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    • 65. 发明授权
    • Symmetric magnetic tunnel device
    • 对称磁隧道装置
    • US06211559B1
    • 2001-04-03
    • US09032107
    • 1998-02-27
    • Theodore ZhuHerbert Goronkin
    • Theodore ZhuHerbert Goronkin
    • H01L2982
    • H01F10/3263B82Y10/00B82Y25/00H01F10/3254H01L43/08
    • A symmetric magnetic tunnel device including first and second magnetic tunnel junctions each including a pinned magnetic layer, an insulating tunnel layer and a free magnetic layer stacked in parallel juxtaposition to allow tunneling of electrons through the insulating tunnel layer between the pinned and free magnetic layers. The first and second magnetic tunnel junctions positioned in parallel juxtaposition so as to form a continuous electron path through the first and second magnetic tunnel junctions and to provide a cell signal across the first and second magnetic tunnel junctions greater than a cell signal across each of the first and second magnetic tunnel junctions individually.
    • 一种包括第一和第二磁隧道结的对称磁隧道装置,每个磁隧道结包括被并置的磁性层,绝缘隧道层和自由磁性层,并联并置,以允许电子隧道穿过固定和自由磁性层之间的绝缘隧道层。 第一和第二磁性隧道结位于平行并置的位置,以便形成穿过第一和第二磁性隧道结的连续电子路径,并且跨越第一和第二磁性隧道结提供大于跨越第一和第二磁性隧道结的单元信号的单元信号 第一和第二磁性隧道结单独。
    • 67. 发明授权
    • Enhanced conductivity quantum well structure having resonant interface
phonon induced charge coupling
    • 具有谐振界面声子诱导电荷耦合的增强的电导量子阱结构
    • US5142341A
    • 1992-08-25
    • US681261
    • 1991-04-08
    • Herbert GoronkinX. Theodore Zhu
    • Herbert GoronkinX. Theodore Zhu
    • H01L29/06H01L29/15H01L29/66
    • H01L29/155
    • An enhanced conductivity structure comprising first and second coupled quantum well channel layers spaced from each other by a barrier layer of predetermined thickness is provided. The barrier layer and other supporting layers comprise a first material type, while the first and second quantum wells comprise a second material type having a narrower bandgap than the first material type. Each of the quantum wells is thin to confine current flow to the plane of the quantum wells. First and second spacer layers of the first material type are formed adjacent to each of the quantum wells, and planar doping layers are provided on each of the spacer layers. First and second buffer layers of the first material type are formed adjacent to each of the spacer layers.
    • 提供了包括通过预定厚度的阻挡层彼此隔开的第一和第二耦合量子阱沟道层的增强的导电结构。 阻挡层和其它支撑层包括第一材料类型,而第一和第二量子阱包括具有比第一材料类型更窄的带隙的第二材料类型。 每个量子阱都很薄,以将电流限制到量子阱的平面。 第一材料类型的第一和第二间隔层形成为与每个量子阱相邻,并且平面掺杂层设置在每个间隔层上。 第一材料类型的第一和第二缓冲层形成为与每个间隔层相邻。