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61. 发明授权

US06696219B2 Positive resist laminate 有权
标题翻译：正抗蚀层压板
公开(公告)号：US06696219B2
公开(公告)日：2004-02-24
申请号：US09880030
申请日：2001-06-14
申请人： Shoichiro Yasunami , Kenichiro Sato
发明人： Shoichiro Yasunami , Kenichiro Sato
IPC分类号： G03F711
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/094
摘要： A positive resist laminate which comprises a substrate, a first resist layer and a second resist layer, wherein the first resist layer is to be a heat-hardening layer and comprises (a-1) a polymer containing an alicyclic skeleton in the side chain thereof, and the second resist layer comprises: (b) a polymer which contains a silicon atom in the side chain thereof and which is insoluble in water and becomes soluble in an aqueous alkali solution by the action of an acid; and (c) a compound which generates an acid upon irradiation with an actinic ray or radiation.
摘要翻译：一种正性抗蚀剂层叠体，其包含基材，第一抗蚀剂层和第二抗蚀剂层，其中所述第一抗蚀剂层为热硬化层，其包含（a-1）侧链中含有脂环族骨架的聚合物第二抗蚀剂层包括：（b）在侧链中含有硅原子并且不溶于水并通过酸的作用而溶于碱性水溶液中的聚合物; 和（c）在用光化射线或辐射照射时产生酸的化合物。

62. 发明授权

US06589705B1 Positive-working photoresist composition 失效
标题翻译：正光刻胶组合物
公开(公告)号：US06589705B1
公开(公告)日：2003-07-08
申请号：US09698190
申请日：2000-10-30
申请人： Kenichiro Sato , Kazuyoshi Mizutani , Shoichiro Yasunami
发明人： Kenichiro Sato , Kazuyoshi Mizutani , Shoichiro Yasunami
IPC分类号： G03C172
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/0048
摘要： A positive-working photoresist composition comprises (A) a resin comprising the specific repeating structural units which resin increases in its solubility in an alkaline developer when acted upon by an acid, (B′) an onium salt compound which generates an acid when irradiated with active ray or radiation and (C) at least one of fluorine-based and/or silicon-based surface active agent and nonionic surface active agent or a positive-working photoresist composition comprises (A) a resin comprising the specific repeating structural units which resin increases in its solubility in an alkaline developer when acted upon by an acid, (B) a compound which generates an acid when irradiated with active ray or radiation, and (D) a mixed solvent containing at least one propylene glycol monoalkyl ether carboxylate and at least one of solvents selected from the group consisting of propylene glycol monoalkyl ether, alkyl lactate and alkoxyalkyl propionate and solvents selected from the group consisting of &ggr;-butyrolactone, ethylene carbonate and propylene carbonate.
摘要翻译：正性光致抗蚀剂组合物包含（A）包含特定重复结构单元的树脂，当被酸作用时树脂在碱性显影剂中的溶解度增加，（B'）当照射时产生酸的鎓盐化合物活性射线或辐射，和（C）氟基和/或硅基表面活性剂和非离子表面活性剂或正性光致抗蚀剂组合物中的至少一种包含（A）包含特定重复结构单元的树脂，该树脂（B）当用活性射线或辐射照射时产生酸的化合物，和（D）含有至少一种丙二醇单烷基醚羧酸酯的混合溶剂，和选自丙二醇单烷基醚，乳酸烷基酯和丙酸烷氧基烷基酯中的至少一种溶剂和选自以下的溶剂：的γ-丁内酯，碳酸亚乙酯和碳酸亚丙酯。

