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51. 发明授权

US06803176B2 Methods for forming line patterns in semiconductor substrates 失效
标题翻译：在半导体衬底中形成线图案的方法
公开(公告)号：US06803176B2
公开(公告)日：2004-10-12
申请号：US10227067
申请日：2002-08-23
申请人： Sang-jun Choi , Yool Kang , Joo-tae Moon , Jeong-hee Chung , Sang-gyun Woo
发明人： Sang-jun Choi , Yool Kang , Joo-tae Moon , Jeong-hee Chung , Sang-gyun Woo
IPC分类号： G03F740
CPC分类号： G03F7/40
摘要： A method for forming a fine pattern in a semiconductor substrate, by coating a target layer to be etched on a semiconductor substrate with a resist composition including at least one compound capable of forming a photoresist pattern by a photolithography process, and a free radical initiator. The free radical initiator is capable of being decomposed by a thermal process at a temperature equal to or higher than the glass transition temperature of the at least one compound. A lithography process is performed on the resist compound layer to form a photoresist pattern. The resist compound layer having the photoresist pattern formed therein is heated to a temperature equal to or higher than the glass transition temperature of the at least one compound, and wherein a partial cross-linking reaction in the resist composition occurs.
摘要翻译：一种在半导体衬底中形成精细图案的方法，其中通过用光刻工艺将包含至少一种能形成光致抗蚀剂图案的化合物的抗蚀剂组合物涂覆在半导体衬底上的待蚀刻靶材层和自由基引发剂。自由基引发剂能够在等于或高于至少一种化合物的玻璃化转变温度的温度下被热处理分解。在抗蚀剂化合物层上进行光刻工艺以形成光致抗蚀剂图案。将其中形成有光致抗蚀剂图案的抗蚀剂化合物层加热到等于或高于至少一种化合物的玻璃化转变温度的温度，并且其中发生抗蚀剂组合物中的部分交联反应。

52. 发明授权

US06270942B1 Photosensitive polymer having cyclic backbone and resist composition comprising the same 有权
标题翻译：具有环状骨架的光敏聚合物和包含其的抗蚀剂组合物
公开(公告)号：US06270942B1
公开(公告)日：2001-08-07
申请号：US09539138
申请日：2000-03-30
申请人： Sang-jun Choi
发明人： Sang-jun Choi
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115
摘要： A photosensitive polymer having a cyclic backbone and containing an alicyclic compound and a resist composition obtained therefrom are provided. The photosensitive polymer has a weight-average molecular weight of between about 3,000-100,000 and represented by the following formula: wherein R1, R2 and R5 are independently hydrogen or methyl, R3 is methyl, ethyl, C3 to C20 aliphatic hydrocarbon or alicyclic compound, R4 is hydrogen, hydroxy, hydroxymethyl, carboxylic acid, 2-hydroxyethyloxycarbonyl, tert-butoxycarbonyl or alicyclic compound, R6 is hydrogen atom, 2-hydroxyethyl, tert-butyl, isobornyl, adamantyl, norbornyl or menthyl, l/(l+m+n+p) is between about 0.1-0.5, m/(l+m+n+p) is between about 0.3-0.5, n/(l+m+n+p) is between about 0.0-0.3, and p/(l+m+n+p) is between about 0.0-0.3.
摘要翻译：提供具有环状主链并含有脂环族化合物的光敏聚合物和由其得到的抗蚀剂组合物。感光性聚合物的重均分子量在3000〜10000000之间，由下式表示：其中R1，R2和R5独立地为氢或甲基，R3为甲基，乙基，C3至C20脂族烃或脂环族化合物， R4是氢，羟基，羟甲基，羧酸，2-羟基乙氧基羰基，叔丁氧基羰基或脂环族化合物，R6是氢原子，2-羟乙基，叔丁基，异冰片基，金刚烷基，降冰片基或薄荷基，l /（1 + n + p）在约0.1-0.5之间，m /（1 + m + n + p）在约0.3-0.5之间，n /（1 + m + n + p）在约0.0-0.3之间，（l + m + n + p）在约0.0-0.3之间。

