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61. 发明授权

US08341518B2 Report format setting method and apparatus, and defect review system 有权
标题翻译：报告格式设定方法和设备，缺陷审查系统
公开(公告)号：US08341518B2
公开(公告)日：2012-12-25
申请号：US12901954
申请日：2010-10-11
申请人： Takehiro Hirai
发明人： Takehiro Hirai
IPC分类号： G06F17/00
CPC分类号： G06F8/10
摘要： Generated is a template edition screen on which to display components of a report as modules by OSD by use of icons. One of the icons is selected by use of a pointing device including a mouse. By a drag-and-drop operation, the icon is placed at a desired position in an output format setup area formed in the same screen. The icon is set in a desired size by another drag-and-drop operation. Details of a module shown by the icon thus placed can be set up in a detail setup area in the same screen. Information on a format thus set up is retained as a template through a retention function, and accordingly can be used easily by simply calling the information. Moreover, the retained template can be edited as well. This makes it possible not only to create a new template, but also to modify an existing template.
摘要翻译：生成的是一个模板编辑屏幕，通过使用图标，通过OSD显示报告的组件作为模块。通过使用包括鼠标的指示设备来选择其中一个图标。通过拖放操作，将图标放置在同一屏幕中形成的输出格式设置区域中的所需位置。通过另一个拖放操作将图标设置为所需的大小。由此放置的图标所示的模块的细节可以在同一屏幕的详细设置区域中设置。关于通过保留功能将由此设置的格式的信息作为模板保留，因此可以通过简单地调用信息来容易地使用。此外，还可以编辑保留的模板。这样做不仅可以创建新的模板，还可以修改现有的模板。

62. 发明授权

US08330248B2 Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method 有权
标题翻译：半导体装置，半导体装置制造用掩模和光学邻近校正方法
公开(公告)号：US08330248B2
公开(公告)日：2012-12-11
申请号：US13014346
申请日：2011-01-26
申请人： Yasuko Tabata , Akio Misaka , Takehiro Hirai , Hideyuki Arai , Yuji Nonami
发明人： Yasuko Tabata , Akio Misaka , Takehiro Hirai , Hideyuki Arai , Yuji Nonami
IPC分类号： H01L31/23
CPC分类号： G06F17/5068 , G03F1/36 , G03F1/38 , H01L21/28123 , H01L21/31144 , H01L21/32139 , H01L27/0207
摘要： A semiconductor device includes a circuit portion including at least one real feature, and a plurality of dummy feature groups each including a plurality of dummy features spaced apart from each other by a first distance. The plurality of dummy feature groups are spaced apart from each other by a second distance larger than the first distance, and the circuit portion and the plurality of dummy feature groups are spaced apart from each other by the second distance.
摘要翻译：半导体器件包括包括至少一个实际特征的电路部分和多个虚拟特征组，每个虚拟特征组包括彼此间隔开第一距离的多个虚拟特征。多个虚拟特征组彼此间隔开大于第一距离的第二距离，并且电路部分和多个虚拟特征组彼此间隔开第二距离。

63. 发明申请

US20120305767A1 Pattern Inspection Method, Pattern Inspection Program, and Electronic Device Inspection System 有权
标题翻译：模式检验方法，模式检验程序和电子设备检测系统
公开(公告)号：US20120305767A1
公开(公告)日：2012-12-06
申请号：US13577568
申请日：2011-02-09
申请人： Yasutaka Toyoda , Tomohiro Funakoshi , Takehiro Hirai
发明人： Yasutaka Toyoda , Tomohiro Funakoshi , Takehiro Hirai
IPC分类号： G06K9/46 , H01J37/26
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/24495 , H01L22/12
摘要： It is an object of the present invention to provide a technique capable of accurately inspecting a circuit pattern in which the contrast of an observation image is not clear, like a circuit pattern having a multilayer structure. A pattern inspection method according to the present invention divides a circuit pattern using the brightness of a reflection electron image and associates the region in the reflection electron image belonging to each division with the region in a secondary electron image (see FIG. 3).
摘要翻译：本发明的目的是提供一种能够精确地检查观察图像的对比度不清晰的电路图案的技术，如具有多层结构的电路图案。根据本发明的图案检查方法使用反射电子图像的亮度来划分电路图案，并且将属于每个划分的反射电子图像中的区域与二次电子图像中的区域相关联（参见图3）。

