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61. 发明申请

US20060110571A1 Optical record carrier for use with uv radiation beam 审中-公开
标题翻译：用于uv辐射束的光学记录载体
公开(公告)号：US20060110571A1
公开(公告)日：2006-05-25
申请号：US10529687
申请日：2003-09-19
申请人： Helmar Van Santen , Hendrik Stapert , Johan Kloosterboer
发明人： Helmar Van Santen , Hendrik Stapert , Johan Kloosterboer
IPC分类号： B32B3/02
CPC分类号： G11B7/2542 , G11B7/252 , G11B7/2534 , G11B7/2545 , G11B2007/24314 , G11B2007/24316 , G11B2007/2571 , G11B2007/25713
摘要： The present invention relates to an optical record carrier for recording and/or information using a radiation beam in the UV wavelength range, in particular having a wavelength in the range from 230 to 270 nm, comprising a substrate layer (S) and an information stack (R) comprising an information layer (P) comprising a material for forming marks and spaces representing an information by irradiation of a UV radiation beam, a transparent cover layer (C) on top of the side of the said record carrier facing the incident UV radiation beam. The cover layer (C) is made of a cured resin composition being a silicon based reactive material, which achieves a high UV transparency required for the recording and/or reading of data. The optical record carrier may further comprise at least one additional information stack and at least one transparent spacer layer for separating the information stacks from each other, said spacer layer (SP) being made of the said resin composition.
摘要翻译：本发明涉及一种用于记录和/或使用UV波长范围内的辐射束，特别是波长在230至270nm范围内的信息的光学记录载体，包括基底层（S）和信息堆叠（R）包括信息层（P），所述信息层（P）包括用于形成通过UV辐射束的照射来表示信息的标记和空间的材料;在所述记录载体的面对入射的UV的一侧的顶部上的透明覆盖层辐射束。覆盖层（C）由基于硅的反应性材料的固化树脂组合物制成，其实现了数据记录和/或读取所需的高的UV透明度。光学记录载体还可以包括至少一个附加信息堆叠和用于将信息堆叠彼此分离的至少一个透明间隔层，所述间隔层（SP）由所述树脂组合物制成。

62. 发明授权

US06952253B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06952253B2
公开(公告)日：2005-10-04
申请号：US10705783
申请日：2003-11-12
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
摘要翻译：在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。

63. 发明申请

US20050174549A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050174549A1
公开(公告)日：2005-08-11
申请号：US10773461
申请日：2004-02-09
申请人： Paulus Duineveld , Peter Dirksen , Aleksey Kolesnychenko , Helmar Van Santen
发明人： Paulus Duineveld , Peter Dirksen , Aleksey Kolesnychenko , Helmar Van Santen
IPC分类号： H01L21/027 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
摘要翻译：浸没式光刻设备包括电压发生器或电源，该电压发生器或电源对与浸入液体接触的物体施加电位差，使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体，这是由于电动势浸泡液中的气泡表面。

64. 发明授权

US06649093B2 Method of manufacturing an optically scannable information carrier 失效
公开(公告)号：US06649093B2
公开(公告)日：2003-11-18
申请号：US09915679
申请日：2001-07-26
申请人： Helmar Van Santen , Gerard Eduard Van Rosmalen
发明人： Helmar Van Santen , Gerard Eduard Van Rosmalen
IPC分类号： B29D1100
CPC分类号： G11B7/122 , G11B7/261 , Y10S425/81
摘要： The invention relates to a method of manufacturing a master mold (1), which is used to manufacture an optical information disc, such as a CD or DVD. According to the method, a substrate (3) is provided with a photosensitive layer (5), which is subsequently irradiated by means of a radiation beam (7), which is focused to a scanning spot (11) on said layer by means of an optical lens system (9). A liquid, such as water, is supplied into a gap (53) present between the photosensitive layer and an auxiliary lens (59) of the lens system facing said layer. As a result, the size of the scanning spot is decreased and the information density of the information disc to be manufactured is increased. According to the invention, the liquid is supplied via a supply opening (69) which is positioned immediately adjacent the auxiliary lens (59), in a direction which, viewed from the scanning spot (11), is contrary to a direction (Z) wherein the substrate (3) is moved with respect to the lens system (9). Thus, the liquid supplied via the supply opening is transported immediately and exclusively into said gap (53), so that the amount of liquid to be supplied to fill the gap is limited. The supply opening is formed in a wall portion (65), which extends in an imaginary plane in which also a side wall (63) of the auxiliary lens (59) facing the photosensitive layer is present. As a result, a homogeneous Couette flow of liquid without air inclusions is obtained in the gap. This Couette flow does not cause any undesirable mechanical vibrations of the lens system. The invention further relates to a method of manufacturing an optical information disc, according to which method a master mold (1) is manufactured in a first step, and the information disc is manufactured in a second step by means of a replica process using said master mold. The invention further relates to a device (25) for the manufacture of a master mold by means of a method according to the invention.

