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61. 发明申请

US20070070099A1 METHODS AND APPARATUS FOR INKJET PRINTING ON NON-PLANAR SUBSTRATES 审中-公开
标题翻译：用于印刷非平板基板的方法和装置
公开(公告)号：US20070070099A1
公开(公告)日：2007-03-29
申请号：US11536533
申请日：2006-09-28
申请人： Emanuel Beer , Chang Lin , Shinichi Kurita , Quanyuan Shang , Benjamin Johnston
发明人： Emanuel Beer , Chang Lin , Shinichi Kurita , Quanyuan Shang , Benjamin Johnston
IPC分类号： B41J25/308
CPC分类号： B41J2/0456 , B41J2/0458 , B41J2/04588 , B41J3/28 , B41J3/4073 , B41J11/0035 , B41J25/308 , G02F1/1303 , G02F1/133516
摘要： A sensor apparatus for an inkjet printing device is provided. The sensor apparatus may include 1) at least one print head adapted to deposit ink on a top surface of a substrate, wherein the substrate is in motion relative to the print head, 2) at least one sensor adapted to detect the distance of the at least one sensor from the top surface of the substrate, and 3) a controller adapted to determine the substrate to nozzle distance based on the distance of the sensor to the top surface of the substrate, and adjust the trajectory of the ink being deposited on the substrate based on the substrate to nozzle distance. Numerous other aspects are provided.
摘要翻译：提供了一种用于喷墨打印装置的传感器装置。所述传感器装置可以包括：1）适于将墨水沉积在基底的顶表面上的至少一个打印头，其中所述基底相对于所述打印头运动; 2）至少一个传感器，适于检测所述at 至少一个传感器，以及3）控制器，其适于基于所述传感器与所述基板顶表面的距离来确定所述基板与喷嘴的距离，并且调整沉积在所述基板上的所述油墨的轨迹基板基于基板与喷嘴的距离。提供了许多其他方面。

62. 发明申请

US20060156975A1 Integrated apparatus of substrate treatment for manufacturing of color filters by inkjet printing systems 审中-公开
标题翻译：用于通过喷墨印刷系统制造滤色器的基板处理的集成设备
公开(公告)号：US20060156975A1
公开(公告)日：2006-07-20
申请号：US11180364
申请日：2005-07-13
申请人： Fan Sze , Quanyuan Shang , John White
发明人： Fan Sze , Quanyuan Shang , John White
IPC分类号： B05D5/12 , B05C5/00 , B05B7/06
CPC分类号： G02F1/133516 , G02F1/133512
摘要： Embodiments of the invention describe an apparatus and a method for treating a substrate of flat panel display is provided. In one embodiment, an inkjet printing system for a substrate of flat panel display comprises a chemical compound application assembly that applies chemical compound(s) on the substrate of flat panel display, a stage that supports the substrate of flat panel display and a stage positioning system that moves the stage, and an inkjet printing module that dispenses inkjet on the substrate of flat panel display. In another embodiment, a processing system for a substrate of flat panel display comprises a chemical compound application assembly that applies chemical compound(s) on the substrate of flat panel display wherein the chemical compound application assembly has a chemical compound applicator whose width substantially spans the width of the substrate of flat panel display, and a stage that supports the substrate of flat panel display and a stage positioning system that moves the stage. In another embodiment, a method of processing a substrate of flat panel display comprises depositing a layer comprising a chemical compound on the surface of a substrate of flat panel display by a chemical compound application assembly, whose width spans substantially the width of the substrate of flat panel display, of a processing system, and then inkjetting at least three colors on the substrate of flat panel display by an inkjet printing module of the processing system.
摘要翻译：本发明的实施例提供了一种用于处理平板显示器的基板的设备和方法。在一个实施例中，用于平板显示器的基板的喷墨打印系统包括在平板显示器的基板上施加化学化合物的化合物施加组件，支撑平板显示器的基板的台阶和平台定位移动台的系统以及在平板显示器的基板上分配喷墨的喷墨打印模块。在另一个实施例中，一种用于平板显示器的基板的处理系统包括化学化合物应用组件，该化合物施用组件在平板显示器的基板上施加化学化合物，其中化合物施用组件具有化学复合施用器，其宽度基本上跨越平板显示器的基板的宽度，以及支撑平板显示器的基板的台和使台阶移动的台架定位系统。在另一个实施例中，一种处理平板显示器的基板的方法包括通过化学化合物施加组件在平板显示器的基板的表面上沉积包含化合物的层，其宽度基本上跨过平面的基板的宽度面板显示器，然后通过处理系统的喷墨打印模块在平板显示器的基板上喷墨至少三种颜色。

