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    • 65. 发明申请
    • Force Feedback Leveling of Tip Arrays for Nanolithography
    • 用于纳米光刻的尖端阵列的力反馈调平
    • US20110165329A1
    • 2011-07-07
    • US12960439
    • 2010-12-03
    • Chad A. MirkinXing LiaoAdam B. Braunschweig
    • Chad A. MirkinXing LiaoAdam B. Braunschweig
    • B05D5/00B05D1/28G01L1/06B82Y99/00
    • G03F7/0002
    • A method of leveling a polymer pen array includes contacting a pen array with a surface and measuring a total force exerted on the surface by the pen array, the pen array being disposed at a first angle with respect to a first axis of the surface and a second angle with respect to a second axis of the surface; tilting one or both of the pen array and the surface to vary the first and second angles of the pen array with respect to the surface; measuring the total force exerted by the tilted pen array on the surface; and repeating the tilting and measuring steps until a global maximum of the total force exerted on the surface by the pen array is measured, thereby determining first and second angles which correspond to a leveled position of the pen array with respect to the surface.
    • 调整聚合物笔阵列的方法包括使笔阵列与表面接触并且通过笔阵列测量施加在表面上的总力,笔阵列相对于表面的第一轴线以第一角度设置, 相对于表面的第二轴线的第二角度; 倾斜笔阵列和表面中的一个或两个以改变笔阵列相对于表面的第一和第二角度; 测量由倾斜笔阵列施加在表面上的总力; 并且重复倾斜和​​测量步骤,直到测量由笔阵列施加在表面上的总力的全局最大值,从而确定对应于笔阵列相对于表面的调平位置的第一和第二角度。
    • 66. 发明授权
    • Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
    • 从纳米尖端直接写入纳米光刻的核酸
    • US07951334B2
    • 2011-05-31
    • US12044738
    • 2008-03-07
    • Chad A. MirkinLinette DemersDavid S. Ginger
    • Chad A. MirkinLinette DemersDavid S. Ginger
    • B01L3/02
    • G03F7/0002G01Q80/00Y10T436/2575
    • The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.
    • 描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案,包括导电和绝缘基底。 含有反应性基团如硫醇基团的核酸(包括寡核苷酸)的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。 反应性基团提供化学吸附或共价结合到基底表面。 所得到的表现出良好稳定性的核酸特征可与互补核酸杂交,并使用例如用核酸官能化的纳米颗粒进行相应的探测。 可以通过选择尖端处理,相对湿度和核酸结构来控制图案化。