63. 发明授权

US06303265B1 Positive photoresist composition for exposure to far ultraviolet light 有权
标题翻译：用于暴露于远紫外光的正性光致抗蚀剂组合物
公开(公告)号：US06303265B1
公开(公告)日：2001-10-16
申请号：US09345159
申请日：1999-06-30
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： G03C173
CPC分类号： G03F7/0397 , G03F7/0395 , Y10S430/107
摘要： A positive photoresist composition for exposure to far ultraviolet light which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B) a resin which is decomposed by the action of an acid to increase its solubility in an alkaline developing solution and has a group represented by the following formula (1) connected to at least one terminal of the molecular chain thereof: —X—R (1) wherein X represents —R1—, —S—R1—, —O—R1—, —NH—R1— or —NR2—R1—; R represents an alkoxy group, a hydroxy group, —COO—R2, —CONH—R2, —CONHSO2—R2 or —CONH2; R1 represents a divalent hydrocarbon group having from 1 to 20 carbon atoms; and R2 represents an alkyl group. The positive photoresist composition provides good sensitivity, resolution and resist pattern when used with a light source having a wavelength of 250 nm or less, particularly 220 nm or less and which forms a solution having excellent storage stability when dissolved in an organic solvent.
摘要翻译：用于暴露于远紫外光的正性光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，和（B）通过酸的作用分解以提高其在碱性显影液，并具有与下述分子链的至少一个末端相连的下式（1）表示的基团：其中，X表示-R 1，-S-R 1，-O-R 1，-NH- R1-或-NR2-R1-; R代表烷氧基，羟基，-COO-R2，-CONH-R2，-CONHSO2-R2或-CONH2; R1表示碳原子数为1〜20的二价烃基; 并且R 2表示烷基。当与具有250nm或更小，特别是220nm或更小的波长的光源一起使用时，正性光致抗蚀剂组合物提供良好的灵敏度，分辨率和抗蚀剂图案，并且当溶解时形成具有优异的储存稳定性的溶液在有机溶剂中。

64. 发明授权

US5639587A Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture 失效
标题翻译：含有碱溶性树脂和醌二叠氮化物酯混合物的正性光致抗蚀剂组合物
公开(公告)号：US5639587A
公开(公告)日：1997-06-17
申请号：US615832
申请日：1996-03-14
申请人： Kenichiro Sato , Koji Shirakawa , Shinji Sakaguchi
发明人： Kenichiro Sato , Koji Shirakawa , Shinji Sakaguchi
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A positive photoresist composition is disclosed, which comprises an alkali-soluble resin, at least one of 1,2-naphthoquinonediazidesulfonic monoesters of specific polyhydroxy compounds, and at least one of 1,2-naphthoquinonediazidesulfonic ester of specific polyhydroxy compounds. The positive photoresist composition exhibits remarkably improved sensitivity and resolution, and broad development latitude regardless of the film thickness, and further, low film thickness dependence of resist performances.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含碱溶性树脂，特定多羟基化合物的1,2-萘醌二叠氮化物磺酸单酯中的至少一种和特定多羟基化合物的1,2-萘醌二叠氮化物磺酸酯中的至少一种。正光致抗蚀剂组合物显示出显着提高的灵敏度和分辨率，并且广泛的开发纬度，而不管膜厚度如何，以及抗蚀剂性能的低膜厚依赖性。

65. 发明授权

US08460850B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same 有权
标题翻译：光化感光或辐射敏感树脂组合物和使用其的图案形成方法
公开(公告)号：US08460850B2
公开(公告)日：2013-06-11
申请号：US12493830
申请日：2009-06-29
申请人： Kenichiro Sato , Akinori Shibuya , Shuhei Yamaguchi , Hiroshi Inada
发明人： Kenichiro Sato , Akinori Shibuya , Shuhei Yamaguchi , Hiroshi Inada
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： G03F7/0395 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/60 , C08F230/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/2041
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin having at least two of repeating units represented by general formula (1) below and exhibiting increased solubility in an alkali developer when acted on by an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation. In the formula, each of R, A, R0, Z, L and n represents the same as defined in the claims and in the specification.
摘要翻译：光化射线敏感性或辐射敏感性树脂组合物包含（A）具有下述通式（1）表示的重复单元中的至少两个的树脂，并且当通过酸作用时在碱显影剂中表现出增加的溶解度，（B ）当暴露于光化射线或辐射时产生酸的化合物。在该式中，R，A，R 0，Z，L和n中的每一个与权利要求书和说明书中所定义的相同。

