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51. 发明授权

US06367129B1 Buckle 有权
标题翻译：扣
公开(公告)号：US06367129B1
公开(公告)日：2002-04-09
申请号：US09508393
申请日：2000-03-13
申请人： Shinji Mori
发明人： Shinji Mori
IPC分类号： A44B1126
CPC分类号： A44B11/2523 , Y10T24/4019 , Y10T24/45623 , Y10T24/45644 , Y10T24/45665
摘要： A buckle is provided in which a number of parts can be reduced and which can reliably maintain a latched state. When a tongue plate is engaged (latched) by a lock plate, presser members of a cam urged by a return spring abut receiving surfaces of the lock plate, and therefore, a latched state cannot be inadvertently released. Further, when the latched state is to be released, by pressing a release button, a claw is pushed such that a cam rotates, and the presser members separate from the receiving surfaces. As a result, the return spring is compressed, and due to elastic force of the return spring, the release button returns to its original position. In this way, because the return spring carries out both the operation of urging the cam and the operation of returning the release button to its original position, the number of parts is reduced.
摘要翻译：提供一种带扣，其中可以减少多个部件并且可以可靠地保持闩锁状态。当舌板通过锁定板接合（锁定）时，由复位弹簧推动的凸轮的压紧件抵靠锁定板的接收表面，因此不能无意地释放闩锁状态。此外，当锁定状态要被释放时，通过按压释放按钮，爪被推动使得凸轮旋转，并且压紧构件与接收表面分离。结果，复位弹簧被压缩，并且由于复位弹簧的弹力，释放按钮返回到其原始位置。这样，由于复位弹簧同时执行推动凸轮的操作和将释放按钮恢复到其初始位置的操作，因此减少了零件数量。

52. 发明授权

US5163709A Preloader 失效
标题翻译： PRELOADER
公开(公告)号：US5163709A
公开(公告)日：1992-11-17
申请号：US670902
申请日：1991-03-18
申请人： Shinji Mori
发明人： Shinji Mori
IPC分类号： B60R22/40 , B60R22/46
CPC分类号： B60R22/4652
摘要： A preloader characteristically comprises the following: a preloader sensor unit comprising an inertial member and an ignition member fixed to a detonator by the movement of the inertial member; in accommodating portion accommodating the preloader sensor unit; a supporting member in which the accommodating portion is installed by the rotation of the accommodating portion, where the accommodating portion is rotated around a direction of the fire of the ignition pin at an optional or predetermined interval of rotative angle from reference position; a display member which is provided on the external surface of the accommodating portion and has a specific positional relationship with the inertial member and displays the positional relationship with the inertial member; and positioning members respectively provided for the accommodating portion and the supporting member for positioning the accommodating portion to the supporting member in relation to the display of the display member. Independent of the axial-directional inclined angle of the winding shaft against the vertical direction of the vehicle body, the inertial member can be set to the predetermined angle merely by adjusting the angle based on the shooting direction of the ignition member in the course of securing the accommodating portion to the supporting member by applying the display member and the positioning member. A common preloader sensor unit can also be made available.
摘要翻译：预加载器特征在于包括：预加载器传感器单元，其包括惯性构件和通过惯性构件的运动固定到雷管的点火构件; 在容纳所述预加载器传感器单元的容纳部中; 支撑构件，其中容纳部分通过容纳部分的旋转而安装，其中容纳部分以与点火开关的火焰相反的方向以与参考位置相对的可选或预定的旋转角度旋转; 显示构件，其设置在所述容纳部的外表面上，并且与所述惯性构件具有特定的位置关系，并且显示与所述惯性构件的位置关系; 以及分别设置用于容纳部分的定位构件和用于相对于显示构件的显示器将容纳部分定位到支撑构件的支撑构件。独立于卷绕轴相对于车体垂直方向的轴向倾斜角度，只有通过在固定过程中基于点火元件的拍摄方向调节角度，才能将惯性构件设定为预定角度通过施加显示构件和定位构件将支撑构件的容纳部分。也可以提供通用的预加载器传感器单元。

