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51. 发明授权

US09076631B2 Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope 有权
标题翻译：界面，在非真空环境中观察物体的方法和扫描电子显微镜
公开(公告)号：US09076631B2
公开(公告)日：2015-07-07
申请号：US14302221
申请日：2014-06-11
申请人： Dov Shachal
发明人： Dov Shachal
IPC分类号： H01J40/00 , H01J37/28 , H01J37/20 , H01J37/301
CPC分类号： H01J37/285 , H01J37/06 , H01J37/20 , H01J37/28 , H01J37/301 , H01J2237/006 , H01J2237/0458 , H01J2237/15 , H01J2237/164 , H01J2237/182 , H01J2237/2002 , H01J2237/2006 , H01J2237/2605 , H01J2237/28 , H01J2237/2801 , H01J2237/2806 , H01J2237/2807
摘要： An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
摘要翻译：接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

52. 发明授权

US08963100B2 Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) pa 有权
标题翻译：来自气田离子源的氮离子保持在1.0×10 ^（ - 6）Pa至1.0×10 ^（ - 2）Pa
公开(公告)号：US08963100B2
公开(公告)日：2015-02-24
申请号：US13654509
申请日：2012-10-18
申请人： Anto Yasaka , Fumio Aramaki , Yasuhiko Sugiyama , Tomokazu Kozakai , Osamu Matsuda
发明人： Anto Yasaka , Fumio Aramaki , Yasuhiko Sugiyama , Tomokazu Kozakai , Osamu Matsuda
IPC分类号： H01J37/08 , G21K5/04 , H01J37/305
CPC分类号： H01J27/024 , H01J27/26 , H01J37/08 , H01J37/3056 , H01J2237/0807 , H01J2237/182
摘要： A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter, and the gas supply unit maintains the pressure in the ion source chamber in the range 1.0×10−6 Pa to 1.0×10−2 Pa. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.
摘要翻译：聚焦离子束装置具有离子源室，其中设置有用于发射离子的发射极。气体供给单元向离子源室供给氮气，使得氮气吸附在发射体的表面，气体供给单元将离子源室内的压力维持在1.0×10 -6 Pa〜1.0× 10-2Pa。提取电极与发射极间隔开，电压施加到提取电极，使吸附的氮气离子化，并以离子束的形式提取氮离子。温度控制单元控制发射器的温度。

53. 发明申请

US20130216959A1 CHARGED PARTICLE BEAM APPARATUS, AND ARTICLE MANUFACTURING METHOD 有权
标题翻译：充电颗粒光束装置和制品制造方法
公开(公告)号：US20130216959A1
公开(公告)日：2013-08-22
申请号：US13771388
申请日：2013-02-20
申请人： CANON KABUSHIKI KAISHA
发明人： Ichiro TANAKA , Akira MIYAKE
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/3177 , H01J2237/182
摘要： A charged particle beam apparatus for processing an object using a charged particle beam includes a charged particle lens in which an array of apertures, through each of which a charged particle beam passes, is formed; a vacuum container which contains the charged particle lens; and a radiation source configured to generate an ionizing radiation; wherein the apparatus is configured to cause the radiation source to pass the ionizing radiation through the array of apertures in a state in which a pressure in the vacuum container is changing.
摘要翻译：用于使用带电粒子束处理物体的带电粒子束装置包括：带电粒子透镜，其中形成通过每个带电粒子束通过的孔阵列; 包含带电粒子透镜的真空容器; 以及被配置为产生电离辐射的辐射源; 其中所述装置被配置为使得所述辐射源在所述真空容器中的压力正在改变的状态下使所述电离辐射通过所述孔阵列。

