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61. 发明申请

US20130105441A1 MASK BLANK AND METHOD OF MANUFACTURING AN IMPRINTING MOLD 有权
标题翻译：掩模层和制造压模的方法
公开(公告)号：US20130105441A1
公开(公告)日：2013-05-02
申请号：US13641220
申请日：2011-04-04
申请人： Osamu Nozawa , Masahiro Hashimoto
发明人： Osamu Nozawa , Masahiro Hashimoto
IPC分类号： B44C1/22
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0015
摘要： Provided is a mask blank which is used for manufacturing an imprinting mold and which may form a fine mold pattern with high pattern accuracy. A mask blank (10) includes a transparent substrate (1) and a thin film (2) contacted with a surface of the substrate. The thin film (2) includes a laminated film including an upper layer (4) which is composed of a material containing silicon (Si) or a material containing tantalum (Ta), and a lower layer (3) which is composed of a material containing at least one of hafnium (Hf) and zirconium (Zr) and containing substantially no oxygen.
摘要翻译：提供了用于制造压印模具的掩模坯料，并且可以形成具有高图案精度的精细模具图案。掩模坯料（10）包括透明基板（1）和与基板表面接触的薄膜（2）。薄膜（2）包括层叠膜，该层叠膜包括由含有硅（Si）的材料或含有钽（Ta）的材料构成的上层（4）和由材料构成的下层（3）含有铪（Hf）和锆（Zr）中的至少一种并且基本上不含氧。

62. 发明申请

US20120251931A1 TRANSFER MASK, METHOD OF MANUFACTURING A TRANSFER MASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 有权
标题翻译：转移掩模，制造转移掩模的方法和制造半导体器件的方法
公开(公告)号：US20120251931A1
公开(公告)日：2012-10-04
申请号：US13501348
申请日：2010-10-08
申请人： Masahiro Hashimoto , Kazuya Sakai , Toshiyuki Suzuki , Kazunori Ono
发明人： Masahiro Hashimoto , Kazuya Sakai , Toshiyuki Suzuki , Kazunori Ono
IPC分类号： G03F1/00 , G03F7/20 , G03F1/76 , G03F1/46 , G03F1/26
CPC分类号： G03F1/32 , G03F1/54 , G03F1/80
摘要： Provided is a transfer mask which has a transfer pattern formed in a pattern-forming thin film provided on a transparent substrate and is adapted to be applied with exposure light having a wavelength of 200 nm or less. The pattern-forming thin film is made of a material containing silicon an a transition metal other than chromium and the chromium content in the film is less than 1.0×1018 atoms/cm3.
摘要翻译：提供一种转印掩模，其具有形成在设置在透明基板上的图案形成薄膜中的转印图案，并且适于施加具有200nm或更小的波长的曝光光。图案形成薄膜由含有铬以外的过渡金属的材料制成，膜中的铬含量小于1.0×1018原子/ cm3。

