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    • 64. 发明申请
    • High Voltage Integration Circuit With Freewheeling Diode Embedded in Transistor
    • 具有嵌入在晶体管中的续流二极管的高压集成电路
    • US20100244756A1
    • 2010-09-30
    • US12795564
    • 2010-06-07
    • Taeg-hyun KangSung-son Yun
    • Taeg-hyun KangSung-son Yun
    • H02P6/14H01L27/06
    • H01L27/0727H01L27/0761H01L29/0619H01L29/0696H01L29/7819H01L29/861
    • A high voltage integrated circuit contains a freewheeling diode embedded in a transistor. It further includes a control block controlling a high voltage transistor and a power block—including the high voltage transistor—isolated from the control block by a device isolation region. The high voltage transistor includes a semiconductor substrate of a first conductivity type, a epitaxial layer of a second conductivity type on the semiconductor substrate, a buried layer of the second conductivity type between the semiconductor substrate and the epitaxial layer, a collector region of the second conductivity type on the buried layer, a base region of the first conductivity type on the epitaxial layer, and an emitter region of the second conductivity type formed in the base region. The power block further includes a deep impurity region of the first conductivity type near the collector region to form a PN junction.
    • 高压集成电路包含嵌入晶体管的续流二极管。 它还包括控制高压晶体管的控制块和包括通过器件隔离区从控制块隔离的高压晶体管的功率块。 高压晶体管包括第一导电类型的半导体衬底,半导体衬底上的第二导电类型的外延层,半导体衬底和外延层之间的第二导电类型的掩埋层,第二导电类型的第二导电类型的集电极区域 掩埋层上的导电类型,外延层上的第一导电类型的基极区域和形成在基极区域中的第二导电类型的发射极区域。 功率块还包括在集电极区附近的第一导电类型的深杂质区,以形成PN结。
    • 65. 发明授权
    • High voltage integration circuit with freewheeling diode embedded in transistor
    • 具有嵌入晶体管的续流二极管的高压集成电路
    • US07732858B2
    • 2010-06-08
    • US11603671
    • 2006-11-22
    • Taeg-hyun KangSung-son Yun
    • Taeg-hyun KangSung-son Yun
    • H01L29/94
    • H01L27/0727H01L27/0761H01L29/0619H01L29/0696H01L29/7819H01L29/861
    • A high voltage integrated circuit contains a freewheeling diode embedded in a transistor. It further includes a control block controlling a high voltage transistor and a power block—including the high voltage transistor—isolated from the control block by a device isolation region. The high voltage transistor includes a semiconductor substrate of a first conductivity type, a epitaxial layer of a second conductivity type on the semiconductor substrate, a buried layer of the second conductivity type between the semiconductor substrate and the epitaxial layer, a collector region of the second conductivity type on the buried layer, a base region of the first conductivity type on the epitaxial layer, and an emitter region of the second conductivity type formed in the base region. The power block further includes a deep impurity region of the first conductivity type near the collector region to form a PN junction.
    • 高压集成电路包含嵌入晶体管的续流二极管。 它还包括控制高压晶体管的控制块和包括通过器件隔离区从控制块隔离的高压晶体管的功率块。 高压晶体管包括第一导电类型的半导体衬底,半导体衬底上的第二导电类型的外延层,半导体衬底和外延层之间的第二导电类型的掩埋层,第二导电类型的第二导电类型的集电极区域 掩埋层上的导电类型,外延层上的第一导电类型的基极区域和形成在基极区域中的第二导电类型的发射极区域。 功率块还包括在集电极区附近的第一导电类型的深杂质区,以形成PN结。
    • 66. 发明授权
    • Photodiode and method of manufacturing the same
    • 光电二极管及其制造方法
    • US07476598B2
    • 2009-01-13
    • US11670457
    • 2007-02-02
    • Ho-Sung SonSung-Ryoul BaeDong-Kyun Nam
    • Ho-Sung SonSung-Ryoul BaeDong-Kyun Nam
    • H01L21/20
    • H01L31/105H01L31/02168Y02E10/50
    • A photodiode and a method of manufacturing the photodiode are provided. The method includes forming a diode junction structure including a light receiving unit and an electrode unit on a semiconductor substrate, forming a buffer oxide layer and an etching blocking layer on the junction structure, forming an interlayer insulating layer and an intermetal insulating layer and an interconnecting structure, exposing the etching blocking layer by etching the intermetal insulating layer and the interlayer insulating layer, removing a portion of the etching blocking layer and the buffer oxide layer of the light-receiving unit by dry etching, and exposing a semiconductor surface of the light-receiving unit by wet etching.