54. 发明授权

US08278634B2 System and method for ion implantation with improved productivity and uniformity 有权
标题翻译：用于离子注入的系统和方法，提高生产率和均匀性
公开(公告)号：US08278634B2
公开(公告)日：2012-10-02
申请号：US12796215
申请日：2010-06-08
申请人： Bo H. Vanderberg , Steven C. Hays , Andy Ray
发明人： Bo H. Vanderberg , Steven C. Hays , Andy Ray
IPC分类号： H01J37/317
CPC分类号： H01J37/317 , H01J37/147 , H01J37/244 , H01J37/3171 , H01J49/30 , H01J2237/006 , H01J2237/182 , H01J2237/24542
摘要： A method comprising introducing an injected gas (e.g., Argon, Xenon) into a beam line region comprising a magnetic scanner is provided herein. The injected gas improves beam current by enhancing (e.g., increasing, decreasing) charge neutralization of the magnetic ion beam (e.g., the ion beam at regions where the scanning magnetic field is non-zero) thereby reducing the current loss due to the zero field effect (ZFE). By reducing the current loss in regions having a magnetic field, the magnetic beam current is increased (e.g., the beam current is increased in regions where the magnetic field is non-zero) raising the overall beam current in a uniform manner over an entire scan path and thereby reducing the effect of the ZFE. In other words, the ZFE is removed by effectively minimizing it through an increase in the magnetized beam current.
摘要翻译：本文提供了将注入的气体（例如，氩，氙）引入到包括磁扫描器的束线区域中的方法。注入的气体通过增强（例如，增加，减少）磁离子束的电荷中和（例如，扫描磁场不为零的区域处的离子束）来改善束流，从而减少由于零场导致的电流损耗效果（ZFE）。通过减小具有磁场的区域中的电流损耗，磁束电流增加（例如，在磁场不为零的区域中，束电流增加）在整个扫描中以均匀的方式提高整个束电流路径，从而减少ZFE的影响。换句话说，ZFE通过磁化束电流的增加有效地最小化而被去除。

55. 发明授权

US08164057B2 Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope 有权
标题翻译：界面，在非真空环境中观察物体的方法和扫描电子显微镜
公开(公告)号：US08164057B2
公开(公告)日：2012-04-24
申请号：US12446757
申请日：2007-10-23
申请人： Dov Shachal
发明人： Dov Shachal
IPC分类号： G01N23/00
CPC分类号： H01J37/285 , H01J37/06 , H01J37/20 , H01J37/28 , H01J37/301 , H01J2237/006 , H01J2237/0458 , H01J2237/15 , H01J2237/164 , H01J2237/182 , H01J2237/2002 , H01J2237/2006 , H01J2237/2605 , H01J2237/28 , H01J2237/2801 , H01J2237/2806 , H01J2237/2807
摘要： An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
摘要翻译：接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

56. 发明申请

US20110212624A1 SYSTEM, METHOD AND APPARATUS FOR PLASMA ETCH HAVING INDEPENDENT CONTROL OF ION GENERATION AND DISSOCIATION OF PROCESS GAS 有权
标题翻译：具有离子发生和过程气体分离独立控制的等离子体蚀刻的系统，方法和装置
公开(公告)号：US20110212624A1
公开(公告)日：2011-09-01
申请号：US12713523
申请日：2010-02-26
申请人： Eric A. Hudson
发明人： Eric A. Hudson
IPC分类号： H01L21/3065 , C23F1/08
CPC分类号： H01L21/3065 , H01J37/32532 , H01J37/32541 , H01J37/32596 , H01J2237/182 , H01L21/31116 , H05H1/24
摘要： A method of etching a semiconductor wafer including injecting a source gas mixture into a process chamber including injecting the source gas mixture into a multiple hollow cathode cavities in a top electrode of the process chamber and generating a plasma in each one of the hollow cathode cavities. Generating the plasma in the hollow cathode cavities includes applying a first biasing signal to the hollow cathode cavities. The generated plasma or activated species is output from corresponding outlets of each of the hollow cathode cavities into a wafer processing region in the process chamber. The wafer processing region is located between the outlets of the hollow cathode cavities and a surface to be etched. An etchant gas mixture is injected into the wafer processing region. A plasma can also be supported and/or generated in the wafer processing region. The etchant gas mixture is injected through multiple injection ports in the top electrode such that the etchant gas mixture mixes with the plasma output from the outlets of the hollow cathode cavities. The etchant gas mixture is substantially prevented from flowing into the outlets of the hollow cathode cavities by the plasma flowing from the outlets of hollow cathode cavities. Mixing the etchant gas mixture and the output from the hollow cathode cavities generates a desired chemical species in the wafer processing region and the surface to be etched can be etched. A system for generating an etching species is also describer herein.
摘要翻译：一种蚀刻半导体晶片的方法，包括将源气体混合物注入到处理室中，包括将源气体混合物注入到处理室的顶部电极中的多个空心阴极腔中，并在每个空心阴极腔中产生等离子体。在中空阴极腔中产生等离子体包括将第一偏置信号施加到中空阴极腔。产生的等离子体或活化物质从每个空心阴极腔的相应出口输出到处理室中的晶片处理区域。晶片处理区域位于中空阴极腔的出口和待蚀刻的表面之间。将蚀刻气体混合物注入晶片处理区域。等离子体也可以在晶片处理区域中被支持和/或产生。蚀刻剂气体混合物通过顶部电极中的多个注入口注入，使得蚀刻剂气体混合物与来自空心阴极腔的出口的等离子体输出混合。通过等离子体从空心阴极腔的出口流出，基本上防止了蚀刻剂气体混合物流入空心阴极腔的出口。将蚀刻剂气体混合物和来自空心阴极腔的输出混合在晶片加工区域中产生所需的化学物质，并且可以蚀刻待蚀刻的表面。本文还描述了用于产生蚀刻物质的系统。

