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    • 59. 发明申请
    • LOW LAG TRANSFER GATE DEVICE
    • LOW LAG传输闸门装置
    • US20090180010A1
    • 2009-07-16
    • US12013826
    • 2008-01-14
    • James W. AdkissonAndres BryantJohn J. Ellis-Monaghan
    • James W. AdkissonAndres BryantJohn J. Ellis-Monaghan
    • H04N3/14H01L31/18
    • H01L31/103H04N5/353H04N5/374H04N5/3745
    • A method of forming a CMOS active pixel sensor (APS) cell structure having at least one transfer gate device and method of operation. A first transfer gate device comprises a diodic or split transfer gate conductor structure having a first doped region of first conductivity type material and a second doped region of a second conductivity type material. A photosensing device is formed adjacent the first doped region for collecting charge carriers in response to light incident thereto, and, a diffusion region of a second conductivity type material is formed at or below the substrate surface adjacent the second doped region of the transfer gate device for receiving charges transferred from the photosensing device while preventing spillback of charges to the photosensing device upon timed voltage bias to the diodic or split transfer gate conductor structure. Alternately, an intermediate charge storage device and second transfer gate device may be provided which may first temporarily receive charge carriers from the photosensing device, and, upon activating the second transfer gate device in a further timed fashion, read out the charge stored at the intermediate charge storage device for transfer to the second transfer gate device while preventing spillback of charges to the photosensing device. The APS cell structure is further adapted for a global shutter mode of operation, and further comprises a light shield element is further provided to ensure no light reaches the photosensing and charge storage devices during charge transfer operation.
    • 一种形成具有至少一个传输栅极器件和操作方法的CMOS有源像素传感器(APS)单元结构的方法。 第一传输栅极器件包括具有第一导电类型材料的第一掺杂区域和第二导电类型材料的第二掺杂区域的二极或分裂传输栅极导体结构。 光敏装置形成在第一掺杂区域附近,用于响应于入射到其上的光而收集电荷载流子,并且第二导电类型材料的扩散区域形成在与传输栅极器件的第二掺杂区域相邻的衬底表面处或下方 用于接收从光敏装置转移的电荷,同时防止在针对二极或分离转移栅极导体结构的定时电压偏压时对光敏装置的电荷溢出。 或者,可以提供中间电荷存储装置和第二传输门装置,其可以首先临时从光敏装置接收电荷载体,并且在以另外的定时方式激活第二传输门装置时,读出存储在中间 电荷存储装置,用于传送到第二传输门装置,同时防止电荷向光感器件溢出。 APS单元结构进一步适用于全局快门操作模式,并且进一步包括遮光元件,以在电荷转移操作期间确保没有光到达光敏和电荷存储装置。