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    • 63. 发明申请
    • Metal Filling Device
    • 金属灌装装置
    • US20140224445A1
    • 2014-08-14
    • US14343650
    • 2012-09-14
    • Tatsuo Kikuchi
    • Tatsuo Kikuchi
    • H01L21/3205B22D19/00B22D45/00H01L21/768
    • H01L21/32051B22D19/00B22D19/08B22D39/02B22D45/00C23C6/00H01L21/768H01L21/76898
    • A metal filling apparatus 1 fills a molten metal M into a minute space formed on a surface of a semiconductor wafer K. The metal filling apparatus 1 has a processor body 2 having a processing chamber 5 in which the semiconductor wafer K is held, a molten metal supply mechanism 10, and a molten metal recovery mechanism 20. The molten metal supply mechanism 10 includes a supply tank 11 in which the molten metal M is stored, a supply pipe 13 connected to the processing chamber 5 of the processor body 11 and the supply tank 11, and a supplier 12 interposed in the supply pipe 13 and supplying the molten metal M in the supply tank 11 into the processing chamber 5 through the supply pipe 13, and the molten metal recovery mechanism 20 recovers the molten metal M supplied into the processing chamber 5 from the processing chamber 5.
    • 金属填充装置1将熔融金属M填充到形成在半导体晶片K的表面上的微小空间中。金属填充装置1具有处理体2,处理室2具有保持半导体晶片K的处理室5, 金属供给机构10和熔融金属回收机构20.熔融金属供给机构10包括供给槽11,熔融金属M被储存在该供给槽11中,供给管13与处理体11的处理室5连接, 供给罐11和供给管12,插入到供给管13中,通过供给管13将供给槽11内的熔融金属M供给到处理室5,熔融金属回收机构20回收供给到的供给槽 来自处理室5的处理室5。
    • 65. 发明授权
    • Method of controlling steering control equipment for aircraft, and steering control equipment for aircraft and aircraft provided therewith
    • 控制飞机转向控制设备的方法以及为此提供的飞机和飞机的转向控制设备
    • US08630750B2
    • 2014-01-14
    • US13275571
    • 2011-10-18
    • Kazunari TadaKazushi FuruichiYutaro Minami
    • Kazunari TadaKazushi FuruichiYutaro Minami
    • G01C23/00B64C25/50
    • B64C25/50G05D1/0083
    • A steering control equipment has a controller having a provisional-target-angular-position calculating section calculating a provisional target angular position of a steering mechanism corresponding to the operation amounts of a steering handle and rudder pedals, a speed setting section setting the aircraft speed on the basis of detected ground speed and airspeed, a target-angular-position limiting section outputting the provisional target angular position as a final target angular position when the calculated provisional target angular position is equal to or lower than a limit value corresponding to the set speed and outputting the limit value as a final target angular position when the calculated provisional target angular position is larger than the limit value, and a actuating control section controlling an actuating mechanism for actuating the steering mechanism so that the output final target angular position and the actual angular position of the steering mechanism detected coincide with each other.
    • 转向控制装置具有控制器,该控制器具有临时目标角位置计算部,计算与转向手柄和方向舵踏板的操作量对应的转向机构的临时目标角位置,设定飞行器速度的速度设定部 作为检测到的地面速度和空速的基础,当所计算的临时目标角位置等于或低于对应于设定速度的极限值时,将临时目标角位置输出为最终目标角位置的目标角位置限制部 以及当所计算的临时目标角位置大于所述极限值时,将所述极限值作为最终目标角位置输出;以及致动控制部,其控制用于致动所述转向机构的致动机构,使得所述输出的最终目标角位置和实际 转向机构的角位置被检测到 相互否认。
    • 66. 发明申请
    • SIX-DIRECTION DIRECTING DEVICE
    • 六方向指导设备
    • US20130255090A1
    • 2013-10-03
    • US13824334
    • 2011-09-26
    • Futoshi Magosaki
    • Futoshi Magosaki
    • G01C19/38
    • G01C19/38
    • The six direction directing device includes a shaft, a rotation member, a driving source, and a guide member. The shaft extends in an X axis direction. The rotation member is rotatable around an inclined axis inclined at α deg with respect to the shaft. The rotation member has an xyz rectangular coordinate system. The rotation member further includes a spherical surface and an orbit portion formed around an x axis of the spherical surface. The guide member is fixed to an XYZ rectangular coordinate system. The orbit portion has such a shape that the y axis of the rotation member is sequentially directed in + and − directions on the U, V, and W axes that cross one another at intervals of 60 deg around the X axis when the rotation member is rotated in contact with the guide member by the rotation of the shaft.
    • 六方向定向装置包括轴,旋转构件,驱动源和引导构件。 轴沿X轴方向延伸。 旋转构件可以相对于轴倾斜为α°的倾斜轴线旋转。 旋转构件具有xyz直角坐标系。 旋转构件还包括球形表面和围绕球形表面的x轴形成的轨道部分。 导向件固定在XYZ直角坐标系上。 轨道部具有这样的形状,使得旋转构件的y轴在U轴,V轴和W轴上以+和 - 方向依次指向,当旋转构件为 通过轴的旋转与导向构件接触地旋转。
    • 70. 发明申请
    • Plasma Etching Method
    • 等离子蚀刻法
    • US20120052688A1
    • 2012-03-01
    • US13318279
    • 2010-09-06
    • Akimitsu OishiShoichi MurakamiMasayasu Hatashita
    • Akimitsu OishiShoichi MurakamiMasayasu Hatashita
    • H01L21/302
    • H01L21/0475H01L21/3065H01L29/1608
    • The present invention relates to a plasma etching method with which a wide-gap semiconductor substrate can be etched with high accuracy. An inert gas is supplied into a processing chamber and plasma is generated from the inert gas, a bias potential is applied to a platen on which a wide-gap semiconductor substrate is placed, thereby making ions generated by the generation of plasma from the inert gas incident on the semiconductor substrate on the platen to thereby heat the semiconductor substrate. After the temperature of the semiconductor substrate reaches an etching temperature between 200° C. and 400° C., an etching gas is supplied into the processing chamber and plasma is generated from the etching gas and a bias potential is applied to the platen, thereby etching the semiconductor substrate while maintaining the temperature of the semiconductor substrate at the etching temperature.
    • 本发明涉及一种可以高精度地蚀刻宽间隙半导体衬底的等离子体蚀刻方法。 将惰性气体供给到处理室中,从惰性气体产生等离子体,将偏置电位施加到放置宽间隙半导体基板的压板上,由此产生由惰性气体产生等离子体产生的离子 入射到压板上的半导体衬底上从而加热半导体衬底。 在半导体衬底的温度达到200℃至400℃的蚀刻温度之后,将蚀刻气体供应到处理室中,并且从蚀刻气体产生等离子体,并且将偏置电位施加到压板,由此 在将半导体衬底的温度保持在蚀刻温度的同时蚀刻半导体衬底。