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51. 发明申请

US20100104128A1 METHOD AND APPARATUS FOR DETERMINING THE POSITION OF A STRUCTURE ON A CARRIER RELATIVE TO A REFERENCE POINT OF THE CARRIER 有权
标题翻译：用于确定载体相对于载体的参考点的结构位置的方法和装置
公开(公告)号：US20100104128A1
公开(公告)日：2010-04-29
申请号：US12518288
申请日：2007-11-20
申请人： Michael Arnz , Gerd Klose , Michael Totzeck
发明人： Michael Arnz , Gerd Klose , Michael Totzeck
IPC分类号： G06K9/00
CPC分类号： G03F9/7092 , G03F1/84 , G03F7/70625 , G03F9/7088 , G06K9/3216 , G06K9/6203 , G06K2009/3225 , G06T7/74 , G06T2207/30148
摘要： A method is provided for determining the position of a structure on a carrier, relative to a reference point of the carrier, said method comprising the steps of: a) providing an image including a reference structure; b) recording an image of the structure on the carrier by means of a recording device, with a known recording position relative to the reference points; c) superimposing the two images to form one superimposed image; d) determining the image distance of the two structures in the superimposed image; e) shifting the two structures in the superimposed image relative to one another, depending on the determined image distance; f) checking whether the determined image distance is below a predetermined maximum value; wherein, if the image distance is below the maximum value, the method is continued in step g), and, if the image distance is not below the maximum value, steps d)-f) are repeated, taking into account the determined image distance/distances: g) determining the position of the structure relative to the reference point, on the basis of the recording position in step b) and of the image distance/image distances determined in step(s) d).
摘要翻译：提供了一种用于确定载体上的结构相对于载体的参考点的位置的方法，所述方法包括以下步骤：a）提供包括参考结构的图像; b）通过记录装置将结构的图像记录在载体上，具有相对于参考点的已知记录位置; c）叠加两个图像以形成一个叠加的图像; d）确定叠加图像中两个结构的图像距离; e）根据确定的图像距离，相对于彼此移动叠加图像中的两个结构; f）检查确定的图像距离是否低于预定的最大值; 其中，如果图像距离低于最大值，则在步骤g）中继续该方法，并且如果图像距离不低于最大值，则重复步骤d）-f），同时考虑所确定的图像距离 /距离 g）基于步骤b）中的记录位置和步骤（d）中确定的图像距离/图像距离来确定结构相对于参考点的位置。

52. 发明授权

US07535640B2 Imaging system for emulation of a high aperture scanning system 有权
标题翻译：用于高光圈扫描系统仿真的成像系统
公开(公告)号：US07535640B2
公开(公告)日：2009-05-19
申请号：US10923551
申请日：2004-08-20
申请人： Michael Totzeck , Ulrich Stroessner , Joern Greif-Wuestenbecker
发明人： Michael Totzeck , Ulrich Stroessner , Joern Greif-Wuestenbecker
IPC分类号： G02B27/28
CPC分类号： G03F7/70566 , G02B21/002 , G02B27/286 , G03F7/70666
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems is provided. The imaging system for emulating high-aperture scanner systems includes imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. It is possible to examine lithography masks for defects in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems Realistic images of the stepper systems can be generated by emulating the occurring vector effects.
摘要翻译：提供了一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈扫描仪系统的成像系统包括成像光学器件，检测器和评估单元，其中至少一个偏振有源光学元件根据需要在成像光束路径中布置以选择成像光束的不同偏振分量，可以在成像光束路径中引入具有强度衰减功能的光学元件，由检测器接收掩模和/或样品的图像以用于不同偏振的光束分量，并被传送到评估单元进行进一步处理。尽管结构越来越小，成像系统的图像侧数值孔径越来越高，可以检查光刻掩模的缺陷。可以通过仿真出现的矢量效应来生成步进系统的现实图像。

