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    • 61. 发明授权
    • Low-noise, fast-lock phase-lock loop with “gearshifting” control
    • 具有“换档”控制的低噪声,快速锁定锁相环
    • US06504437B1
    • 2003-01-07
    • US09891595
    • 2001-06-26
    • Dale H. NelsonLizhong Sun
    • Dale H. NelsonLizhong Sun
    • H03L700
    • H03L7/107H03L7/0898H03L7/1972
    • A phase-lock loop (PLL) circuit provides fast locking and low spurious modulation jitter through “gearshifting” control. The gearshifting PLL combines the advantages of low jitter from integer-N PLL and fast locking from fractional-N PLL. The PLL circuit includes a phase/frequency detector, a charge pump, a loop filter, and a voltage controlled oscillator (VCO). Control of the PLL circuit includes configuring the PLL circuit in two configurations, one for each phase of operation. The bandwidth of the loop filter is increased during the first phase of operation and the circuit is locked to a frequency that is close to the desired output frequency. During the second phase, the bandwidth of the loop filter is decreased and the circuit is locked to the desired frequency. The first configuration provides a relatively fast lock time compared to the lock time provided by the second configuration. The second configuration provides more stability than the first configuration.
    • 锁相环(PLL)电路通过“换档”控制提供快速锁定和低杂散调制抖动。 换档PLL结合了来自整数N PLL的低抖动和分数N PLL的快速锁定的优点。 PLL电路包括相位/频率检测器,电荷泵,环路滤波器和压控振荡器(VCO)。 PLL电路的控制包括将PLL电路配置为两种配置,一种用于每个操作阶段。 环路滤波器的带宽在操作的第一阶段增加,并且电路被锁定到接近期望输出频率的频率。 在第二阶段期间,环路滤波器的带宽减小并且电路被锁定到期望的频率。 与由第二配置提供的锁定时间相比,第一配置提供相对较快的锁定时间。 第二种配置提供比第一种配置更多的稳定性。
    • 63. 发明授权
    • Charge pump for low-voltage, low-jitter phase locked loops
    • 电荷泵用于低电压,低抖动锁相环
    • US06278332B1
    • 2001-08-21
    • US09504515
    • 2000-02-15
    • Dale Harvey NelsonLizhong Sun
    • Dale Harvey NelsonLizhong Sun
    • H03L7085
    • H03L7/0896H03L7/18
    • An integrated circuit has a phase-locked loop (PLL) frequency synthesizer circuit which has a charge pump circuit for providing an output control voltage to adjust an oscillator frequency in response to fast and slow signals provided by a phase detector. The charge pump circuit has first and second current sources, and a switching network for selectively coupling, in response to said fast signal, the first current source to one of an internal node and an output node coupled to an output capacitor and having an output voltage, and, in response to said slow signal, the second current source to one of the internal node and the output node. The charge pump circuit has first and second unity gain buffers coupled in parallel at their inputs to the output node and at their outputs to the internal node, wherein the first buffer is configured to have a voltage tracking range approximately up to a positive supply rail and the second buffer is configured to have a voltage tracking range approximately down to a negative supply rail, wherein the voltage tracking ranges of said buffers overlap each other, to provide an overall substantially rail-to-rail voltage tracking range.
