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51. 发明授权

US07388677B2 Optical metrology optimization for repetitive structures 有权
标题翻译：重复结构光学计量优化
公开(公告)号：US07388677B2
公开(公告)日：2008-06-17
申请号：US11061303
申请日：2005-02-18
申请人： Vi Vuong , Junwei Bao , Joerg Bischoff
发明人： Vi Vuong , Junwei Bao , Joerg Bischoff
IPC分类号： G01B11/30 , G01B11/24 , G01B3/22 , G01B13/16 , G01B15/04 , G01B17/06 , G01B21/20
CPC分类号： G01N21/4788 , G01B11/24 , G03F7/70625
摘要： The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top-view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.
摘要翻译：表征晶片中重复结构的顶视图，并且选择表示重复结构的顶视图分布变化的参数。开发了一种光学测量模型，其包括所选择的重复结构的顶视图轮廓参数。优化的光学测量模型用于生成与测量的衍射信号进行比较的模拟衍射信号。

52. 发明申请

US20080115140A1 Allocating processing units to processing clusters to generate simulated diffraction signals 失效
$Allocating processing units to processing clusters to generate simulated diffraction signals$
标题翻译：将处理单元分配到处理簇以产生模拟衍射信号
公开(公告)号：US20080115140A1
公开(公告)日：2008-05-15
申请号：US11525793
申请日：2006-09-22
申请人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
发明人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
IPC分类号： G06F9/50
CPC分类号： G06F9/505
摘要： In allocating processing units, first and second requests for jobs are obtained. First and second numbers of processing units requested are determined. First and second numbers of available processing units are determined. When the first number of available processing units is non-zero, the first number of available number of processing units or the first number of processing units requested is assigned to a first processing cluster. A first processing unit in the first processing cluster is designated as a master node. When the second number of available processing units is non-zero, the second number of available number of processing units or the second number of processing units requested is assigned to a second processing cluster. The first processing unit in the second processing cluster is designated as a slave node. The first and second jobs are assigned to the first and second processing clusters, respectively.
摘要翻译：在分配处理单元时，获得第一和第二个作业请求。确定请求的第一和第二数量的处理单元。确定可用处理单元的第一和第二数量。当第一数量的可用处理单元不为零时，将第一数量的可用处理单元数量或所请求的第一数量的处理单元分配给第一处理簇。第一处理簇中的第一处理单元被指定为主节点。当第二数量的可用处理单元是非零时，将第二数量的可用数量的处理单元或第二数量的处理单元分配给第二处理簇。第二处理簇中的第一处理单元被指定为从节点。第一和第二作业分别分配给第一和第二处理簇。

53. 发明申请

US20080106728A1 Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer 有权
标题翻译：使用偏振反射计连续测量在半导体晶片上形成的结构
公开(公告)号：US20080106728A1
公开(公告)日：2008-05-08
申请号：US11594497
申请日：2006-11-07
申请人： Vi Vuong , Junwei Bao , Manuel Madriaga
发明人： Vi Vuong , Junwei Bao , Manuel Madriaga
IPC分类号： G01N21/00
CPC分类号： G01N21/4788 , G01N21/95607 , G01N2021/8416 , G01N2021/95615
摘要： Structures formed on a semiconductor wafer are consecutively measured by obtaining first and second measured diffraction signals of a first structure and a second structure formed abutting the first structure. The first and second measured diffraction signals were consecutively measured using a polarized reflectometer. The first measured diffraction signal is compared to a first simulated diffraction signal generated using a profile model of the first structure. The profile model has profile parameters that characterize geometries of the first structure. One or more features of the first structure are determined based on the comparison. The second measured diffraction signal is converted to a converted diffraction signal. The converted diffraction signal is compared to the first simulated diffraction signal or a second simulated diffraction signal generated using the same profile model as the first simulated diffraction signal. One or more features of the second structure are determined based on the comparison.
摘要翻译：通过获得与第一结构邻接形成的第一结构和第二结构的第一和第二测量的衍射信号，连续测量形成在半导体晶片上的结构。使用偏振反射计连续测量第一和第二测量的衍射信号。将第一测量的衍射信号与使用第一结构的轮廓模型产生的第一模拟衍射信号进行比较。轮廓模型具有表征第一结构的几何形状的轮廓参数。基于比较确定第一结构的一个或多个特征。第二测量的衍射信号被转换成转换的衍射信号。将转换的衍射信号与第一模拟衍射信号或使用与第一模拟衍射信号相同的轮廓模型产生的第二模拟衍射信号进行比较。基于比较来确定第二结构的一个或多个特征。