63. 发明授权

US08197993B2 Method of manufacturing transfer mask and method of manufacturing semiconductor device 有权
标题翻译：传输掩模的制造方法和制造半导体器件的方法
公开(公告)号：US08197993B2
公开(公告)日：2012-06-12
申请号：US13122680
申请日：2010-10-08
申请人： Masahiro Hashimoto , Kazuya Sakai , Toshiyuki Suzuki , Kazunori Ono
发明人： Masahiro Hashimoto , Kazuya Sakai , Toshiyuki Suzuki , Kazunori Ono
IPC分类号： G03F1/00 , B08B3/00
CPC分类号： G03F1/46 , G03F1/54 , G03F1/80 , G03F1/82
摘要： The present invention is a method of manufacturing a transfer mask with use of a mask blank in which a thin film for pattern formation and a chromium-based thin film made of a material containing chromium are stacked on a transparent substrate in this order. The thin film for pattern formation is made of material containing silicon and a transition metal other than chromium. The chromium-based thin film is made of a material containing chromium. Exposure light having a wavelength of 200 nm or less is applied to the transfer mask. In the manufacturing method, the transfer mask is produced by performing, in the following order, a process of forming a resist film having a transfer pattern on the chromium-based thin film, a process of forming a transfer pattern in the chromium-based thin film with use of a mask of the resist film having the transfer pattern, a process of forming a transfer pattern in the thin film for pattern formation with use of a mask of the chromium-based thin film having the transfer pattern, and a process of removing the chromium-based thin film by etching. The manufacturing method further includes a cleaning process of at least one of alkali solution cleaning, hot water cleaning, and ozone-containing water cleaning on the produced transfer mask until a width of the transfer pattern of the thin film for pattern formation is reduced by 4 nm or a space width of the thin film for pattern formation is increased by 4 nm.
摘要翻译：本发明是一种使用掩模坯料制造转印掩模的方法，其中用于图案形成的薄膜和由含铬材料制成的铬基薄膜依次层叠在透明基板上。用于图案形成的薄膜由含有硅和除铬以外的过渡金属的材料制成。铬基薄膜由含铬的材料制成。将具有200nm以下波长的曝光光施加到转印掩模。在制造方法中，通过以下顺序，通过在铬系薄膜上形成具有转印图案的抗蚀剂膜的工序来制造转印掩模，在铬系薄膜中形成转印图案的工序使用具有转印图案的抗蚀剂膜的掩模的膜，使用具有转印图案的铬基薄膜的掩模在图案形成用薄膜中形成转印图案的工序，以及通过蚀刻去除铬基薄膜。该制造方法还包括在制造的转印掩模上进行碱溶液清洗，热水清洗和含臭氧水清洗中的至少一种的清洗处理，直到图案形成用薄膜的转印图案的宽度减少4 nm或用于图案形成的薄膜的空间宽度增加4nm。

64. 发明申请

US20100245310A1 LUMINANCE CONTROL METHOD AND DISPLAY 审中-公开
标题翻译：发光控制方法和显示
公开(公告)号：US20100245310A1
公开(公告)日：2010-09-30
申请号：US12739780
申请日：2008-10-24
申请人： Masahiro Hashimoto
发明人： Masahiro Hashimoto
IPC分类号： G09G5/10
CPC分类号： G09G3/3406 , G09G2320/06 , G09G2320/0633 , G09G2320/0653 , G09G2360/144 , H04M1/22 , H04M2250/12
摘要： A display device includes a display panel, a light emitting device that provides backlight to the display panel, and a control device that determines the brightness of the backlight that the light emitting device should provide. The control device detects a timing when the brightness of the backlight illuminating the display panel is switched; recognizes an updated brightness level that should replace, as the one to be applied, an initial brightness level representing the brightness of the backlight at the detection timing; and changes the brightness of the backlight step by step after the detection timing from the initial brightness level to the updated brightness level.
摘要翻译：显示装置包括显示面板，向显示面板提供背光的发光装置和确定发光装置应提供的背光的亮度的控制装置。控制装置检测照明显示面板的背光的亮度被切换的定时; 识别更新的亮度级别，其应该替换要被应用的亮度级别，该初始亮度级别表示在检测定时处的背光的亮度; 并且在从初始亮度水平到更新的亮度水平的检测定时之后逐步地改变背光的亮度。

65. 发明申请

US20100075236A1 PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME 有权
标题翻译： PHOTOMASK BLANK，PHOTOMASK及其制造方法
公开(公告)号：US20100075236A1
公开(公告)日：2010-03-25
申请号：US12562617
申请日：2009-09-18
申请人： Masahiro Hashimoto , Hideaki Mitsui
发明人： Masahiro Hashimoto , Hideaki Mitsui
IPC分类号： G03F1/00
CPC分类号： G03F1/34 , G03F1/32 , G03F1/80
摘要： A photomask blank is for fabricating a phase shift mask having a light-transmissive substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. The phase shift part is a dug-down part formed by digging down the light-transmissive substrate from a surface thereof to a digging depth adapted to produce the predetermined phase difference with respect to exposure light transmitted through the light-transmissive substrate at a portion where the phase shift part is not provided. The photomask blank includes a light-shielding part formed in a peripheral area around a transfer pattern area of the surface of the light-transmissive substrate and adapted to shield exposure light and further includes an etching mask film formed in the transfer pattern area of the surface of the light-transmissive substrate and made of a material being substantially dry-etchable with a chlorine-based gas, but not substantially dry-etchable with a fluorine-based gas, the etching mask film serving as an etching mask at least until the digging depth is reached when forming the dug-down part.
摘要翻译：光掩模坯件用于制造具有透光基板的相移掩模，该透光基板设置有适于给予透射曝光的预定相位差的相移部分。相移部分是通过从其表面向下挖掘透光性基板而形成的挖掘部分，其适用于相对于透过透光基板的曝光光产生预定相位差，不设置相移部。光掩模坯料包括形成在透光基板的表面的转印图案区域周围的周边区域中的遮光部，其适于屏蔽曝光光，并且还包括形成在表面的转印图案区域中的蚀刻掩模膜由基于氯的气体基本可干蚀刻的材料制成，但基本上不能用氟基气体干法蚀刻的材料制成，所述蚀刻掩模膜至少直到挖掘为止在形成挖掘部分时达到深度。

