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51. 发明申请

US20030025893A1 Projection exposure apparatus and projection exposure method 失效
标题翻译：投影曝光装置和投影曝光方法
公开(公告)号：US20030025893A1
公开(公告)日：2003-02-06
申请号：US10259418
申请日：2002-09-30
申请人： Nikon Corporation
发明人： Kenji Nishi
IPC分类号： G03B027/42
CPC分类号： G03F7/70733 , G03F7/70716 , G03F7/70741 , G03F9/70
摘要： A projection exposure apparatus for exposing a photosensitive substrate with a pattern on a circular mask by projection through a projection optical system. The apparatus includes a prealignment stage for previously correcting an error of the circular mask in its rotational direction, and a transport arm and a rotatable arm for transporting the circular mask from the prealignment stage to a mask stage. The prealignment stage includes an optical detecting system for detecting the rotational error of the circular mask from a predetermined orientation on the prealignment stage, a rotatable stage for rotating the circular mask on the prealignment stage, and a unit for controlling the rotatable stage on the basis of the rotational error so that the circular mask has the predetermined orientation. Orientational adjustment can be previously performed before importing the circular mask to the mask stage of the projection exposure apparatus.
摘要翻译：一种投影曝光装置，用于通过投影光学系统通过投影将具有图案的感光基板曝光在圆形掩模上。该装置包括用于预先校正圆形掩模在其旋转方向上的误差的预对准台，以及用于将圆形掩模从预对准台传送到掩模台的传送臂和可旋转臂。预对准台包括用于从预对准台上的预定取向检测圆形掩模的旋转误差的光学检测系统，用于在预对准台上旋转圆形掩模的可旋转台，以及用于在基准上控制可旋转台的单元的旋转误差使得圆形掩模具有预定取向。在将圆形掩模导入到投影曝光装置的掩模台之前，可以先进行取向调整。

52. 发明申请

US20030020890A1 Debris removing system for use in X-ray light source 失效
标题翻译：用于X射线光源的碎屑去除系统
公开(公告)号：US20030020890A1
公开(公告)日：2003-01-30
申请号：US10187852
申请日：2002-07-03
申请人： Canon Kabushiki Kaisha
发明人： Nobuaki Ogushi , Yutaka Watanabe , Akira Miyake
IPC分类号： G03B027/42
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70916 , G21K1/04 , G21K1/043
摘要： Disclosed is a debris removing system for preventing debris, being scattered from an X-ray source, the debris removing system including an attracting unit disposed between a light emission point of the X-ray source and the optical system, for attracting debris, the attracting unit having an attracting surface parallel or approximately parallel to an axis passing through the light emission point. The debris removing system further includes a rotation unit for rotating the attracting unit about the axis. This debris removing system assures a superior debris removing effect and a good EUV light utilization efficiency, being compatible with each other.
摘要翻译：公开了一种用于防止从X射线源散落的碎片的碎屑去除系统，该碎屑去除系统包括设置在X射线源的发光点和光学系统之间的吸引单元，用于吸引碎片，吸引单元具有平行于或大致平行于穿过发光点的轴线的吸引表面。碎片去除系统还包括用于围绕轴线旋转吸引单元的旋转单元。这种碎屑去除系统确保了优异的除尘效果和良好的EUV光利用效率，彼此兼容。

53. 发明申请

US20030016337A1 MEMS device with controlled gas space chemistry 有权
标题翻译：具有可控气体空间化学的MEMS器件
公开(公告)号：US20030016337A1
公开(公告)日：2003-01-23
申请号：US10101669
申请日：2002-03-18
发明人： Walter M. Duncan , Simon Joshua Jacobs , Michael R. Douglass , Richard O. Gale
IPC分类号： G03B027/42
CPC分类号： G02B1/14 , B81B7/0012 , B81B2201/042 , G02B1/105 , G02B26/0833 , G03B27/42 , G03F7/70291 , G03F7/70983
摘要： A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.
摘要翻译：用于保护在紫外线照射应用中使用的MEMS器件的过程不会由于UV通量和封装气体成分之间的光化学活化而损坏，所述UV通量和封装气体成分由放置在器件封装中的各种润滑剂和钝化剂的排出物形成，以防止粘附 MEMS器件的运动部件。该方法用金属卤化物膜涂覆MEMS器件和封装的光学窗表面的暴露表面以消除该光化学活化，因此显着地延长了MEMS器件的可靠性和使用寿命。