53. 发明授权

US6165680A Dissolution inhibitor of chemically amplified photoresist and chemically amplified photoresist composition containing the same 失效
标题翻译：化学放大光致抗蚀剂的溶解抑制剂和含有它们的化学放大光致抗蚀剂组合物
公开(公告)号：US6165680A
公开(公告)日：2000-12-26
申请号：US234516
申请日：1999-01-21
申请人： Sang-jun Choi
发明人： Sang-jun Choi
IPC分类号： H01L21/027 , C07C69/618 , G03F7/004 , G03F7/039
CPC分类号： C07C69/618 , G03F7/0045 , G03F7/039 , Y10S430/115
摘要： A dissolution inhibitor for use in a chemically amplified photoresist, and a chemically amplified photoresist composition containing the same are provided. The dissolution inhibitor is a compound in which an acid-labile di-alkylmalonate group is combined as a functional group with a C.sub.1 to C.sub.20 hydrocarbon. The chemically amplified photoresist composition containing the dissolution inhibitor has a high contrast and high thermal decomposition temperature, making it suitable for forming a fine pattern having excellent profile.
摘要翻译：提供了用于化学放大光致抗蚀剂的溶解抑制剂和含有该溶解抑制剂的化学放大光致抗蚀剂组合物。溶解抑制剂是其中酸不稳定的二烷基丙二酸酯基团与C1至C20烃结合作为官能团的化合物。含有溶解抑制剂的化学放大型光致抗蚀剂组合物具有高对比度和高热分解温度，使其适合于形成具有优异外形的精细图案。

54. 发明授权

US6051362A Silicon containing polymer and chemically amplified resist composition comprising the same 有权
标题翻译：含硅聚合物和包含其的化学增幅抗蚀剂组合物
公开(公告)号：US6051362A
公开(公告)日：2000-04-18
申请号：US251159
申请日：1999-02-17
申请人： Sang-jun Choi , Joo-tae Moon
发明人： Sang-jun Choi , Joo-tae Moon
IPC分类号： G03F7/039 , C08F210/02 , C08F210/06 , C08F220/12 , C08F226/08 , C08F230/08 , G03F7/004 , G03F7/075 , G03C1/72
CPC分类号： G03F7/0758 , G03F7/0045 , Y10S206/806 , Y10S430/106 , Y10S430/111
摘要： A polymer for use in a chemically amplified photoresist and represented by the following formula: ##STR1## where R' is one selected from the group including: ##STR2## in which R.sub.1 is one selected from the group including --H and --CH.sub.3, m and n are integers, and m/(m+n)=0.1-0.6, and ##STR3##
摘要翻译：一种用于化学放大光致抗蚀剂并由下式表示的聚合物：其中R'为选自以下的基团：其中R 1为选自-H和-CH 3的基团，m和n为整数，和 m /（m + n）= 0.1-0.6，

55. 发明授权

US08551759B2 Oligomer probe array and method of producing the same 失效
标题翻译：低聚物探针阵列及其制备方法
公开(公告)号：US08551759B2
公开(公告)日：2013-10-08
申请号：US11686506
申请日：2007-03-15
申请人： Jung-hwan Hah , Sung-min Chi , Kyoung-seon Kim , Won-sun Kim , Han-ku Cho , Sang-jun Choi , Man-hyoung Ryoo
发明人： Jung-hwan Hah , Sung-min Chi , Kyoung-seon Kim , Won-sun Kim , Han-ku Cho , Sang-jun Choi , Man-hyoung Ryoo
IPC分类号： C12M1/00 , C12M1/34 , C12Q1/68 , G01N33/53 , G01N33/551 , G01N33/552 , G01N33/545 , C07H21/02
CPC分类号： C12Q1/6834 , C12Q2563/155
摘要： An oligomer probe array having improved reaction yield is provided. The oligomer probe array includes a substrate, an immobilization layer on the substrate, a plurality of nano particles coupled with a surface of the immobilization layer, and a plurality of oligomer probes coupled with surfaces of the nano particles.
摘要翻译：提供了具有改善的反应产率的低聚物探针阵列。低聚物探针阵列包括基底，基底上的固定层，与固定层的表面耦合的多个纳米颗粒以及与纳米颗粒表面结合的多个低聚物探针。