53. 发明授权

US4998684A Acceleration sensor for a retractable seat belt 失效
标题翻译：用于可伸缩安全带的加速度传感器
公开(公告)号：US4998684A
公开(公告)日：1991-03-12
申请号：US335491
申请日：1989-04-10
申请人： Shinji Mori
发明人： Shinji Mori
IPC分类号： G01P15/02 , B60R22/40
CPC分类号： B60R22/40
摘要： An acceleration sensor for detecting a horizontal acceleration on the basis of a displacement of the mass bodies is arranged to have a plurality of mass bodies disposed closely to each other. A partition wall is disposed between these mass bodies so that the displacement of the mass bodies in the direction toward the partition wall can be prevented.
摘要翻译：基于质量体的位移检测水平加速度的加速度传感器被布置为具有彼此紧密配置的多个质量体。在这些质量体之间设置有分隔壁，能够防止质量体在朝向分隔壁的方向上的位移。

54. 发明授权

US4993656A Webbing retractor 失效
标题翻译：织带牵开器
公开(公告)号：US4993656A
公开(公告)日：1991-02-19
申请号：US414512
申请日：1989-09-29
申请人： Hiroshi Tsuge , Yasutaka Watanabe , Fuminori Teraoka , Shinji Mori
发明人： Hiroshi Tsuge , Yasutaka Watanabe , Fuminori Teraoka , Shinji Mori
IPC分类号： B60R22/36 , B60R22/34 , B60R22/40 , B60R22/405 , B60R22/48
CPC分类号： B60R22/405 , B60R2022/3419
摘要： A webbing retractor which, when a webbing is drawn out instantaneously, prevents the drawing out of the webbing by operating a lock mechanism. In addition, when a vehicle is decelerated suddenly, the drawing out of the webbing is also instantaneously prevented by causing a pawl to engage with a lock wheel preventing the lock wheel from rotating. The webbing retractor includes a lever which is swung in such a manner as to be movable between a first position in which the pawl is made unengageable with the lock wheel and a second position in which the pawl is made engageable with the lock wheel. The webbing retraction also includes a lever swing member which causes the lever to be located in the first position as the take-up shaft rotates in a webbing taking-up direction and to be situated in the second position as the take-up shaft rotates in a webbing draw-out direction. Accordingly, the pawl is prevented from engaging with the lock wheel at a take-up limit of the webbing.
摘要翻译：一种织带卷收器，当织带立即拉出时，通过操作锁定机构来防止拉出织带。此外，当车辆突然减速时，也可以通过使棘爪与防止锁轮旋转的锁定轮接合来瞬间防止织带的拉出。所述带卷卷收器包括杠杆，所述杠杆以能够在所述棘爪与所述锁定轮不能接合的第一位置和所述棘爪与所述锁定轮啮合的第二位置之间移动的方式摆动。织带收回还包括杠杆摆动构件，当杠杆绕卷绕方向旋转时，杆杆位于第一位置，并且随着卷取轴旋转而位于第二位置织带拉出方向。因此，防止棘爪在织带的卷绕极限处与锁定轮接合。

55. 发明授权

US4711408A Webbing wind-up force limiting apparatus 失效
标题翻译：织带卷绕力限制装置
公开(公告)号：US4711408A
公开(公告)日：1987-12-08
申请号：US2976
申请日：1987-01-13
申请人： Shinji Mori
发明人： Shinji Mori
IPC分类号： B60R22/44
CPC分类号： B60R22/44 , B60R2022/446
摘要： A webbing wind-up force limiting apparatus for use in a webbing retractor wherein a pair of webbing take-up resilient members are connected together through a gear wheel and the webbing wind-up force is reduced by locking the rotation of the gear wheel. The apparatus includes a rotary member whose diameter is enlarged by an inertia member in response to the rotation of the gear wheel when the occupant unfastens the webbing, and a ring which comes into contact with the rotary member when its diameter is enlarged. Accordingly, when the occupant unfastens the webbing, the gear wheel is prevented from rotating rapidly.
摘要翻译：一种用于织带卷收器的织带卷绕力限制装置，其中一对织带卷绕弹性构件通过齿轮连接在一起，并且通过锁定齿轮的旋转来减小织带卷起力。该装置包括旋转构件，当乘员松开织带时，响应于齿轮的旋转，通过惯性构件使其直径扩大，以及当其直径增大时与旋转构件接触的环。因此，当乘员松开织带时，防止齿轮快速旋转。