57. 发明申请

US20110031214A1 VACUUM PROCESSING CHAMBERS INCORPORATING A MOVEABLE FLOW EQUALIZER 失效
标题翻译：真空加工罐配有可移动流量均衡器
公开(公告)号：US20110031214A1
公开(公告)日：2011-02-10
申请号：US12537179
申请日：2009-08-06
申请人： Jisoo Kim , Thorsten B. Lill
发明人： Jisoo Kim , Thorsten B. Lill
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01L21/68785 , C23C16/4412 , H01J37/185 , H01J37/3244 , H01J37/32449 , H01J2237/182 , H01J2237/2001 , H01L21/6719
摘要： A method and apparatus for vacuum processing of a workpiece, the apparatus including a flow equalizer disposed in a vacuum processing chamber between a workpiece support pedestal and a pump port located in a wall of the vacuum processing chamber. In an embodiment, the flow equalizer has a first annular surface concentric about the workpiece support pedestal to provide conductance symmetry about the workpiece support even when the pump port is asymmetrically positioned within the vacuum processing chamber. In an embodiment, the flow equalizer has a second annular surface facing a lower surface of the workpiece support pedestal to restrict conductance as the flow equalizer is moved is response to a chamber pressure control signal. In an embodiment, the apparatus for vacuum processing of a workpiece includes tandem vacuum processing chambers sharing a vacuum pump with each tandem chamber including a flow equalizer to reduce cross-talk between the tandem chambers.
摘要翻译：一种用于真空处理工件的方法和装置，该装置包括设置在工件支撑基座和位于真空处理室的壁中的泵口之间的真空处理室中的流量均衡器。在一个实施例中，流量均衡器具有围绕工件支撑基座同心的第一环形表面，以便即使当泵口不对称地位于真空处理室内时也能够提供关于工件支撑件的电导对称性。在一个实施例中，流量均衡器具有面向工件支撑基座的下表面的第二环形表面，以在流量均衡器移动时限制电导响应于腔室压力控制信号。在一个实施例中，用于真空处理工件的装置包括串联真空处理室，其共享真空泵，每个串联室包括流量均衡器以减少串联室之间的串扰。

58. 发明申请

US20110006207A1 METHOD FOR S/TEM SAMPLE ANALYSIS 有权
标题翻译： S / TEM样品分析方法
公开(公告)号：US20110006207A1
公开(公告)日：2011-01-13
申请号：US12446387
申请日：2007-10-22
申请人： Jason Arjavac , Pei Zou , David James Tasker , Maximus Theodorus Otten , Gerhard Daniel
发明人： Jason Arjavac , Pei Zou , David James Tasker , Maximus Theodorus Otten , Gerhard Daniel
IPC分类号： G01N23/04 , G01N1/32
CPC分类号： G01N1/28 , G01N1/06 , G01N1/08 , G01N1/32 , G01N23/04 , H01J37/06 , H01J37/18 , H01J37/20 , H01J37/26 , H01J37/28 , H01J37/3056 , H01J2237/063 , H01J2237/182 , H01J2237/204 , H01J2237/208 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749
摘要： An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (
摘要翻译：一种用于S / TEM样品制备和分析的改进方法和装置。本发明的优选实施例提供用于TEM样品制备的改进方法，特别是对于小几何（<100nm厚）TEM薄片。本发明的优选实施例还通过提供部分或全部自动化TEM样品制作的方法来提供在诸如集成电路或半导体晶片上制造的其它结构的物体上的基于S / TEM的测量的在线方法，以使得创建过程并分析TEM样品减少劳动密集度，并提高TEM分析的产量和再现性。

