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51. 发明授权

US08563091B2 Film formation method, film formation device, piezoelectric film, piezoelectric device and liquid discharge device 有权
标题翻译：成膜方法，成膜装置，压电膜，压电装置和液体排出装置
公开(公告)号：US08563091B2
公开(公告)日：2013-10-22
申请号：US12707520
申请日：2010-02-17
申请人： Takamichi Fujii , Takayuki Naono
发明人： Takamichi Fujii , Takayuki Naono
IPC分类号： C23C14/00 , H05H1/00
CPC分类号： C23C14/34 , B41J2/161 , B41J2/1642 , B41J2/1646 , B41J2202/21 , C23C14/086 , C23C14/088 , C23C14/548
摘要： When a film containing constituent elements of a target is formed on a substrate through a vapor deposition process using plasma with placing the substrate and the target to face to each other, the film is formed with surrounding the substrate with a wall surface having the constituent elements of the target adhering thereto, and applying a physical treatment to the wall surface to cause the components adhering to the wall surface to be released into the film formation atmosphere.
摘要翻译：当通过使用等离子体的气相沉积工艺在基板上形成含有靶的构成元素的膜时，将基板和目标物彼此面对，形成具有围绕基板的壁，其具有构成元件的附着物，对壁面进行物理处理，使附着在壁面上的成分释放到成膜气氛中。

52. 发明授权

US08524329B2 Electroless copper deposition 有权
标题翻译：无电镀铜沉积
公开(公告)号：US08524329B2
公开(公告)日：2013-09-03
申请号：US13324939
申请日：2011-12-13
申请人： Yezdi N. Dordi , Richard P. Janek , Dries Dictus
发明人： Yezdi N. Dordi , Richard P. Janek , Dries Dictus
IPC分类号： H05H1/00
CPC分类号： C23C16/26 , C23C16/56 , C23C18/2086 , C23C18/22 , C23C18/38 , H01J37/32082 , H01J37/3244 , H01L2924/0002 , H01L2924/00
摘要： A method for providing electroless plating is provided. An amorphous carbon barrier layer is formed over the low-k dielectric layer by providing a flow a deposition gas, comprising a hydrocarbon, H2, and an oxygen free diluent, forming a plasma from the deposition gas, and stopping the flow of the deposition gas. The amorphous carbon barrier layer is conditioned by providing a flow of a conditioning gas comprising H2 and a diluent, forming a plasma from the conditioning gas, which conditions a top surface of the amorphous carbon barrier layer, and stopping the flow of the conditioning gas. The amorphous carbon barrier layer is functionalized by providing a flow of a functionalizing gas comprising NH3 or H2 and N2, forming a plasma from the functionalizing gas, and stopping the flow of the functionalizing gas. An electroless process is provided to form an electrode over the barrier layer.
摘要翻译：提供了一种提供化学镀的方法。通过提供包含烃，H 2和无氧稀释剂的沉积气体流形成在低k电介质层上的无定形碳阻挡层，从沉积气体形成等离子体，并停止沉积气体的流动。通过提供包含H2和稀释剂的调节气体的流动来调节无定形碳阻挡层，该稀释剂从调节气体形成等离子体，其调节无定形碳阻挡层的顶表面，并停止调节气体的流动。通过提供包含NH 3或H 2和N 2的官能化气体的流动，从功能化气体形成等离子体并停止官能化气体的流动，使无定形碳阻挡层功能化。提供无电解方法以在阻挡层上形成电极。

