专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

61. 发明授权

US08591699B2 Method and system for supplying a cleaning gas into a process chamber 有权
公开(公告)号：US08591699B2
公开(公告)日：2013-11-26
申请号：US13676820
申请日：2012-11-14
申请人： Ramprakash Sankarakrishnan , Dale R. Du Bois , Ganesh Balasubramanian , Karthik Janakiraman , Juan Carlos Rocha-Alvarez , Thomas Nowak , Visweswaren Sivaramakrishnan , Hichem M'Saad
发明人： Ramprakash Sankarakrishnan , Dale R. Du Bois , Ganesh Balasubramanian , Karthik Janakiraman , Juan Carlos Rocha-Alvarez , Thomas Nowak , Visweswaren Sivaramakrishnan , Hichem M'Saad
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： F16K31/0655 , B08B5/00 , B08B7/0021 , C23C16/4405 , C23C16/4409 , C23C16/45561 , F16K1/221 , F16K1/224 , F16K31/06 , F16K31/088 , Y10S438/905
摘要： A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.

62. 发明申请

US20130126206A1 APPARATUS AND METHODS FOR IMPROVING RELIABILITY OF RF GROUNDING 有权
标题翻译：改善射频接地可靠性的装置和方法
公开(公告)号：US20130126206A1
公开(公告)日：2013-05-23
申请号：US13302012
申请日：2011-11-22
申请人： Jianhua Zhou , Dale R. Du Bois , Mohamad A. Ayoub , Juan Carlos Rocha-Alvarez
发明人： Jianhua Zhou , Dale R. Du Bois , Mohamad A. Ayoub , Juan Carlos Rocha-Alvarez
IPC分类号： H02G3/04
CPC分类号： H01J37/32091 , H01J37/32577
摘要： Embodiments of the present invention provide an RF conducting rod comprising a hollow portion. Particularly, the RF conducting rod comprises an elongated hollow body having a sidewall enclosing an inner volume, a first solid connector extending from a first end of the elongated hollow body, and a second solid connector extending from a second end of the elongated hollow body. Each of the elongated hollow body, the first solid connector and the second solid connector is formed from an electrically conductive material.
摘要翻译：本发明的实施例提供一种包括中空部分的RF导电棒。特别地，RF导杆包括细长的中空本体，其具有封闭内部容积的侧壁，从细长中空体的第一端延伸的第一固体连接器和从细长中空体的第二端延伸的第二固体连接器。每个细长的中空体，第一固体连接器和第二固体连接器由导电材料形成。

63. 发明申请

US20120211484A1 METHODS AND APPARATUS FOR A MULTI-ZONE PEDESTAL HEATER 审中-公开
标题翻译：多区加热器的方法和装置
公开(公告)号：US20120211484A1
公开(公告)日：2012-08-23
申请号：US13033592
申请日：2011-02-23
申请人： Jianhua Zhou , Juan Carlos Rocha-Alvarez
发明人： Jianhua Zhou , Juan Carlos Rocha-Alvarez
IPC分类号： H05B3/68 , H01C17/02
CPC分类号： H01L21/67248 , H01L21/67103 , Y10T29/49083
摘要： The present invention provides systems, methods and apparatus for manufacturing a multi-zone pedestal heater. A multi-zone pedestal heater includes a heater plate which includes a first zone including a first heating element and a first thermocouple for sensing the temperature of the first zone wherein the first zone is disposed in the center of the heater plate; and a second zone including a second heating element and a first embedded thermocouple for sensing the temperature of the second zone wherein the first embedded thermocouple includes a first longitudinal piece that extends from a center of the heater plate to the second zone and the first longitudinal piece is entirely encased within the heater plate. Numerous additional aspects are disclosed.
摘要翻译：本发明提供用于制造多区基座加热器的系统，方法和装置。多区基座加热器包括加热板，加热板包括第一区域，第一区域包括第一加热元件和第一热电偶，用于感测第一区域的温度，其中第一区域设置在加热器板的中心; 以及第二区域，包括第二加热元件和用于感测第二区域的温度的第一嵌入式热电偶，其中第一嵌入式热电偶包括从加热器板的中心延伸到第二区域的第一纵向件和第一纵向件被完全封装在加热器板内。公开了许多附加方面。

64. 发明申请

US20120003398A1 APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO UV RADIATION USING A REFLECTOR HAVING BOTH ELLIPTICAL AND PARABOLIC REFLECTIVE SECTIONS 有权
标题翻译：使用具有两个ELLIPTICAL和PARABOLIC反射部分的反射器将基板暴露于紫外线辐射的装置和方法
公开(公告)号：US20120003398A1
公开(公告)日：2012-01-05
申请号：US12976746
申请日：2010-12-22
申请人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
发明人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
IPC分类号： B29C35/08 , G21K5/00
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。还公开了其他实施例。

