会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 52. 发明申请
    • Method for Determining ACE2 Activity
    • 确定ACE2活性的方法
    • US20100261214A1
    • 2010-10-14
    • US12445906
    • 2007-10-19
    • Hans LoibnerManfred SchusterEvelyne Janzek-Hawlat
    • Hans LoibnerManfred SchusterEvelyne Janzek-Hawlat
    • C12Q1/37
    • G01N33/573C12Q1/37
    • The present invention relates to a method of determining ACE2 activity, comprising the following steps: providing ACE2-binding units immobilized on a solid carrier and specific for a part of ACE2 which is not involved in the catalytic activity of ACE2; contacting the immobilized ACE2-binding units with a sample which potentially includes the ACE2, wherein the ACE2 is bound by the ACE2-binding unit; removing the non-binding portions of the sample from the ACE2 bound to the ACE2-binding units; adding a substrate of the ACE2 which is reacted by the ACE2 activity, with the reaction providing a signal; and measuring the change in the signal during a specific period of time, wherein the change can be correlated with the ACE2 activity.
    • 本发明涉及一种测定ACE2活性的方法,包括以下步骤:提供固定在固体载体上且对ACE2的不参与ACE2催化活性的一部分ACE2特异的ACE2结合单元; 使固定化的ACE2结合单元与潜在地包含ACE2的样品接触,其中ACE2被ACE2结合单元结合; 从与ACE2结合单元结合的ACE2中除去样品的非结合部分; 加入由ACE2活性反应的ACE2底物,反应提供信号; 并测量特定时间段内信号的变化,其中变化可以与ACE2活性相关。
    • 56. 发明授权
    • X-ray analysis apparatus with a graded multilayer mirror
    • 具有渐变多层镜的X射线分析装置
    • US06226349B1
    • 2001-05-01
    • US09356346
    • 1999-07-19
    • Manfred SchusterHerbert GoebelCarsten MichaelsenRuediger Bormann
    • Manfred SchusterHerbert GoebelCarsten MichaelsenRuediger Bormann
    • G01N23207
    • G01N23/201G01N23/20G21K1/062
    • An X-ray analysis apparatus having a curved paraboloid-shaped curved graded multilayer Bragg reflector (5) is characterized in that the layers of the reflector (5) are directly introduced onto a concave curved surface of a paraboloid-shaped hollow substrate and a maximum allowable shape deviation for the concave substrate surface facing the reflector is &Dgr;p={square root over (2px)} &Dgr;&thgr;R, and having a maximum allowable waviness Δ ⁢   ⁢ y Δ ⁢   ⁢ x = 1 2 ⁢ Δθ R and a maximum allowable roughness &Dgr;y=d/2&pgr;, preferentially &Dgr;y≦0.3 nm, wherein the X radiation (7) impinges on the curved surface of the reflector (5) at an angle of incidence 0°
    • 具有弯曲抛物面形弯曲多层布拉格反射体(5)的X射线分析装置的特征在于,将反射器(5)的各层直接导入抛物面形中空基板的凹曲面上, 面向反射器的凹面基板表面的允许形状偏差为DELTAp = {平方根超过(2px)} DELTAthetaR,并且具有最大允许波纹度和最大允许粗糙度DELTAy = d / 2pi,优选为DELTAy <= 0.3nm,其中X 辐射(7)以入射角0°<= 5°撞击反射器(5)的弯曲表面,随着反射器层朝向抛物面开口的周期厚度d在x方向上增加, 偏差DELTAd / DELTAx小于d /(2x)。 以这种方式,在可靠性和寿命方面,分析装置的传输被显着地提高,同时降低了制造难度和费用。