53. 发明授权

US08524051B2 Coated article with oxidation graded layer proximate IR reflecting layer(s) and corresponding method 有权
标题翻译：具有邻近红外反射层的氧化分级层的涂层制品和相应的方法
公开(公告)号：US08524051B2
公开(公告)日：2013-09-03
申请号：US10847672
申请日：2004-05-18
申请人： Jens-Peter Muller , Vijayen S Veerasamy
发明人： Jens-Peter Muller , Vijayen S Veerasamy
IPC分类号： C23C14/00 , C23C14/32 , H05H1/00
CPC分类号： C23C14/5833 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3689 , C03C17/3694 , C03C23/0055 , C03C2217/78 , C03C2218/322 , C23C14/08 , C23C14/185 , C23C14/5853
摘要： A coated article is provided that may be heat treated in certain example embodiments. A graded layer (e.g., contact layer or other suitable layer) is formed by initially sputter-depositing a layer, and thereafter ion beam treating the sputter-deposited layer with at least reactive gas ions in order to form a graded layer. In certain example embodiments, the result is a coated article that has improved visible transmission and/or durability, without sacrificing optional heat treatability.
摘要翻译：提供了可以在某些示例性实施例中进行热处理的涂覆制品。通过最初溅射沉积一层形成梯度层（例如，接触层或其它合适的层），此后离子束用至少反应性气体离子处理溅射沉积层以形成渐变层。在某些示例性实施方案中，结果是具有改善的可见透射率和/或耐久性的涂覆制品，而不牺牲任选的可热处理性。

54. 发明授权

US08420183B2 Method of manufacturing composite material 有权
标题翻译：制造复合材料的方法
公开(公告)号：US08420183B2
公开(公告)日：2013-04-16
申请号：US13564289
申请日：2012-08-01
申请人： David Inston
发明人： David Inston
IPC分类号： H05H1/00 , B05D3/12 , B32B27/04
CPC分类号： B29C59/14 , B29B15/12 , B29B15/122 , B29C70/506 , Y10T428/249924
摘要： Disclosed is a method of manufacturing a composite sheet. The method comprises (a) irradiating a sheet of fibers and a matrix film at an irradiation zone with a plasma at substantially atmospheric pressure, and (b) impregnating the sheet of fibers with the matrix at an adhesion zone. The processes (a) and (b) are performed simultaneously, and the matrix film is irradiated with a plasma at said irradiation zone after being unwound from a roller and prior to entering said adhesion zone.
摘要翻译：公开了一种复合片材的制造方法。该方法包括（a）在基本上大气压的等离子体的照射区域照射纤维片和基质膜，和（b）在粘合区域用基质浸渍纤维片。方法（a）和（b）同时进行，并且在从辊退出之后并且在进入所述粘附区之前，在所述照射区域用等离子体照射基质膜。

55. 发明授权

US08414983B2 Particle beam process for the alignment of reactive mesogens 有权
标题翻译：用于对准反应性介晶的粒子束过程
公开(公告)号：US08414983B2
公开(公告)日：2013-04-09
申请号：US12439403
申请日：2007-08-10
申请人： Owain Llyr Parri , Alison Linda May , Julian Vaughan-Spickers , Karl Skjonnemand , Oleg Yaroshchuck
发明人： Owain Llyr Parri , Alison Linda May , Julian Vaughan-Spickers , Karl Skjonnemand , Oleg Yaroshchuck
IPC分类号： B05D3/06 , H05H1/00
CPC分类号： G02F1/13378 , B42D25/328 , B42D25/364 , B42D2033/26
摘要： The invention relates to a method of aligning reactive mesogens (RM) on a substrate subjected to particle beam treatment, to RM's oriented by said method, especially in form of thin layers, to oriented polymers and polymer films obtained from such oriented RM's and RM layers, and to the use of the RM's, layers, polymers and films in optical, electronic and electrooptical applications.
摘要翻译：本发明涉及将经过粒子束处理的基底上的反应性介晶（RM）与通过所述方法（特别是薄层形式）取向的RM定向到由这种取向的RM和RM层获得的取向聚合物和聚合物膜的方法，以及在光学，电子和电光学应用中使用RM，层，聚合物和薄膜。