65. 发明申请

US20110256041A1 FLUID FILTRATION FOR SUBSTRATE PROCESSING CHAMBER 失效
标题翻译：基板加工室流体过滤
公开(公告)号：US20110256041A1
公开(公告)日：2011-10-20
申请号：US12914822
申请日：2010-10-28
申请人： Dustin W. HO , Juan Carlos ROCHA-ALVAREZ , Hichem M'SAAD
发明人： Dustin W. HO , Juan Carlos ROCHA-ALVAREZ , Hichem M'SAAD
IPC分类号： B01D61/00 , B01J8/00 , B01D53/38 , B01D63/00
CPC分类号： C23C16/4402 , C23C16/4481 , C23C16/52
摘要： A filter for filtering a fluid in a substrate processing apparatus comprises first and second stages that are connected to one another. A delivery system provides a vaporized liquid to the filter. The first stage of the filter comprises a basic compound, and the second stage of the filter comprises a desiccant. A second filter comprises a permeation filter with permeable membrane to filter the fluid. Methods of filtering the fluid to reduce formation of undesirable process residues using the filter(s) are also described.
摘要翻译：用于过滤衬底处理设备中的流体的过滤器包括彼此连接的第一和第二阶段。输送系统向过滤器提供蒸发的液体。过滤器的第一阶段包括碱性化合物，并且过滤器的第二阶段包括干燥剂。第二过滤器包括具有可渗透膜的渗透过滤器以过滤流体。还描述了使用过滤器过滤流体以减少不期望的工艺残余物的形成的方法。

66. 发明申请

US20110147363A1 MULTIFUNCTIONAL HEATER/CHILLER PEDESTAL FOR WIDE RANGE WAFER TEMPERATURE CONTROL 有权
标题翻译：多功能加热器/冷却器用于宽范围的温度控制
公开(公告)号：US20110147363A1
公开(公告)日：2011-06-23
申请号：US12641819
申请日：2009-12-18
申请人： Lipyeow Yap , Tuan Anh Nguyen , Dale R. Du Bois , Sanjeev Baluja , Thomas Nowak , Juan Carlos Rocha-Alvarez , Jianhua Zhou
发明人： Lipyeow Yap , Tuan Anh Nguyen , Dale R. Du Bois , Sanjeev Baluja , Thomas Nowak , Juan Carlos Rocha-Alvarez , Jianhua Zhou
IPC分类号： H05B3/68
CPC分类号： H01L21/67109 , H01L21/68792
摘要： Embodiments of the invention generally relate to a semiconductor processing chamber and, more specifically, a heated support pedestal for a semiconductor processing chamber. In one embodiment, a pedestal for a semiconductor processing chamber is provided. The pedestal comprises a substrate support comprising a conductive material and having a support surface for receiving a substrate, a resistive heater encapsulated within the substrate support, a hollow shaft coupled to the substrate support at a first end and a mating interface at an opposing end, the hollow shaft comprising a shaft body having a hollow core, and a cooling channel assembly encircling the hollow core and disposed within the shaft body for removing heat from the pedestal via an internal cooling path, wherein the substrate support has a heat control gap positioned between the heating element and the ring-shaped cooling channel.
摘要翻译：本发明的实施例一般涉及半导体处理室，更具体地说，涉及用于半导体处理室的加热支撑基座。在一个实施例中，提供了一种用于半导体处理室的基座。基座包括基板支撑件，该基板支撑件包括导电材料并且具有用于接收基板的支撑表面，封装在基板支撑件内的电阻加热器，在第一端处耦合到基板支撑件的中空轴和在相对端处的配合接口，所述空心轴包括具有中空芯的轴体和围绕所述中空芯的冷却通道组件，所述冷却通道组件设置在所述轴体内，用于经由内部冷却路径从所述基座移除热量，其中所述基板支撑件具有位于加热元件和环形冷却通道。

67. 发明授权

US07909595B2 Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections 有权
标题翻译：使用具有椭圆形和抛物面反射部分的反射器将衬底暴露于UV辐射的装置和方法
公开(公告)号：US07909595B2
公开(公告)日：2011-03-22
申请号：US11686901
申请日：2007-03-15
申请人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
发明人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
IPC分类号： B29C35/08
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。还公开了其他实施例。