56. 发明授权

US08860031B2 Non-volatile semiconductor memory device and method of manufacturing the same 有权
标题翻译：非易失性半导体存储器件及其制造方法
公开(公告)号：US08860031B2
公开(公告)日：2014-10-14
申请号：US13423955
申请日：2012-03-19
申请人： Shinji Mori
发明人： Shinji Mori
IPC分类号： H01L27/105 , H01L21/20 , H01L29/78 , H01L29/66 , H01L27/115 , H01L29/792 , H01L21/02
CPC分类号： H01L29/7926 , H01L21/02532 , H01L21/0262 , H01L27/11582 , H01L29/66833
摘要： A non-volatile semiconductor memory device according to an embodiment includes a semiconductor substrate and a transistor provided on the semiconductor substrate. The transistor includes a conductive layer, a gate insulating layer, a semiconductor layer, and an oxidation layer. The conductive layer functions as a gate of the transistor. The gate insulating layer contacts with a side surface of the conductive layer. The semiconductor layer has a side surface sandwiching the gate insulating layer with the conductive layer, extends a direction perpendicular to the semiconductor substrate, and functions as a body of the transistor. The oxidation layer contacts with the other side surface of the semiconductor layer. The semiconductor layer is made of silicon germanium. The oxidation layer is made of a silicon oxide.
摘要翻译：根据实施例的非易失性半导体存储器件包括半导体衬底和设置在半导体衬底上的晶体管。晶体管包括导电层，栅极绝缘层，半导体层和氧化层。导电层用作晶体管的栅极。栅绝缘层与导电层的侧表面接触。半导体层具有将导电层夹在栅极绝缘层上的侧表面，并且垂直于半导体衬底的方向延伸，并用作晶体管本体。氧化层与半导体层的另一侧表面接触。半导体层由硅锗制成。氧化层由氧化硅制成。

57. 发明授权

US08763943B2 Webbing take-up device 有权
标题翻译：织带收卷装置
公开(公告)号：US08763943B2
公开(公告)日：2014-07-01
申请号：US13018752
申请日：2011-02-01
申请人： Takahiro Osaki , Shinji Mori
发明人： Takahiro Osaki , Shinji Mori
IPC分类号： B65H75/48
CPC分类号： B60R22/44
摘要： A webbing take-up device which can improve the workability of the assembly work of a tension reducer is obtained. In this webbing take-up device, a take-up spring unit is arranged closer to the opening side of a case than a reduction spring unit within a case. For this reason, when a clutch is arranged inside the reduction balance spring and the inner end of the reduction balance spring in a spiral direction is locked to a spring case of the clutch, the clutch and the reduction balance spring can be easily and visually recognized from the opening side of the case. Thus, the other end of the reduction balance spring can be easily locked to the spring case.
摘要翻译：可以获得能够提高张力减小器的组装作业的加工性的织带卷取装置。在这种织带卷取装置中，卷取弹簧单元布置成比壳体内的还原弹簧单元更靠近壳体的开口侧。因此，当离合器配置在减速平衡弹簧内部并且减速平衡弹簧的螺旋方向的内端被锁定到离合器的弹簧壳体时，离合器和减速平衡弹簧可以容易地和视觉上识别从外壳的开口侧。因此，减速平衡弹簧的另一端可以容易地锁定到弹簧箱。

58. 发明授权

US08551871B2 Method of fabricating semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US08551871B2
公开(公告)日：2013-10-08
申请号：US13240662
申请日：2011-09-22
申请人： Ichiro Mizushima , Shinji Mori , Masahiko Murano , Tsutomu Sato , Takashi Nakao , Hiroshi Itokawa
发明人： Ichiro Mizushima , Shinji Mori , Masahiko Murano , Tsutomu Sato , Takashi Nakao , Hiroshi Itokawa
IPC分类号： H01L21/20 , H01L21/36
CPC分类号： H01L21/02636 , H01L21/02381 , H01L21/02532 , H01L21/0262
摘要： A method of fabricating a semiconductor device according to one embodiment includes: exposing a surface of a semiconductor substrate to a halogen-containing gas that contains at least one of Si and Ge, the semiconductor substrate being provided with a member comprising an oxide and consisting mainly of Si; and exposing the surface of the semiconductor substrate to an atmosphere containing at least one of a Si-containing gas not containing halogen and a Ge-containing gas not containing halogen after starting exposure of the surface of the semiconductor substrate to the halogen-containing gas, thereby epitaxially growing a crystal film containing at least one of Si and Ge on the surface.
摘要翻译：根据一个实施例的制造半导体器件的方法包括：将半导体衬底的表面暴露于含有Si和Ge中的至少一种的含卤素的气体，所述半导体衬底设置有包含氧化物的构件，主要由的Si; 以及将半导体衬底的表面开始暴露于含卤素气体之后，将半导体衬底的表面暴露于含有不含卤素的含Si气体和不含卤素的含Ge气体中的至少一种的气氛中，从而在表面上外延生长含有Si和Ge中的至少一种的晶体膜。

