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    • 59. 发明申请
    • Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film
    • 阻隔膜和层压材料,用于包装的容器和使用锯的图像显示介质以及阻挡膜的制造方法
    • US20070031703A1
    • 2007-02-08
    • US11496202
    • 2006-07-31
    • Minoru KomadaYoshihiro Kishimoto
    • Minoru KomadaYoshihiro Kishimoto
    • B32B18/00C23C14/00
    • C23C14/10C04B35/565C04B35/584C04B2235/3856C04B2235/3895C23C8/36C23C12/02C23C28/00C23C28/04
    • An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:140 to 170:20 to 40, peak position of infrared-ray absorption due to Si-O-Si stretching vibration between 1060 to 1090 cm−1, a film density in a range of 2.6 to 2.8 g/cm3, and a distance between: grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, has a composition wherein the barrier layer is a silicon oxi-nitride film, and the silicon oxi-nitride film has an atomic ratio in a range of Si:O:N:C=100:60 to 90:60 to 90:20 to 40, a maximum peak of infrared-ray absorption due to Si—O stretching vibration and Si—N stretching vibration is in a range of 820 to 930 cm−1, a film density is in a range of 2.9 to 3.2 g/cm3, and a distance between grains is 30 nm or shorter.
    • 本发明的目的是提供一种具有极高的阻隔性和更好的透明度的阻挡膜及其制造方法,以及叠层材料,用于包装的容器和使用阻挡膜的图像显示介质。 根据本发明,提供了一种在基材膜的至少一个表面上设置有阻挡层的阻挡膜,其中阻挡层是原子比在Si:O:C = 100:140〜170:20〜40,由于Si-O-Si伸缩振动在1060〜1090cm -1之间的红外线吸收的峰值位置,膜密度在2.6〜 2.8g / cm 3,晶粒间距离为30nm以下。 另外,提供了在基板薄膜的至少一个表面上设置有阻挡层的阻挡膜,具有其中阻挡层为硅氧化氮膜的组成,硅氧化氮膜具有原子比 在Si:O:N:C = 100:60至90:60至90:20至40的范围内,由于Si-O伸缩振动和Si-N伸缩振动导致的红外线吸收的最大峰值为 范围为820〜930cm -1,膜密度为2.9〜3.2g / cm 3,范围为30nm以下。