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    • 52. 发明授权
    • CPP device with an enhanced dR/R ratio
    • 具有增强的dR / R比的CPP装置
    • US08031441B2
    • 2011-10-04
    • US11803057
    • 2007-05-11
    • Kunliang ZhangMin LiMoris DovekYue Liu
    • Kunliang ZhangMin LiMoris DovekYue Liu
    • G11B5/39
    • G11B5/3909B82Y10/00B82Y25/00G11B5/3906G11B2005/3996Y10T29/49039Y10T29/49043Y10T29/49044
    • A CPP-GMR spin valve having a composite spacer layer comprised of at least one metal (M) layer and at least one semiconductor or semi-metal (S) layer is disclosed. The composite spacer may have a M/S, S/M, M/S/M, S/M/S, M/S/M/S/M, or a multilayer (M/S/M)n configuration where n is an integer ≧1. The pinned layer preferably has an AP2/coupling/AP1 configuration wherein the AP2 portion is a FCC trilayer represented by CoZFe(100-Z)/FeYCo(100-Y)/CoZFe(100-Z) where y is 0 to 60 atomic %, and z is 75 to 100 atomic %. In one embodiment, M is Cu with a thickness from 0.5 to 50 Angstroms and S is ZnO with a thickness of 1 to 50 Angstroms. The S layer may be doped with one or more elements. The dR/R ratio of the spin valve is increased to 10% or greater while maintaining acceptable EM and RA performance.
    • 公开了具有由至少一个金属(M)层和至少一个半导体或半金属(S)层组成的复合间隔层的CPP-GMR自旋阀。 复合间隔物可以具有M / S,S / M,M / S / M,S / M / S,M / S / M / S / M或多层(M / S / M) 是整数≧1。 钉扎层优选具有AP2 /耦合/ AP1配置,其中AP2部分是由CoZFe(100-Z)/ FeYCo(100-Y)/ CoZFe(100-Z)表示的FCC三层,其中y为0至60原子% ,z为75〜100原子%。 在一个实施方案中,M是厚度为0.5至50埃的Cu,S是厚度为1至50埃的ZnO。 S层可以掺杂有一个或多个元素。 自旋阀的dR / R比提高到10%以上,同时保持可接受的EM和RA性能。
    • 53. 发明授权
    • TMR or CPP structure with improved exchange properties
    • 具有改进的交换性能的TMR或CPP结构
    • US07978439B2
    • 2011-07-12
    • US11820251
    • 2007-06-19
    • Kunliang ZhangHui-Chuan WangTong ZhaoMin Li
    • Kunliang ZhangHui-Chuan WangTong ZhaoMin Li
    • G11B5/39
    • G11B5/3909B82Y10/00B82Y25/00G01R33/093G11B5/3906H01L43/08Y10T428/1114
    • An insertion layer is provided between an AFM layer and an AP2 pinned layer in a GMR or TMR element to improve exchange coupling properties by increasing Hex and the Hex/Hc ratio without degrading the MR ratio. The insertion layer may be a 1 to 15 Angstrom thick amorphous magnetic layer comprised of at least one element of Co, Fe, or Ni, and at least one element having an amorphous character selected from B, Zr, Hf, Nb, Ta, Si, or P, or a 1 to 5 Angstrom thick non-magnetic layer comprised of Cu, Ru, Mn, Hf, or Cr. Preferably, the content of the one or more amorphous elements in the amorphous magnetic layer is less than 40 atomic %. Optionally, the insertion layer may be formed within the AP2 pinned layer. Examples of an insertion layer are CoFeB, CoFeZr, CoFeNb, CoFeHf, CoFeNiZr, CoFeNiHf, and CoFeNiNbZr.
