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61. 发明授权

US08101335B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US08101335B2
公开(公告)日：2012-01-24
申请号：US12463751
申请日：2009-05-11
申请人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译：碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。

62. 发明申请

US20080085466A1 Polymer, resist protective coating material, and patterning process 有权
标题翻译：聚合物，抗蚀剂保护涂层材料和图案化工艺
公开(公告)号：US20080085466A1
公开(公告)日：2008-04-10
申请号：US11905727
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03C1/73 , C08G63/06 , G03F7/20
CPC分类号： G03F7/11 , C09D133/066 , C09D133/16 , G03F7/0046 , G03F7/2041
摘要： A resist protective coating material comprises a polymer comprising repeat units having formulae (1a) and (1b) and having a Mw of 1,000-500,000. R1a and R1b are H, F or alkyl or fluoroalkyl, R2a, R2b, R3a and R3b are H or alkyl, or R2a and R2b, and R3a and R3b may bond together to form a ring, 0
摘要翻译：抗蚀剂保护涂层材料包括包含具有式（1a）和（1b）的重复单元并且具有1,000-500,000的Mw的聚合物。 R 1a和R 1b是H，F或烷基或氟代烷基，R 2a，R 2b，R b， R 3a和R 3b是H或烷基，或R 2a和R 2b和R 3a， / SUP>和R 3b可以键合在一起形成环，0

63. 发明授权

US06743566B2 Cyclic acetal compound, polymer, resist composition and patterning process 有权
标题翻译：环状缩醛化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06743566B2
公开(公告)日：2004-06-01
申请号：US10219139
申请日：2002-08-16
申请人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
发明人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
IPC分类号： G03C500
CPC分类号： C07D317/24 , C08F232/08 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
摘要翻译：其中k = 0或1，n为0至6的整数的式（1）的环状缩醛化合物是新颖的。使用环状缩醛化合物作为单体，得到聚合物。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，并且具有优异的灵敏度，分辨率和耐蚀刻性。

64. 发明授权

US06673515B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06673515B2
公开(公告)日：2004-01-06
申请号：US09951523
申请日：2001-09-14
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： G03F7/039 , C08G61/08 , G03F7/0045
摘要： The invention provides a polymer comprising recurring units of formula (1—1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译：本发明提供了包含式（1-1）或（1-2）的重复单元的聚合物，其中k为0或1，m为0,1,2,3或4，n为1或2，并且具有重量平均分子量为1,000〜500,000。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

65. 发明授权

US06566038B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06566038B2
公开(公告)日：2003-05-20
申请号：US09842396
申请日：2001-04-26
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7039
CPC分类号： C08F222/06 , C08F222/40 , C08F232/08 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , C08F232/04 , C08F2220/1866 , C08F232/00
摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is halogen or acyloxy, alkoxycarbonyloxy or alkylsulfonyloxy group which may be substituted with halogen, R5 is H or alkyl, R6 is an acid labile group, Z is a single bond or a divalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译：提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R 1为H，CH 3或CH 2 CO 2 R 3，R 2为H，CH 3或CO 2 R 3，R 3为烷基，R 4为卤素或酰氧基，可被卤素取代的烷氧基羰氧基或烷基磺酰氧基，R 5为H或烷基，R 6为酸不稳定基团， Z为单键或二价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

66. 发明授权

US06566037B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06566037B2
公开(公告)日：2003-05-20
申请号：US09797878
申请日：2001-03-05
申请人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Jun Hatakeyama
发明人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： C08F232/08 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) and having a Mw of 1,000-500,000 is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 and R15 are acid labile groups, and at least one of R6 to R9 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are H or alkyl, at least one of R10 to R13 is a monovalent hydrocarbon group containing a —CO2— partial structure, and the reminders are H or alkyl, R14 is a polycyclic hydrocarbon group or polycyclic hydrocarbon-containing alkyl group, Z is a trivalent hydrocarbon group, k=0 or 1, x is>0, a, b, c and d are≧0, satisfying x+a+b+c+d=1. A resist composition comprising the polymer has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.
摘要翻译：提供了包含式（1）的重复单元并且具有1,000-500,000的Mw的聚合物.R1是H，甲基或CH2CO2R3，R2是H，甲基或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基 R 5和R 15为酸不稳定基团，R 6〜R 9中的至少一个为羧基或羟基的一价烃基，提醒为H或烷基，R 10〜R 13中的至少一个为含有 -CO 2部分结构，提醒为H或烷基，R 14为多环烃基或含多环烃基的烷基，Z为三价烃基，k = 0或1，x为> 0，a，b， c和d为> = 0，满足x + a + b + c + d = 1。包含聚合物的抗蚀剂组合物具有显着提高的灵敏度，分辨率和耐蚀刻性，并且在微细加工中非常有用。