68. 发明授权

US07829145B2 Methods of uniformity control for low flow process and chamber to chamber matching 有权
标题翻译：低流程和室到室匹配的均匀性控制方法
公开(公告)号：US07829145B2
公开(公告)日：2010-11-09
申请号：US12256405
申请日：2008-10-22
申请人： Ganesh Balasubramanian , Juan Carlos Rocha-Alvarez , Tom K. Cho , Daemian Raj
发明人： Ganesh Balasubramanian , Juan Carlos Rocha-Alvarez , Tom K. Cho , Daemian Raj
IPC分类号： C23C16/00
CPC分类号： C23C16/4405 , C23C16/45565 , C23C16/45574
摘要： Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the method for processing a substrate includes delivering a processing gas into a chemical vapor deposition chamber through a first gas pathway that includes flow through a first plurality of apertures in a blocker plate, the blocker plate creating a pressure drop of at least approximately 0.8 torr thereacross, reacting the processing gas to deposit a material on a substrate surface, removing the substrate from the chamber, delivering a cleaning gas into the chamber through a second gas pathway around the blocker plate bypassing the blocker plate and through a second plurality of apertures formed in the blocker plate, and reacting the cleaning gases with deposits within the chamber to etch the deposits from the chamber.
摘要翻译：公开了将气体分配到处理室中的装置和方法。在一个实施例中，用于处理衬底的方法包括通过第一气体通路将处理气体输送到化学气相沉积室，所述第一气体通路包括通过阻挡板中的第一多个孔的流动，所述阻挡板产生至少一个压降使处理气体反应在衬底表面上沉积材料，从腔室中移除衬底，通过围绕阻挡板的第二气体通道将清洁气体输送到室中，并绕过第二个多个形成在阻挡板中的孔，并使清洁气体与腔室内的沉积物反应，以蚀刻来自腔室的沉积物。

69. 发明授权

US07802538B2 Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors 有权
标题翻译：通过使用粘性前体的化学气相沉积法沉积功能梯度电介质膜的方法
公开(公告)号：US07802538B2
公开(公告)日：2010-09-28
申请号：US11608333
申请日：2006-12-08
申请人： Deenesh Padhi , Sohyun Park , Ganesh Balasubramanian , Juan Carlos Rocha-Alvarez , Li-Qun Xia , Derek R. Witty , Hichem M'Saad
发明人： Deenesh Padhi , Sohyun Park , Ganesh Balasubramanian , Juan Carlos Rocha-Alvarez , Li-Qun Xia , Derek R. Witty , Hichem M'Saad
IPC分类号： C23C16/00 , C23C16/30 , C23C16/455 , C23C16/52
CPC分类号： H01L21/31633 , C23C16/029 , C23C16/401 , C23C16/45523 , H01L21/02126 , H01L21/02216 , H01L21/02274 , H01L21/02304 , H01L21/76841
摘要： A method of forming a graded dielectric layer on an underlying layer including flowing a mixture of a silicon-carbon containing gas, an oxygen containing gas and a carrier gas through a showerhead comprising a blocking plate and a faceplate to form an oxide rich portion of the graded dielectric layer, where the silicon-carbon containing gas has an initial flow rate, flowing the silicon-carbon containing gas at a first intermediate flow rate for about 0.5 seconds or longer, where the first intermediate flow rate is higher than the initial flow rate, and flowing the silicon-carbon containing gas at a fastest flow rate higher than the first intermediate flow rate to form a carbon rich portion of the graded dielectric layer.
摘要翻译：一种在下层上形成渐变电介质层的方法，包括使含硅碳的气体，含氧气体和载体气体的混合物流过包括阻挡板和面板的喷头，以形成氧化物富集部分其中含硅碳的气体具有初始流速，使含硅碳的气体以第一中间流速流动约0.5秒或更长，其中第一中间流速高于初始流速并且使含硅碳的气体以比第一中间流速高的最快流速流动，以形成渐变电介质层的富碳部分。

70. 发明申请

US20100096569A1 ULTRAVIOLET-TRANSMITTING MICROWAVE REFLECTOR COMPRISING A MICROMESH SCREEN 审中-公开
标题翻译：包含MICROMESH屏幕的超紫外线发射微波反射器
公开(公告)号：US20100096569A1
公开(公告)日：2010-04-22
申请号：US12255578
申请日：2008-10-21
申请人： Tuan Anh Nguyen , Yao-Hung Yang , Sanjeev Baluja , Thomas Nowak , Juan Carlos Rocha-Alvarez
发明人： Tuan Anh Nguyen , Yao-Hung Yang , Sanjeev Baluja , Thomas Nowak , Juan Carlos Rocha-Alvarez
IPC分类号： H01J1/52 , C25D5/02 , C25D1/00
CPC分类号： C25D5/022 , C25D1/08
摘要： An ultraviolet-transmitting microwave reflector for a substrate processing chamber, comprises a micromesh screen extending across the metallic frame. In one version, the micromesh screen comprises at least one electroformed layer. A method of fabricating the microwave reflector comprises electroforming a metallic frame surrounding a micromesh screen such that the micromesh screen comprises an open area of greater than 80% of the total area.
摘要翻译：用于基板处理室的紫外线透射微波反射器包括跨过金属框架延伸的微镜屏幕。在一个版本中，微镜屏幕包括至少一个电铸层。制造微波反射器的方法包括电铸微型屏幕周围的金属框架，使得微型屏幕包括大于总面积的80％的开放面积。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式