54. 发明申请

US20070002337A1 Modeling and measuring structures with spatially varying properties in optical metrology 有权
标题翻译：光学计量学中具有空间变化特性的建模和测量结构
公开(公告)号：US20070002337A1
公开(公告)日：2007-01-04
申请号：US11173198
申请日：2005-07-01
申请人： Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
发明人： Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G03F7/70625
摘要： The profile of a structure having a region with a spatially varying property is modeled using an optical metrology model. A set of profile parameters is defined for the optical metrology model to characterize the profile of the structure. A set of layers is defined for a portion the optical metrology model that corresponds to the region of the structure with the spatially varying property, each layer having a defined height and width. For each layer, a mathematic function that varies across at least a portion of the width of the layer is defined to characterize the spatially varying property within a corresponding layer in the region of the structure.
摘要翻译：使用光学测量模型对具有空间变化特性的区域的结构的轮廓进行建模。为光学测量模型定义了一组轮廓参数，以表征结构轮廓。对于与具有空间变化性质的结构区域对应的光学计量学模型的一部分定义了一组层，每层具有限定的高度和宽度。对于每个层，在层的宽度的至少一部分上变化的数学函数被定义为表征结构区域中相应层内的空间变化特性。

55. 发明申请

US20050209816A1 Optical metrology optimization for repetitive structures 有权
标题翻译：重复结构光学计量优化
公开(公告)号：US20050209816A1
公开(公告)日：2005-09-22
申请号：US11061303
申请日：2005-02-18
申请人： Vi Vuong , Junwei Bao , Joerg Bischoff
发明人： Vi Vuong , Junwei Bao , Joerg Bischoff
IPC分类号： G01B3/22 , G01B11/24
CPC分类号： G01N21/4788 , G01B11/24 , G03F7/70625
摘要： The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top-view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.
摘要翻译：表征晶片中重复结构的顶视图，并且选择表示重复结构的顶视图分布变化的参数。开发了一种光学测量模型，其包括所选择的重复结构的顶视图轮廓参数。优化的光学测量模型用于生成与测量的衍射信号进行比较的模拟衍射信号。

56. 发明授权

US07505148B2 Matching optical metrology tools using spectra enhancement 失效
标题翻译：使用光谱增强匹配光学测量工具
公开(公告)号：US07505148B2
公开(公告)日：2009-03-17
申请号：US11601351
申请日：2006-11-16
申请人： Vi Vuong , Yan Chen , Holger Tuitje
发明人： Vi Vuong , Yan Chen , Holger Tuitje
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/274 , G01N21/4788 , G01N21/93
摘要： Optical metrology tools are matched by obtaining a first set of measured diffraction signals, which was measured using a first optical metrology tool, and a second set of measured diffraction signals, which was measured using a second optical metrology tool. A first spectra-shift offset is generated based on the difference between the first set of measured diffraction signals and the second set of measured diffraction signals. A first noise weighting function for the first optical metrology tool is generated based on measured diffraction signals measured using the first optical metrology tool. A first measured diffraction signal measured using the first optical metrology tool is obtained. A first adjusted diffraction signal is generated by adjusting the first measured diffraction signal using the first spectra-shift offset and the first noise weighting function.
摘要翻译：通过获得使用第一光学测量工具测量的第一组测量的衍射信号和使用第二光学测量工具测量的第二组测量的衍射信号来匹配光学测量工具。基于第一组测量的衍射信号和第二组测量的衍射信号之间的差产生第一光谱偏移偏移。基于使用第一光学测量工具测量的测量的衍射信号，产生用于第一光学测量工具的第一噪声加权函数。获得使用第一光学测量工具测量的第一测量衍射信号。通过使用第一光谱移位偏移和第一噪声加权函数调整第一测量的衍射信号来产生第一调节的衍射信号。

57. 发明授权

US07522294B2 Measuring a process parameter of a semiconductor fabrication process using optical metrology 失效
标题翻译：使用光学测量法测量半导体制造工艺的工艺参数
公开(公告)号：US07522294B2
公开(公告)日：2009-04-21
申请号：US12026485
申请日：2008-02-05
申请人： Hanyou Chu , Vi Vuong , Yan Chen
发明人： Hanyou Chu , Vi Vuong , Yan Chen
IPC分类号： G06F19/00 , H01L21/66
CPC分类号： H01L22/20
摘要： To measure a process parameter of a semiconductor fabrication process, the fabrication process is performed on a first area using a first value of the process parameter. The fabrication process is performed on a second area using a second value of the process parameter. A first measurement of the first area is obtained using an optical metrology tool. A second measurement of the second area is obtained using the optical metrology tool. One or more optical properties of the first area are determined based on the first measurement. One or more optical properties of the second area are determined based on the second measurement. The fabrication process is performed on a third area. A third measurement of the third area is obtained using the optical metrology tool. A third value of the process parameter is determined based on the third measurement and a relationship between the determined optical properties of the first and second areas.
摘要翻译：为了测量半导体制造工艺的工艺参数，使用工艺参数的第一值在第一区域上执行制造工艺。使用过程参数的第二值在第二区域上执行制造过程。使用光学测量工具获得第一区域的第一测量。使用光学测量工具获得第二区域的第二测量。基于第一测量确定第一区域的一个或多个光学性质。基于第二测量来确定第二区域的一个或多个光学特性。制造工艺在第三区域进行。使用光学测量工具获得第三个区域的第三个测量值。基于第三测量和所确定的第一和第二区域的光学特性之间的关系确定过程参数的第三值。