63. 发明授权

US07031600B2 Method and apparatus for silicon oxide deposition on large area substrates 有权
公开(公告)号：US07031600B2
公开(公告)日：2006-04-18
申请号：US10409466
申请日：2003-04-07
申请人： Sanjay D. Yadav , Quanyuan Shang , Wendell T. Blonigan
发明人： Sanjay D. Yadav , Quanyuan Shang , Wendell T. Blonigan
IPC分类号： C23C14/00
CPC分类号： C23C16/402 , C23C16/4485
摘要： A method and apparatus for depositing a dielectric material at a rate of at least 3000 Angstroms per minute on a large area substrate that has a surface area of at least about 0.35 square meters is provided. In one embodiment, the dielectric material is silicon oxide. Also provided is a large area substrate having a layer of dielectric material deposited by a process yielding a deposition rate in excess of about 3000 Angstroms per minute and a processing chamber for fabricating the same.

64. 发明申请

US20050255244A1 Lifting glass substrate without center lift pins 审中-公开
标题翻译：提升玻璃基板，无中心升降针
公开(公告)号：US20050255244A1
公开(公告)日：2005-11-17
申请号：US11188375
申请日：2005-07-25
申请人： Li Hou , Quanyuan Shang , Robert Greene
发明人： Li Hou , Quanyuan Shang , Robert Greene
IPC分类号： H01L21/687 , C23C16/00 , H05H1/24
CPC分类号： H01L21/68742 , H01L21/68778
摘要： A method for lifting a substrate from a susceptor. A plurality of lift pins is configured so that they support the substrate without contacting a central portion of the substrate. The processed substrate has a first dimension that is at least 500 millimeters and a second dimension that is at least 500 millimeters. Each lift pin in the plurality of lift pins is configured so that it supports the substrate from a point that is at least 120 millimeters from a center of the substrate. The plurality of lift pins is configured so that each side of the susceptor is supported by at least three lift pins. In some embodiments, a support member overlies at least a subset of the plurality of lift pins.
摘要翻译：一种用于从基座提起基板的方法。多个提升销构造成使得它们支撑基板而不接触基板的中心部分。经处理的基底具有至少500毫米的第一尺寸和至少500毫米的第二尺寸。多个提升销中的每个提升销被构造成使得其从距衬底的中心至少120毫米的点支撑衬底。多个提升销构造成使得基座的每侧由至少三个提升销支撑。在一些实施例中，支撑构件覆盖多个提升销的至少一个子集。

65. 发明申请

US20050253917A1 Method for forming color filters in flat panel displays by inkjetting 审中-公开
标题翻译：通过喷墨在平板显示器中形成滤色器的方法
公开(公告)号：US20050253917A1
公开(公告)日：2005-11-17
申请号：US10845629
申请日：2004-05-13
申请人： Quanyuan Shang , Fan Cheung Sze , John White
发明人： Quanyuan Shang , Fan Cheung Sze , John White
IPC分类号： G02B5/20 , B41M5/20 , B41M7/00 , G02B5/23 , G02F1/1335
CPC分类号： G02F1/133516 , B41M7/0072 , B41M7/0081
摘要： A method for forming color filters for flat panel displays comprising dispensing color inks into a pre-patterned matrix using an inkjet device and curing the dispensed color inks. In one aspect, the color inks are cured in a concave configuration. In another aspect, the color inks are cured using electron beam, laser, X-ray, or other suitable high energy source.
摘要翻译：一种用于形成用于平板显示器的滤色器的方法，包括使用喷墨装置将彩色油墨分散到预先图案化的基质中并固化所分配的彩色油墨。在一个方面，彩色油墨以凹形构型固化。另一方面，彩色油墨使用电子束，激光，X射线或其他合适的高能量源固化。