66. 发明授权

US08173349B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device 有权
标题翻译：感光树脂组合物，高分子化合物，形成图案的方法和电子器件
公开(公告)号：US08173349B2
公开(公告)日：2012-05-08
申请号：US12410468
申请日：2009-03-25
申请人： Masanori Hikita , Yasufumi Ooishi , Kenichiro Sato
发明人： Masanori Hikita , Yasufumi Ooishi , Kenichiro Sato
IPC分类号： G03F7/00 , G03F7/004 , B14J2/16 , C08J3/28
CPC分类号： G03F7/0392 , C08G75/23 , C08L63/00 , G03F7/0045 , G03F7/0233 , Y10S430/114 , Y10S430/115 , Y10S430/128 , Y10T428/24802
摘要： A polymer compound is provided which is excellent in heat resistance and insulating property, and a photosensitive resin composition is provided which includes the polymer compound, and may form a cured pattern or a cured film excellent in pattern forming property, resolution, heat resistance and insulating property. Also, a method for forming a cured pattern excellent in pattern forming property, resolution, heat resistance and insulating property using the photosensitive resin composition, and an electronic device having high reliance for a semiconductor device or for a display device are provided. The photosensitive resin composition includes a polymer compound obtained by reacting a monomer represented by Formula (1) and a monomer represented by Formula (2), and a photosensitizing agent.
摘要翻译：提供耐热性和绝缘性优异的高分子化合物，并且提供包含高分子化合物的感光性树脂组合物，并且可以形成图案形成性，分辨率，耐热性和绝缘性优异的固化图案或固化膜属性。另外，提供了使用该感光性树脂组合物形成图案形成性，分辨率，耐热性和绝缘性优异的固化图案的方法以及对半导体装置或显示装置具有高依赖性的电子装置。感光性树脂组合物包含通过使由式（1）表示的单体与由式（2）表示的单体反应得到的高分子化合物和光敏剂。

67. 发明授权

US08133550B2 Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device 有权
标题翻译：聚苯并恶唑前体，使用其的感光性树脂组合物，以及半导体装置的制造方法
公开(公告)号：US08133550B2
公开(公告)日：2012-03-13
申请号：US11855302
申请日：2007-09-14
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： C08J7/04 , G03F7/00 , G03F7/26
CPC分类号： H01L21/02118 , C08F2/50 , C08G69/48 , C08G73/22 , G03F7/0233 , G03F7/037 , H01L21/312
摘要： A polybenzoxazole precursor is represented by the following formula (1): wherein R1a to R4a, R1b to R4b, X1, Y1 and m are defined in the specification.
摘要翻译：聚苯并恶唑前体由下式（1）表示：其中R1a至R4a，R1b至R4b，X1，Y1和m在本说明书中定义。

68. 发明授权

US07615331B2 Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device 有权
标题翻译：感光树脂组合物，使用其的固化浮雕图案的制造方法以及半导体装置
公开(公告)号：US07615331B2
公开(公告)日：2009-11-10
申请号：US11851751
申请日：2007-09-07
申请人： Tsukasa Yamanaka , Kenichiro Sato
发明人： Tsukasa Yamanaka , Kenichiro Sato
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/40
摘要： A photosensitive resin composition contains: a polymer represented by the formula (I) as defined herein, in which 0.5 mol % or more of A in the polymer represented by the formula (I) is a protective group; a photosensitizing agent; a compound containing a methacryloyl or acryloyl group within a molecule of the compound; and a solvent.
摘要翻译：感光性树脂组合物含有：由式（I）表示的聚合物中的0.5mol％以上的A为保护基的式（I）所示的聚合物，光敏剂; 在化合物的分子内含有甲基丙烯酰基或丙烯酰基的化合物的化合物; 和溶剂。

69. 发明授权

US07368216B2 Photosensitive resin composition and manufacturing method of semiconductor device using the same 有权
标题翻译：光敏树脂组合物及使用其的半导体器件的制造方法
公开(公告)号：US07368216B2
公开(公告)日：2008-05-06
申请号：US11655905
申请日：2007-01-22
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： G03F7/023 , G03F7/32
CPC分类号： G03F7/0757 , G03F7/0046 , G03F7/022 , G03F7/0233
摘要： A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition.
摘要翻译：含有聚苯并恶唑前体，醌二叠氮化物光敏剂和碳酸酯溶剂的正型感光性树脂组合物以及使用该组合物的半导体装置的制造方法。

70. 发明授权

US07291441B2 Positive resist composition and pattern forming method utilizing the same 有权
标题翻译：正型抗蚀剂组合物和利用其的图案形成方法
公开(公告)号：US07291441B2
公开(公告)日：2007-11-06
申请号：US11210672
申请日：2005-08-25
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition comprising: a resin that comprises a repeating unit including a specific norbornane lactone structure and a repeating unit including a specific alicyclic hydrocarbon structure, and that increases a solubility of the resin in an alkaline developer by an action of an acid; and a compound that generates an acid upon treatment with one of an actinic ray and radiation, and a pattern forming method utilizing the same.
摘要翻译：一种正型抗蚀剂组合物，其包含：包含特定降冰片烷内酯结构的重复单元和包含特定脂环族烃结构的重复单元的树脂，并且通过酸的作用增加树脂在碱性显影剂中的溶解度; 以及在用光化学射线和辐射之一处理时产生酸的化合物，以及利用该化合物的图案形成方法。

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