专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

61. 发明申请

US20100084553A1 CHARGED PARTICLE DETECTION APPARATUS AND DETECTION METHOD 有权
标题翻译：充电颗粒检测装置和检测方法
公开(公告)号：US20100084553A1
公开(公告)日：2010-04-08
申请号：US12247849
申请日：2008-10-08
申请人： Juergen FROSIEN
发明人： Juergen FROSIEN
IPC分类号： G01N23/00
CPC分类号： G01T1/00
摘要： A detection apparatus for use in a charged particle beam device is provided. The detection apparatus includes a separation field generating portion adapted to generate a separation field separating positively and negatively charged secondary particles, at least one first detector for detecting positively charged particles, at least one second detector for detecting negatively charged particles, wherein the detection apparatus is adapted to simultaneously detect the positively charged secondary particles in the at least one first detector and the negatively charged secondary particles in the at least one second detector. Further, a method of simultaneously detecting negatively and positively charged particles is provided. The method includes providing a separation field, providing at least one first detector and at least one second detector, separating the negatively charged particles from the positively charged particles in the separation field, simultaneously detecting positively charged particles with the at least one first detector and negatively charged particles with the at least one second detector.
摘要翻译：提供一种用于带电粒子束装置的检测装置。检测装置包括：分离场产生部分，适于产生分离带正电荷和带负电荷的二次粒子的分离场;至少一个检测带正电荷的粒子的第一检测器;用于检测带负电荷的粒子的至少一个第二检测器，其中检测装置适于同时检测所述至少一个第一检测器中的带正电荷的次级颗粒和所述至少一个第二检测器中的带负电荷的次级颗粒。此外，提供同时检测带正电的带电粒子的方法。该方法包括提供分离场，提供至少一个第一检测器和至少一个第二检测器，从分离场中带正电的粒子分离带负电的粒子，同时用至少一个第一检测器检测带正电的粒子，带电粒子与至少一个第二检测器。

62. 发明授权

US07652263B2 Focussing lens for charged particle beams 有权
标题翻译：用于带电粒子束的聚焦透镜
公开(公告)号：US07652263B2
公开(公告)日：2010-01-26
申请号：US10587137
申请日：2005-01-21
申请人： Hans-Peter Feuerbaum
发明人： Hans-Peter Feuerbaum
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/12
摘要： A focussing lens for focussing a charged particle beam onto a specimen at a predetermined landing angle. The focussing lens comprises at least one first electrode having a first aperture to generate a focussing electric field for focussing the charged particle beam onto the specimen and a correcting electrode having a curved surface to compensate for landing angle dependent distortions of the focussing electric field caused by the specimen. With the curved surface of the correcting electrode, it is possible to improve the focussing of a charged particle beam at landing angles that differ from the perpendicular landing angle.
摘要翻译：一种聚焦透镜，用于以预定的着陆角将带电粒子束聚焦到样本上。聚焦透镜包括具有第一孔径的至少一个第一电极，以产生用于将带电粒子束聚焦到样本上的聚焦电场，以及具有弯曲表面的校正电极，以补偿由...引起的聚焦电场的着落角度相关失真标本。利用校正电极的弯曲表面，可以改善与垂直着陆角不同的着陆角的带电粒子束的聚焦。

63. 发明授权

US07595490B2 Charged particle beam emitting device and method for operating a charged particle beam emitting device 有权
标题翻译：带电粒子束发射装置和用于操作带电粒子束发射装置的方法
公开(公告)号：US07595490B2
公开(公告)日：2009-09-29
申请号：US11469728
申请日：2006-09-01
申请人： Fang Zhou , Pavel Adamec , Jürgen Frosien , Jimmy Vishnipolsky
发明人： Fang Zhou , Pavel Adamec , Jürgen Frosien , Jimmy Vishnipolsky
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/073 , H01J2237/022 , H01J2237/06325
摘要： A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.
摘要翻译：提供了一种用于操作带电粒子束发射器件的方法，特别是包括冷场发射器的电子束发射器件。该方法包括以下步骤：将冷场发射器置于给定压力的真空中，发射体在给定的电提取场下表现出高的初始发射电流I0和较低的稳定平均发射电流IS; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过向冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理，由此在冷场发射器的发射电流已经下降到较低的稳定平均发射值IS之前进行清洁处理; 并重复清洁处理以将发射极的发射电流连续地保持在基本上稳定的发射值IS上。