66. 发明授权

US06869838B2 Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications 失效
标题翻译：沉积有源矩阵液晶显示（AMLCD）应用的钝化层
公开(公告)号：US06869838B2
公开(公告)日：2005-03-22
申请号：US10118864
申请日：2002-04-09
申请人： Kam Law , Quanyuan Shang , William Reid Harshbarger , Dan Maydan
发明人： Kam Law , Quanyuan Shang , William Reid Harshbarger , Dan Maydan
IPC分类号： H01L21/336 , H01L27/10
CPC分类号： H01L29/66757 , H01L29/66765 , H01L2924/0002 , H01L2924/00
摘要： A method of passivation layer deposition using a cyclical deposition process is described. The cyclical deposition process may comprise alternately adsorbing a silicon-containing precursor and a reactant gas on a substrate structure. Thin film transistors, such as a bottom-gate transistor or a top-gate transistor, including a silicon-containing passivation layer, may be formed using such cyclical deposition techniques.
摘要翻译：描述了使用循环沉积工艺的钝化层沉积的方法。循环沉积工艺可以包括在衬底结构上交替地吸附含硅前体和反应气体。可以使用这种循环沉积技术来形成包括含硅钝化层的诸如底栅晶体管或顶栅晶体管的薄膜晶体管。

67. 发明授权

US06858548B2 Application of carbon doped silicon oxide film to flat panel industry 失效
标题翻译：碳掺杂氧化硅膜应用于平板工业
公开(公告)号：US06858548B2
公开(公告)日：2005-02-22
申请号：US10125961
申请日：2002-04-18
申请人： Tae Kyung Won , Quanyuan Shang , William R. Harshbarger
发明人： Tae Kyung Won , Quanyuan Shang , William R. Harshbarger
IPC分类号： C23C16/40 , C23C16/509 , G02F1/1362 , H01L21/77 , H01L21/84 , H01L27/12 , H01L21/31 , H01L21/469
CPC分类号： G02F1/1362 , C23C16/401 , C23C16/5096 , G02F1/136227 , H01L27/1248 , Y10T428/31663
摘要： A process for depositing a low dielectric constant layer (k
摘要翻译：一种用于在平板显示器和平板显示器上沉积低介电常数层（k <3）的工艺。该方法包括使一种或多种有机硅化合物与含氧化合物以约0.345W / cm 2至约1.265W / cm 2的RF功率水平反应。平板显示器包括具有第一基板，沉积在第一基板上的多个屏障，第二基板，沉积在第二基板上的低介电常数层（k <3）的等离子体显示面板，以及多个接地电极形成在阻挡层和电介质层之间。

