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51. 发明授权

US06900888B2 Method and apparatus for inspecting a pattern formed on a substrate 失效
标题翻译：用于检查在基板上形成的图案的方法和装置
公开(公告)号：US06900888B2
公开(公告)日：2005-05-31
申请号：US10650756
申请日：2003-08-29
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01N21/956 , G03F7/20 , G03F9/00 , G01N21/88
CPC分类号： G03F7/7065 , G01N21/95684
摘要： The inventive method and apparatus for detecting defects of a microscopic circuit pattern by imaging the pattern at high resolution comprises an objective lens for imaging the subject pattern, a laser illumination means for illuminating the pupil of the objective lens, means of diminishing the coherency of the laser illumination, an accumulative detector, and means of processing the signal detected by the detector. The method and apparatus are capable of imaging the subject pattern at high sensitivity and high speed based on the illumination by a short wavelength, which is indispensable for the enhancement of resolution, particularly based on a laser light source which is advantageous for practicing, with a resulting image being the same or better in quality as compared with an image resulting from the ordinary discharge tube illumination, whereby it is possible to detect microscopic defects at high sensitivity.
摘要翻译：用于通过以高分辨率对图案进行成像来检测微观电路图案的缺陷的本发明的方法和装置包括用于对被摄体图案进行成像的物镜，用于照射物镜的瞳孔的激光照明装置，降低该物镜的相干性的手段激光照明，累积检测器，以及处理由检测器检测到的信号的装置。该方法和装置能够以高灵敏度和高速度基于短波长的照明来对被摄体图案进行成像，这对于提高分辨率是不可或缺的，特别是基于有利于实践的激光光源与普通放电管照明产生的图像相比，所得到的图像的质量相同或更好，从而可以以高灵敏度检测微观缺陷。

52. 发明授权

US06800859B1 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US06800859B1
公开(公告)日：2004-10-05
申请号：US09473296
申请日：1999-12-28
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21956
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： With a view to provide a method and equipment for detecting a minute circuit pattern with a high resolution, pattern defect detecting equipment is provided, comprising: an ultraviolet laser source; coherence reducing means for reducing the coherence of the ultraviolet laser beam emitted from this ultraviolet laser source; projecting means for projecting the ultraviolet laser beam passing through this coherence reducing means on a pupil of an objecting lens; illuminating means for illuminating a detection field of view in the object uniformly by the ultraviolet laser beam projected on the pupil of the objective lens by this projecting means through the objective lens; image detecting means for detecting an image of the object illuminated almost uniformly by the illuminating means; and detecting means for detecting a defect on the object by comparing image data obtained from the image of the object detected by this image detecting means to image data stored beforehand.
摘要翻译：为了提供用于检测具有高分辨率的微小电路图案的方法和设备，提供了图案缺陷检测设备，包括：紫外激光源; 相干减少装置，用于减少从该紫外激光源发出的紫外激光束的相干性; 投影装置，用于将穿过该相干减少装置的紫外激光束投射在物镜的瞳孔上; 照射装置，用于通过该投影装置通过物镜通过投射在物镜的光瞳上的紫外激光束均匀地照射物体中的检测视场; 图像检测装置，用于检测照明装置几乎均匀地照亮的物体的图像; 以及检测装置，用于通过将从该图像检测装置检测的对象的图像获得的图像数据与预先存储的图像数据进行比较来检测对象上的缺陷。

53. 发明授权

US06690469B1 Method and apparatus for observing and inspecting defects 失效
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US06690469B1
公开(公告)日：2004-02-10
申请号：US09397334
申请日：1999-09-14
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J400
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置，并且使得半导体器件的细线图案之间的对比度差异更大。缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

54. 发明授权

US06556290B2 Defect inspection method and apparatus therefor 有权
公开(公告)号：US06556290B2
公开(公告)日：2003-04-29
申请号：US09797597
申请日：2001-03-05
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01N2100
CPC分类号： G01N21/956
摘要： A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.

