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    • 52. 发明申请
    • Plasma Etching Apparatus
    • 等离子蚀刻装置
    • US20110303365A1
    • 2011-12-15
    • US13203191
    • 2010-07-16
    • Takashi YamamotoNaoya Ikemoto
    • Takashi YamamotoNaoya Ikemoto
    • C23F1/08H05H1/24
    • H01J37/32422H01J37/321H01J37/32357
    • The present invention relates to a plasma etching apparatus capable of uniformly etching the entire surface of a substrate regardless of the kind of the substrate. A plasma etching apparatus 1 has a processing chamber 11 in which the outer diameter of an upper chamber 12 is formed smaller than a lower chamber 13 and the upper chamber 12 is provided at the central portion of the top surface of the lower chamber 13, a grounded plate-shaped member 14 which is provided on the ceiling of the lower chamber 13 to divide the inner space of the processing chamber 11 and which has a plurality of through holes 14a penetrating from the top surface to the bottom surface thereof, a platen 16 which is disposed in the lower chamber 13 and on which a substrate K is placed, a gas supply device 20 for supplying an etching gas into the upper chamber 12, plasma generating devices 26, 29 for exciting etching gases in the upper chamber 12 and in the lower chamber 13 into a plasma, respectively, an exhaust device 35 for reducing the pressure within the processing chamber 11, and an RF power supply unit 32 for supplying RF power to the platen 16.
    • 本发明涉及能够均匀地蚀刻基板的整个表面的等离子体蚀刻装置,而与基板的种类无关。 等离子体蚀刻装置1具有处理室11,其中上室12的外径形成为小于下室13,上室12设置在下室13的顶表面的中心部分, 设置在下室13的天花板上以分隔处理室11的内部空间并且具有从顶表面贯穿其底表面的多个通孔14a的接地板状构件14,压板16 其设置在下室13中并且其上放置有基板K的气体供应装置20,用于将蚀刻气体供应到上室12中,等离子体产生装置26,29用于激发上室12中的蚀刻气体 下室13分别成为等离子体,用于减小处理室11内的压力的排气装置35和用于向压板16提供RF功率的RF电源单元32。
    • 59. 发明申请
    • Dental Composition
    • 牙科组成
    • US20090258966A1
    • 2009-10-15
    • US12089334
    • 2006-10-04
    • Satoshi HirayamaTakuji IkemiYasufumi TsuchiyaTatsuya OriTakashi Yamamoto
    • Satoshi HirayamaTakuji IkemiYasufumi TsuchiyaTatsuya OriTakashi Yamamoto
    • A61K6/00C08K3/32
    • A61K6/0023A61K6/033C08L33/00
    • An object of the present invention is to provide a dental composition having excellent adhesive effect and simultaneously not causing microleakage.A dental composition of a first embodiment of the present invention includes (A) an acidic-group containing polymerizable monomer, (B) a polymerizable monomer, (C) a filler comprising poly(meth)acrylate particles, (D) a calcium-containing material including tetracalcium phosphate (TTCP) and dicalcium phosphate (DCP), and (E) a polymerization initiator. The component (A) is contained at 16-70 parts by weight based on a total of 100 parts by weight of (A)+(B). The component (B) is contained at 84-30 parts by weight based on a total of 100 parts by weight of (A)+(B). The component (C) is contained at 0.2-297 parts by weight relative to a total of 100 parts by weight of (A)+(B). The component (D) is contained at 0.2-297 parts by weight relative to a total of 100 parts by weight of (A)+(B).
    • 本发明的目的是提供具有优异粘合效果并同时不引起微渗漏的牙科用组合物。 本发明的第一实施方式的牙科用组合物包含(A)含酸性基的可聚合单体,(B)可聚合单体,(C)包含聚(甲基)丙烯酸酯颗粒的填料,(D)含钙 包括磷酸四钙(TTCP)和磷酸二钙(DCP)的材料和(E)聚合引发剂。 基于(A)+(B)的总计100重量份,组分(A)含量为16-70重量份。 基于总计100重量份的(A)+(B),组分(B)含有84-30重量份。 相对于总计100重量份的(A)+(B),组分(C)的含量为0.2-297重量份。 组分(D)相对于总计100重量份的(A)+(B)为0.2-297重量份。