    • 提供光电二极管和制造光电二极管的方法。 该方法包括在半导体衬底上形成包括光接收单元和电极单元的二极管结结构,在接合结构上形成缓冲氧化物层和蚀刻阻挡层,形成层间绝缘层和金属间绝缘层和互连 通过蚀刻金属间绝缘层和层间绝缘层来暴露蚀刻阻挡层,通过干法蚀刻去除蚀刻阻挡层的一部分和光接收单元的缓冲氧化物层,并且暴露光的半导体表面 接收单元通过湿蚀刻。
    • 68. 发明授权
    • Inspection system and a method for inspecting a semiconductor wafer
    • 检查系统和检查半导体晶片的方法
    • US07268895B2
    • 2007-09-11
    • US11052698
    • 2005-02-07
    • Kwang-Woon LeeJang-Hyeok LeeWook-Sung Son
    • Kwang-Woon LeeJang-Hyeok LeeWook-Sung Son
    • G01N21/00G01B11/14
    • G01N21/9501
    • An inspection system for inspecting a wafer and an inspection method thereof are provided. The inspection system includes a rotating means for turning and arranging a wafer to an inspection position, an angle measuring means for measuring a rotational angle used by the rotating means to rotate to the inspection position, an inspection apparatus for acquiring inspection data associated with the wafer, and a controller for determining an amending angle from the rotational angle and for amending the inspection data in accordance with the amending angle to calculate amended inspection data, wherein the amended inspection data reflects a state of the wafer on the rotating means.
    • 提供了一种用于检查晶片的检查系统及其检查方法。 检查系统包括用于将晶片转动并布置到检查位置的旋转装置,用于测量由旋转装置旋转到检查位置的旋转角度的角度测量装置,用于获取与晶片相关联的检查数据的检查装置 以及控制器,用于根据所述旋转角度确定修正角度,并根据所述修正角修正所述检查数据,以计算修正的检查数据,其中所述经修改的检查数据反映所述旋转装置上的所述晶片的状态。
    • 69. 发明申请
    • High voltage integration circuit with freewheeling diode embedded in transistor
    • 具有嵌入晶体管的续流二极管的高压集成电路
    • US20070132008A1
    • 2007-06-14
    • US11603671
    • 2006-11-22
    • Taeg-hyun KangSung-son Yun
    • Taeg-hyun KangSung-son Yun
    • H01L29/788
    • H01L27/0727H01L27/0761H01L29/0619H01L29/0696H01L29/7819H01L29/861
    • A high voltage integrated circuit contains a freewheeling diode embedded in a transistor. It further includes a control block controlling a high voltage transistor and a power block—including the high voltage transistor—isolated from the control block by a device isolation region. The high voltage transistor includes a semiconductor substrate of a first conductivity type, a epitaxial layer of a second conductivity type on the semiconductor substrate, a buried layer of the second conductivity type between the semiconductor substrate and the epitaxial layer, a collector region of the second conductivity type on the buried layer, a base region of the first conductivity type on the epitaxial layer, and an emitter region of the second conductivity type formed in the base region. The power block further includes a deep impurity region of the first conductivity type near the collector region to form a PN junction.
    • 高压集成电路包含嵌入晶体管的续流二极管。 它还包括控制高压晶体管的控制块和包括通过器件隔离区从控制块隔离的高压晶体管的功率块。 高压晶体管包括第一导电类型的半导体衬底,半导体衬底上的第二导电类型的外延层,半导体衬底和外延层之间的第二导电类型的掩埋层,第二导电类型的第二导电类型的集电极区域 掩埋层上的导电类型,外延层上的第一导电类型的基极区域和形成在基极区域中的第二导电类型的发射极区域。 功率块还包括在集电极区附近的第一导电类型的深杂质区,以形成PN结。
    • 70. 发明申请
    • Motor with position-adjustable rotor
    • 电机带位置可调转子
    • US20070114864A1
    • 2007-05-24
    • US11603002
    • 2006-11-22
    • Sung Son
    • Sung Son
    • H02K5/16H02K1/22
    • H02K1/28H02K5/1672H02K7/083
    • A motor with a position-adjustable rotor, wherein a rotational shaft of the motor is rotatably supported by a holder assembly, includes a rotor of which the rotational shaft is fixed in a central portion. The rotor has a position adjusting indentation around the rotational shaft, and is formed by pressing soft magnetic powder. Further, the motor includes a position adjusting bushing, inserted into the rotational shaft to be positioned between the rotor and the holder assembly. The position adjusting bushing has an insertion unit inserted into the position adjusting indentation and a locking unit supported at an exterior side of the position adjusting indentation, wherein the insertion unit and the locking unit have different diameters or widths. In the motor, a gap between the rotor and the holder assembly is adjusted by changing a direction in which the position adjusting bushing is inserted into the rotational shaft.
    • 一种具有位置可调转子的电动机,其中电动机的旋转轴由保持器组件可旋转地支撑,包括转子,转子轴固定在转子的中心部分。 转子具有围绕旋转轴的位置调整压痕,并且通过压制软磁粉而形成。 此外,电动机包括位置调节衬套,其插入到转动轴中以定位在转子和保持器组件之间。 位置调整衬套具有插入到位置调整凹部中的插入单元和支撑在位置调整凹部的外侧的锁定单元,其中插入单元和锁定单元具有不同的直径或宽度。 在电动机中,通过改变位置调节衬套插入到旋转轴中的方向来调节转子和保持器组件之间的间隙。