专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US09240584B1 Phase change material source for physical vapor deposition 有权
标题翻译：用于物理气相沉积的相变材料源
公开(公告)号：US09240584B1
公开(公告)日：2016-01-19
申请号：US13728969
申请日：2012-12-27
申请人： Sakti3, Inc.
发明人： Ann Marie Sastry , Myoungdo Chung , HyonCheol Kim
IPC分类号： C23C16/00 , H01M4/04
CPC分类号： H01M4/0423 , C23C14/042 , C23C14/082 , C23C14/14 , C23C14/243 , C23C14/246 , C23C14/26 , C23C14/505 , C23C14/542 , C23C14/588 , H01M4/0421 , H01M4/0471 , H01M4/1395 , H01M10/052 , H01M10/058 , Y02T10/7011
摘要： A method and apparatus for manufacturing electrochemical cells. The apparatus and method includes the modification of solid phase material used in electrochemical cells, such as batteries, into a viscous phase for ease of metering and dispensing onto a hot wall reactor to create a substantially uniform cloud of vapor to be deposited on a substrate or other stacks of cells in a continuous or semi-continuous process and having the useful advantage of depositing large volumes of materials for economical manufacturing.
摘要翻译：一种用于制造电化学电池的方法和装置。该装置和方法包括将电化学电池（例如电池）中使用的固相材料修改成粘性相，以便于计量和分配到热壁反应器上以产生沉积在基底上的基本均匀的蒸气云，或连续或半连续过程中的其它堆叠的电池，并且具有沉积大量材料用于经济制造的有用优点。

52. 发明申请

US20150307984A1 EVAPORATION CELL 审中-公开
标题翻译：蒸发细胞
公开(公告)号：US20150307984A1
公开(公告)日：2015-10-29
申请号：US14694164
申请日：2015-04-23
申请人： RIBER
发明人： David ESTEVE , Franck STEMMELEN
IPC分类号： C23C14/24
CPC分类号： C23C14/243 , C23C14/246 , C23C14/26 , C23C14/542 , C23C14/56 , C23C14/564
摘要： An evaporation cell for evaporating a material onto a substrate placed in a vacuum deposition chamber, includes an inner enclosure delimiting an evaporation chamber for receiving a crucible containing the material and having an opening for inserting the crucible into the evaporation chamber; evaporation elements placed at the periphery of the inner enclosure for placing the crucible in evaporation conditions; an injection duct for transporting a flow of vapour of the evaporated material from the evaporation chamber to an injector located in the vacuum deposition chamber; and a stop valve placed on the injection duct. The evaporation cell includes insertion opening/shutting elements that have an open configuration for inserting the crucible into the evaporation chamber, and a closed configuration for confining the evaporation chamber in communication with the vacuum deposition chamber via the injection duct, and opening elements to provide an evaporation opening in an envelope of the crucible.
摘要翻译：用于将材料蒸发到放置在真空沉积室中的基板上的蒸发单元包括限定蒸发室的内部外壳，用于接纳含有该材料的坩埚，并具有用于将坩埚插入蒸发室的开口; 放置在内壳周边的蒸发元件将坩埚置于蒸发条件下; 用于将蒸发的材料的蒸汽流从蒸发室输送到位于真空沉积室中的喷射器的注入管道; 和一个放置在注射管上的截止阀。蒸发单元包括具有用于将坩埚插入蒸发室的打开构造的插入开/关元件，以及用于限制蒸发室经由注入管道与真空沉积室连通的关闭构造，以及开启元件以提供在坩埚的封套内的蒸发开口。

