (A1) which has a structural unit (a0) represented by general formula (a-0) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2 or more.
摘要翻译：包含曝光时产生酸的基础树脂组分（A）和酸产生剂组分（B）的抗蚀剂组合物包括具有由通式（a）表示的结构单元（a0）的树脂（A1）的组分（A） a-0）：其中R表示氢原子，卤素原子，低级烷基或卤代低级烷基; a表示0〜2的整数， b表示1〜3的整数， c表示1〜2的整数， a + b为2以上的整数。

63. 发明授权

US07855044B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07855044B2
公开(公告)日：2010-12-21
申请号：US11993005
申请日：2006-06-16
申请人： Masaru Takeshita , Hideo Hada , Takeshi Iwai
发明人： Masaru Takeshita , Hideo Hada , Takeshi Iwai
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/0045 , Y10S430/111
摘要： A positive resist composition including a resin component (A) and an acid generator component (B), the resin component (A) including a copolymer (A1) having a structural unit (a1) derived from an acrylate ester having a monocyclic or polycyclic group-containing acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing cyclic group, a structural unit (a3) derived from an acrylate ester having a hydroxyl group and/or cyano group-containing polycyclic group, and a structural unit (a4) represented by general formula (a4-1) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; R′ represents a hydrogen atom, a lower alkyl group or an alkoxy group of 1 to 5 carbon atoms; and f represents 0 or 1.
摘要翻译：包含树脂组分（A）和酸产生剂组分（B）的正型抗蚀剂组合物，所述树脂组分（A）包含具有衍生自具有单环或多环基团的丙烯酸酯的结构单元（a1）的共聚物（A1）含有可离解的溶解抑制基团，衍生自具有含内酯环状基团的丙烯酸酯的结构单元（a2），衍生自具有羟基和/或含氰基的丙烯酸酯的结构单元（a3）多环基和由以下通式（a4-1）表示的结构单元（a4）：其中R表示氢原子，卤素原子，低级烷基或卤代低级烷基; R'表示氢原子，低级烷基或碳原子数1〜5的烷氧基。 f表示0或1。

64. 发明授权

US07645559B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07645559B2
公开(公告)日：2010-01-12
申请号：US12064288
申请日：2006-08-16
申请人： Ryoji Watanabe , Masaru Takeshita
发明人： Ryoji Watanabe , Masaru Takeshita
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , C08F220/28 , G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition and method of forming a resist pattern are provided which enable formation of a resist pattern having excellent shape with reduced LWR.The positive resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) having a structural unit (a1) which has an acetal-type protection group, and the acid-generator component (B) including an acid generator (B1) having a cation moiety represented by general formula (b-5) shown below: wherein Ra and Rb each independently represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; Rc represents an aryl group or alkyl group which may or may not have a substituent; and n′ and n″ each independently represents an integer of 0 to 3.
摘要翻译：提供一种正型抗蚀剂组合物和形成抗蚀剂图案的方法，其能够形成具有优异形状的抗蚀剂图案，其具有减小的LWR。正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和在照射时产生酸的酸产生剂组分（B），具有结构单元（a1）的树脂组分（A）具有缩醛型保护基和含有具有下述通式（b-5）表示的阳离子部分的酸发生剂（B1）的酸发生剂成分（B）：其中，Ra和Rb各自独立地表示烷基，烷氧基，卤素原子或羟基; Rc表示可以具有或不具有取代基的芳基或烷基; n'和n“各自独立地表示0〜3的整数。