64. 发明授权

US07589328B2 Gas field ION source for multiple applications 有权
标题翻译：气田ION源适用于多种应用
公开(公告)号：US07589328B2
公开(公告)日：2009-09-15
申请号：US11925609
申请日：2007-10-26
申请人： Juergen Frosien , Dieter Winkler
发明人： Juergen Frosien , Dieter Winkler
IPC分类号： H01J49/10 , H01J27/02 , H01J27/26
CPC分类号： H01J27/26 , H01J37/08 , H01J37/28 , H01J37/3056 , H01J2237/006 , H01J2237/0807 , H01J2237/0827 , H01J2237/244 , H01J2237/3174 , H01J2237/31749
摘要： A focused ion beam device is described. The device includes an ion beam column including an enclosure for housing an emitter with an emitter area for generating ions, a first gas inlet adapted to introduce a first gas to the emitter area, a second gas inlet adapted to introduce a second gas different from the first gas to the emitter area, and a switching unit adapted to switch between introducing the first gas and introducing the second gas.
摘要翻译：描述了聚焦离子束装置。该装置包括离子束柱，其包括用于容纳具有用于产生离子的发射极区域的发射极的外壳，适于将第一气体引入发射极区域的第一气体入口，适于引入不同于第二气体的第二气体的第二气体入口第一气体到发射极区域，以及开关单元，其适于在引入第一气体和引入第二气体之间切换。

65. 发明授权

US07465939B2 Aberration correction device and method for operating same 有权
标题翻译：畸变校正装置及其操作方法
公开(公告)号：US07465939B2
公开(公告)日：2008-12-16
申请号：US11568175
申请日：2005-06-20
申请人： Juergen Frosien
发明人： Juergen Frosien
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , H01J49/06 , H01J49/288 , H01J2237/057 , H01J2237/1534
摘要： The present invention provides an aberration correction device. The aberration correction device comprises a Wien filter element, a quadrupole element for compensating a focusing property of the Wien filter element, and at least one multipole element for spherical aberration correction. The Wien filter element and said quadrupole element are adapted to generate, in combination, an astigmatic image. Furthermore, the at least one multipole element is adapted to act essentially in a plane of sagittal or meridional focus of the astigmatic image. Thereby, chromatic aberration is reduced as well as spherical aberration can be corrected.
摘要翻译：本发明提供一种像差校正装置。像差校正装置包括维恩滤波器元件，用于补偿维恩滤波器元件的聚焦特性的四极元件和用于球面像差校正的至少一个多极元件。维恩滤波器元件和所述四极杆元件适于组合地产生像散图像。此外，至少一个多极元件适于基本上在像散图像的矢状或子午焦点的平面中起作用。从而，可以减小色差，并且可以校正球面像差。

