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51. 发明授权

US4983994A Thermal transfer type printing device 失效
标题翻译：热转印式印刷装置
公开(公告)号：US4983994A
公开(公告)日：1991-01-08
申请号：US412797
申请日：1989-09-26
申请人： Takashi Mori , Eiichi Sasaki
发明人： Takashi Mori , Eiichi Sasaki
IPC分类号： B41J2/36
CPC分类号： B41J2/36
摘要： A printing device suitable for printing on a record medium for use in an overhead projector (OHP) prints at a density controlled as a function of the type of an OHP (transmission type of reflection type) in which the record medium will be used, and/or as a function of the distance from the OHP to the screen. The device can use a transfer printing type print head, in which case the density control can be achieved by means of amplitude or pulse width modulation of the electrical signal energizing the print head or by means of controlling the number or short energization pulses to be applied to the print head.
摘要翻译：适用于在用于高架投影仪（OHP）的记录介质上打印的打印装置以根据将使用记录介质的OHP（透射型反射型）的类型来控制的浓度进行打印，以及 /或作为从OHP到屏幕的距离的函数。该装置可以使用转印印刷型打印头，在这种情况下，密度控制可以通过激励打印头的电信号的幅度或脉冲宽度调制来实现，或通过控制要施加的数量或短激励脉冲到打印头。

52. 发明授权

US4806987A Projection-exposing apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4806987A
公开(公告)日：1989-02-21
申请号：US135377
申请日：1987-12-21
申请人： Takashi Mori , Koichi Matsumoto , Tsutomu Takai , Masaichi Murakami , Kyoichi Suwa
发明人： Takashi Mori , Koichi Matsumoto , Tsutomu Takai , Masaichi Murakami , Kyoichi Suwa
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70475
摘要： A projection-exposing apparatus comprises a projecting optical system for projecting an image of a reticle having a predetermined pattern onto a wafer, and a stage for causing a relative shifting movement between a position of the wafer and a position of the reticle. A first exposure is effected for projecting and exposing the reticle image pattern from the projection optical system in a first area on the wafer and then the stage is shifted by a predetermined amount to effect second exposure for projecting and exposing the reticle image pattern in a second area positioned adjacent to the first area on the wafer thereby the reticle image being projected and exposed onto different areas on the same wafer. The stage causes the relative shifting movement between the reticle and the wafer in such a manner that the reticle image pattern obtained by the first exposure and the reticle image pattern obtained by the second exposure are overlapped with each other on the wafer by a predetermined amount.
摘要翻译：投影曝光装置包括投影光学系统，用于将具有预定图案的掩模版的图像投影到晶片上，以及用于在晶片的位置和光罩之间进行相对移动的台。进行第一曝光以在晶片上的第一区域中投影和曝光来自投影光学系统的标线片图像图案，然后将该台移动预定量，以进行第二次曝光，以在第二曝光中投影和曝光标线图像图案区域定位成与晶片上的第一区域相邻，从而掩模版图像被投影并暴露在同一晶片上的不同区域上。该阶段以这样的方式引起标线片和晶片之间的相对移动运动，使得通过第一曝光获得的标线图像图案和通过第二次曝光获得的标线图像图案在晶片上彼此重叠预定量。

53. 发明授权

US4058523A Bis(benzamido)-benzene derivatives 失效
标题翻译：双（苯甲酰氨基） - 苯衍生物
公开(公告)号：US4058523A
公开(公告)日：1977-11-15
申请号：US723444
申请日：1976-09-15
申请人： Takashi Mori , Sakae Takaku , Nobuhiro Oi , Minoru Shindo , Takeaki Hirano , Shigeyuki Kataoka , Kouji Furuno
发明人： Takashi Mori , Sakae Takaku , Nobuhiro Oi , Minoru Shindo , Takeaki Hirano , Shigeyuki Kataoka , Kouji Furuno
IPC分类号： C07C233/12 , C07D295/12 , C07D295/10 , A61K31/165 , A61K31/535 , C07C103/78
CPC分类号： C07D295/12 , C07C233/12
摘要： Bis(benzamido)-benzene derivatives having various pharmaceutical activities such as activity for preventing and treating peptic ulcer, peripheral vasodilating action, hypotensive activity and analgesic activity and represented by the formula ##STR1## wherein X, Y, Z, R.sub.1, R.sub.2 and R.sub.3 are as defined hereinafter and a process for preparing the same are disclosed.
摘要翻译：具有各种药物活性的双（苯甲酰氨基） - 苯衍生物，例如用于预防和治疗消化性溃疡的活性，外周血管扩张作用，降血压活性和止痛活性，并由式表示，其中X，Y，Z，R 1，R 2和R 3 如下所述，并公开了其制备方法。