53. 发明申请

US20070182969A1 Method for approximating an influence of an optical system on the state of polarization of optical radiation 有权
标题翻译：近似光学系统对光学辐射极化状态的影响的方法
公开(公告)号：US20070182969A1
公开(公告)日：2007-08-09
申请号：US11703570
申请日：2007-02-07
申请人： Markus Mengel , Michael Totzeck
发明人： Markus Mengel , Michael Totzeck
IPC分类号： G01B9/02
CPC分类号： G01J4/04 , G01J9/02 , G01J9/0215 , G01J2009/0223 , G01M11/02 , G01N21/19 , G01N2021/216 , G03F7/70566 , G03F7/70591
摘要： A method for approximating an influence of an optical system on the state of polarization of optical radiation comprises the steps of providing incoming optical radiation for the optical system in several incoming states of polarization, including at least one incoming state having circularly polarized radiation components; directing the incoming optical radiation onto the optical system; measuring at least one characteristic, including a phase distribution, of a resulting outgoing optical radiation emerging from the optical system with respect to each of the incoming states of polarization; and approximating the influence of the optical system on the state of polarization of optical radiation by evaluating the measured characteristics of the outgoing optical radiation.
摘要翻译：用于近似光学系统对光辐射的偏振状态的影响的方法包括以下步骤：在几个进入的偏振状态中为光学系统提供入射光辐射，包括至少一个具有圆偏振辐射分量的入射状态; 将进入的光辐射引导到光学系统上; 测量相对于所述进入的偏振状态中的每一个的从所述光学系统出射的所得出射光辐射的至少一个特性（包括相位分布）; 并通过评估出射光辐射的测量特性来近似光学系统对光学辐射的偏振状态的影响。

54. 发明申请

US20050243222A1 Optical system of a microlithographic projection exposure apparatus 审中-公开
标题翻译：微光刻投影曝光装置的光学系统
公开(公告)号：US20050243222A1
公开(公告)日：2005-11-03
申请号：US11104101
申请日：2005-04-12
申请人： Manfred Maul , Michael Totzeck , Olaf Dittman , Damian Fiolka
发明人： Manfred Maul , Michael Totzeck , Olaf Dittman , Damian Fiolka
IPC分类号： G02B13/24 , G02B5/30 , G02B13/14 , G02F1/1335 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70966 , G02B5/3083 , G02B13/143 , G03F7/70566
摘要： An optical system, for example an illumination system or a projection objective (10), of a microlithographic projection exposure apparatus contains an optical element (L2, L3) which consists of a birefringent material. A projection light beam (14) formed by linearly polarized light rays passes through the optical element (L2, L3). In order to avoid perturbations of the polarization distribution of the light beam, the birefringent material is aligned such that each light ray entering the material is polarized substantially parallel or substantially perpendicularly to a slow birefringent axis for the respective light ray.
摘要翻译：微光刻投影曝光装置的光学系统例如照明系统或投影物镜（10）包含由双折射材料构成的光学元件（L 2，L 3）。由线偏振光形成的投影光束（14）通过光学元件（L 2，L 3）。为了避免光束的偏振分布的扰动，双折射材料被对准，使得进入材料的每个光线基本上平行或基本垂直于相应光线的慢双折射轴线偏振。

55. 发明授权

US09304405B2 Microlithography illumination system and microlithography illumination optical unit 有权
标题翻译：微光刻照明系统和微光刻照明光学单元
公开(公告)号：US09304405B2
公开(公告)日：2016-04-05
申请号：US12974436
申请日：2010-12-21
申请人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
发明人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译：用于微光刻的照明光学单元用照明光照亮物场。该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。