67. 发明授权

US06515150B2 Cyclic acetal compound, polymer, resist composition and patterning process 有权
公开(公告)号：US06515150B2
公开(公告)日：2003-02-04
申请号：US09967946
申请日：2001-10-02
申请人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
发明人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
IPC分类号： C07D31726
CPC分类号： C07D317/24 , C08F232/08 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

68. 发明授权

US06515149B2 Acetal compound, polymer, resist composition and patterning response 有权
公开(公告)号：US06515149B2
公开(公告)日：2003-02-04
申请号：US09922635
申请日：2001-08-07
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C07D31712
CPC分类号： C08G61/08 , C08G61/02 , Y10S430/106 , Y10S430/111
摘要： Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

69. 发明授权

US08808966B2 Positive resist composition and patterning process 有权
标题翻译：正抗蚀剂组成和图案化工艺
公开(公告)号：US08808966B2
公开(公告)日：2014-08-19
申请号：US13557900
申请日：2012-07-25
申请人： Jun Hatakeyama , Koji Hasegawa
发明人： Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/004 , G03F7/38 , C08F24/00 , C08F220/24 , C08F232/08 , G03F7/039
CPC分类号： G03F7/0397 , C08F12/22 , C08F24/00 , C08F212/14 , C08F212/32 , C08F220/24 , C08F220/30 , C08F232/08 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/38 , Y10S430/106 , Y10S430/111 , C08F2220/282 , C08F232/04 , C08F220/38 , C08F220/16 , C08F2220/301 , C08F234/02 , C08F220/18
摘要： A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness. In formula (1), A is —(CR22)m—, B is —(CR52)n—, R2 and R5 are hydrogen or alkyl, m and n are 1 or 2, R3 is alkyl, alkenyl, alkynyl or aryl, R6 is alkyl, alkoxy, alkanoyl, alkoxycarbonyl, hydroxyl, nitro, aryl, halogen, or cyano, and p is 0 to 4.
摘要翻译：包含具有由具有式（1）的酸不稳定基团取代的羧基的聚合物的正型抗蚀剂组合物在曝光前后表现出高对比度的碱溶解速率，高分辨率，良好的图案轮廓和最小的边缘粗糙度。在式（1）中，A是 - （CR 22）m - ，B是 - （CR 52）n - ， - R 2和R 5是氢或烷基，m和n是1或2，R 3是烷基，烯基，炔基或芳基， R6是烷基，烷氧基，烷酰基，烷氧基羰基，羟基，硝基，芳基，卤素或氰基，p是0-4。

70. 发明授权

US08791290B2 Acetal compound, polymer, resist composition, and patterning process 有权
标题翻译：乙缩醛化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US08791290B2
公开(公告)日：2014-07-29
申请号：US13069824
申请日：2011-03-23
申请人： Koji Hasegawa , Jun Hatakeyama , Takeshi Nagata , Seiichiro Tachibana , Takeshi Kinsho
发明人： Koji Hasegawa , Jun Hatakeyama , Takeshi Nagata , Seiichiro Tachibana , Takeshi Kinsho
IPC分类号： C07C67/02
CPC分类号： C07C69/54 , C07C69/653 , C07C2603/68 , C07C2603/74 , C08F20/28 , C08F224/00 , G03F1/32 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal.
摘要翻译：本发明提供了含有具有醇羟基的金刚烷环的缩醛化合物，该醇羟基被具有支链结构的羰基部分的缩醛基保护。包含含有衍生自缩醛化合物的重复单元和酸产生剂的聚合物的光致抗蚀剂膜的特征在于当经受曝光和有机溶剂显影时，通过正/负反转形成图像时的高溶解度对比度。

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