65. 发明授权

US07638258B2 Positive resist composition and method for resist pattern formation 有权
标题翻译：抗蚀剂图案形成的正型抗蚀剂组成和方法
公开(公告)号：US07638258B2
公开(公告)日：2009-12-29
申请号：US11814916
申请日：2006-01-25
申请人： Masaru Takeshita
发明人： Masaru Takeshita
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/111
摘要： A positive resist composition includes a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the resin component (A) is a mixture of a copolymer (A1) that includes a structural unit (a1) derived from an acrylate ester that contains an acid-dissociable, dissolution-inhibiting group, a structural unit (a2) derived from a methacrylate ester that contains a lactone-containing monocyclic group, and a structural unit (a3) derived from an acrylate ester that contains a polar group-containing polycyclic group, and a copolymer (A2) that has a different structure from the copolymer (A1) and has a lower hydrophilicity than the copolymer (A1).
摘要翻译：正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A）是共聚物 A1），其包含衍生自含有酸解离性溶解抑制基团的丙烯酸酯的结构单元（a1），源自含有内酯单环基团的甲基丙烯酸酯的结构单元（a2）和结构单元由含有极性基团的多环基团的丙烯酸酯衍生的单元（a3）和与共聚物（A1）具有不同结构并且具有比共聚物（A1）低的亲水性的共聚物（A2）。

66. 发明授权

US07575846B2 Resist polymer and resist composition 有权
标题翻译：抗聚合物和抗蚀剂组成
公开(公告)号：US07575846B2
公开(公告)日：2009-08-18
申请号：US10543914
申请日：2004-01-29
申请人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
发明人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
IPC分类号： G03C1/73 , G03F7/039 , C08F120/70 , C08F24/00
CPC分类号： C08F220/28 , G03F7/0397 , Y10S430/111
摘要： The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
摘要翻译：本发明的抗蚀剂聚合物包含具有氰基的特定结构单元，具有酸解离基的结构单元和具有内酯骨架的特定结构单元。当在DUV准分子激光光刻或电子束光刻中使用上述聚合物作为抗蚀剂树脂时，其表现出高灵敏度和高分辨率，并且提供良好的抗蚀剂图案形状，线边缘粗糙度的发生程度小或微凝胶的产生。

67. 发明申请

US20090142700A1 RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 有权
标题翻译：光电组合物树脂，光电组合物和形成电阻图案的方法
公开(公告)号：US20090142700A1
公开(公告)日：2009-06-04
申请号：US12365752
申请日：2009-02-04
申请人： Hideo Hada , Masaru Takeshita , Shogo Matsumaru , Hiroaki Shimizu
发明人： Hideo Hada , Masaru Takeshita , Shogo Matsumaru , Hiroaki Shimizu
IPC分类号： G03F7/20 , C08G63/00 , C08G63/688 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/109 , Y10S430/115
摘要： A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the α-position to the hydroxyl group has at least one electron attractive group.
摘要翻译：公开了用于光致抗蚀剂组合物的树脂，其具有优异的分辨率和线边缘粗糙度特性。还公开了光致抗蚀剂组合物和使用这种树脂形成抗蚀剂图案的方法。该树脂在聚合物末端具有与碳原子键合的羟基，并且与羟基的α-位上的碳原子具有至少一个吸电子基团。

68. 发明申请

US20090042129A1 POSITIVE RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION 有权
标题翻译：积极抗性组合物和抗性图案形成方法
公开(公告)号：US20090042129A1
公开(公告)日：2009-02-12
申请号：US11814916
申请日：2006-01-25
申请人： Masaru Takeshita
发明人： Masaru Takeshita
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , Y10S430/111
摘要： A positive resist composition includes a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the resin component (A) is a mixture of a copolymer (A1) that includes a structural unit (a1) derived from an acrylate ester that contains an acid-dissociable, dissolution-inhibiting group, a structural unit (a2) derived from a methacrylate ester that contains a lactone-containing monocyclic group, and a structural unit (a3) derived from an acrylate ester that contains a polar group-containing polycyclic group, and a copolymer (A2) that has a different structure from the copolymer (A1) and has a lower hydrophilicity than the copolymer (A1).
摘要翻译：正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A）是共聚物 A1），其包含衍生自含有酸解离性溶解抑制基团的丙烯酸酯的结构单元（a1），源自含有内酯单环基团的甲基丙烯酸酯的结构单元（a2）和结构单元由含有极性基团的多环基团的丙烯酸酯衍生的单元（a3）和与共聚物（A1）具有不同结构并且具有比共聚物（A1）低的亲水性的共聚物（A2）。