54. 发明申请

US20030007140A1 Stage apparatus and method of driving the same 失效
标题翻译：舞台装置及其驱动方法
公开(公告)号：US20030007140A1
公开(公告)日：2003-01-09
申请号：US10187854
申请日：2002-07-03
申请人： Canon Kabushiki Kaisha
发明人： Nobushige Korenaga
IPC分类号： G03B027/58 , G03B027/42
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70758
摘要： An X-Y stage includes a coarse movement stage provided to a surface plate to move an intermediate plate, and a fine movement stage provided on the intermediate plate to finely move a top plate. The coarse movement stage has an X driving linear motor and Y driving linear motor for respectively moving X and Y sliders with respect to a base surface plate. The fine movement stage has a fine driving linear motor that connects the intermediate plate and a fine movement table. The fine movement table has an electromagnetic coupling provided between the intermediate plate and the top plate to apply an accelerating force to the top plate in accordance with acceleration and deceleration of the X driving linear motor and Y driving linear motor of the coarse movement stage. The electromagnetic coupling applies an acceleration to the top plate during an acceleration or deceleration period when the X slider or Y slider moves.
摘要翻译： X-Y平台包括设置在表板上以移动中间板的粗移动台和设置在中间板上以精细移动顶板的精细移动台。粗动平台具有用于相对于基面板分别移动X和Y滑块的X驱动线性电动机和Y驱动线性电动机。精细运动台具有连接中间板和精细运动台的精细驱动线性电动机。微型移动台具有设置在中间板和顶板之间的电磁耦合，以根据X驱动线性电动机和粗动级的Y驱动线性电动机的加速和减速对顶板施加加速力。当X滑块或Y滑块移动时，电磁耦合在加速或减速期间向顶板施加加速度。

55. 发明申请

US20030003372A1 Microelectromechanical system mask 失效
公开(公告)号：US20030003372A1
公开(公告)日：2003-01-02
申请号：US09895696
申请日：2001-06-29
发明人： John Hutchinson
IPC分类号： G03F009/00 , G21K005/00 , G03B027/42
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70291
摘要： The present invention discloses a microelectromechanical system mask with an array of reflectors, each reflector having two mirrors separated from each other by an adjustable gap.

56. 发明申请

US20020196419A1 Illumination apparatus, exposure apparatus, and device fabricating method using the same 有权
标题翻译：照明装置，曝光装置及使用其的装置制造方法
公开(公告)号：US20020196419A1
公开(公告)日：2002-12-26
申请号：US10151985
申请日：2002-05-21
发明人： Satoru Mizouchi
IPC分类号： G03B027/54 , G03B027/42
CPC分类号： G03F7/70558 , G03B27/54 , G03F7/70066
摘要： An illumination apparatus includes an optical integrator for illuminating a target plane by using light emitted from a light source, the illumination apparatus forming an approximately rectangular illuminated area by using light emitted from the optical integrator that includes a first optical system for enlarging the beam in a longitudinal direction of the illuminated area, and a second optical system for enlarging the beam in a lateral direction of the illuminated area, wherein a light exit plane of the first optical system is provided closer to the target plane than that of the second optical system.
摘要翻译：照明装置包括：光积分器，用于通过使用从光源发射的光来照射目标平面，照明装置通过使用从光学积分器发射的光形成近似矩形的照明区域，该光学积分器包括第一光学系统，用于将光束放大以及第二光学系统，用于在照明区域的横向方向上放大光束，其中第一光学系统的光出射平面设置成比第二光学系统更靠近目标平面。