56. 发明申请

US20100237312A1 Nonvolatile memory device 有权
标题翻译：非易失性存储器件
公开(公告)号：US20100237312A1
公开(公告)日：2010-09-23
申请号：US12659175
申请日：2010-02-26
申请人： Kwang-soo Seol , Yoon-dong Park , Deok-kee Kim , Sang-jun Choi
发明人： Kwang-soo Seol , Yoon-dong Park , Deok-kee Kim , Sang-jun Choi
IPC分类号： H01L45/00
CPC分类号： H01L27/2445 , H01L27/2436 , H01L27/249 , H01L45/04 , H01L45/06 , H01L45/1226 , H01L45/144 , H01L45/146 , H01L45/147
摘要： The nonvolatile memory device includes at least one pair of first electrode lines, at least one device structure disposed between the at least one pair of first electrode lines and a dielectric layer disposed between the at least one device structure and the at least one pair of first electrode lines. The at least one device structure includes a second electrode line including a first conductive type semiconductor, a resistance changing material layer adjacent to the second electrode line, a channel adjacent to the resistance changing material layer and including a second conductive type semiconductor different from the first conductive type semiconductor and a third electrode line adjacent to the channel and including the first conductive type semiconductor.
摘要翻译：非易失性存储器件包括至少一对第一电极线，设置在至少一对第一电极线之间的至少一个器件结构和设置在该至少一个器件结构与至少一对第一电极线之间的电介质层电极线。所述至少一个器件结构包括第二电极线，所述第二电极线包括第一导电类型半导体，与所述第二电极线相邻的电阻改变材料层，与所述电阻变化材料层相邻的通道，并且包括不同于所述第一导电类型的第一导电型半导体导电型半导体和与沟道相邻的第三电极线，并且包括第一导电型半导体。

57. 发明授权

US07566773B2 Photolabile compound and substrate for oligomer probe array with the same 失效
标题翻译：用于低聚物探针阵列的不稳定化合物和底物相同
公开(公告)号：US07566773B2
公开(公告)日：2009-07-28
申请号：US11686626
申请日：2007-03-15
申请人： Sung-min Chi , Jung-hwan Hah , Kyoung-seon Kim , Won-sun Kim , Sang-jun Choi , Man-hyoung Ryoo
发明人： Sung-min Chi , Jung-hwan Hah , Kyoung-seon Kim , Won-sun Kim , Sang-jun Choi , Man-hyoung Ryoo
IPC分类号： C07H19/00 , C07H21/00
CPC分类号： C07H17/00 , B01J19/0046 , B01J2219/00452 , B01J2219/00454 , B01J2219/00527 , B01J2219/00605 , B01J2219/00648 , B01J2219/00659 , B01J2219/00711 , B01J2219/00722 , B82Y30/00
摘要： Provided is a substrate for an oligomer probe array to which a photolabile material having an acetylene derivative is directly attached or attached via a linker.
摘要翻译：提供了一种用于低聚物探针阵列的基底，具有乙炔衍生物的光不稳定材料通过连接体直接附着或附着于其上。