    • 在GMR或TMR元件中的AFM层和AP2钉扎层之间设置插入层,以通过增加Hex和Hex / Hc比来提高交换耦合性能,而不降低MR比。 插入层可以是由至少一种Co,Fe或Ni元素组成的1至15埃厚的非晶磁性层,以及至少一种具有选自B,Zr,Hf,Nb,Ta,Si ,或P,或由Cu,Ru,Mn,Hf或Cr组成的1〜5埃厚的非磁性层。 优选地,非晶磁性层中的一种或多种非晶质元素的含量小于40原子%。 可选地,插入层可以形成在AP2钉扎层内。 插入层的实例是CoFeB,CoFeZr,CoFeNb,CoFeHf,CoFeNiZr,CoFeNiHf和CoFeNiNbZr。
    • 55. 发明申请
    • TMR device with novel free layer stucture
    • TMR器件具有新颖的自由层结构
    • US20100177449A1
    • 2010-07-15
    • US12319972
    • 2009-01-14
    • Tong ZhaoHui-Chuan WangMin LiKunliang Zhang
    • Tong ZhaoHui-Chuan WangMin LiKunliang Zhang
    • G11B5/33B05D5/12
    • G11B5/3909B82Y10/00B82Y25/00G01R33/098G11B5/3906H01L43/08H01L43/10H01L43/12
    • A composite free layer having a FL1/insertion/FL2 configuration is disclosed for achieving high dR/R, low RA, and low λ in TMR or GMR sensors. Ferromagnetic FL1 and FL2 layers have (+) λ and (−) λ values, respectively. FL1 may be CoFe, CoFeB, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, or Nb. FL2 may be CoFe, NiFe, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, Nb, or B. The thin insertion layer includes at least one magnetic element such as Co, Fe, and Ni, and at least one non-magnetic element selected from Ta, Ti, W, Zr, Hf, Nb, Mo, V, Cr, or B. In a TMR stack with a MgO tunnel barrier, dR/R>60%, λ˜1×10−6, and RA=1.2 ohm-um2 when FL1 is CoFe/CoFeB/CoFe, FL2 is CoFe/NiFe/CoFe, and the insertion layer is CoTa or CoFeBTa.
    • 公开了具有FL1 /插入/ FL2配置的复合自由层,用于在TMR或GMR传感器中实现高dR / R,低RA和低λ。 铁磁FL1和FL2层分别具有(+)λ和( - )λ值。 FL1可以是CoFe,CoFeB或其与Ni,Ta,Mn,Ti,W,Zr,Hf,Tb或Nb的合金。 FL2可以是CoFe,NiFe或其与Ni,Ta,Mn,Ti,W,Zr,Hf,Tb,Nb或B的合金。薄插入层包括至少一种诸如Co,Fe和Ni 以及选自Ta,Ti,W,Zr,Hf,Nb,Mo,V,Cr或B中的至少一种非磁性元素。在具有MgO隧道势垒的TMR堆叠中,dR / R> 60%,λ 〜1×10-6,当FL1为CoFe / CoFeB / CoFe时,RA = 1.2ohm-um2,FL2为CoFe / NiFe / CoFe,插入层为CoTa或CoFeBTa。
    • 56. 发明申请
    • Novel hard bias design for extra high density recording
    • 用于超高密度记录的新型硬偏置设计
    • US20100172053A1
    • 2010-07-08
    • US12660908
    • 2010-03-05
    • Kunliang ZhangYun-Fei LiChyu-Jiuh TorngChen-Jung Chien
    • Kunliang ZhangYun-Fei LiChyu-Jiuh TorngChen-Jung Chien
    • G11B5/187B05D1/36
    • B82Y25/00B82Y10/00G11B5/3912G11B5/3932G11B2005/3996
    • A hard bias structure for biasing a free layer in a MR element within a read head is comprised of a composite hard bias layer having a Co78.6Cr5.2Pt16.2/Co65Cr15Pt20 configuration. The upper Co65Cr15Pt20 layer has a larger Hc value and a thickness about 2 to 10 times greater than that of the Co78.6Cr5.2Pt16.2 layer. The hard bias structure may also include a BCC underlayer such as FeCoMo which enhances the magnetic moment of the hard bias structure. Optionally, the thickness of the Co78.6Cr5.2Pt16.2 layer is zero and the Co65Cr15Pt20 layer is formed on the BCC underlayer. The present invention also encompasses a laminated hard bias structure. The Mrt value for the hard bias structure may be optimized by adjusting the thicknesses of the BCC underlayer and CoCrPt layers. As a result, a larger process window is realized and lower asymmetry output during a read operation is achieved.
    • 用于偏置读取头内的MR元件中的自由层的硬偏置结构由具有Co78.6Cr5.2Pt16.2 / Co65Cr15Pt20配置的复合硬偏置层组成。 Co65Cr15Pt20上层具有较大的Hc值,厚度约为Co78.6Cr5.2Pt16.2层的2〜10倍。 硬偏压结构还可以包括诸如FeCoMo的BCC底层,其增强了硬偏压结构的磁矩。 可选地,Co78.6Cr5.2Pt16.2层的厚度为零,Co65Cr15Pt20层形成在BCC底层上。 本发明还包括层压硬偏置结构。 可以通过调整BCC底层和CoCrPt层的厚度来优化硬偏置结构的Mrt值。 结果,实现了更大的处理窗口,并且在读取操作期间实现了较低的不对称输出。