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    • 67. 发明申请
    • Magnetic memory devices using magnetic domain motion
    • 使用磁畴运动的磁存储器件
    • US20070195588A1
    • 2007-08-23
    • US11707002
    • 2007-02-16
    • Tae-wan KimKee-won KimYoung-Jin ChoIn-Jun Hwang
    • Tae-wan KimKee-won KimYoung-Jin ChoIn-Jun Hwang
    • G11C11/00
    • G11C11/16G11C19/0808G11C19/0841G11C2213/77
    • A magnetic memory device includes a recording layer, a reference layer, a first input portion and a second input portion. The recording layer has perpendicular magnetization direction and a plurality of magnetic domains, and the reference layer corresponds to a portion of the recording layer and has a pinned magnetization direction. The recording layer has a data storage cell wherein a plurality of data bit regions each including a magnetic domain are formed. The magnetic domain corresponds to an effective size of the reference layer. The first input portion inputs at least one of a writing signal and a reading signal. The second input portion is electrically connected to the recording layer and inputs a magnetic domain motion signal in order to move data stored in a data bit region of the recording layer to an adjoining data bit region.
    • 磁存储器件包括记录层,参考层,第一输入部分和第二输入部分。 记录层具有垂直磁化方向和多个磁畴,并且参考层对应于记录层的一部分并具有钉扎磁化方向。 记录层具有数据存储单元,其中形成各自包括磁畴的多个数据位区域。 磁畴对应于参考层的有效尺寸。 第一输入部分输入写入信号和读取信号中的至少一个。 第二输入部分电连接到记录层并输入磁畴运动信号,以便将存储在记录层的数据位区域中的数据移动到相邻的数据位区域。
    • 69. 发明授权
    • Capacitor for semiconductor device, manufacturing method thereof, and electronic device employing the same
    • 半导体装置用电容器及其制造方法以及使用该半导体装置的电子装置
    • US07105401B2
    • 2006-09-12
    • US10930953
    • 2004-09-01
    • Jung-hyun LeeYo-sep MinYoung-jin Cho
    • Jung-hyun LeeYo-sep MinYoung-jin Cho
    • H01L21/8242
    • H01L28/56H01L21/3141H01L21/321H01L27/0629H01L28/55H01L28/65
    • A capacitor for use in a semiconductor device, a method of fabricating the capacitor, and an electronic device adopting the capacitor, wherein the capacitor includes upper and lower electrodes, each formed of a platinum group metal; a thin dielectric layer disposed between the upper and lower electrodes; and a buffer layer disposed between the lower electrode and the thin dielectric layer, the buffer layer including a metal oxide of Group 3, 4, or 13. In an embodiment, the method of fabricating includes absorbing CO on a surface of a lower electrode of a platinum group metal, placing the lower electrode under a reducing atmosphere to produce a lattice oxygen, using the lattice oxygen to form a thin dielectric layer by performing an ALD process using a precursor for the thin dielectric layer, and forming an upper electrode of a platinum group metal on the thin dielectric layer.
    • 一种用于半导体器件的电容器,制造该电容器的方法以及采用该电容器的电子器件,其中该电容器包括由铂族金属形成的上下电极; 设置在上电极和下电极之间的薄介电层; 以及设置在下电极和薄电介质层之间的缓冲层,缓冲层包括第3,4或13族的金属氧化物。在一个实施方案中,制造方法包括在下电极的表面上吸收CO 铂族金属,将下电极置于还原气氛下以产生晶格氧,使用晶格氧通过使用用于薄介电层的前体进行ALD工艺形成薄介电层,并形成上电极 铂族金属在薄介电层上。