54. 发明授权

US09289034B2 Fastener stringer and slide fastener 有权
标题翻译：紧固件纵梁和拉链
公开(公告)号：US09289034B2
公开(公告)日：2016-03-22
申请号：US13884311
申请日：2010-11-10
申请人： Yoshimichi Yamakita , Takashi Mori , Tadahiro Inomata
发明人： Yoshimichi Yamakita , Takashi Mori , Tadahiro Inomata
IPC分类号： A44B19/34 , A44B19/12 , D01D5/253 , B29D5/02
CPC分类号： A44B19/34 , A44B19/12 , B29D5/02 , D01D5/253 , Y10T24/25 , Y10T24/2518
摘要： A continuous fastener element in a fastener stringer has a plurality of fine projections disposed on a circumferential surface of a monofilament continuously along a length direction of the monofilament and a plurality of recesses disposed between the projections. A cross-sectional shape of the projection is curved convexly, and a cross-sectional shape of the recess is curved concavely. A curvature of the convex curved surface of the projections is set to be larger than a curvature of the concave curved surface of the recess in a cross-section of the monofilament. At least the projections disposed on the upper and lower leg parts are twisted with respect to an extension direction of the upper and lower leg parts, and a plurality of the projections disposed on the upper leg part or the lower leg part in a twisted state face the same direction.
摘要翻译：紧固件纵梁中的连续紧固元件具有沿单丝长度方向连续地设置在单丝的圆周表面上的多个细小突起和设置在突起之间的多个凹部。凸起的横截面形状是凸形弯曲的，并且凹部的横截面形状被凹入地弯曲。突起的凸曲面的曲率设定为大于单丝的截面中的凹部的凹曲面的曲率。至少设置在上部和下部腿部上的突起相对于上部和下部腿部的延伸方向扭转，并且多个突起以扭曲状态面设置在上腿部或小腿部上方向相同

55. 发明授权

US09200380B2 Single-crystal manufacturing method and single-crystal manufacturing apparatus 有权
标题翻译：单晶制造方法和单晶制造装置
公开(公告)号：US09200380B2
公开(公告)日：2015-12-01
申请号：US13125899
申请日：2009-10-19
申请人： Suguru Matsumoto , Susumu Sonokawa , Toshiharu Uesugi , Takashi Mori
发明人： Suguru Matsumoto , Susumu Sonokawa , Toshiharu Uesugi , Takashi Mori
IPC分类号： C30B15/30 , C30B29/06 , C30B35/00
CPC分类号： C30B29/06 , C30B15/305 , C30B35/00 , Y10T117/1032 , Y10T117/1072
摘要： The present invention provides a silicon single crystal manufacturing method for manufacturing a single crystal based on a horizontal magnetic field applied CZ method for pulling the single crystal while applying a horizontal magnetic field to a silicon raw material melt accommodated in a quartz crucible by a magnetic field application device, comprising: measuring a center position of the magnetic field generated by the magnetic field application device; and deviating the measured center position of the magnetic field from a pulling member serving as a rotation axis of the single crystal in a horizontal direction within the range of 2 to 14 mm before manufacture of the single crystal and/or during manufacture of the single crystal. As a result, the silicon single crystal manufacturing method and manufacturing apparatus that enable manufacture of a single crystal while suppressing fluctuations in diameter and in oxygen concentration without a variation caused due to characteristics of the apparatus can be provided.
摘要翻译：本发明提供了一种基于水平磁场施加CZ方法制造单晶的硅单晶制造方法，用于在通过磁场对容纳在石英坩埚中的硅原料熔体施加水平磁场的同时拉动单晶应用装置，包括：测量由所述磁场施加装置产生的磁场的中心位置; 并且在制造单晶之前和/或在单晶制造期间，将测量的中心位置偏离作为单晶的旋转轴的拉构件在水平方向上在2至14mm的范围内。结果，可以提供能够在抑制由于设备的特性引起的变化的同时抑制直径和氧浓度的波动的同时制造单晶的硅单晶制造方法和制造装置。