53. 发明授权

US09150952B2 Deposition source and deposition apparatus including the same 有权
标题翻译：沉积源和包括其的沉积装置
公开(公告)号：US09150952B2
公开(公告)日：2015-10-06
申请号：US13413615
申请日：2012-03-06
申请人： Jong-Woo Lee , Young-Soo Cho
发明人： Jong-Woo Lee , Young-Soo Cho
IPC分类号： C23C16/00 , C23C14/12 , C23C14/24
CPC分类号： C23C14/12 , C23C14/243
摘要： A deposition source including: a dopant vaporization source; a first host vaporization source including a first vaporization source unit on a side of the dopant vaporization source and a second vaporization source unit on another side of the dopant vaporization source; and a second host vaporization source including a third vaporization source unit on the side of the dopant vaporization source and arranged in parallel with the first vaporization source unit, and a fourth vaporization source unit on the another side of the dopant vaporization source and arranged in parallel with the second vaporization source unit.
摘要翻译：一种沉积源，包括：掺杂剂气化源; 第一主体蒸发源，其包括在所述掺杂剂气化源的一侧上的第一蒸发源单元和在所述掺杂剂气化源的另一侧上的第二蒸发源单元; 以及第二主体蒸发源，其包括在所述掺杂剂气化源侧并且与所述第一蒸发源单元平行布置的第三蒸发源单元，以及在所述掺杂剂气化源的另一侧并排布置的第四蒸发源单元与第二蒸发源单元。

54. 发明申请

US20150240345A1 APPARATUS AND METHOD FOR COATING ORGANIC FILM 审中-公开
公开(公告)号：US20150240345A1
公开(公告)日：2015-08-27
申请号：US14708786
申请日：2015-05-11
申请人： BOE TECHNOLOGY GROUP CO., LTD.
发明人： Wulin SHEN , Chunsheng JIANG , Qing DAI , Haijing CHEN , Guangcai YUAN , Jingang FANG
IPC分类号： C23C14/30 , C23C14/04
CPC分类号： H01L51/0013 , B05B5/001 , B05B5/0255 , B05B5/03 , B05B5/0533 , B05B5/057 , B05D1/007 , B05D1/60 , C23C14/042 , C23C14/12 , C23C14/24 , C23C14/243 , C23C14/30 , C23C14/32 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： An apparatus and method for coating an organic film are disclosed. The apparatus comprises an evaporation device, an electron emission device and a spray device; wherein the evaporation device comprises an evaporation container, the evaporation container is a linear evaporation container, in which a uniform organic gas is generated; the electron emission device is horizontally arranged over the evaporation container such that the organic gas evaporated in the evaporation container is uniformly charged and becomes charged organic gas; the spray device is provided with an electric field, under which the charged organic gas is moved toward a substrate so as to deposit the organic film on the substrate.

55. 发明申请

US20150203958A1 METHOD FOR SUPPLYING DEPOSITION MATERIAL, METHOD FOR PRODUCING SUBSTRATE, CONTROL DEVICE AND DEPOSITION DEVICE 审中-公开
标题翻译：提供沉积材料的方法，生产基材的方法，控制装置和沉积装置
公开(公告)号：US20150203958A1
公开(公告)日：2015-07-23
申请号：US14419840
申请日：2012-10-19
申请人： MITSUBISHI HEAVY INDUSTRIES, LTD.
发明人： Ryuta Yamaguchi , Tetsuya Goto , Nobuyuki Shigeoka
IPC分类号： C23C14/24
CPC分类号： C23C14/246 , C23C14/24 , C23C14/243 , C23C14/543
摘要： Provided is a method for supplying a deposition material including a heating step of heating and evaporating a deposition material accommodated in a material accommodating section in which the deposition material is accommodated, a supply step of supplying the deposition material into the material accommodating section by feeding and melting a deposition material in a solid phase toward the melted deposition material in the material accommodating section, and a melted state detection step of detecting a melted state of the deposition material in the solid phase after supply in the supply step.
摘要翻译：提供一种提供沉积材料的方法，该沉积材料包括加热和蒸发容纳在其中容纳沉积材料的材料容纳部分中的沉积材料的加热步骤的供给步骤，该沉积材料通过进料和/ 将固相中的沉积材料熔化到所述材料容纳部分中的熔融沉积材料;以及熔融状态检测步骤，在供给步骤中供给后检测固相中的沉积材料的熔融状态。