69. 发明授权

US07482108B2 Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns 失效
标题翻译：高分子化合物，酸发生剂，正性抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07482108B2
公开(公告)日：2009-01-27
申请号：US11572990
申请日：2005-07-01
申请人： Shogo Matsumaru , Masaru Takeshita , Takeshi Iwai , Hideo Hada
发明人： Shogo Matsumaru , Masaru Takeshita , Takeshi Iwai , Hideo Hada
IPC分类号： G30F7/00 , G30F7/004
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/38 , G03F7/0397 , Y10S430/106 , Y10S430/114
摘要： The invention provides a polymer compound capable of forming a positive resist composition that can form a high-resolution pattern with a reduced level of LER, an acid generator formed from such a polymer compound, a positive resist composition that includes such a polymer compound, and a method for forming a resist pattern that uses such a positive resist composition. The polymer compound includes a structural unit (a1) derived from an (α-lower alkyl) acrylate ester having an acid-dissociable, dissolution-inhibiting group, a structural unit (a2) represented by a general formula (a2-1) shown below [wherein, R represents a hydrogen atom or a lower alkyl group; A represents a divalent organic group; B represents a monovalent organic group; X represents a sulfur atom or iodine atom; n represents either 1 or 2; and Y represents a straight-chain, branched or cyclic alkyl group in which at least one hydrogen atom may be substituted with a fluorine atom], and a structural unit (a3) derived from an (α-lower alkyl) acrylate ester that contains a polar group-containing aliphatic polycyclic group.
摘要翻译：本发明提供一种能够形成正性抗蚀剂组合物的高分子化合物，其可以形成具有降低的LER水平的高分辨率图案，由这种高分子化合物形成的酸发生剂，包含这种高分子化合物的正性抗蚀剂组合物和形成使用这种正性抗蚀剂组合物的抗蚀剂图案的方法。高分子化合物包括衍生自具有酸解离性，溶解抑制基团的（α-低级烷基）丙烯酸酯的结构单元（a1），由以下所示的通式（a2-1）表示的结构单元（a2） [式中，R表示氢原子或低级烷基; A表示二价有机基团; B表示一价有机基团; X表示硫原子或碘原子; n表示1或2; 和Y表示其中至少一个氢原子可被氟原子取代的直链，支链或环状烷基]和衍生自（α-低级烷基）丙烯酸酯的结构单元（a3），其包含含极性基团的脂族多环基团。

70. 发明申请

US20070275307A1 Resist Composition and Method for Forming Resist Pattern 有权
标题翻译：抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US20070275307A1
公开(公告)日：2007-11-29
申请号：US10576405
申请日：2004-10-20
申请人： Hideo Hada , Masaru Takeshita , Ryotaro Hayashi , Syogo Matsumaru , Taku Hirayama , Hiroaki Shimizu
发明人： Hideo Hada , Masaru Takeshita , Ryotaro Hayashi , Syogo Matsumaru , Taku Hirayama , Hiroaki Shimizu
IPC分类号： H01L21/027 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/122
摘要： A resist composition is provided that yields fine resolution, and improved levels of line edge roughness and depth of focus. This composition includes a resin component (A) that undergoes a change in alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a resin with a weight average molecular weight of no more than 8,000 containing structural units (a) derived from a (meth)acrylate ester, and the component (B) includes at least one sulfonium compound represented by a general formula (b-1) or a general formula (b-2) shown below.
摘要翻译：提供了抗蚀剂组合物，其产生精细的分辨率，并且改善了线边缘粗糙度和聚焦深度的水平。该组合物包含在酸作用下发生碱溶解性变化的树脂成分（A）和暴露时产生酸的酸发生剂成分（B），其中，成分（A）为重均分子量由（甲基）丙烯酸酯衍生的含有结构单元（a）的重量不大于8,000，组分（B）包括至少一种由通式（b-1）或通式（b- 2）如下所示。

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