66. 发明授权

US07439500B2 Analyzing system and charged particle beam device 有权
标题翻译：分析系统和带电粒子束装置
公开(公告)号：US07439500B2
公开(公告)日：2008-10-21
申请号：US11384044
申请日：2006-03-17
申请人： Juergen Frosien , Stefan Lanio
发明人： Juergen Frosien , Stefan Lanio
IPC分类号： H01J37/244 , H01J37/05 , H01J49/48 , G01R31/305
CPC分类号： H01J37/05 , G01R31/305 , H01J37/244 , H01J49/488 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/26
摘要： The present invention relates to an analyzing system with improved detection scheme and a charged particle beam device comprising the same. The analyzing system for analyzing a beam of charged particles has a divider to divide the beam of charged particles according to their energies into a low energy beam and a high energy beam; a front detector for detecting the high energy beam; and at least one reverse detector for detecting the low energy beam. The divider is positioned between the front detector and the at least one reverse detector and the front detector and/or the at least one reverse detector are segmented.
摘要翻译：本发明涉及具有改进的检测方案的分析系统和包括该分析系统的带电粒子束装置。用于分析带电粒子束的分析系统具有分隔器，用于将带电粒子束根据其能量分成低能量束和高能量束; 用于检测高能束的前检测器; 以及用于检测低能量束的至少一个反向检测器。分隔器位于前检测器和至少一个反向检测器之间，并且前分辨器和/或至少一个反向检测器被分段。

67. 发明授权

US07361897B2 Imaging apparatus for high probe currents 有权
标题翻译：高探头电流成像设备
公开(公告)号：US07361897B2
公开(公告)日：2008-04-22
申请号：US11370224
申请日：2006-03-07
申请人： Ralf Degenhardt
发明人： Ralf Degenhardt
IPC分类号： H01J3/14 , H01J37/26 , G01N23/00
CPC分类号： H01J37/28 , H01J37/153
摘要： An imaging apparatus is provided, comprising a first lens, a Wien filter having a first opening and a second opening, and further comprising a 2*m-pole element, m≧2, and a second lens, wherein said first lens is disposed upstream said first opening of the Wien filter and said second lens is disposed downstream said second opening of the Wien filter, and an intermediate image plane of the first lens is located between said first opening and said first lens and an intermediate object plane of the second lens is located between said second opening and said second lens, and wherein said Wien filter is adapted for dispersion-free imaging of a stigmatic image formed in said intermediate image plane of said first lens into a stigmatic image formed in said intermediate object plane of said second lens.
摘要翻译：提供了一种成像装置，包括第一透镜，具有第一开口和第二开口的维恩滤光器，并且还包括m 2 = 2的2 * m极元件和第二透镜，其中所述第一透镜被布置上游所述维恩滤波器的第一开口，并且所述第二透镜设置在所述维恩滤波器的所述第二开口的下游，并且所述第一透镜的中间像平面位于所述第一开口和所述第一透镜之间，并且所述第二透镜的中间物平面透镜位于所述第二开口和所述第二透镜之间，并且其中所述维恩滤波器适于将形成在所述第一透镜的所述中间像平面中的眩光图像的无色成像成形为在所述第二透镜的所述中间物平面中形成的眩光图像第二个镜头。

68. 发明授权

US07355186B2 Charged particle beam device with cleaning unit and method of operation thereof 有权
标题翻译：具有清洁单元的带电粒子束装置及其操作方法
公开(公告)号：US07355186B2
公开(公告)日：2008-04-08
申请号：US10547865
申请日：2004-03-03
申请人： Thomas Jasinski
发明人： Thomas Jasinski
IPC分类号： G21G5/00 , A61N5/00
CPC分类号： H01J3/026 , H01J37/065 , H01J2237/022
摘要： The invention provides a charged particle beam device, an emitter module for emitting charged particle beams and a method of operation thereof. Thereby, a charged particle beam emitter (15) emitting charged particles along an optical axis (1) is realized. On the same carrier body (32), a cleaning emitter (16) for emitting charged particles approximately along the optical axis (1) is realized. Thus, an improved cleaning can be provided.
摘要翻译：本发明提供一种带电粒子束装置，用于发射带电粒子束的发射器模块及其操作方法。由此，实现了沿光轴（1）发射带电粒子的带电粒子束发射器（15）。在相同的载体（32）上，实现了用于沿着光轴（1）近似地发射带电粒子的清洁发射器（16）。因此，可以提供改进的清洁。