56. 发明授权

US09180653B2 Prepreg production method 有权
标题翻译：预浸料生产方法
公开(公告)号：US09180653B2
公开(公告)日：2015-11-10
申请号：US14354443
申请日：2012-08-28
申请人： Daiki Minamida , Koichi Kawase , Osamu Kuramata , Takashi Mori , Keita Oe
发明人： Daiki Minamida , Koichi Kawase , Osamu Kuramata , Takashi Mori , Keita Oe
IPC分类号： C08J5/24 , G01N21/88 , G01N21/892 , B32B41/00 , G01N21/898 , G01N21/84 , G01N21/94 , B29C70/50 , B29C70/54 , B32B7/06 , B32B29/02 , G01N21/89
CPC分类号： B32B41/00 , B29C70/506 , B29C70/54 , B32B7/06 , B32B29/02 , B32B2041/04 , B32B2250/40 , B32B2255/12 , B32B2255/26 , B32B2262/106 , B32B2305/076 , B32B2305/08 , B32B2305/22 , B32B2307/738 , B32B2307/748 , B32B2313/04 , B32B2363/00 , B32B2377/00 , C08J5/24 , G01N21/8422 , G01N21/88 , G01N21/8806 , G01N21/89 , G01N21/8914 , G01N21/892 , G01N21/8921 , G01N21/898 , G01N21/94 , G01N2021/8472 , G01N2021/8841 , G01N2021/8854 , G01N2021/8861 , G01N2021/8874 , G01N2021/888 , G01N2021/8908 , G01N2021/8925
摘要： Provided is a method of producing prepreg including: inspecting, with an optical device, in a resin sheet made of a release paper and a resin film which is formed by coating the release paper with a resin to be impregnated into a carbon fiber bundle, the surface of the resin film, detecting a defect in the surface of the resin film which would be the cause of a defect in the prepreg to be produced, and judging the type of the detected defect; or inspecting, with an optical device, the surface of the prepreg after the release paper is separated from the prepreg sheet which is formed by impregnating a resin forming the resin film into the carbon fiber bundle, detecting defects in the surface of the prepreg, and judging the type of the detected defect.
摘要翻译：本发明提供一种预浸料坯的制造方法，其特征在于，包括：用光学元件检查由剥离纸制成的树脂片和树脂膜，所述树脂片是通过用浸渍在碳纤维束中的树脂涂布所述剥离纸形成的，树脂膜的表面，检测树脂膜的表面的缺陷，这将导致要生产的预浸料坯的缺陷，并判断检测到的缺陷的类型; 或者在将剥离纸与通过将形成树脂膜的树脂浸渍到碳纤维束中而形成的预浸料片分离后，使用光学装置检查预浸料的表面，检测预浸料坯的表面的缺陷，以及判断检测到的缺陷的类型。

57. 发明授权

US09169583B2 Woven tape for slide fastener 有权
标题翻译：用于拉链的编织带
公开(公告)号：US09169583B2
公开(公告)日：2015-10-27
申请号：US13824455
申请日：2010-09-28
申请人： Takayuki Hasegawa , Takahiro Asami , Takashi Mori , Tutomu Hamatani , Hideki Sato
发明人： Takayuki Hasegawa , Takahiro Asami , Takashi Mori , Tutomu Hamatani , Hideki Sato
IPC分类号： D03D1/00 , A44B19/34
CPC分类号： D03D1/00 , A44B19/34 , A44B19/346 , D10B2501/0631 , Y10T24/25 , Y10T428/24008 , Y10T428/24479 , Y10T442/30
摘要： A woven tape for a slide fastener comprising an element mounting portion and a tape main portion, wherein the tape portion includes warp having a fineness of 30-100 dTex and a weaving density of 100-220 yarns/inch (2.54 cm), weft having a fineness of 60-180 dTex and a weaving density of 30-80 yarns/inch (2.54 cm), and a ratio of the number of yarns in the warp constituting a plain weave structure to the total number of yarns in the warp in the tape main portion is at least 40%. The woven tape for a slide fastener has a low weight and yet a high strength.
摘要翻译：一种用于拉链的编织带，包括元件安装部分和带主体部分，其中带部分包括细度为30-100dTex的经纱，织造密度为100-220纱/英寸（2.54cm），纬纱具有细度为60-180dTex，织造密度为30-80纱/英寸（2.54cm），构成平纹结构的经纱中的纱线数与纱线中的纱线总数之比胶带主要部分至少为40％。用于拉链的编织带具有较低的重量并且还具有高的强度。

