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    • 53. 发明申请
    • Microscope and sample observation method
    • 显微镜和样品观察法
    • US20050190436A1
    • 2005-09-01
    • US10880100
    • 2004-06-30
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru Sakamoto
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru Sakamoto
    • G02B21/00G02B21/33
    • G02B21/0016G02B21/33Y10S359/90
    • For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index no and a thickness to of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index no and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
    • 对于作为检查对象的半导体装置S,提供了图像获取部分1,包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜(SIL)3 装置S到物镜20和离开光轴的待机位置。 然后在两个控制模式中进行观察,该两种控制模式包括SIL 3位于待机位置的第一模式,并且基于第一模式的基板的折射率no和厚度对其执行聚焦和像差校正 半导体器件S和第二模式,其中SIL 3位于插入位置,并且基于衬底的折射率no和厚度t 0 0进行聚焦和像差校正, 和折射率n 1 1,厚度d 1,以及SIL 3的曲率半径R 1 1。 这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。
    • 57. 发明授权
    • Method of fixing flavorant which improves sidestream smoke smell of tobacco and cigarette
    • 固定香味剂的方法,改善烟草和香烟的侧流烟味
    • US06706120B2
    • 2004-03-16
    • US10073420
    • 2002-02-13
    • Masato MiyauchiHideki NagaeHiroshi TanabeHiroaki Nakano
    • Masato MiyauchiHideki NagaeHiroshi TanabeHiroaki Nakano
    • A24B1530
    • A24B15/282A24D1/02
    • A method of fixing a flavorant for improving the small of a sidestream smoke of tobacco. This method includes applying, to tobacco wrapper paper, a tobacco sidestream smoke smell-improving agent including an ethanol or propylene glycol solution of the flavorant added to an emulsion of an ethylene-vinyl acetate copolymer having an ethylene content of 30% by weight or less, the emulsion having a solid content of 10 to 60% by weight, and drying it to fix the flavorant to the wrapper paper. The ethanol solution of the flavorant is added to the emulsion such that an amount of ethanol is 40% by weight or less with respect to 100% by weight of the emulsion, while the propylene glycol of the flavorant is added to the emulsion such that an amount of propylene glycol is 11% by weight or less with respect to 100% by weight of the emulsion.
    • 一种固定用于改善烟草侧流烟雾的香料的方法。 该方法包括向烟草包皮纸施加烟草侧流烟气味改善剂,其包括添加到乙烯含量为30重量%以下的乙烯 - 乙酸乙烯酯共聚物的乳液中的调味剂的乙醇或丙二醇溶液 ,该乳液的固含量为10至60重量%,并将其干燥以将香料固定在包装纸上。 将调味剂的乙醇溶液加入到乳液中,使得相对于100重量%的乳液,乙醇的量为40重量%以下,同时向该乳液中加入调味剂的丙二醇使得 相对于100重量%的乳液,丙二醇的量为11重量%以下。
    • 60. 发明授权
    • Thin film transistor
    • 薄膜晶体管
    • US06512246B1
    • 2003-01-28
    • US09656631
    • 2000-09-07
    • Hiroshi Tanabe
    • Hiroshi Tanabe
    • H01L2904
    • H01L29/66757G02F1/13454H01L27/1281H01L29/78603H01L29/78675
    • In a thin film transistor provided with a metallic layer with a light-shading property and a Si layer formed on an insulating layer, a dent for locally thinning the insulating layer is formed on a portion corresponding to a drain region. When the Si layer is recrystallized by means of a laser light irradiation, the dent serves as a crystalline nucleus formation region in order to recrystallize a particular portion earlier than other portions. Recrystallization of melted Si starts from a periphery of a bottom surface of the dent, hence a Si layer formed of a single crystal or uniformed crystal grains which serves as an active region of the TFT can be obtained.
    • 在设置有具有遮光性的金属层和形成在绝缘层上的Si层的薄膜晶体管中,在对应于漏极区域的部分上形成用于局部变薄绝缘层的凹坑。 当Si层通过激光照射而重结晶时,该凹痕用作结晶核形成区域,以使得比其它部分更早地重结晶特定部分。 熔融Si的再结晶从凹部的底面的周围开始,因此可以获得由作为TFT的有源区域的单晶或均匀晶粒形成的Si层。