59. 发明申请

US20120090535A1 Method of Fabricating Semiconductor Device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20120090535A1
公开(公告)日：2012-04-19
申请号：US13240662
申请日：2011-09-22
申请人： Ichiro Mizushima , Shinji Mori , Masahiko Murano , Tsutomu Sato , Takashi Nakao , Hiroshi Itokawa
发明人： Ichiro Mizushima , Shinji Mori , Masahiko Murano , Tsutomu Sato , Takashi Nakao , Hiroshi Itokawa
IPC分类号： C30B25/02
CPC分类号： H01L21/02636 , H01L21/02381 , H01L21/02532 , H01L21/0262
摘要： A method of fabricating a semiconductor device according to one embodiment includes: exposing a surface of a semiconductor substrate to a halogen-containing gas that contains at least one of Si and Ge, the semiconductor substrate being provided with a member comprising an oxide and consisting mainly of Si; and exposing the surface of the semiconductor substrate to an atmosphere containing at least one of a Si-containing gas not containing halogen and a Ge-containing gas not containing halogen after starting exposure of the surface of the semiconductor substrate to the halogen-containing gas, thereby epitaxially growing a crystal film containing at least one of Si and Ge on the surface.
摘要翻译：根据一个实施例的制造半导体器件的方法包括：将半导体衬底的表面暴露于含有Si和Ge中的至少一种的含卤素的气体，所述半导体衬底设置有包含氧化物的构件，主要由的Si; 以及将半导体衬底的表面开始暴露于含卤素气体之后，将半导体衬底的表面暴露于含有不含卤素的含Si气体和不含卤素的含Ge气体中的至少一种的气氛中，从而在表面上外延生长含有Si和Ge中的至少一种的晶体膜。

60. 发明授权

US08043945B2 Method of fabricating semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US08043945B2
公开(公告)日：2011-10-25
申请号：US12401453
申请日：2009-03-10
申请人： Ichiro Mizushima , Shinji Mori , Masahiko Murano , Tsutomu Sato , Takashi Nakao , Hiroshi Itokawa
发明人： Ichiro Mizushima , Shinji Mori , Masahiko Murano , Tsutomu Sato , Takashi Nakao , Hiroshi Itokawa
IPC分类号： H01L21/20 , H01L21/36
CPC分类号： H01L21/02636 , H01L21/02381 , H01L21/02532 , H01L21/0262
摘要： A method of fabricating a semiconductor device according to one embodiment includes: exposing a surface of a semiconductor substrate to a halogen-containing gas that contains at least one of Si and Ge, the semiconductor substrate being provided with a member comprising an oxide and consisting mainly of Si; and exposing the surface of the semiconductor substrate to an atmosphere containing at least one of a Si-containing gas not containing halogen and a Ge-containing gas not containing halogen after starting exposure of the surface of the semiconductor substrate to the halogen-containing gas, thereby epitaxially growing a crystal film containing at least one of Si and Ge on the surface.
摘要翻译：根据一个实施例的制造半导体器件的方法包括：将半导体衬底的表面暴露于含有Si和Ge中的至少一种的含卤素的气体，所述半导体衬底设置有包含氧化物的构件，主要由的Si; 以及将半导体衬底的表面开始暴露于含卤素气体之后，将半导体衬底的表面暴露于含有不含卤素的含Si气体和不含卤素的含Ge气体中的至少一种的气氛中，从而在表面上外延生长含有Si和Ge中的至少一种的晶体膜。

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