64. 发明申请

US20120257041A1 METHOD FOR DEFECT INSPECTION AND APPARATUS FOR DEFECT INSPECTION 审中-公开
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120257041A1
公开(公告)日：2012-10-11
申请号：US13513258
申请日：2010-11-22
申请人： Ryo Nakagaki , Minoru Harada , Takehiro Hirai , Yuji Takagi
发明人： Ryo Nakagaki , Minoru Harada , Takehiro Hirai , Yuji Takagi
IPC分类号： H04N7/18
CPC分类号： H01J37/28 , H01J2237/24592 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Provided is a technique for a wafer inspection conducted by simple operation, which is useful even when the inspection covers a variety of items and the inspection items are changed frequently with time like in a start-up period of a semi-conductor process. According to the technique, inspection images are collected, and then a template is prepared from the inspection images. A plurality of regions are defined on the template, and inspection methods and output indexes are registered in correspondence with the respective regions. In the inspection, by reference to the template images corresponding to the derived inspection images, the inspection is conducted based on the inspection information registered therein and the quantitative output levels are calculated.
摘要翻译：提供了一种通过简单的操作进行的晶片检查的技术，即使在检查覆盖各种物品并且检查项目在半导体处理的启动期间随时间频繁地变化也是有用的。根据该技术，收集检查图像，然后从检查图像准备模板。在模板上定义多个区域，并且与各个区域对应地登记检查方法和输出索引。在检查中，参考与导出的检查图像对应的模板图像，基于登记在其中的检查信息进行检查，并计算定量输出水平。

65. 发明授权

US07925367B2 Defect review and classification system 有权
标题翻译：缺陷审查和分类制度
公开(公告)号：US07925367B2
公开(公告)日：2011-04-12
申请号：US12573463
申请日：2009-10-05
申请人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
发明人： Takehiro Hirai , Kazuo Aoki , Kenji Obara
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32218 , Y02P90/22
摘要： The invention proposes a system that interrupts a processing associated with an ADC having low priority when an ADC processing cannot catch up with ADR by an ADC alone that is not under execution but uses an ADC for an ADR having high priority. To preferentially execute ADR/ADC having high priority, the invention employs an algorithm for serially selecting ADR/ADC in the order of higher processing capacity (in the order of greater numerical values in the expression by a DPH unit) from among ADR/ADCs that have the lowest priority, no matter whether the ADR/DC is now under execution or not.
摘要翻译：本发明提出了一种系统，当ADC处理不能通过一个ADC不能跟踪ADR而不能执行但对具有高优先级的ADR使用ADC时，中断与具有低优先级的ADC相关联的处理的系统。为了优先执行具有高优先级的ADR / ADC，本发明采用一种用于从ADR / ADC中的处理能力较高（按DPH单元的表达式中的较大数值的数量级）的顺序选择ADR / ADC的算法，优先级最低，无论ADR / DC是否在执行中。