56. 发明授权

US09134626B2 Microscope and microscopy method for space-resolved measurement of a predetermined structure, in particular a structure of a lithographic mask 有权
标题翻译：用于预定结构的空间分辨测量的显微镜和显微镜方法，特别是光刻掩模的结构
公开(公告)号：US09134626B2
公开(公告)日：2015-09-15
申请号：US12517583
申请日：2007-11-20
申请人： Hans-Juergen Mann , Michael Totzeck , Norbert Kerwien
发明人： Hans-Juergen Mann , Michael Totzeck , Norbert Kerwien
IPC分类号： G02B27/28 , G03F7/20 , G02B21/00 , G02B21/06 , G02B21/16 , G03F1/00
CPC分类号： G03F7/70625 , G02B21/0092 , G02B21/06 , G02B21/16 , G02B27/28 , G02B27/283 , G03F1/0092 , G03F1/84 , G03F7/70616
摘要： A microscope is provided for space-resolved measurement of a predetermined structure. The microscope includes a source of radiation, which emits electromagnetic radiation of a predetermined wavelength, an optical system, which irradiates the electromagnetic radiation onto the structure to be measured and images the structure, irradiated with the electromagnetic radiation, onto a detector. The optical system has two eigen polarization conditions, and the optical system includes a polarization module by which a polarization condition can be set for the electromagnetic radiation of the source of radiation, the polarization conditions corresponding to the eigen polarization conditions.
摘要翻译：提供了用于预定结构的空间分辨测量的显微镜。显微镜包括发射预定波长的电磁辐射的辐射源，将电磁辐射照射到待测量的结构上并将被电磁辐射照射的结构成像到检测器上的光学系统。光学系统具有两个本征极化条件，并且光学系统包括偏振模块，通过该偏振模块可以对辐射源的电磁辐射设置偏振条件，对应于特征极化条件的偏振条件。

57. 发明授权

US08570488B2 Transmitting optical element and objective for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的透射光学元件和物镜
公开(公告)号：US08570488B2
公开(公告)日：2013-10-29
申请号：US11718146
申请日：2005-12-08
申请人： Wilfried Clauss , Michael Totzeck , Gisela Rissmann
发明人： Wilfried Clauss , Michael Totzeck , Werner Mueller-Rissmann
IPC分类号： G03B27/52
CPC分类号： C04B35/443 , C04B35/053 , C04B35/44 , C04B35/6455 , C04B2235/3225 , C04B2235/72 , C04B2235/762 , C04B2235/77 , C04B2235/786 , C04B2235/9646 , G02B1/02 , G03F7/70341 , G03F7/70941 , G03F7/70958
摘要： A transmitting optical element adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material, with the polycrystalline material having crystallites with a cubic crystal structure, and with the mean crystallite size of these crystallites being at least micrometers, and at most micrometers.
摘要翻译：适用于微光刻投影曝光装置的物镜的发射光学元件由多晶材料构成，多晶材料具有立方晶体结构的微晶，并且这些微晶的平均微晶尺寸至少为微米，并且至多微米。

58. 发明授权

US08031326B2 Illumination system or projection lens of a microlithographic exposure system 有权
标题翻译：微光曝光系统的照明系统或投影透镜
公开(公告)号：US08031326B2
公开(公告)日：2011-10-04
申请号：US12042621
申请日：2008-03-05
申请人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
发明人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G02B5/3083 , G02B27/286 , G03F7/70566 , G03F7/70966
摘要： In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.
摘要翻译：在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中，可以将第三取向描述为从第二取向旋转而出现，旋转不对准以围绕光学系统轴旋转90°的角度或其整数倍。

59. 发明申请

US20090306921A1 SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS 有权
标题翻译：通过使用定向ZERNIKE POLYNOMIALS的光学系统的规格，优化和匹配
公开(公告)号：US20090306921A1
公开(公告)日：2009-12-10
申请号：US12421996
申请日：2009-04-10
申请人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
发明人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
IPC分类号： G01M11/02 , G06F19/00
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译：本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

60. 发明授权

US07423727B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07423727B2
公开(公告)日：2008-09-09
申请号：US11041873
申请日：2005-01-25
申请人： Michael Totzeck , Bernd Peter Geh , Skip Miller
发明人： Michael Totzeck , Bernd Peter Geh , Skip Miller
IPC分类号： G03B27/64
CPC分类号： G03F7/70966 , G03F7/70566
摘要： A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a radially varying birefringence.
摘要翻译：光刻设备包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化;衬底台，其被配置为保持衬底;以及投影系统，被配置为将所述光束作为图案投影到基板的目标部分。光刻设备还包括设置在光束的路径中的偏振修正器。偏振调节剂包括具有径向变化的双折射的材料。

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