59. 发明申请

US20100122901A1 Vapor-Barrier Vacuum Isolation System 有权
标题翻译：气体隔离真空隔离系统
公开(公告)号：US20100122901A1
公开(公告)日：2010-05-20
申请号：US12470689
申请日：2009-05-22
申请人： Leonard M. Weinstein , Karen M. Taminger
发明人： Leonard M. Weinstein , Karen M. Taminger
IPC分类号： C23C14/34
CPC分类号： H01J37/16 , H01J37/18 , H01J2237/002 , H01J2237/006 , H01J2237/182 , H01J2237/188 , H01J2237/2002
摘要： A system includes a collimated beam source within a vacuum chamber, a condensable barrier gas, cooling material, a pump, and isolation chambers cooled by the cooling material to condense the barrier gas. Pressure levels of each isolation chamber are substantially greater than in the vacuum chamber. Coaxially-aligned orifices connect a working chamber, the isolation chambers, and the vacuum chamber. The pump evacuates uncondensed barrier gas. The barrier gas blocks entry of atmospheric vapor from the working chamber into the isolation chambers, and undergoes supersonic flow expansion upon entering each isolation chamber. A method includes connecting the isolation chambers to the vacuum chamber, directing vapor to a boundary with the working chamber, and supersonically expanding the vapor as it enters the isolation chambers via the orifices. The vapor condenses in each isolation chamber using the cooling material, and uncondensed vapor is pumped out of the isolation chambers via the pump.
摘要翻译：系统包括在真空室内的准直光束源，可冷凝阻挡气体，冷却材料，泵以及由冷却材料冷却以隔离阻挡气体的隔离室。每个隔离室的压力水平基本上大于真空室中的压力水平。同轴对齐的孔连接工作室，隔离室和真空室。泵排出未凝结的阻挡气体。阻挡气体阻止大气蒸气从工作室进入隔离室，并且在进入每个隔离室时经历超音速流动膨胀。一种方法包括将隔离室连接到真空室，将蒸汽引导到与工作室的边界，以及当蒸气通过孔口进入隔离室时使其蒸气膨胀。蒸汽在每个隔离室中使用冷却材料冷凝，未冷凝的蒸汽通过泵从隔离室泵出。

60. 发明申请

US20090242762A1 Apparatus and Method for Inspecting Sample 有权
标题翻译：检测样品的仪器和方法
公开(公告)号：US20090242762A1
公开(公告)日：2009-10-01
申请号：US12407918
申请日：2009-03-20
申请人： Hidetoshi Nishiyama , Mitsuru Koizumi
发明人： Hidetoshi Nishiyama , Mitsuru Koizumi
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , G01N23/2204 , G01N2223/307 , G01N2223/612 , G01N2223/637 , H01J37/20 , H01J37/228 , H01J37/265 , H01J37/28 , H01J2237/182 , H01J2237/2004 , H01J2237/244 , H01J2237/2808
摘要： Method and apparatus have a film including a first surface to hold the liquid sample thereon, a vacuum chamber for reducing the pressure of an ambient in contact with a second surface of the film, primary beam irradiation means connected with the vacuum chamber and irradiating the sample with a primary beam via the film, signal detection means for detecting a secondary signal produced from the sample in response to the beam irradiation, a partitioning plate for partially partitioning off the space between the film and the primary beam irradiation means in the vacuum chamber, and a vacuum gauge for detecting the pressure inside the vacuum chamber.
摘要翻译：方法和装置具有包括用于将液体样品保持在其上的第一表面的膜，用于降低与膜的第二表面接触的环境压力的真空室，与真空室连接并照射样品的主光束照射装置通过胶片具有主光束，信号检测装置，用于响应于光束照射检测从样品产生的二次信号;分隔板，用于在真空室中部分地分隔膜和主光束照射装置之间的空间，以及用于检测真空室内的压力的真空计。

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