66. 发明授权

US07873205B2 Apparatus and method for classifying defects using multiple classification modules 有权
标题翻译：使用多个分类模块分类缺陷的装置和方法
公开(公告)号：US07873205B2
公开(公告)日：2011-01-18
申请号：US10809464
申请日：2004-03-26
申请人： Hirohito Okuda , Yuji Takagi , Toshifumi Honda , Atsushi Miyamoto , Takehiro Hirai
发明人： Hirohito Okuda , Yuji Takagi , Toshifumi Honda , Atsushi Miyamoto , Takehiro Hirai
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06K9/6277 , G06K9/6292 , G06T2207/30141 , G06T2207/30148
摘要： A classification model optimum for realization of a defect classification request by a user is not known by the user. Then, the user sets a classification model which is not necessarily suitable and makes classification, resulting in degradation in classification performance. Therefore, the present invention automatically generates plural potential classification models and combines class likelihoods calculated from the plural classification models to classify. To combine, an index about the adequacy of each model, in other words, an index indicating a reliable level of likelihood calculated from the each potential classification model, is also calculated. Considering the calculated result, the class likelihoods calculated from the plural classification models are combined to execute classification.
摘要翻译：用户实现缺陷分类请求最优的分类模型是用户不知道的。然后，用户设置不一定适合的分类模型，进行分类，导致分类性能下降。因此，本发明自动生成多个潜在分类模型，并且将从多个分类模型计算出的类似度进行分类。为了组合，还计算了关于每个模型的充分性的指数，换句话说，表示从每个潜在分类模型计算的可靠的似然水平的指数。考虑到计算结果，将从多个分类模型计算的类似度组合起来进行分类。

67. 发明授权

US07836398B2 Report format setting method and apparatus, and defect review system 有权
标题翻译：报告格式设定方法和设备，缺陷审查系统
公开(公告)号：US07836398B2
公开(公告)日：2010-11-16
申请号：US11699063
申请日：2007-01-29
申请人： Takehiro Hirai
发明人： Takehiro Hirai
IPC分类号： G06F17/00 , G06K9/00 , G01M19/00
CPC分类号： G06F8/10
摘要： Generated is a template edition screen on which to display components of a report as modules by OSD by use of icons. One of the icons is selected by use of a pointing device including a mouse. By a drag-and-drop operation, the icon is placed at a desired position in an output format setup area formed in the same screen. The icon is set in a desired size by another drag-and-drop operation. Details of a module shown by the icon thus placed can be set up in a detail setup area in the same screen. Information on a format thus set up is retained as a template through a retention function, and accordingly can be used easily by simply calling the information. Moreover, the retained template can be edited as well. This makes it possible not only to create a new template, but also to modify an existing template.
摘要翻译：生成的是一个模板编辑屏幕，通过使用图标，通过OSD显示报告的组件作为模块。通过使用包括鼠标的指示设备来选择其中一个图标。通过拖放操作，将图标放置在同一屏幕中形成的输出格式设置区域中的所需位置。通过另一个拖放操作将图标设置为所需的大小。由此放置的图标所示的模块的细节可以在同一屏幕的详细设置区域中设置。关于通过保留功能将由此设置的格式的信息作为模板保留，因此可以通过简单地调用信息来容易地使用。此外，还可以编辑保留的模板。这样做不仅可以创建新的模板，还可以修改现有的模板。

68. 发明授权

US07656171B2 Method and apparatus for reviewing defects by detecting images having voltage contrast 有权
标题翻译：通过检测具有电压对比度的图像来检查缺陷的方法和装置
公开(公告)号：US07656171B2
公开(公告)日：2010-02-02
申请号：US12285894
申请日：2008-10-16
申请人： Toshifumi Honda , Takehiro Hirai
发明人： Toshifumi Honda , Takehiro Hirai
IPC分类号： G01R31/305
CPC分类号： G01R31/307 , G01R31/2884 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/221 , H01J2237/24564 , H01J2237/2487 , H01J2237/2594 , H01J2237/2817 , H01J2237/30416
摘要： A method and apparatus for detecting defects includes irradiating and scanning an electron beam focused on an area of a sample, detecting charged particles generated from the sample by the irradiating and scanning of the electron beam with a first detector which detects charged particles having relatively low energy to obtain a first image of the area and with a second detector which detects charged particles having relatively high energy to obtain a second image of the area, comparing the first inspection image of the area with a first reference image to generate a first difference image, and comparing obtained second image of the area with a second reference image to generate a second difference image, and detecting an open defect or a short defect from at least one of the generated first difference image and the second difference image.
摘要翻译：用于检测缺陷的方法和装置包括：照射和扫描聚焦在样品区域上的电子束，通过用检测具有相对较低能量的带电粒子的第一检测器对电子束进行照射和扫描来检测从样品产生的带电粒子为了获得该区域的第一图像，并且利用检测具有相对较高能量的带电粒子以获得该区域的第二图像的第二检测器，将该区域的第一检查图像与第一参考图像进行比较以生成第一差分图像，以及将获得的区域的第二图像与第二参考图像进行比较以产生第二差分图像，并且从所生成的第一差分图像和第二差分图像中的至少一个检测开放缺陷或短缺陷。