66. 发明授权

US07356699B2 Electronic watermark detection device and electronic watermark detection method 失效
标题翻译：电子水印检测装置及电子水印检测方法
公开(公告)号：US07356699B2
公开(公告)日：2008-04-08
申请号：US09982579
申请日：2001-10-18
申请人： Masahiro Hashimoto
发明人： Masahiro Hashimoto
IPC分类号： H04L9/00
CPC分类号： H04N1/32149 , H04N1/32165
摘要： In the electronic watermark detection device, an electronic watermark detection unit receives input of a DCT coefficient and a picture start from a preprocessing unit to detect an electronic watermark inserted into image data and indicative of copyright information or the like, a detection result adjustment unit receives input of a picture start from the preprocessing unit and input of a detector result and a detector interruption from the electronic watermark detection unit to count the number of pictures, as well as generating and outputting a detection interruption according to the detection result, and an interruption processing unit receives input of a detection result and a detection interruption from the detection result adjustment unit to generate an interruption signal according to a system, as well as outputting the detection result.
摘要翻译：在电子水印检测装置中，电子水印检测单元从预处理单元接收DCT系数的输入和图像开始，以检测插入图像数据中的电子水印和指示版权信息等，检测结果调整单元接收图像的输入从预处理单元开始，从电子水印检测单元输入检测器结果和检测器中断，对图像数进行计数，并根据检测结果生成并输出检测中断，中断处理单元从检测结果调整单元接收检测结果和检测中断的输入，以根据系统产生中断信号，以及输出检测结果。

67. 发明授权

US07027611B2 Controlling a watermark strength embedded into a digital image 失效
标题翻译：控制嵌入到数字图像中的水印强度
公开(公告)号：US07027611B2
公开(公告)日：2006-04-11
申请号：US09876708
申请日：2001-06-07
申请人： Masahiro Hashimoto
发明人： Masahiro Hashimoto
IPC分类号： G06K9/00
CPC分类号： G06T1/0028 , G06T2201/0052 , G06T2201/0202 , H04N1/32154 , H04N1/32165 , H04N1/32277
摘要： On embedding a watermark in a stream of digital images, a watermark strength is automatically varied in accordance with an amount of the digital images by detecting the amount of the digital images by a detection portion. The amount of the digital images may be measured at every unit time, for example, a unit of block, macroblock, slice, picture. Thus, detectability of the watermark is improved by adjusting the watermark strength on the basis of the amount of the digital images.
摘要翻译：在将水印嵌入到数字图像流中时，通过检测部分检测数字图像的数量，可以根据数字图像的数量自动地改变水印强度。可以在每单位时间测量数字图像的量，例如，块，宏块，片，图片的单位。因此，通过基于数字图像的量来调整水印强度来提高水印的可检测性。