    • 集成电路具有锁相环(PLL)频率合成器电路,其具有电荷泵电路,用于提供输出控制电压以响应由相位检测器提供的快速和慢速信号来调节振荡器频率。 电荷泵电路具有第一和第二电流源,以及开关网络,用于响应于所述快速信号,将第一电流源选择性地耦合到耦合到输出电容器并且具有输出电压的内部节点和输出节点之一 并且响应于所述慢信号,将第二电流源连接到内部节点和输出节点之一。 电荷泵电路具有第一和第二单位增益缓冲器,它们在其输入处并联耦合到输出节点并且在其输出端处耦合到内部节点,其中第一缓冲器被配置为具有大约高达正的供电轨的电压跟踪范围, 第二缓冲器被配置为具有大致低于负电源轨的电压跟踪范围,其中所述缓冲器的电压跟踪范围彼此重叠,以提供总体上基本上轨至轨的电压跟踪范围。
    • 66. 发明申请
    • METHODS AND APPARATUS FOR OPERATING AN INKJET PRINTING SYSTEM
    • 一种喷墨打印系统的操作方法和装置
    • US20070256709A1
    • 2007-11-08
    • US11741722
    • 2007-04-28
    • QUANYUAN SHANGShinichi KuritaLizhong Sun
    • QUANYUAN SHANGShinichi KuritaLizhong Sun
    • B08B7/04B08B13/00B08B3/08B08B7/00
    • B41J2/1606B41J2/16552B41J2202/03B41J2202/09Y10T29/49
    • The invention provides a method of operating a inkjet printing system that may include a print head parking structure and a print head cleaning station. A print head parking structure may include a solvent and/or nozzle surface treatment bath for inkjet print heads. Print heads may be returned to the print head parking structure after a substrate has been printed, after one or more printing passes, and/or frequently enough to prevent ink from drying on or clogging the print heads. Once sealed within the print head parking structure, the print heads (or a portion thereof) may be dipped in a solvent bath to dissolve or wash away any ink that has been deposited on the print heads. The print heads may be coated with a surface treatment that improves jetting reliability. The print heads may be dried and moved to the print head cleaning station where they may be wiped and pre-jetting may be performed.
    • 本发明提供了一种操作可包括打印头停车结构和打印头清洁站的喷墨打印系统的方法。 打印头停车结构可以包括用于喷墨打印头的溶剂和/或喷嘴表面处理槽。 在印刷一个或多个印刷之后,和/或经常足以防止油墨干燥或堵塞打印头,印刷头可以在印刷基板之后返回打印头停车结构。 一旦密封在打印头停车结构中,打印头(或其一部分)可以浸入溶剂浴中以溶解或洗去已经沉积在打印头上的任何油墨。 打印头可以涂覆有提高喷射可靠性的表面处理。 打印头可以被干燥并移动到打印头清洁站,在那里可以擦拭并且可以进行预喷射。
    • 69. 发明授权
    • Methods for reducing delamination during chemical mechanical polishing
    • 在化学机械抛光过程中减少分层的方法
    • US07037174B2
    • 2006-05-02
    • US10678906
    • 2003-10-03
    • Yufei ChenLizhong SunDoohan LeeWei-Yung Hsu
    • Yufei ChenLizhong SunDoohan LeeWei-Yung Hsu
    • B49D1/00
    • B24B37/042B24B49/006H01L21/02074H01L21/3212Y02P70/605
    • Method and apparatus are provided for polishing substrates comprising conductive and low k dielectric materials with reduced or minimum substrate surface damage and delamination. In one aspect, a method is provided for processing a substrate including positioning a substrate having a conductive material form thereon in a polishing apparatus having a rotational carrier head and a rotatable platen, wherein the substrate is disposed in the rotational carrier head and the platen has a polishing article disposed thereon, rotating the first carrier head at a first carrier head rotational rate and rotating a platen at a first platen rotational rate, contacting the substrate and the polishing article, accelerating the first carrier head rotational rate to a second carrier head rotational rate and accelerating the first platen rotational rate to a second platen rotational rate, and polishing the substrate at the second carrier head rotational rate and at the second platen rotational rate.
    • 提供了用于抛光衬底的方法和装置,其包括具有降低或最小衬底表面损伤和分层的导电和低k电介质材料。 一方面,提供了一种处理衬底的方法,包括在具有旋转载体头和可旋转压板的抛光装置中定位其上具有导电材料的衬底,其中衬底设置在旋转载体头部中,并且压板具有 设置在其上的抛光制品,以第一载体头旋转速率旋转第一载体头并以第一压板旋转速率旋转压板,使基板和抛光制品接触,将第一载体头旋转速率加速到第二载体头旋转 速度并将第一压板转速加速到第二压板旋转速率,并以第二承载头转速和第二压板旋转速率抛光衬底。