56. 发明授权

US08343372B2 Surface processing method for mounting stage 有权
标题翻译：表面处理方法安装阶段
公开(公告)号：US08343372B2
公开(公告)日：2013-01-01
申请号：US12057975
申请日：2008-03-28
申请人： Tadashi Aoto , Eiichiro Kikuchi , Masakazu Higuma , Kimihiro Higuchi
发明人： Tadashi Aoto , Eiichiro Kikuchi , Masakazu Higuma , Kimihiro Higuchi
IPC分类号： B29C61/04 , H05H1/00
CPC分类号： H01L21/67103 , H01L21/6875
摘要： A surface processing method for a mounting stage, which enables a mounting surface conforming to a substrate to be formed while saving time and effort. The substrate is mounted on a mounting surface of the mounting stage disposed in a housing chamber of a substrate processing apparatus that carries out plasma processing on the substrate. The mounted substrate is thermally expanded.
摘要翻译：一种用于安装台的表面处理方法，其能够在节省时间和精力的同时形成符合基板的安装表面。基板安装在安装台的安装表面上，该安装台设置在基板处理设备的容纳室中，该基板处理设备在基板上执行等离子体处理。安装的基板被热膨胀。

57. 发明申请

US20120312473A1 HIGH FREQUENCY POWER DISTRIBUTION DEVICE AND SUBSTRATE PROCESSING APPARATUS USING SAME 审中-公开
标题翻译：高频功率分配装置和基板处理装置
公开(公告)号：US20120312473A1
公开(公告)日：2012-12-13
申请号：US13492061
申请日：2012-06-08
申请人： Kenichi Hanawa , Takahiro Tomita
发明人： Kenichi Hanawa , Takahiro Tomita
IPC分类号： H05H1/00 , H03H7/48
CPC分类号： H01J37/32091 , H01J37/32174
摘要： A high frequency power distribution device includes: a distribution member for uniformly dividing a high frequency power into divided high frequency powers; coaxial transmission lines through which the divided high frequency powers are introduced to the parallel plate electrodes; and an impedance control mechanism which controls an input impedance to decrease a current value. The distribution member includes: a high frequency power input unit for inputting the high frequency power to an input point; and a plurality of high frequency power output units spaced from each other at a regular interval, and each of the coaxial transmission lines are connected to one of the high frequency power output units, and the impedance control mechanism is provided at the high frequency power input unit.
摘要翻译：高频配电装置包括：分配部件，用于将高频功率均匀地划分成分频的高频功率; 将分开的高频功率引入平行板电极的同轴传输线; 以及阻抗控制机构，其控制输入阻抗以减小电流值。分配构件包括：高频电力输入单元，用于将高频电力输入到输入点; 以及多个高频电力输出单元，以规则的间隔彼此间隔开，并且每个同轴传输线连接到高频电力输出单元中的一个，并且阻抗控制机构设置在高频电力输入单元。

58. 发明申请

US20120311992A1 HALL THRUSTER, COSMONAUTIC VEHICLE, AND PROPULSION METHOD 有权
标题翻译：霍尔扰流器，COSMONAUTIC车辆和推进方法
公开(公告)号：US20120311992A1
公开(公告)日：2012-12-13
申请号：US13579640
申请日：2010-03-01
申请人： Toshiyuki Ozaki , Kimiya Komurasaki
发明人： Toshiyuki Ozaki , Kimiya Komurasaki
IPC分类号： F03H1/00 , H05H1/00
CPC分类号： H05H1/54 , B64G1/405 , F03H1/0012 , F03H1/0037 , F03H1/0062 , F03H1/0068 , F03H1/0075
摘要： In a Hall thruster 10, an acceleration channel 12 ionizes propellant flowing into an annular discharge space 11 to generate ions, and accelerates and discharges the generated ions. A distributor 37 supplies propellant from a plurality of holes 13 arranged azimuthally, via an anode 14 penetrating to the discharge space 11 of the acceleration channel 12, to the discharge space 11 of the acceleration channel 12, an amount of the propellant varying according to positions of the plurality of holes 13, thereby generating a plurality of regions, between adjacent ones of which the mass flow rate of the propellant is different, azimuthally in the discharge space 11 of the acceleration channel 12. During that time, the distributor 37 adjusts, with respect to the mass flow rate of the propellant in the discharge space 11 of the acceleration channel 12, a differential within a range of 5 to 15% between the mass flow rate of the propellant in a region with a large mass flow rate of the propellant and the mass flow rate of the propellant in a region with a small mass flow rate of the propellant. Thus, the width of a operation parameter region with reduced discharge current oscillation of the Hall thruster 10 is expanded.
摘要翻译：在霍尔推进器10中，加速通道12将流入环形放电空间11的推进剂电离以产生离子，并加速和排出所产生的离子。分配器37经由穿过加速通道12的放电空间11的阳极14方位排列的多个孔13向加速通道12的放电空间11供给推进剂，推进剂的量根据位置而变化，从而在加速通道12的放电空间11中在方位角之间产生多个区域，其中相邻的区域之间的推进剂的质量流量不同。在此期间，分配器37调整，相对于加速通道12的放电空间11中的推进剂的质量流量，在推进剂的质量流量与质量流量的大的质量流量之间的差为5〜15％推进剂和推进剂在推进剂质量流量较小的区域中的质量流量。因此，扩大了霍尔推进器10的放电电流振荡减小的动作参数区域的宽度。