68. 发明授权

US06857387B1 Multiple frequency plasma chamber with grounding capacitor at cathode 失效
标题翻译：多频等离子体室，阴极接地电容
公开(公告)号：US06857387B1
公开(公告)日：2005-02-22
申请号：US09563963
申请日：2000-05-03
申请人： Sheng Sun , Jeff C. Olsen , Sanjay Yadav , Quanyuan Shang , Kam S. Law
发明人： Sheng Sun , Jeff C. Olsen , Sanjay Yadav , Quanyuan Shang , Kam S. Law
IPC分类号： H05H1/46 , B01J19/08 , C23C16/34 , C23C16/509 , C23C16/52 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/31 , C23C16/505 , C23F1/00 , H01L21/306
CPC分类号： C23C16/5096 , C23C16/345 , C23C16/52 , H01J37/32082 , H01J37/32165
摘要： An apparatus and method for fabricating an electronic workpiece in which first and second electrodes within a plasma chamber are respectively connected to low frequency and high frequency RF power supplies. At least one capacitor is connected between the first electrode and electrical ground. The one or more capacitors can reduce or eliminate the coupling of high frequency RF power to any plasma outside the region directly between the two electrodes. Consequently, the invention can improve the performance of the plasma process by concentrating more of the RF power in the region between the two electrodes.
摘要翻译：一种用于制造电子工件的装置和方法，其中等离子体室内的第一和第二电极分别连接到低频和高频RF电源。至少一个电容器连接在第一电极和电接地之间。一个或多个电容器可以减少或消除高频RF功率与直接在两个电极之间的区域外的任何等离子体的耦合。因此，本发明可以通过将更多的RF功率集中在两个电极之间的区域来提高等离子体处理的性能。

69. 发明授权

US06765178B2 Chamber for uniform substrate heating 有权
标题翻译：室用于均匀的基板加热
公开(公告)号：US06765178B2
公开(公告)日：2004-07-20
申请号：US10025152
申请日：2001-12-18
申请人： Quanyuan Shang , Janine Kardokus , Akihiro Hosokawa
发明人： Quanyuan Shang , Janine Kardokus , Akihiro Hosokawa
IPC分类号： F27B514
CPC分类号： H01L21/67109
摘要： Embodiments of the invention generally provide an apparatus and a method for providing a uniform thermal profile to a plurality of substrates during heat processing. In one embodiment, a cassette containing one or more heated substrate supports is moveably disposed within a heating chamber having an about uniform thermal profile therein to more uniformly heat the substrates.
摘要翻译：本发明的实施例通常提供一种用于在热处理期间向多个基板提供均匀热分布的装置和方法。在一个实施例中，包含一个或多个加热的衬底支撑件的盒可移动地设置在其中具有大致均匀的热分布的加热室内，以更均匀地加热衬底。

70. 发明授权

US06647993B2 Surface-treated shower head for use in a substrate processing chamber 失效
标题翻译：用于基板处理室的表面处理淋浴喷头
公开(公告)号：US06647993B2
公开(公告)日：2003-11-18
申请号：US09740596
申请日：2000-12-19
申请人： Quanyuan Shang , Sheng Sun , Kam S. Law , Emanuel Beer
发明人： Quanyuan Shang , Sheng Sun , Kam S. Law , Emanuel Beer
IPC分类号： B08B704
CPC分类号： C23C16/45565 , C23C16/4404 , C23C16/4405 , G03F7/70925 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J2237/3325 , H01J2237/334 , Y10S438/905
摘要： A substrate processing system includes a processing chamber and a plasma source located external to the chamber. A conduit connects the plasma source to an interior region of the chamber to provide a reactive species to the chamber interior for cleaning interior surfaces of the chamber. A shower head, disposed between the plasma source and an interior region of the chamber, can serve as an electrode and also can serve as a gas distribution mechanism. The shower head includes a surface treatment, such as a non-anodized aluminum outer layer, an electro-polished surface of bare aluminum, or a fluorine-based protective outer layer. The surface-treated shower head improves the rate of removal of materials deposited on the interior surfaces of the chamber during cleaning, reduces contamination of substrates during processing, and provides more efficient use of the power source used for heating the substrate during processing.
摘要翻译：衬底处理系统包括位于腔室外部的处理室和等离子体源。导管将等离子体源连接到腔室的内部区域，以向腔室内部提供反应物质以清洁腔室的内表面。设置在等离子体源和室的内部区域之间的喷头可以用作电极，并且还可以用作气体分配机构。淋浴头包括表面处理，例如非阳极氧化的铝外层，裸铝的电抛光表面或氟基保护外层。表面处理的花洒头在清洁过程中提高了沉积在室内表面上的材料的去除速度，减少了处理过程中衬底的污染，并且在加工过程中提供了用于加热衬底的电源的更有效的使用。

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