69. 发明申请

US20090222753A1 DEFECT INSPECTION TOOL AND METHOD OF PARAMETER TUNING FOR DEFECT INSPECTION TOOL 有权
标题翻译：缺陷检查工具和缺陷检查工具参数调试方法
公开(公告)号：US20090222753A1
公开(公告)日：2009-09-03
申请号：US12370784
申请日：2009-02-13
申请人： Kohei YAMAGUCHI , Kenji Obara , Takehiro Hirai
发明人： Kohei YAMAGUCHI , Kenji Obara , Takehiro Hirai
IPC分类号： G06F3/048 , G06K9/00 , G06F19/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148
摘要： Setting of a parameter of a defect inspection tool is based on trial and error in which effects are confirmed one by one and set, and the setting requires a high technique and is significantly inefficient. The present invention is to provide an inspection method and an inspection tool capable of solving such a problem and of setting the parameter (hereinafter, referred to as an inspection parameter) required for detecting the defect easily.In order to solve the problem, a defect inspection tool according to the present invention is provided with image obtaining unit for obtaining an image by applying an electron beam to a specimen; an image processing unit for performing a calculation process by using each predetermined inspection parameter group based on the image obtained by the image obtaining unit; and a parameter tuning unit for performing a process to determine an effective inspection parameter group from calculation results by the calculation process and narrowing down an inspection parameter group range by repeating the process for a plurality of images obtained by the image obtaining unit, and is provided with a configuration to detect the defect by using the inspection parameter group narrowed down.
摘要翻译：缺陷检查工具的参数设置是基于一个一个确认效果并进行设置的试错法，设定要求较高的技术，效果显着。本发明提供一种能够解决这样的问题的检查方法和检查工具，并且容易地设定检测缺陷所需的参数（以下称为检查参数）。为了解决这个问题，根据本发明的缺陷检查工具设置有图像获取单元，用于通过向样本施加电子束来获得图像; 图像处理单元，用于基于由图像获取单元获得的图像，使用每个预定检查参数组来执行计算处理; 以及参数调整单元，用于通过计算处理执行从计算结果确定有效检查参数组的处理，并通过重复由图像获取单元获得的多个图像的处理来缩小检查参数组范围，并且提供通过使用缩小的检查参数组来检测缺陷。

70. 发明申请

US20090045335A1 INSPECTION METHOD FOR SEMICONDUCTOR WAFER FOR REVIEWING DEFECTS 有权
标题翻译：用于检查缺陷的半导体波形检测方法
公开(公告)号：US20090045335A1
公开(公告)日：2009-02-19
申请号：US11607906
申请日：2006-12-04
申请人： Kenji Obara , Takehiro Hirai
发明人： Kenji Obara , Takehiro Hirai
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J37/222 , H01J37/244 , H01J37/26 , H01J37/28 , H01J2237/24475 , H01J2237/2448 , H01J2237/24592 , H01J2237/28 , H01J2237/2809 , H01J2237/2817
摘要： An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.
摘要翻译：本发明的目的是提供一种使用电子显微镜观察晶片边缘的合适方法。电子显微镜包括可以使图像倾斜的列，从而允许从倾斜方向观察晶片边缘。

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