59. 发明授权

US08241711B2 Method of manufacturing composite material 有权
标题翻译：制造复合材料的方法
公开(公告)号：US08241711B2
公开(公告)日：2012-08-14
申请号：US12375108
申请日：2007-08-01
申请人： David Inston
发明人： David Inston
IPC分类号： H05H1/00 , B05D3/12 , B32B27/04
CPC分类号： B29C59/14 , B29B15/12 , B29B15/122 , B29C70/506 , Y10T428/249924
摘要： Disclosed is a method of manufacturing a composite sheet. The method comprises (a) irradiating a sheet of fibers and a matrix film at an irradiation zone with a plasma at substantially atmospheric pressure, and (b) impregnating the sheet of fibers with the matrix at an adhesion zone. The processes (a) and (b) are performed simultaneously, and the matrix film is irradiated with a plasma at said irradiation zone after being unwound from a roller and prior to entering said adhesion zone.
摘要翻译：公开了一种复合片材的制造方法。该方法包括（a）在基本上大气压的等离子体的照射区域照射纤维片和基质膜，和（b）在粘合区域用基质浸渍纤维片。方法（a）和（b）同时进行，并且在从辊退出之后并且在进入所述粘附区之前，在所述照射区域用等离子体照射基质膜。

60. 发明申请

US20120199554A1 DECORATIVE SURFACE FINISH AND METHOD OF FORMING SAME 审中-公开
标题翻译：装饰性表面处理及其形成方法
公开(公告)号：US20120199554A1
公开(公告)日：2012-08-09
申请号：US13450529
申请日：2012-04-19
申请人： Ling Hao , David P. Hartrick , Lee A. Chase , Alan D. Fanta , Daniel W. Irvine , Yong Zhang , Maoshi Guan
发明人： Ling Hao , David P. Hartrick , Lee A. Chase , Alan D. Fanta , Daniel W. Irvine , Yong Zhang , Maoshi Guan
IPC分类号： B05D3/12 , B44C1/22 , H05H1/00
CPC分类号： C09D5/28 , B05D5/067 , C08J7/045 , C23C18/165 , C23C18/1651 , C23C18/2006 , C23C18/22 , C23C18/30 , C23C18/54
摘要： A decorative metal finish for a part with a non-conductive surface where the non-conductive surface is lightly roughened to improve its adherence capabilities. A thin metal layer is electrolessly deposited on the lightly roughened surface to provide a bright durable metal finish on the non-conductive surface. An organic coating layer is deposited over the thin metal layer to provide protection for the metal finish.
摘要翻译：用于具有非导电表面的部件的装饰金属表面，其中非导电表面被粗糙地粗糙化以提高其粘附能力。薄金属层无电沉积在轻度粗糙的表面上，以在非导电表面上提供光亮耐用的金属表面。有机涂层沉积在薄金属层上，为金属表面提供保护。

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