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    • 62. 发明授权
    • Curve approach control apparatus
    • 曲线进近控制装置
    • US06778896B1
    • 2004-08-17
    • US09631939
    • 2000-08-03
    • Munenori MatsuuraAkira Takahashi
    • Munenori MatsuuraAkira Takahashi
    • G01C2100
    • B60K31/0066
    • The present invention provides a curve approach control apparatus comprising an allowable lateral acceleration setting unit to set as an allowable lateral acceleration a lateral acceleration that a vehicle can tolerate when it negotiates a curve in front; an allowable approach speed setting unit to set as an allowable approach speed an approach speed at which the vehicle can negotiate the curve, based on at least the allowable lateral acceleration; a decision control unit to estimate and judge an approach of the vehicle to the curve based on at least the allowable approach speed and execute a predetermined control; and a road surface friction coefficient estimation unit to estimate a road surface friction coefficient. The allowable lateral acceleration setting unit corrects, according to the road surface friction coefficient, an allowable percentage of the lateral acceleration that occurs in the vehicle as it negotiates the curve and sets the allowable lateral acceleration.
    • 本发明提供了一种曲线进近控制装置,其包括允许的横向加速度设定单元,其将协商前面的曲线时车辆能够容忍的横向加速度设定为允许的横向加速度; 允许进入速度设定单元,至少基于允许的横向加速度来设定车辆可以协商曲线的接近速度作为允许的进近速度; 判定控制单元,至少基于所述允许接近速度来估计和判定所述车辆对所述曲线的接近,并执行预定的控制; 以及用于估计路面摩擦系数的路面摩擦系数估计单元。 允许的横向加速度设定单元根据路面摩擦系数来校正车辆中出现的横向加速度的允许百分比,并且设定允许的横向加速度。
    • 63. 发明授权
    • Position measuring apparatus and exposure apparatus
    • 位置测量装置和曝光装置
    • US06744512B2
    • 2004-06-01
    • US10231159
    • 2002-08-30
    • Akira Takahashi
    • Akira Takahashi
    • G01B1100
    • G03F9/7088G03F9/7092
    • An object of the invention is to provide a position measuring apparatus which can measure position information of a mark formed on an object with high accuracy, and an exposure apparatus which can perform exposure by performing alignment highly accurately, based on the highly accurate position information measured by the position measuring apparatus, and as a result, can realize fine processing. In order to achieve the object, the present invention is a position information measuring apparatus for measuring position information of an alignment mark, by converting an image Im1 of an alignment mark formed on an image pickup plane F1 of an image pickup device into image information, while scanning the image Im1 in a scanning direction SC1, and performing calculation processing with respect to the obtained image information, wherein the measuring direction D11 of the image Im1 of the alignment mark is set so as to be orthogonal to the scanning direction SC1.
    • 本发明的目的是提供一种可以高精度地测量形成在物体上的标记的位置信息的位置测量装置,以及基于所测量的高度准确的位置信息,可以高精度地执行对准而进行曝光的曝光装置 通过位置测量装置,结果可以实现精细处理。 为了实现该目的,本发明是一种位置信息测量装置,用于通过将形成在图像拾取装置的图像拾取平面F1上的对准标记的图像Im1转换成图像信息来测量对准标记的位置信息, 同时在扫描方向SC1上扫描图像Im1,并对所获得的图像信息执行计算处理,其中对准标记的图像Im1的测量方向D11被设置为与扫描方向SC1正交。
    • 68. 发明授权
    • System for exhaust gas purification
    • 废气净化系统
    • US06350416B2
    • 2002-02-26
    • US09093789
    • 1998-06-09
    • Naomi NodaYukinari ShibagakiAkira TakahashiHiroshige Mizuno
    • Naomi NodaYukinari ShibagakiAkira TakahashiHiroshige Mizuno
    • B01D5334
    • B01D53/945B01D2255/912F01N3/0814F01N3/0835F01N13/009Y02T10/22
    • A system for exhaust gas purification disposed in the exhaust pipe of an internal combustion engine, includes an adsorbent formed by loading, on a monolithic carrier, (1) a zeolite containing at least one kind of ion of an element having an electronegativity of 1.40 or more and (2) a catalyst material formed by loading at least one kind of noble metal selected from Pt, Pd and Rh on a heat-resistant inorganic oxide, and at least one loaded carrier formed by loading, on a monolithic carrier, a catalyst component having a purifiability for the harmful substances present in the exhaust gas emitted from the engine and/or an adsorbent component having an adsorptivity for the hydrocarbons also present in the exhaust gas, the loaded carrier being provided upstream of the adsorbent in the flow direction of the exhaust gas and having a total volume of 0.6 l or more. In this system for exhaust gas purification, the thermal deterioration of the adsorbent is reduced because there is used an adsorbent of higher HC desorption start temperature and because the thermal load applied to the adsorbent is decreased by the use of a particular means.
    • 一种设置在内燃机的排气管中的废气净化系统,包括通过在整体式载体上装载(1)含有至少一种具有1.40的电负性的元素的离子的沸石形成的吸附剂,或 更多和(2)通过将选自Pt,Pd和Rh中的至少一种贵金属负载在耐热无机氧化物上形成的催化剂材料,以及通过在整体式载体上负载催化剂形成的至少一种负载载体 具有对从发动机排出的排气中存在的有害物质具有可净化性的成分和/或对废气中也存在的具有对烃的吸附性的吸附剂成分,负载载体在吸附剂的流动方向上游侧设置 废气,总体积为0.6l以上。 在这种废气净化系统中,由于使用HC解吸开始温度较高的吸附剂,因为通过使用特定的方法降低了对吸附剂的热负荷,所以吸附剂的热劣化降低。
    • 70. 发明授权
    • Projection exposure apparatus and exposure method
    • 投影曝光装置和曝光方法
    • US06335537B1
    • 2002-01-01
    • US09598317
    • 2000-06-21
    • Akira Takahashi
    • Akira Takahashi
    • G01B1100
    • G03F9/7088G03F7/70125G03F9/70G03F9/7015
    • In the projection exposure apparatus of the present invention, alignment controller selects, from baseline memory, the appropriate baseline amount in correspondence with the insertion, into optical axes and in positional detection optical system, of illumination light limiting member and phase plate. In this way, by using a baseline amount corresponding to a modification of the optical conditions, a desired position on substrate is accurately disposed beneath the projection optical system. Furthermore, even when there are changes in the electrical circuit characteristics of the positional detection optical system as a result of changes in the amplification ratio of the amplifier, the alignment controller conducts processing which is identical to that described above. By means of this, even when the characteristics of the positional detection optical system are changed, the baseline amount corresponding to the changes in characteristics is corrected, and reliable alignment is possible.
    • 在本发明的投影曝光装置中,对准控制器从基线存储器中选择对应于照明光限制构件和相位板的光轴和位置检测光学系统中的适当基线量。 以这种方式,通过使用对应于光学条件的修改的基线量,在投影光学系统下方精确地设置在基板上的期望位置。 此外,即使由于放大器的放大率的变化而导致位置检测光学系统的电路特性发生变化,所以对准控制器进行与上述相同的处理。 由此,即使在位置检测光学系统的特性发生变化的情况下,对与特性变化对应的基线量进行校正,也可以进行可靠的对准。