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51. 发明申请

US20080173815A1 Electron beam apparatus and device production method using the electron beam apparatus 审中-公开
公开(公告)号：US20080173815A1
公开(公告)日：2008-07-24
申请号：US12068589
申请日：2008-02-08
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： G01N23/00
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.

52. 发明授权

US07109484B2 Sheet beam-type inspection apparatus 有权
标题翻译：片状梁型检查装置
公开(公告)号：US07109484B2
公开(公告)日：2006-09-19
申请号：US10989368
申请日：2004-11-17
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
IPC分类号： H01J37/28 , G01N23/22
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system. Specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.
摘要翻译：诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器。具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达待测基板2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及用于在基板2006上显示或存储缺陷位置的控制系统2017。

53. 发明授权

US07601972B2 Inspection system by charged particle beam and method of manufacturing devices using the system 有权
公开(公告)号：US07601972B2
公开(公告)日：2009-10-13
申请号：US11907097
申请日：2007-10-09
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
IPC分类号： H01J37/18
CPC分类号： G03F7/70616 , G01N23/225 , H01J37/05 , H01J37/06 , H01J37/073 , H01J37/075 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/0435 , H01J2237/057 , H01J2237/06316 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/248 , H01J2237/2482 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.

54. 发明申请

US20070272859A1 Electron beam apparatus and device production method using the electron beam apparatus 有权
标题翻译：电子束装置和使用电子束装置的装置制造方法
公开(公告)号：US20070272859A1
公开(公告)日：2007-11-29
申请号：US11808497
申请日：2007-06-11
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： G01N23/00
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc.. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.
摘要翻译：本发明的目的是提供一种改进的电子束装置，其处理量，精度等得到改进。本发明的电子束装置的特征之一是具有多个光学系统，每个光学系统包括用于用多个一次电子束扫描和照射样品的一次电子光学系统; 用于检测通过用一次电子束照射样品而发射的多个次级光束的检测器装置; 以及用于将二次电子束从样品引导到检测器装置的二次电子光学系统; 全部配置为使得多个光学系统用其一次电子束扫描样品的不同区域，并且检测从各个区域中的每一个发射的各个二次电子束。这是什么使得更高的吞吐量成为可能。为了提供高精度，该装置被配置为使得其光学系统的轴线可以通过各种方法对准和校正像差。

55. 发明授权

US07439502B2 Electron beam apparatus and device production method using the electron beam apparatus 有权
标题翻译：电子束装置和使用电子束装置的装置制造方法
公开(公告)号：US07439502B2
公开(公告)日：2008-10-21
申请号：US11808497
申请日：2007-06-11
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： G01N23/00 , G01N23/22 , H01J37/28 , H01J37/256
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.
摘要翻译：本发明的目的是提供一种改进的电子束装置，其处理量，精度等得到改进。本发明的电子束装置的特征之一是具有多个光学系统，每个光学系统包括用于扫描和照射具有多个一次电子束的样品的初级电子光学系统; 用于检测通过用一次电子束照射样品而发射的多个次级光束的检测器装置; 以及用于将二次电子束从样品引导到检测器装置的二次电子光学系统; 全部配置为使得多个光学系统用其一次电子束扫描样品的不同区域，并且检测从各个区域中的每一个发射的各个二次电子束。这是什么使得更高的吞吐量成为可能。为了提供高精度，该装置被配置为使得其光学系统的轴线可以通过各种方法对准和校正像差。

56. 发明申请

US20080042060A1 Inspection system by charged particle beam and method of manufacturing devices using the system 有权
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US20080042060A1
公开(公告)日：2008-02-21
申请号：US11907097
申请日：2007-10-09
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
IPC分类号： G21K5/02
CPC分类号： G03F7/70616 , G01N23/225 , H01J37/05 , H01J37/06 , H01J37/073 , H01J37/075 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/0435 , H01J2237/057 , H01J2237/06316 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/248 , H01J2237/2482 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.
摘要翻译：检查装置及使用该检查装置的半导体装置的制造方法。检查装置用于诸如晶片的样品的缺陷检查，线宽测量，表面电位测量等。在检查装置中，多个带电粒子从初级光学系统传送到样品，从样品发射的二次带电粒子与主光学系统分离，并通过二次光学系统引入到检测器。在移动样品的同时进行带电粒子的照射。带电粒子的照射点沿着样品的移动方向排列成N行，沿着与其垂直的方向排列成M列。带电粒子的每一列照射点在垂直于样品的移动方向的方向上连续移动预定量。

57. 发明授权

US07244932B2 Electron beam apparatus and device fabrication method using the electron beam apparatus 失效
标题翻译：电子束装置和使用电子束装置的装置制造方法
公开(公告)号：US07244932B2
公开(公告)日：2007-07-17
申请号：US09985323
申请日：2001-11-02
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： H01J37/28 , H01J37/256 , G01N23/22
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.
摘要翻译：本发明的目的是提供一种改进的电子束装置，其处理量，精度等得到改进。本发明的电子束装置的特征之一是具有多个光学系统，每个光学系统包括用于扫描和照射具有多个一次电子束的样品的初级电子光学系统; 用于检测通过用一次电子束照射样品而发射的多个次级光束的检测器装置; 以及用于将二次电子束从样品引导到检测器装置的二次电子光学系统; 全部配置成使得多个光学系统用其一次电子束扫描样品的不同区域，并且检测从各个区域中的每一个发射的各个二次电子束。这是什么使得更高的吞吐量成为可能。为了提供高精度，该装置被配置为使得其光学系统的轴线可以通过各种方法对准和校正像差。

58. 发明申请

US20050092921A1 Sheet beam-type inspection apparatus 有权
标题翻译：片状梁型检查装置
公开(公告)号：US20050092921A1
公开(公告)日：2005-05-05
申请号：US10989368
申请日：2004-11-17
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
IPC分类号： G01N23/225 , G03F1/76 , G03F1/78 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , G21K7/00 , G01N23/00
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system. Specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.
摘要翻译：诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器。具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达待测基板2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及用于在基板2006上显示或存储缺陷位置的控制系统2017。

59. 发明授权

US07297949B2 Inspection system by charged particle beam and method of manufacturing devices using the system 失效
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US07297949B2
公开(公告)日：2007-11-20
申请号：US11528595
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
IPC分类号： H01J37/26 , H01J37/28
CPC分类号： G03F7/70616 , G01N23/225 , H01J37/05 , H01J37/06 , H01J37/073 , H01J37/075 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/0435 , H01J2237/057 , H01J2237/06316 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/248 , H01J2237/2482 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.
摘要翻译：检查装置及使用该检查装置的半导体装置的制造方法。检查装置用于诸如晶片的样品的缺陷检查，线宽测量，表面电位测量等。在检查装置中，多个带电粒子从初级光学系统传送到样品，从样品发射的二次带电粒子与主光学系统分离，并通过二次光学系统引入到检测器。在移动样品的同时进行带电粒子的照射。带电粒子的照射点沿着样品的移动方向排列成N行，沿着与其垂直的方向排列成M列。带电粒子的每一列照射点在垂直于样品的移动方向的方向上连续移动预定量。

60. 发明申请

US20070057186A1 Inspection system by charged particle beam and method of manufacturing devices using the system 失效
公开(公告)号：US20070057186A1
公开(公告)日：2007-03-15
申请号：US11528595
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
IPC分类号： G21K7/00
CPC分类号： G03F7/70616 , G01N23/225 , H01J37/05 , H01J37/06 , H01J37/073 , H01J37/075 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/0435 , H01J2237/057 , H01J2237/06316 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/248 , H01J2237/2482 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.

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