58. 发明申请

US20140134542A1 Positive-Type Resist Composition 有权
标题翻译：正型抗蚀剂组合物
公开(公告)号：US20140134542A1
公开(公告)日：2014-05-15
申请号：US14127392
申请日：2012-06-18
申请人： Yoshiharu Terui , Takashi Mori , Haruhiko Komoriya
发明人： Yoshiharu Terui , Takashi Mori , Haruhiko Komoriya
IPC分类号： G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/16
摘要： A positive-type resist composition according to the present invention includes a fluorine-containing aliphatic alcohol, a polymer, a vinyl compound and a photoacid generator, wherein the fluorine-containing aliphatic alcohol is a monohydric C2-C8 aliphatic alcohol in which the number of hydrogen atoms is equal to or less than the number of fluorine atoms. This positive-type resist composition has a small influence on organic materials, such as less dissolution and swelling of the organic materials, and can form a resist film on an organic polymer substrate etc. by a wet application process such that the resulting resist film or resist pattern shows high solvent resistance.
摘要翻译：根据本发明的正型抗蚀剂组合物包括含氟脂族醇，聚合物，乙烯基化合物和光酸产生剂，其中含氟脂族醇是一元C2-C8脂族醇，其中数量为氢原子等于或小于氟原子数。这种正型抗蚀剂组合物对有机材料的影响较小，例如有机材料的溶解和溶胀较小，并且可以通过湿施加工艺在有机聚合物基材等上形成抗蚀剂膜，使得所得的抗蚀剂膜或抗蚀剂图案显示出高耐溶剂性。

59. 发明授权

US08716385B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation 有权
标题翻译：可聚合的含氟单体，氟聚合物，抗蚀剂材料和图案形成方法
公开(公告)号：US08716385B2
公开(公告)日：2014-05-06
申请号：US13139665
申请日：2009-12-03
申请人： Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
发明人： Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
IPC分类号： C09D133/16
CPC分类号： G03F7/038 , C08F20/28 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/004 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10T428/24479
摘要： Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
摘要翻译：公开了由以下通式（1）表示的可聚合的含氟单体。在该式中，R 1表示氢原子，甲基，氟原子或三氟甲基。 n为0或1的整数，m为1〜（3 + n）的整数。 R2和R3各自独立地表示氢原子或保护基。含有通过聚合或共聚单体获得的含氟聚合物的抗蚀剂适用于通过浸渍曝光的微细加工或基于浸渍曝光的双重图案化工艺。

60. 发明申请

US20130004146A1 RECORDING DEVICE AND DUBBING METHOD 审中-公开
标题翻译：记录装置和排液方法
公开(公告)号：US20130004146A1
公开(公告)日：2013-01-03
申请号：US13466540
申请日：2012-05-08
申请人： Yuki Kaneko , Takashi Mori , Katsuya Yuri
发明人： Yuki Kaneko , Takashi Mori , Katsuya Yuri
IPC分类号： H04N5/93 , H04N7/26
CPC分类号： H04N5/765 , H04N19/436 , H04N19/46
摘要： According to at least one embodiment, a transmitting apparatus includes a dividing module configured to divide one recorded content into block data items, encoding modules configured to encode a plurality of block data items divided by the dividing module for the respective block data items, and a transmitting module configured to transmit the plurality of block data items encoded by the encoding modules together with arrangement information indicating a position of content before division by the dividing module with a degree M of parallelization of at least M=1.
摘要翻译：根据至少一个实施例，发送装置包括：分割模块，被配置为将一个记录的内容划分成块数据项，编码模块，被配置为编码由分割模块划分的用于各个块数据项的多个块数据项;以及发送模块，被配置为将所述编码模块编码的所述多个块数据项与由所述划分模块划分的内容的位置指示的并行化程度至少为M = 1的配置信息一起发送。

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