56. 发明申请

US20150168068A1 THERMAL EVAPORATION SOURCES FOR WIDE-AREA DEPOSITION 有权
标题翻译：用于宽区沉积的热蒸发源
公开(公告)号：US20150168068A1
公开(公告)日：2015-06-18
申请号：US14625433
申请日：2015-02-18
申请人： JLN Solar, Inc.
发明人： Robert W. Birkmire , Gregory M. Hanket
IPC分类号： F27B14/00 , C23C14/24
CPC分类号： F27B14/00 , C23C14/243
摘要： A thermal evaporation sources are described. These thermal evaporation sources include a crucible configured to contain a volume of evaporant and a vapor space above the evaporant.
摘要翻译：描述了热蒸发源。这些热蒸发源包括构造成容纳蒸发剂体积和蒸发器上方的蒸汽空间的坩埚。

57. 发明申请

US20150167151A1 CARRIER SYSTEMS FOR INTRODUCING MATERIALS INTO MATERIAL PROCESSING SYSTEMS 审中-公开
标题翻译：将材料引入材料加工系统的载体系统
公开(公告)号：US20150167151A1
公开(公告)日：2015-06-18
申请号：US14634034
申请日：2015-02-27
申请人： HZO, Inc.
发明人： James Dempster , Jason Maynard
IPC分类号： C23C14/24
CPC分类号： C23C14/243 , C23C16/448 , F27D5/00
摘要： In various aspects and embodiment, the present disclosure relates to a carrier system for receiving and holding precursor material. The carrier system may be used within a material processing system for forming protecting coatings on a substrate. The carrier system may comprise a carrier including a plurality of receptacles. The carrier system may further include a plurality of cups, each cup configured to be removably positioned with a receptacle of the carrier.
摘要翻译：在各方面和实施例中，本发明涉及用于接收和保持前体材料的载体系统。载体系统可以在用于在基底上形成保护涂层的材料处理系统中使用。载体系统可以包括包括多个容器的载体。载体系统可以进一步包括多个杯，每个杯配置成可拆卸地与载体的容器定位。

58. 发明申请

US20150162535A1 APPARATUS AND METHOD FOR COATING ORGANIC FILM 有权
标题翻译：用于涂覆有机膜的装置和方法
公开(公告)号：US20150162535A1
公开(公告)日：2015-06-11
申请号：US14241723
申请日：2013-12-16
申请人： BOE TECHNOLOGY GROUP CO., LTD.
发明人： Wulin Shen , Chunsheng Jiang , Qing Dai , Haijing Chen , Guangcai Yuan , Jingang Fang
IPC分类号： H01L51/00 , B05B5/053 , B05B5/00 , B05B5/03 , H01L51/56 , B05D1/00
CPC分类号： H01L51/0013 , B05B5/001 , B05B5/0255 , B05B5/03 , B05B5/0533 , B05B5/057 , B05D1/007 , B05D1/60 , C23C14/042 , C23C14/12 , C23C14/24 , C23C14/243 , C23C14/30 , C23C14/32 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： An apparatus and method for coating an organic film are disclosed. The apparatus comprises an evaporation device, an electron emission device and a spray device; wherein the evaporation device comprises an evaporation container, the evaporation container is a linear evaporation container, in which a uniform organic gas is generated; the electron emission device is horizontally arranged over the evaporation container such that the organic gas evaporated in the evaporation container is uniformly charged and becomes charged organic gas; the spray device is provided with an electric field, under which the charged organic gas is moved toward a substrate so as to deposit the organic film on the substrate.
摘要翻译：公开了一种用于涂覆有机膜的设备和方法。该装置包括蒸发装置，电子发射装置和喷射装置; 其中所述蒸发装置包括蒸发容器，所述蒸发容器是线性蒸发容器，其中产生均匀的有机气体; 电子发射装置水平地布置在蒸发容器上，使得蒸发容器中蒸发的有机气体均匀充电并成为带电的有机气体; 喷射装置设置有电场，使带电的有机气体朝向基板移动，以将有机膜沉积在基板上。