58. 发明申请

US20110307424A1 DETERMINATION OF TRAINING SET SIZE FOR A MACHINE LEARNING SYSTEM 有权
标题翻译：确定机器学习系统的训练尺寸
公开(公告)号：US20110307424A1
公开(公告)日：2011-12-15
申请号：US12813431
申请日：2010-06-10
申请人： Wen Jin , Vi Vuong , Walter Dean Mieher
发明人： Wen Jin , Vi Vuong , Walter Dean Mieher
IPC分类号： G06F15/18
CPC分类号： G06N99/005
摘要： Automated determination of a number of profiles for a training data set to be used in training a machine learning system for generating target function information from modeled profile parameters. In one embodiment, a first principal component analysis (PCA) is performed on a training data set, and a second PCA is performed on a combined data set which includes the training data set and a test data set. A test data set estimate is generated based on the first PCA transform and the second PCA matrix. The size of error between the test data set and the test data set estimate is used to determine whether a number of profiles associated with the training data set is sufficiently large for training a machine learning system to generate a library of spectral information.
摘要翻译：自动确定用于培训机器学习系统用于从建模的轮廓参数生成目标函数信息的训练数据集的轮廓数。在一个实施例中，对训练数据集执行第一主成分分析（PCA），并且对包括训练数据集和测试数据集的组合数据集执行第二PCA。基于第一PCA变换和第二PCA矩阵生成测试数据集估计。测试数据集和测试数据集估计之间的误差大小用于确定与训练数据集相关联的多个简档是否足够大，用于训练机器学习系统以生成光谱信息库。

59. 发明申请

US20080117437A1 Drift compensation for an optical metrology tool 有权
公开(公告)号：US20080117437A1
公开(公告)日：2008-05-22
申请号：US11601038
申请日：2006-11-16
申请人： Vi Vuong , Yan Chen , Holger Tuitje
发明人： Vi Vuong , Yan Chen , Holger Tuitje
IPC分类号： G01B11/24 , G01J1/10
CPC分类号： G01B11/24 , G01B21/045 , G01N21/276 , G01N21/4788 , G01N21/93 , G01N21/956
摘要： Drift in an optical metrology tool is compensated for by obtaining a first measured diffraction signal and a second measured diffraction signal of a first calibration structure mounted on the optical metrology tool. The first and second measured diffraction signals were measured using the optical metrology tool. The second measured diffraction signal was measured later in time than the first measured diffraction signal. A first drift function is generated based on the difference between the first and second measured diffraction signals. A third measured diffraction signal is obtained of a first structure formed on a first wafer using the optical metrology tool. A first adjusted diffraction signal is generated by adjusting the third measured diffraction signal using the first drift function.

60. 发明申请

US20080117411A1 Matching optical metrology tools using spectra enhancement 失效
标题翻译：使用光谱增强匹配光学测量工具
公开(公告)号：US20080117411A1
公开(公告)日：2008-05-22
申请号：US11601351
申请日：2006-11-16
申请人： Vi Vuong , Yan Chen , Holger Tuitje
发明人： Vi Vuong , Yan Chen , Holger Tuitje
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/274 , G01N21/4788 , G01N21/93
摘要： Optical metrology tools are matched by obtaining a first set of measured diffraction signals, which was measured using a first optical metrology tool, and a second set of measured diffraction signals, which was measured using a second optical metrology tool. A first spectra-shift offset is generated based on the difference between the first set of measured diffraction signals and the second set of measured diffraction signals. A first noise weighting function for the first optical metrology tool is generated based on measured diffraction signals measured using the first optical metrology tool. A first measured diffraction signal measured using the first optical metrology tool is obtained. A first adjusted diffraction signal is generated by adjusting the first measured diffraction signal using the first spectra-shift offset and the first noise weighting function.
摘要翻译：通过获得使用第一光学测量工具测量的第一组测量的衍射信号和使用第二光学测量工具测量的第二组测量的衍射信号来匹配光学测量工具。基于第一组测量的衍射信号和第二组测量的衍射信号之间的差产生第一光谱偏移偏移。基于使用第一光学测量工具测量的测量的衍射信号，产生用于第一光学测量工具的第一噪声加权函数。获得使用第一光学测量工具测量的第一测量衍射信号。通过使用第一光谱移位偏移和第一噪声加权函数调整第一测量的衍射信号来产生第一调节的衍射信号。

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