65. 发明授权

US08797503B2 Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure 有权
标题翻译：平版印刷设备和器件制造方法，其具有在液体限制结构的孔的上方的液体入口
公开(公告)号：US08797503B2
公开(公告)日：2014-08-05
申请号：US13149404
申请日：2011-05-31
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.
摘要翻译：在光刻设备中，液体供应系统将液体提供到工作台与光学元件之间的空间并与光学元件的表面相接触，该空间的横截面积小于衬底的面积，液体供应系统包括沿着光学元件表面和工作台之间的空间的边界的至少一部分延伸的液体限制结构，其中液体限制结构的至少一部分位于光学元件表面和工作台之间，所述液体限制结构的至少一部分具有所述图案化束可以穿过的孔，所述液体限制结构包括将所述液体供应到所述孔上方的空间的入口，并且所述液体限制结构包括用于除去所述液体的出口，由入口提供，从孔下方的空间。

66. 发明授权

US08208120B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08208120B2
公开(公告)日：2012-06-26
申请号：US12078997
申请日：2008-04-09
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译：在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。在结构和衬底的表面之间使用气体以在空间中容纳液体。

67. 发明申请

US20100008196A1 ABERRATION CORRECTING APPARATUS 审中-公开
标题翻译：异常校正装置
公开(公告)号：US20100008196A1
公开(公告)日：2010-01-14
申请号：US11722186
申请日：2005-12-19
申请人： Helmar Van Santen , Michael Adrianus Henricus Van Der AA
发明人： Helmar Van Santen , Michael Adrianus Henricus Van Der AA
IPC分类号： G11B7/00 , G02B27/14
CPC分类号： G11B7/1369 , G02B3/14 , G02B26/005 , G11B7/13925 , G11B2007/0006 , G11B2020/1288 , G11B2220/2541
摘要： In optical disc systems, read-out is hampered because of spherical aberrations resulting from cover layer thickness variations or because discs consists of multiple layers. The aberration correcting apparatus (1) of the present invention is arranged to correct such an optical aberration. Therefore, the aberration correcting apparatus (1) comprises a fluid chamber containing a first fluid and a second fluid having different indices of refraction. The first (5) and second fluid (6) are in contact over a meniscus (7) acting as a refractive surface, wherein the shape of the meniscus (7) can be influenced by a magnetic field generated by a magnetizing coil (20).
摘要翻译：在光盘系统中，由于覆盖层厚度变化导致的球面像差或由于光盘由多层组成，所以读出受阻。本发明的像差校正装置（1）被配置为校正这种光学像差。因此，像差校正装置（1）包括含有第一流体和具有不同折射率的第二流体的流体室。第一流体（5）和第二流体（6）在用作折射表面的弯月面（7）上接触，其中弯月面（7）的形状可以受到由磁化线圈（20）产生的磁场的影响，。

68. 发明授权

US07593093B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07593093B2
公开(公告)日：2009-09-22
申请号：US11710408
申请日：2007-02-26
申请人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
发明人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

69. 发明授权

US07388648B2 Lithographic projection apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07388648B2
公开(公告)日：2008-06-17
申请号：US11239493
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/42 , G02B3/06
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a first inlet configured to supply a liquid, through which a patterned beam is to be projected, to the space, and a second inlet configured to supply gas and formed in a face of the structure. The face is arranged to oppose a surface of the substrate and the second inlet is located radially outward, with respect to an optical axis of the projection system, of the space and has a porous member to evenly distribute gas flow over an area of the second inlet.
摘要翻译：光刻投影装置包括沿着投影系统和基板台之间的空间的边界的至少一部分延伸的液体限制结构。液体限制结构位于投影系统的最终表面附近，并且包括第一入口，该第一入口构造成将待图案化的梁待投射的液体供应到该空间;以及第二入口，其构造成供应气体并形成一个面的结构。所述面被布置为与所述基底的表面相对，并且所述第二入口相对于所述投影系统的光轴位于所述空间的径向外侧，并且具有多孔构件以将气流均匀地分布在所述第二区域的区域上进口。

70. 发明申请

US20070052936A1 Method and device for irradiating spots on a layer 有权
标题翻译：用于在层上照射斑点的方法和装置
公开(公告)号：US20070052936A1
公开(公告)日：2007-03-08
申请号：US10539313
申请日：2003-11-20
申请人： Jacobus Neijzen , Helmar Van Santen
发明人： Jacobus Neijzen , Helmar Van Santen
IPC分类号： G03B23/04
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.
摘要翻译：为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于透镜的相对运动，使得相继地照射该层的不同部分和透镜表面之间的间隙最靠近层保持。此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应导管供给。至少一部分液体填充了辐射照射到该点的凹槽。

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