59. 发明授权

US09045819B2 Method for forming thin film while providing cooling gas to rear surface of substrate 有权
标题翻译：在向衬底的背面提供冷却气体的同时形成薄膜的方法
公开(公告)号：US09045819B2
公开(公告)日：2015-06-02
申请号：US13132023
申请日：2009-12-10
申请人： Kazuyoshi Honda , Yasuharu Shinokawa , Hiromasa Yagi , Satoshi Shibutani , Sadayuki Okazaki , Yuko Ogawa , Daisuke Suetsugu
发明人： Kazuyoshi Honda , Yasuharu Shinokawa , Hiromasa Yagi , Satoshi Shibutani , Sadayuki Okazaki , Yuko Ogawa , Daisuke Suetsugu
IPC分类号： C23C14/24 , C23C14/04 , C23C14/14 , C23C14/54 , C23C14/56
CPC分类号： C23C14/042 , C23C14/14 , C23C14/24 , C23C14/243 , C23C14/541 , C23C14/562
摘要： Deterioration of the degree of vacuum in a vacuum chamber is prevented while securing adequate cooling performance by gas cooling. A substrate 21 is provided in a vacuum, and the cooling body 1 is provided close to a film non-formation surface of the substrate 21. A thin film is formed by depositing a film forming material on a film formation surface of the substrate 21 while introducing a cooling gas into between the substrate 21 and the cooling body 1. At this time, a gas which reacts with the film forming material is introduced as the cooling gas.
摘要翻译：在通过气体冷却确保足够的冷却性能的同时防止真空室中的真空度恶化。在真空中设置基板21，将冷却体1设置在基板21的膜非形成面附近。通过在基板21的成膜面上沉积成膜材料而形成薄膜，同时将冷却气体引入到基板21和冷却体1之间。此时，引入与成膜材料反应的气体作为冷却气体。

60. 发明授权

US08986455B2 Thermal evaporation sources for wide-area deposition 有权
标题翻译：用于广域沉积的热蒸发源
公开(公告)号：US08986455B2
公开(公告)日：2015-03-24
申请号：US12250172
申请日：2008-10-13
申请人： Robert W. Birkmire , Gregory M. Hanket
发明人： Robert W. Birkmire , Gregory M. Hanket
IPC分类号： C23C16/00 , C23C14/24
CPC分类号： F27B14/00 , C23C14/243
摘要： A thermal evaporation source includes: a crucible configured to contain a volume of evaporant and a vapor space above the evaporant; a manifold body having within it a hollow expansion chamber that is flowably connected to the vapor space via one or more restriction orifices; one or more effusion nozzles flowably connected to the expansion chamber and exiting an outer surface of the thermal evaporation source, the nozzle(s) oriented to direct an evaporant vapor flow out of the source vertically downward, in one or more horizontal directions, or in one or more directions intermediate between horizontal and vertically downward; and a heater capable of heating some or all of the thermal evaporation source to a temperature sufficient to produce the one or more evaporant vapor flows when a vacuum is applied to the thermal evaporation source.
摘要翻译：热蒸发源包括：坩埚，其构造成容纳蒸发剂的体积和蒸发器上方的蒸汽空间; 歧管主体，在其内部具有中空膨胀室，其经由一个或多个限制孔流动地连接到蒸气空间; 一个或多个渗出喷嘴可流动地连接到膨胀室并离开热蒸发源的外表面，喷嘴被定向成将蒸发蒸气流沿垂直向下的一个或多个水平方向引导出源，或者在在水平和垂直向下之间中间的一个或多个方向; 以及当将真空加到热蒸发源上时能够将部分或全部热蒸发源加热到足以产生一个或多个蒸发蒸气流的温度的加热器。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式