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    • 57. 发明授权
    • Method of manufacturing near field light generating device
    • 制造近场光产生装置的方法
    • US06303402B1
    • 2001-10-16
    • US09604408
    • 2000-06-27
    • Takuji HatanoAkira Sato
    • Takuji HatanoAkira Sato
    • H01L2100
    • G11B7/1387B82Y10/00
    • A method of manufacturing a near field light generating device is provided. A photoresist layer is formed on a transparent layer (123). Then, illumination light (L2) directed from the side of solid immersion lenses (11) passes through first openings (122a) and the transparent layer (123) to reach and expose the photoresist layer. After development of the photoresist layer, exposed parts of the photoresist remain as microscopic resist regions (MR) in positions corresponding to the first openings (122a). After a second opaque layer (124) is formed on the transparent layer (123) and the microscopic resist regions (MR), the microscopic resist regions (MR) are removed by a lift-off method to form second openings (124a) in the second opaque layer (124). The first openings (122a) are thus used as a photomask to form the second openings (124a). Therefore, a large number of microscopic openings (MO) having good product quality are formed accurately and easily as the near field light generating device.
    • 提供一种制造近场光产生装置的方法。 在透明层(123)上形成光致抗蚀剂层。 然后,从固体浸没透镜(11)侧指示的照明光(L2)穿过第一开口(122a)和透明层(123)以到达并暴露光致抗蚀剂层。 在光致抗蚀剂层显影之后,光刻胶的曝光部分在对应于第一开口(122a)的位置上保持为微观抗蚀剂区域(MR)。 在透明层(123)和微观抗蚀剂区域(MR)上形成第二不透明层(124)之后,通过剥离方法去除微观抗蚀剂区域(MR),以形成第二开口(124a) 第二不透明层(124)。 因此,第一开口(122a)用作光掩模以形成第二开口(124a)。 因此,作为近场光产生装置,准确且容易地形成具有良好的产品质量的大量的微小开口(MO)。