58. 发明申请

US20080167200A1 BIOCHIP KITS AND METHODS OF TESTING BIOLOGICAL SAMPLES USING THE SAME 审中-公开
标题翻译：生物试剂盒和使用该方法测试生物样品的方法
公开(公告)号：US20080167200A1
公开(公告)日：2008-07-10
申请号：US11959497
申请日：2007-12-19
申请人： Jung-hwan Hah , Sung-min Chi , Kyoung-seon Kim , Won-sun Kim , Sang-jun Choi
发明人： Jung-hwan Hah , Sung-min Chi , Kyoung-seon Kim , Won-sun Kim , Sang-jun Choi
IPC分类号： C40B30/04 , C40B60/12
CPC分类号： B01L3/508 , B01J2219/00659 , B01J2219/00702 , B01L2300/041 , B01L2300/0636 , B01L2300/0822
摘要： The present invention provides a biochip kit including a first housing; a biochip disposed inside the first housing and configured to include a plurality of molecular probes; and a second housing joined to the first housing and configured to form a reaction space with the first housing and to cover the biochip, wherein the second housing and the first housing are removably joined in a configuration to allow exposure of an upper surface of the biochip. Methods of testing biological samples using the biochip kits are also provided.
摘要翻译：本发明提供了一种生物芯片套件，包括：第一壳体; 生物芯片，其设置在所述第一壳体内并且被配置为包括多个分子探针; 以及第二壳体，其被连接到所述第一壳体并且被配置为与所述第一壳体形成反射空间并覆盖所述生物芯片，其中所述第二壳体和所述第一壳体以可配置的方式可移除地接合以允许所述生物芯片的上表面。还提供了使用生物芯片试剂盒测试生物样品的方法。

59. 发明申请

US20080057322A1 Non-Linear Silicon Compound, Method of Manufacturing Oligomer Probe Array Using the Same, Substrate For Oligomer Probe Array With the Same, and Oligomer Probe Array With the Same 失效
标题翻译：非线性硅化合物，使用其的低聚物探针阵列的制造方法，具有相同功能的低聚物探针阵列和具有相同性质的低聚物探针阵列
公开(公告)号：US20080057322A1
公开(公告)日：2008-03-06
申请号：US11835630
申请日：2007-08-08
申请人： Sung-min Chi , Jung-hwan Hah , Kyoung-seon Kim , Won-sun Kim , Sang-jun Choi , Mah-hyoung Ryoo
发明人： Sung-min Chi , Jung-hwan Hah , Kyoung-seon Kim , Won-sun Kim , Sang-jun Choi , Mah-hyoung Ryoo
IPC分类号： B32B9/04 , B05D1/36 , C07D317/46 , C07F7/10
CPC分类号： G01N33/551 , B01J19/0046 , B01J2219/00432 , B01J2219/00497 , B01J2219/00527 , B01J2219/00585 , B01J2219/00596 , B01J2219/00605 , B01J2219/00675 , B01J2219/00677 , B82Y30/00 , C07F7/1804 , G01N33/54353
摘要： A non-linear silicon compound is provided. The non-linear silicon compound may be a non-linear aromatic compound used as a linker for manufacturing an oligomer probe array. The non-linear silicon compound may reduce self-aggregation so as to form a stable and uniform monolayer. As a result, upon hybridization analysis, the fluorescent intensity may be increased.
摘要翻译：提供非线性硅化合物。非线性硅化合物可以是用作制备低聚物探针阵列的连接体的非线性芳族化合物。非线性硅化合物可以减少自聚集，从而形成稳定且均匀的单层。结果，通过杂交分析，可以增加荧光强度。

60. 发明申请

US20080038732A1 Oligomer Probe Array and Method of Producing the Same 失效
标题翻译：低聚物探针阵列及其制备方法
公开(公告)号：US20080038732A1
公开(公告)日：2008-02-14
申请号：US11686506
申请日：2007-03-15
申请人： Jung-Hwan Hah , Sung-min Chi , Kyoung-seon Kim , Won-sun Kim , Han-ku Cho , Sang-jun Choi , Man-hyoung Ryoo
发明人： Jung-Hwan Hah , Sung-min Chi , Kyoung-seon Kim , Won-sun Kim , Han-ku Cho , Sang-jun Choi , Man-hyoung Ryoo
IPC分类号： C12Q1/68 , C07H21/00
CPC分类号： C12Q1/6834 , C12Q2563/155
摘要： An oligomer probe array having improved reaction yield is provided. The oligomer probe array includes a substrate, an immobilization layer on the substrate, a plurality of nano particles coupled with a surface of the immobilization layer, and a plurality of oligomer probes coupled with surfaces of the nano particles.
摘要翻译：提供了具有改善的反应产率的低聚物探针阵列。低聚物探针阵列包括基底，基底上的固定层，与固定层的表面耦合的多个纳米颗粒以及与纳米颗粒的表面耦合的多个低聚物探针。

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