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    • 52. 发明申请
    • PROCESS FOR MINIMIZING CHIPPING WHEN SEPARATING MEMS DIES ON A WAFER
    • 当在水平分离MEMS表面时最小化流动的过程
    • US20130130424A1
    • 2013-05-23
    • US13695980
    • 2011-05-03
    • Roger HortonJaved Hussain
    • Roger HortonJaved Hussain
    • H01L21/78
    • B81B7/0058B81C1/00888B81C2201/053G01L9/0055H01L21/78
    • A method for separating a plurality of dies on a Micro-Electro-Mechanical System (MEMS) wafer comprising scribing a notch on a first side of the wafer between at least two of the plurality of dies on a first surface and depositing a metal on the first surface of the plurality of dies. The method further comprises scribing a second side of the wafer between at least two of the plurality of dies from a second surface thereof through the notch. The first side and second side are substantially parallel and opposite each other and the first surface and the second surface are substantially parallel and opposite each other. In a process in accordance with the present invention, a method to minimize chipping of the bonding portion of a MEMs device during sawing of the wafer is provided, which minimally affects the process steps associated with separating the die on a wafer.
    • 一种用于在微电子机械系统(MEMS)晶片上分离多个管芯的方法,包括在第一表面上的多个管芯中的至少两个之间划定晶片的第一侧上的缺口并在其上沉积金属 多个管芯的第一表面。 该方法还包括在多个管芯中的至少两个从其第二表面通过凹口划线晶片的第二侧。 第一侧面和第二侧面基本上平行且彼此相对,并且第一表面和第二表面基本上平行且彼此相对。 在根据本发明的方法中,提供了一种在晶片锯切期间最小化MEM器件的接合部分的破损的方法,其最小程度地影响与在晶片上分离晶片相关的工艺步骤。
    • 53. 发明申请
    • MEMS PACKAGE STRUCTURE
    • MEMS封装结构
    • US20120267732A1
    • 2012-10-25
    • US13535682
    • 2012-06-28
    • Hsin-Hui HSUSheng-Ta LEEChuan-Wei WANG
    • Hsin-Hui HSUSheng-Ta LEEChuan-Wei WANG
    • H01L29/84
    • B81B7/0058B81B7/0006B81B2201/0264B81C1/00246B81C1/00293B81C2203/0136B81C2203/0145B81C2203/0714B81C2203/0735
    • A MEMS package structure, including a substrate, an interconnecting structure, an upper metallic layer, a deposition element and a packaging element is provided. The interconnecting structure is disposed on the substrate. The MEMS structure is disposed on the substrate and within a first cavity. The upper metallic layer is disposed above the MEMS structure and the interconnecting structure, so as to form a second cavity located between the upper metallic layer and the interconnecting structure and communicates with the first cavity. The upper metallic layer has at least a first opening located above the interconnecting structure and at least a second opening located above the MEMS structure. Area of the first opening is greater than that of the second opening. The deposition element is disposed above the upper metallic layer to seal the second opening. The packaging element is disposed above the upper metallic layer to seal the first opening.
    • 提供了包括基板,互连结构,上金属层,沉积元件和封装元件的MEMS封装结构。 互连结构设置在基板上。 MEMS结构设置在基板上并在第一腔内。 上金属层设置在MEMS结构和互连结构之上,以便形成位于上金属层和互连结构之间的第二腔,并与第一腔连通。 上金属层具有位于互连结构上方的至少第一开口和位于MEMS结构上方的至少第二开口。 第一开口的面积大于第二开口的面积。 沉积元件设置在上金属层上方以密封第二开口。 包装元件设置在上金属层上方以密封第一开口。
    • 54. 发明申请
    • MEMS DEVICE WITH RELEASE APERTURE
    • 具有释放孔径的MEMS器件
    • US20120098074A1
    • 2012-04-26
    • US12908985
    • 2010-10-21
    • Chung-Hsien LinChia-Hua ChuChun-Wen Cheng
    • Chung-Hsien LinChia-Hua ChuChun-Wen Cheng
    • H01L23/04H01L21/50
    • B81B7/0058B81C1/00333B81C1/0038B81C2203/0136B81C2203/0145H01L2924/0002H01L2924/00
    • The present disclosure provides a method of fabricating a micro-electro-mechanical systems (MEMS) device. In an embodiment, a method includes providing a substrate including a first sacrificial layer, forming a micro-electro-mechanical systems (MEMS) structure above the first sacrificial layer, and forming a release aperture at substantially a same level above the first sacrificial layer as the MEMS structure. The method further includes forming a second sacrificial layer above the MEMS structure and within the release aperture, and forming a first cap over the second sacrificial layer and the MEMS structure, wherein a leg of the first cap is disposed between the MEMS structure and the release aperture. The method further includes removing the first sacrificial layer, removing the second sacrificial layer through the release aperture, and plugging the release aperture. A MEMS device formed by such a method is also provided.
    • 本公开提供了一种制造微机电系统(MEMS)装置的方法。 在一个实施例中,一种方法包括提供包括第一牺牲层的衬底,在第一牺牲层之上形成微电子机械系统(MEMS)结构,以及在第一牺牲层之上的基本上相同的水平面上形成释放孔, MEMS结构。 该方法还包括在MEMS结构之上和释放孔内形成第二牺牲层,以及在第二牺牲层和MEMS结构之上形成第一帽,其中第一帽的腿设置在MEMS结构和释放之间 光圈。 该方法还包括去除第一牺牲层,通过释放孔去除第二牺牲层并堵塞释放孔。 还提供了通过这种方法形成的MEMS器件。
    • 59. 发明申请
    • PHYSICAL QUANTITY SENSOR
    • 物理量传感器
    • US20110167912A1
    • 2011-07-14
    • US13004295
    • 2011-01-11
    • Tameharu OHTATakeshi SHINODAItaru ISHIIKeisuke NAKANO
    • Tameharu OHTATakeshi SHINODAItaru ISHIIKeisuke NAKANO
    • G01C19/56
    • G01C19/5769B81B7/0058B81B2201/0242G01P1/023G01P15/125H01L2224/48465
    • A physical quantity sensor includes a sensing portion, a casing, a vibration isolating member, an electrically conductive portion, a pad and a bonding wire. The casing encases the sensing portion therein. The vibration isolating member is disposed between the sensing portion and the casing to reduce a relative vibration between the sensing portion and the casing. The bonding wire electrically connects the electrically conductive portion provided on the casing and the pad provided on a surface of the sensing portion. The bonding wire extends from the pad to the electrically conductive portion and includes a bend. The bonding wire is configured to satisfy a relation of 20×d≦h, in which d is an outer diameter of the bonding wire, and h is a dimension of the bonding wire with respect to a direction perpendicular to the surface of the sensing portion.
    • 物理量传感器包括感测部分,壳体,隔振部件,导电部分,焊盘和接合线。 壳体将感测部分包围在其中。 防振构件设置在感测部分和壳体之间以减小感测部分和壳体之间的相对振动。 接合线将设置在壳体上的导电部分和设置在感测部分的表面上的焊盘电连接。 接合线从焊盘延伸到导电部分并且包括弯曲部。 接合线被构造成满足20×d≦̸ h的关系,其中d是接合线的外径,h是接合线相对于垂直于感测部分的表面的方向的尺寸 。