69. 发明授权

US07326927B2 Focusing lens and charged particle beam device for titled landing angle operation 有权
标题翻译：聚焦透镜和带电粒子束装置进行标题着陆角操作
公开(公告)号：US07326927B2
公开(公告)日：2008-02-05
申请号：US11249772
申请日：2005-10-13
申请人： Jürgen Frosien
发明人： Jürgen Frosien
IPC分类号： G21G5/00
CPC分类号： H01J37/28 , H01J37/145 , H01J2237/153 , H01J2237/2814
摘要： The present invention relates to a focusing lens, a charged particle beam device, and a method for focusing a charged particle beam onto a specimen, wherein the focusing lens comprises an auxiliary electrode having an essentially planar electrode surface for focusing the charged particle beam at a tilted landing angle, wherein the essentially planar electrode surface includes an auxiliary electrode angle with the optical axis of the focusing lens that is smaller than 80 degrees. With such a focusing lens, it is possible to operate a charged particle beam device at a tilted landing angle where focusing field distortions, caused by the tilted landing angle, are reduced.
摘要翻译：本发明涉及一种聚焦透镜，带电粒子束装置和用于将带电粒子束聚焦到样本上的方法，其中聚焦透镜包括具有基本上平面的电极表面的辅助电极，用于将带电粒子束聚焦在倾斜的着陆角，其中基本平面的电极表面包括与聚焦透镜的光轴小于80度的辅助电极角度。利用这样的聚焦透镜，可以以倾斜的着陆角操作带电粒子束装置，由此倾斜的着陆角引起的聚焦场失真减小。

70. 发明授权

US07268361B2 Electron emission device 有权
标题翻译：电子发射装置
公开(公告)号：US07268361B2
公开(公告)日：2007-09-11
申请号：US10483114
申请日：2002-07-01
申请人： Pavel Adamec , Dieter Winkler
发明人： Pavel Adamec , Dieter Winkler
IPC分类号： H01L29/06 , H01L21/00
CPC分类号： H01J1/3044 , H01J2201/319
摘要： The invention provides an electron beam device 1 comprising at least one field emission cathode 3 and at least one extracting electrode 5, whereby the field emission cathode 5 comprises a p-type semiconductor region 7 connected to an emitter tip 9 made of a semiconductor material, an n-type semiconductor region 11 forming a pn-diode junction 13 with the p-type semiconductor region 7 a first electric contact 15 on the p-type semiconductor region 7 and a second electric contact 17 on the n-type semiconductor region 11. The p-type semiconductor region 7 prevents the flux of free electrons to the emitter unless electrons are injected into the p-type semiconductor region 7 by the pn-diode junction 13. This way, the field emission cathode 3 can generate an electron beam where the electron beam current is controlled by the forward biasing second voltage V2 across the pn-diode junction. Such electron beam current has an improved current value stability. In addition the electron beam current does not have to be stabilized anymore by adjusting, the voltage between emitter tip 9 and extracting electrode 5 which would interfere with the electric field of electron beam optics. The present invention further provides the field emission cathode as described above and an array of field emission cathodes. The invention further provides a method to generate at least one electron beam.
摘要翻译：本发明提供一种包括至少一个场发射阴极3和至少一个提取电极5的电子束装置1，由此场发射阴极5包括连接到由半导体材料制成的发射极尖端9的p型半导体区域7，在p型半导体区域7上形成p型二极管结13的n型半导体区域11，p型半导体区域7上的第一电接触15和n型半导体区域11上的第二电接触17。 p型半导体区域7防止自由电子束流到发射极，除非电子被pn二极管结13注入到p型半导体区域7中。这样，场发射阴极3可以产生电子束，其中电子束电流由跨越pn二极管结的正向偏置第二电压V 2控制。这种电子束电流具有改善的电流值稳定性。此外，电子束电流不必通过调节发射极尖端9和提取电极5之间的电压，这将干扰电子束光学器件的电场。本发明还提供如上所述的场致发射阴极和场发射阴极阵列。本发明还提供了一种产生至少一个电子束的方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式