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    • 64. 发明申请
    • Antenna Device
    • 天线装置
    • US20090002256A1
    • 2009-01-01
    • US12113289
    • 2008-05-01
    • Hisashi TakisawaJunichj NoroKyuichi SatoTakao KatoArata Togashi
    • Hisashi TakisawaJunichj NoroKyuichi SatoTakao KatoArata Togashi
    • H01Q1/42
    • H01Q1/1221H01Q3/06H01Q9/0407
    • A hinge portion is formed on the base portion. An antenna portion is attached to the hinge portion so as to be pivotable thereabout. The hinge portion includes a hinge base having a first shaft formed on one end thereof, a second shaft formed on the other end thereof, and a first protrusion formed on an outer periphery of the second shaft, and a hinge bush rotatably mounted on the first shaft and engaged with the antenna portion. The antenna portion is formed with a hole surrounding the outer periphery of the second shaft. A projection is formed on an inner periphery of the hole. The first protrusion is brought into contact with the projection when the antenna portion is pivoted so as to define a predetermined angle with respect to the base portion.
    • 铰链部分形成在基部上。 天线部分附接到铰链部分,以便在其周围枢转。 铰链部分包括铰链基座,其具有在其一端形成的第一轴,在其另一端形成的第二轴和形成在第二轴的外周上的第一突起,以及可旋转地安装在第一轴上的铰链衬套 并与天线部分接合。 天线部形成有围绕第二轴的外周的孔。 在孔的内周上形成突起。 当天线部分枢转以便相对于基部限定预定角度时,第一突起与突起接触。
    • 67. 发明授权
    • System and method for evaluation using electron beam and manufacture of devices
    • 使用电子束进行评估的系统和方法以及器件的制造
    • US07235799B2
    • 2007-06-26
    • US10998160
    • 2004-11-29
    • Mamoru NakasujiTohru SatakeTakao KatoNobuharu Noji
    • Mamoru NakasujiTohru SatakeTakao KatoNobuharu Noji
    • H01J1/50
    • H01J37/141B82Y10/00B82Y15/00H01J37/09H01J37/12H01J37/1474H01J37/28H01J2237/0453H01J2237/06316H01J2237/244H01J2237/2538H01J2237/2817
    • An electron beam apparatus having a longer life time of cathode, and allowing a plurality of electron beams to be arranged adequately around an optical axis and five or more electron beams to be formed from a single electron gun. The electron beams emitted from a cathode made of ZrO/W (tungsten zirconium oxide) or a cathode made of carbide of transition metal to the off-optical axis directions may be converged on a sample to scan it. The apparatus includes a plate for reducing a vacuum conductance defined between the electron gun chamber side and the sample side, and apertures are formed through the plate at locations offset from the optical axis allowing for the passage of the electron beams. In order to evaluate a pattern on the sample, the electron beam emitted from the electron gun is incident to the sample surface via an objective lens. The objective lens is composed of a flat electrode having an aperture centered on the optical axis and placed in parallel with the sample surface and an electromagnetic lens including a gap formed in a side facing to the sample. Further, in order to inspect a mask, spacing among a plurality of electron beams after having passed through the mask are extended by a magnifying lens and thus widely spaced electron beams are then converted into optical signal in a scintillator.
    • 一种电子束装置,具有较长的阴极使用寿命,并允许多个电子束在光轴周围适当布置,并可由单个电子枪形成五个或更多个电子束。 从由ZrO / W(钨氧化锆)制成的阴极或由过渡金属的碳化物制成的阴极发射到离轴方向的电子束可以会聚在样品上以进行扫描。 该装置包括用于减小限定在电子枪室侧和样品侧之间的真空电导的板,并且在偏离光轴的位置处穿过板形成允许电子束通过的孔。 为了评估样品上的图案,从电子枪发射的电子束通过物镜入射到样品表面。 物镜由平面电极构成,该平面电极具有以光轴为中心并且与样品表面平行放置的孔,以及包括在面向样品的一侧形成的间隙的电磁透镜。 此外,为了检查掩模,在通过掩模之后的多个电子束之间的间隔通过放大透镜延伸,并且因此在闪烁体中将大量间隔的电子束转换成光信号。
    • 68. 发明授权
    • Electron beam apparatus and device manufacturing method using same
    • 电子束装置及其制造方法
    • US07205540B2
    • 2007-04-17
    • US11262844
    • 2005-11-01
    • Mamoru NakasujiTakao KatoKenji WatanabeShoji YoshikawaTohru SatakeNobuharu Noji
    • Mamoru NakasujiTakao KatoKenji WatanabeShoji YoshikawaTohru SatakeNobuharu Noji
    • G21K7/00H01J37/28H01L21/66G01N23/00
    • B82Y10/00G01N23/225G01R31/307H01J37/242H01J37/265H01J37/28H01J2237/221H01J2237/24507H01J2237/2817
    • An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an E×B separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample. When the sample is evaluated, a direction in which the stage is moved is corrected to align with the direction in which the dies are arranged.
    • 提供电子束装置,用于以简单的结构以高通量可靠地测量电位对比度等。 用于照射形成有电子束图案的晶片的样品(如晶片)以评估样品的电子束装置包括用于容纳电子束源的电子 - 光学柱,物镜,ExB分离器和次级 电子束检测器 用于保持样品的阶段,并相对于电子 - 光学柱相对移动样品; 用于容纳舞台并能够在真空气氛中控制其内部的工作室; 用于将样品供应到载物台的装载机; 电压施加机构,用于向样品施加电压,并且能够向物镜的下电极施加至少两个电压; 以及用于测量模具布置在样品上的方向的对准机构。 当评估样品时,对载物台移动的方向进行校正,使其与模具的排列方向一致。