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    • 52. 发明申请
    • Method of producing thin film magnetic head
    • 制造薄膜磁头的方法
    • US20080087630A1
    • 2008-04-17
    • US11892773
    • 2007-08-27
    • Yuji ItoHiraku HirabayashiYoshiyuki MizoguchiNobuya Oyama
    • Yuji ItoHiraku HirabayashiYoshiyuki MizoguchiNobuya Oyama
    • B44C1/22
    • G11B5/3163G11B5/00826
    • A method of producing a thin film magnetic head includes the steps of: forming a second lower magnetic pole layer in a part on a first lower magnetic pole layer; forming, over the entire wafer surface, an insulating layer so as to be thicker than the thickness of the second lower magnetic pole layer in the stacking direction, the insulating layer being less likely to be etched than the second lower magnetic pole layer; carrying out a planarizing process by CMP on the entire wafer surface until the second lower magnetic pole layer is exposed; forming a concave portion including the second lower magnetic pole layer and the insulating layer by ion beam etching on the entire wafer surface; forming a recording gap layer over the entire wafer surface; and forming a first upper magnetic pole layer in the upper magnetic pole layer so as to fill the concave portion.
    • 一种制造薄膜磁头的方法包括以下步骤:在第一下磁极层的一部分上形成第二下磁极层; 在整个晶片表面上形成绝缘层,以便比层叠方向上的第二下磁极层的厚度厚,绝缘层比第二下磁极层更不易蚀刻; 在整个晶片表面上通过CMP进行平坦化处理,直到第二下磁极层露出; 在整个晶片表面上通过离子束蚀刻形成包括第二下磁极层和绝缘层的凹部; 在整个晶片表面上形成记录间隙层; 以及在所述上磁极层中形成第一上磁极层以填充所述凹部。