68. 发明申请

US20050259534A1 Changer type disc apparatus 审中-公开
标题翻译：换盘式盘装置
公开(公告)号：US20050259534A1
公开(公告)日：2005-11-24
申请号：US11132329
申请日：2005-05-19
申请人： Masahiro Hashimoto
发明人： Masahiro Hashimoto
IPC分类号： H04N5/76 , G11B5/09 , G11B27/00 , G11B27/034 , G11B27/10 , G11B27/32 , H04N5/782 , H04N5/85 , H04N9/804
CPC分类号： G11B27/329 , G11B27/002 , G11B27/034 , G11B27/105 , G11B2220/216 , G11B2220/2562 , H04N5/782 , H04N5/85 , H04N9/8042
摘要： A changer type disc apparatus having a disc changer portion, on which plural discs are mountable, a recording/playing portion for recording a video signal on a disc mounted on the disc changer portion and for playing the video signal recorded thereon, a tuner portion for outputting a video signal obtained by receiving a commercial broadcasting signal, and control means for recording the video signal outputted by the tuner portion, on a disc by using the recording/playing portion, further comprising classification information recording means for recording classification information, according to which programs received by the tuner portion are classified, on a disc by using the recording/playing portion. When a program is reservation-recorded, the control means records a video signal, which is outputted by the tuner portion, on a disc, on which classification information corresponding to the program to be reservation-recorded is recorded, among discs mounted on the disc changer portion.
摘要翻译：一种更换器型盘装置，具有可安装多个盘的盘片更换器部分，用于在安装在盘片更换器部分上的盘上记录视频信号并用于播放记录在其上的视频信号的记录/播放部分，用于输出通过接收商业广播信号获得的视频信号，以及控制装置，用于通过使用记录/播放部分将调谐器部分输出的视频信号记录在盘上，还包括用于记录分类信息的分类信息记录装置，根据通过使用记录/播放部分将由调谐器部分接收的节目分类到盘上。当节目被预约记录时，控制装置将由调谐器部分输出的视频信号记录在盘上，其上记录有与要预约记录的节目相对应的分类信息的盘中安装在盘上的盘更换部分。

69. 发明授权

US4561863A Grinding wheel and manufacturing method thereof 失效
标题翻译：砂轮及其制造方法
公开(公告)号：US4561863A
公开(公告)日：1985-12-31
申请号：US624771
申请日：1984-06-26
申请人： Masahiro Hashimoto , Hideo Tani
发明人： Masahiro Hashimoto , Hideo Tani
IPC分类号： B24D3/00 , B24D3/02 , B24D3/34 , C09K3/14 , B24D11/00
CPC分类号： B24D3/342 , B24D3/00 , B24D3/34 , C09K3/1445
摘要： A grinding wheel which comprises a number of abrasive grains coated with an electrically conductive material, an electrically non-conductive bond having a number of diamond filler dispersed therein. A method of producing the grinding wheel which comprises preparing a mixture of coated abrasive grains, non-conductive bond and diamond filler, filling the mixture into a mold and molding said mixture by applying a pressure while maintaining said mixture at a constant temperature.
摘要翻译：一种砂轮，其包括涂覆有导电材料的多个磨料颗粒，其中分散有多个金刚石填料的非导电粘结。一种制造砂轮的方法，包括制备涂覆的磨粒，非导电粘合剂和金刚石填料的混合物，将混合物填充到模具中并通过施加压力来模制所述混合物，同时将所述混合物保持在恒定温度。

70. 发明授权

US4051461A Management table apparatus in memory hierarchy system 失效
标题翻译：内存分层系统管理表设备
公开(公告)号：US4051461A
公开(公告)日：1977-09-27
申请号：US680851
申请日：1976-04-27
申请人： Masahiro Hashimoto , Kenichi Furumaya
发明人： Masahiro Hashimoto , Kenichi Furumaya
IPC分类号： G06F12/12 , G06F9/22 , G06F12/08 , G06F12/16 , G11C29/00 , G06F11/06 , G06F11/10 , G06F13/00
CPC分类号： G11C29/70 , G06F12/0864
摘要： In a memory hierarchy system comprising a main memory for storing data and a buffer memory for holding a part of the data stored in the main memory as a copy of the main memory data, the data on the buffer memory is frequently replaced by the data on the main memory so as to hold in the buffer memory the data which is very frequently used. The buffer memory also holds the data which is in an area of the main memory where an irremediable fault occurred and that data is prevented from being replaced. Therefore, the buffer memory is substituted for the fault area of the main memory so that a fail soft system is attained.

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