57. 发明申请

US20020191167A1 Semiconductor exposure apparatus and device manufacturing method using the same 审中-公开
标题翻译：半导体曝光装置及其制造方法
公开(公告)号：US20020191167A1
公开(公告)日：2002-12-19
申请号：US10202904
申请日：2002-07-26
发明人： Akio Aoki
IPC分类号： G03B027/42
CPC分类号： H01L21/67253 , G03F7/70691
摘要： In a semiconductor exposure apparatus, when a trouble such as a wafer chuck error which requires operator's action in the chamber occurs, execution or interruption of the exposure sequence is determined on the basis of the situation of the exposure sequence, and unlock of the door of the chamber is controlled on the basis of the determination result. After the error is eliminated, lock of the door is controlled, and the exposure sequence is resumed. By eliminating human factors in operation and making the time required for restoration as short as possible, the interruption time of the semiconductor exposure apparatus is minimized to improve the operation efficiency of the manufacturing line.
摘要翻译：在半导体曝光装置中，当发生诸如要求操作者在室内发生作用的晶片卡盘错误等故障时，根据曝光顺序的情况确定曝光顺序的执行或中断，并且解锁门基于确定结果控制室。错误消除后，控制门的锁定，并恢复曝光顺序。通过消除操作中的人为因素并使恢复所需的时间尽可能短，半导体曝光装置的中断时间被最小化以提高生产线的操作效率。

58. 发明申请

US20020176062A1 Programmable photolithographic mask system and method 失效
标题翻译：可编程光刻掩模系统及方法
公开(公告)号：US20020176062A1
公开(公告)日：2002-11-28
申请号：US10166615
申请日：2002-06-12
申请人： Pixelligent Technologies LLC.
发明人： Gregory D. Cooper , Richard M. Mohring
IPC分类号： G03B027/42
CPC分类号： G03F7/70375 , G03F7/70291
摘要： The present invention overcomes many of the disadvantages of prior lithographic microfabrication processes while providing further improvements that can significantly enhance the ability to make more complicated semiconductor chips at lower cost. A new type of programmable structure for exposing a wafer allows the lithographic pattern to be changed under electronic control. This provides great flexibility, increasing the throughput and decreasing the cost of chip manufacture and providing numerous other advantages. The programmable structure consists of an array of shutters that can be programmed to either transmit light to the wafer (referred to as its nullopennull state) or not transmit light to the wafer (referred to as its nullclosednull state). The programmable structure can comprise or include an array of selective amplifiers. Thus, each selective amplifier is programmed to either amplify light (somewhat analogous to the nullopennull or nulltransparentnull state of a shutter) or be nullnon-amplifyingnull (its nullclosednull or nullopaquenull state). In the non-amplifying state, some portion of the incident light is transmitted through the amplifier material. The shutters and selective amplifiers can work in tandem to form a nullprogrammable layernull. A programmable technique is provided for creating a pattern to be imaged onto a wafer that can be implemented as a viable production technique. Thus, the present invention also provides a technique of making integrated circuits. A diffraction limiter can be used to provide certain advantages associated with contact lithography without requiring some of the disadvantages of contact lithography.
摘要翻译：本发明克服了现有的平版印刷微细加工工艺的许多缺点，同时提供了可以以更低成本显着提高制造更复杂的半导体芯片的能力的进一步改进。用于曝光晶片的新型可编程结构允许在电子控制下改变光刻图案。这提供了极大的灵活性，增加了生产量并且降低了芯片制造的成本并且提供了许多其他优点。可编程结构由一组快门组成，可以被编程为将光传输到晶片（称为其“打开”状态）或不将光传输到晶片（称为其“关闭”状态））。可编程结构可以包括或包括选择放大器的阵列。因此，每个选择放大器被编程为放大光（有点类似于快门的“打开”或“透明”状态）或者是“非放大”（其“闭合”或“不透明”状态））。在非放大状态下，入射光的一部分透过放大器材料。快门和选择放大器可以串联工作以形成“可编程层”。提供了一种可编程技术，用于创建可被实现为可行的生产技术的要被成像到晶片上的图案。因此，本发明还提供了制造集成电路的技术。衍射限制器可以用于提供与接触光刻相关联的某些优点，而不需要接触光刻的一些缺点。

