专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明申请

US20090306921A1 SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS 有权
标题翻译：通过使用定向ZERNIKE POLYNOMIALS的光学系统的规格，优化和匹配
公开(公告)号：US20090306921A1
公开(公告)日：2009-12-10
申请号：US12421996
申请日：2009-04-10
申请人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
发明人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
IPC分类号： G01M11/02 , G06F19/00
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译：本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

52. 发明授权

US07728975B1 Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus 有权
标题翻译：用于描述，评估和改善微光刻投影曝光装置的光学偏振特性的方法
公开(公告)号：US07728975B1
公开(公告)日：2010-06-01
申请号：US11358119
申请日：2006-02-22
申请人： Michael Totzeck , Heiko Feldmann , Daniel Kraehmer , Olaf Dittmann
发明人： Michael Totzeck , Heiko Feldmann , Daniel Kraehmer , Olaf Dittmann
IPC分类号： G01J4/00
CPC分类号： G01J4/04 , G03F7/70508 , G03F7/70566 , G03F7/706
摘要： In a method for describing, evaluating and improving optical polarization properties of a projection objective of a microlithographic projection exposure apparatus, the Jones or Stokes vectors are firstly determined at one or more points in the exit pupil of the projection objective. These are then described at least approximately as a linear superposition of predetermined vector modes with scalar superposition coefficients. The optical polarization properties can subsequently be evaluated on the basis of the superposition coefficients.
摘要翻译：在用于描述，评估和改进微光刻投影曝光装置的投影物镜的光学偏振特性的方法中，首先在投影物镜的出射光瞳的一个或多个点处确定琼斯或斯托克斯矢量。然后将这些描述至少近似为具有标量叠加系数的预定向量模式的线性叠加。随后可以基于叠加系数来评估光学偏振特性。

53. 发明申请

US20070007491A1 Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus 审中-公开
标题翻译：光学元件，特别是用于微光刻投影曝光装置的物镜或照明系统
公开(公告)号：US20070007491A1
公开(公告)日：2007-01-11
申请号：US11414692
申请日：2006-04-28
申请人： Ralf Mueller , Olaf Dittmann , Michael Totzeck , Daniel Kraehmer , Christoph Zaczek , Karl-Heinz Schuster
发明人： Ralf Mueller , Olaf Dittmann , Michael Totzeck , Daniel Kraehmer , Christoph Zaczek , Karl-Heinz Schuster
IPC分类号： C09K19/52
CPC分类号： G02B5/3083 , G02B1/02 , G02B27/281 , G03F7/70966
摘要： The invention concerns an optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus, including a substrate which for light of a predetermined working wavelength which passes through the substrate causes a first retardation between mutually perpendicular polarization states, and a layer which is epitaxially grown on the substrate and which is made from a material with non-cubic crystal structure, which by virtue of natural birefringence causes a second retardation between mutually perpendicular polarization states, which at least partially compensates for the first retardation caused in the substrate.
摘要翻译：本发明涉及一种光学元件，特别是用于微光刻投影曝光设备的物镜或照明系统，该微光刻投影曝光设备包括用于通过基板的预定工作波长的光的基板，引起相互垂直的偏振状态之间的第一延迟，以及在衬底上外延生长并且由具有非立方晶体结构的材料制成的层，其由于天然双折射引起相互垂直的极化状态之间的第二延迟，其至少部分地补偿在底物。

54. 发明授权

US08126669B2 Optimization and matching of optical systems by use of orientation Zernike polynomials 有权
标题翻译：通过使用方位泽尔尼克多项式优化和匹配光学系统
公开(公告)号：US08126669B2
公开(公告)日：2012-02-28
申请号：US12421996
申请日：2009-04-10
申请人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
发明人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
IPC分类号： G01D18/00 , G01B9/00
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译：本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

55. 发明申请

US20100079739A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 有权
标题翻译：投影目标的微观算法
公开(公告)号：US20100079739A1
公开(公告)日：2010-04-01
申请号：US12624993
申请日：2009-11-24
申请人： Aksel Goehnermeier , Daniel Kraehmer , Vladimir Kamenov , Michael Totzeck
发明人： Aksel Goehnermeier , Daniel Kraehmer , Vladimir Kamenov , Michael Totzeck
IPC分类号： G03B27/54
CPC分类号： G03F7/70958 , G03F7/70308 , G03F7/70341 , G03F7/70591 , G03F7/70941
摘要： A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed.
摘要翻译：公开了一种用于微光刻的投影物镜，具有投影物镜的微光刻投影曝光设备，微结构元件的微光刻制造方法以及使用这种制造方法制造的元件。

56. 发明授权

US07474469B2 Arrangement of optical elements in a microlithographic projection exposure apparatus 失效
标题翻译：微光刻投影曝光装置中的光学元件的布置
公开(公告)号：US07474469B2
公开(公告)日：2009-01-06
申请号：US11232606
申请日：2005-09-22
申请人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder , Wolfgang Singer
发明人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder , Wolfgang Singer
IPC分类号： G02B3/12 , G02B3/00
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.
摘要翻译：本发明涉及微光刻投影曝光装置中的光学元件的布置，特别是在微光刻投影曝光装置的投影物镜中。该装置包括刚性第一光学元件，具有第一光学表面的刚性第二光学元件和在相对侧上的第二光学表面和第一液体。第一光学元件具有凹面光学表面。第二光学元件的第一面面对第一光学元件的凹面光学表面。第一液体至少部分地填充第一光学元件和第二光学元件之间的空间。

57. 发明申请

US20060066962A1 Arrangement of optical elements in a microlithographic projection exposure apparatus 失效
公开(公告)号：US20060066962A1
公开(公告)日：2006-03-30
申请号：US11232606
申请日：2005-09-22
申请人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder
发明人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder
IPC分类号： G02B7/02
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.

58. 发明授权

US08605257B2 Projection system with compensation of intensity variations and compensation element therefor 有权
标题翻译：具有强度变化补偿和补偿要素的投影系统
公开(公告)号：US08605257B2
公开(公告)日：2013-12-10
申请号：US11628356
申请日：2005-06-03
申请人： Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer , Guenter Scheible , Sigrid Scheible
发明人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/68
CPC分类号： G02B13/02 , G02B17/0812 , G02B17/0892 , G03F7/70308
摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
摘要翻译：在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

59. 发明申请

US20110242544A1 METHOD AND APPARATUS FOR MEASURING STRUCTURES ON PHOTOLITHOGRAPHY MASKS 有权
标题翻译：用于测量光刻胶掩模结构的方法和装置
公开(公告)号：US20110242544A1
公开(公告)日：2011-10-06
申请号：US13062566
申请日：2009-09-18
申请人： Ulrich Stroessner , Gerd Klose , Michael Totzeck
发明人： Ulrich Stroessner , Gerd Klose , Michael Totzeck
IPC分类号： G01B11/02 , G01B11/14 , G01J4/00
CPC分类号： G03F1/84 , G03F7/70141
摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.
摘要翻译：本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。在这种情况下，控制平台（2）的位置。掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。本发明还涉及一种可以进行这些方法步骤的装置。在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

60. 发明申请

US20110122392A1 MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINATION OPTICAL UNIT 有权
标题翻译：微观照明系统和微观照明光学单元
公开(公告)号：US20110122392A1
公开(公告)日：2011-05-26
申请号：US12974436
申请日：2010-12-21
申请人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
发明人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译：用于微光刻的照明光学单元用照明光照亮物场。该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式