55. 发明授权

US06507417B1 Method and apparatus for picking up 2D image of an object to be sensed 失效
标题翻译：拾取被感测物体的2D图像的方法和装置
公开(公告)号：US06507417B1
公开(公告)日：2003-01-14
申请号：US09105222
申请日：1998-06-26
申请人： Hiroshi Makihira , Shunji Maeda , Kenji Oka , Minoru Yoshida , Yasuhiko Nakayama
发明人： Hiroshi Makihira , Shunji Maeda , Kenji Oka , Minoru Yoshida , Yasuhiko Nakayama
IPC分类号： H04N104
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： An image pickup device for sensing a two-dimensional (2D) image while causing a projected image of an object to be sensed being projected onto a linear image sensor to relatively move with respect to the linear image sensor in a direction (V scanning) perpendicular to the internal scan (H scan) direction of the linear image sensor. This device includes a position detector circuit that detects the position of the object to be sensed, and a pixel size modifier circuit for changing or modifying the setup configuration of a pixel size in the V scan direction of the linear image sensor on the basis of a position detection signal indicative of the position of the to-be-sensed object as detected by the position detector circuit. The pixel size modifier circuit is operable based on the object position detection signal to periodically change the interval of H-scanning start pulses of the linear image sensor.
摘要翻译：用于感测二维（2D）图像同时使待检测对象的投影图像投影到线性图像传感器上的图像拾取装置相对于线性图像传感器在垂直方向（V扫描）上相对移动到线性图像传感器的内部扫描（H扫描）方向。该装置包括检测待感测物体的位置的位置检测器电路和用于基于线性图像传感器的V扫描方向改变或修改像素尺寸的设置配置的像素尺寸修正器电路位置检测信号，其指示由位置检测器电路检测到的待感测对象的位置。像素尺寸修正器电路可以基于物体位置检测信号进行操作，以周期性地改变线性图像传感器的H扫描开始脉冲的间隔。

56. 发明授权

US5774222A Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected 失效
标题翻译：半导体衬底的制造方法以及用于检查待检查物体上的图案缺陷的方法和装置
公开(公告)号：US5774222A
公开(公告)日：1998-06-30
申请号：US539886
申请日：1995-10-06
申请人： Shunji Maeda , Yasuhiko Nakayama , Minoru Yoshida , Hitoshi Kubota , Kenji Oka
发明人： Shunji Maeda , Yasuhiko Nakayama , Minoru Yoshida , Hitoshi Kubota , Kenji Oka
IPC分类号： G01N21/95 , G01N21/956 , G01N21/88
CPC分类号： G01N21/8806 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/95615 , G01N2201/0618 , G01N2201/0634
摘要： A pattern detection method and apparatus thereof for inspecting with high resolution a micro fine defect of a pattern on an inspected object and a semiconductor substrate manufacturing method and system for manufacturing semiconductor substrates such as semiconductor wafers with a high yield. A micro fine pattern on the inspected object is inspected by irradiating an annular-looped illumination through an objective lens onto a wafer mounted on a stage, the wafer having micro fine patterns thereon. The illumination light may be circularly or elliptically polarized and controlled according to an image detected on the pupil of the objective lens and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect so that simultaneously, a micro fine defect or defects on the micro fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect which occurs on the pattern.
摘要翻译：一种用于以高分辨率检查被检查物体上的图案的微细缺陷的图案检测方法及其装置以及以高产率制造半导体晶片等半导体基板的半导体基板的制造方法和系统。通过将通过物镜的环形照明照射到安装在台架上的晶片上，检查被检查物体上的微细图案，晶片上具有微细精细图案。照明光可以根据在物镜的光瞳上检测到的图像而被圆形或椭圆偏振并且被控制，并且通过检测来自晶片的反射光来获得图像信号。将图像信号与参考图像信号进行比较，并且检测出显示不一致的图案的一部分作为缺陷，从而同时以高分辨率检测微细微图案或微细图案上的缺陷。此外，通过分析缺陷的原因和在图案上发生的缺陷因素来控制生产线的工艺条件。

57. 发明授权

US08253934B2 Method and apparatus for inspecting a pattern formed on a substrate 有权
标题翻译：用于检查在基板上形成的图案的方法和装置
公开(公告)号：US08253934B2
公开(公告)日：2012-08-28
申请号：US12649898
申请日：2009-12-30
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G03F7/7065 , G01N21/95684
摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.
摘要翻译：将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息。

58. 发明授权

US07916929B2 Defect inspection method and apparatus 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US07916929B2
公开(公告)日：2011-03-29
申请号：US12359452
申请日：2009-01-26
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
摘要翻译：一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并且针对样本的不同部分上的相似图案，以便更紧密地匹配亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。

59. 发明申请

US20090214102A1 DEFECT INSPECTION METHOD AND APPARATUS 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US20090214102A1
公开(公告)日：2009-08-27
申请号：US12359452
申请日：2009-01-26
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
摘要翻译：一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并指示到样本的不同部分上的相似图案，以便更紧密地匹配亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。

60. 发明授权

US07489395B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US07489395B2
公开(公告)日：2009-02-10
申请号：US11518195
申请日：2006-09-11
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/9501 , G01N21/95684 , G01N2021/9513
摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.
摘要翻译：用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性并且用相干减少的狭缝状激光束照射样品。获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

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