59. 发明申请

US20020163630A1 Movable support in a vacuum chamber and its application in lithographic projection apparatuses 失效
标题翻译：真空室中的可移动支撑及其在光刻投影设备中的应用
公开(公告)号：US20020163630A1
公开(公告)日：2002-11-07
申请号：US10171638
申请日：2002-06-17
申请人： ASM Lithography B.V.
发明人： Theodorus H.J. Bisschops , Hermanus M.J.R. Soemers , Jakob Vijfvinkel , Johannes C. Driessen , Michael J.M. Renkens , Adrianus G. Bouwer
IPC分类号： G03B027/58 , G03B027/42
CPC分类号： G03F7/70841 , F16C32/0603 , F16C33/748 , F16C2300/62 , G03F7/70716 , G03F7/70758
摘要： An object table is supported in a vacuum chamber by an elongate beam or beams extending though elongate slots in opposite walls of the vacuum chamber. Displacement of the beam in two orthogonal directions is achieved by displacing the beam laterally and longitudinally. The elongate slots are sealed by sliding plates supported by a gas bearing. The beam is driven longitudinally by linear motors acting against between a balance mass and the beam. The beam is driven laterally by linear motors acting between a balance mass and the sliding plates. The two balance masses may be separate or combined.
摘要翻译：物体台通过细长的梁或梁支撑在真空室中，细长的梁或梁延伸穿过真空室的相对壁中的细长槽。通过横向和纵向地移动梁来实现横梁在两个正交方向的位移。细长的槽由由气体轴承支撑的滑动板密封。光束由平衡质量与光束之间的线性电机纵向驱动。该梁由平衡质量块和滑板之间的直线电动机横向驱动。两个平衡块可以是分开的或组合的。

60. 发明申请

US20020159042A1 Chamber assembly for an exposure apparatus 审中-公开
标题翻译：曝光装置的室组件
公开(公告)号：US20020159042A1
公开(公告)日：2002-10-31
申请号：US09842744
申请日：2001-04-25
发明人： Alex Ka Tim Poon
IPC分类号： G03B027/42
CPC分类号： G03F7/70691 , G03B27/42
摘要： An exposure apparatus (10) that transfers an image to a device (32) includes a stage (60) that retains the device (32) and a chamber assembly (12). The chamber assembly (12) encircles the device (32) and is used with an environmental system (26) to provide a controlled environment around the device (32). The chamber assembly (12) includes at least one fixed section (34), at least one moving section (36), and a seal assembly (38). The moving section (36) moves relative to the fixed section (34). The seal assembly (38) seals an intersection between the fixed section (34) and the moving section (36) during movement of the moving section (36). Moreover, the moving section (36) is secured to the stage (60) and moves concurrently with the stage (60). The chamber assembly (12) facilitates faster pump-outs of the chamber and enhances the access to the components of the exposure apparatus (10) to allow for field servicing and trouble shooting of the components. Moreover, the components that generate dust and debris are positioned outside the chamber assembly (12) and do not contaminate the controlled environment.
摘要翻译：将图像传送到装置（32）的曝光装置（10）包括保持装置（32）和室组件（12）的台（60）。腔室组件（12）围绕设备（32）并与环境系统（26）一起使用以在设备（32）周围提供受控的环境。腔室组件（12）包括至少一个固定部分（34），至少一个移动部分（36）和密封组件（38）。移动部分（36）相对于固定部分（34）移动。密封组件（38）在移动部分（36）移动期间密封固定部分（34）和移动部分（36）之间的交叉点。此外，移动部分（36）固定到台架（60）上并与台架（60）同时移动。腔室组件（12）有助于更快地抽出腔室并且增强对曝光设备（10）的部件的访问以允许对部件的现场维修和故障排除。此外，产生灰尘和碎屑的部件位于室组件（12）外部，并且不会污染受控环境。

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