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    • 51. 发明申请
    • MONITORING APPARATUS
    • 监控装置
    • US20070293951A1
    • 2007-12-20
    • US11621635
    • 2007-01-10
    • Ichiro TakahashiSeigo KurokawaTakeaki Mishima
    • Ichiro TakahashiSeigo KurokawaTakeaki Mishima
    • G05B15/00
    • H04L43/0817
    • A monitoring apparatus that captures data in a router into a monitoring apparatus to cope with a communication abnormality in a monitoring system that uses the router, a modem, and a network. The monitoring apparatus comprises input modules 343, 345 for being input with a signal from a monitored object 303; a CPU module 341 for processing the signal from the input modules 343, 345; a communication module 342; a data bus 352; and a power module 340. The communication module has two connectors 204, 206 or more each connected to the network; a connection terminal connected to a power supply buss 351; a connection terminal connected to the data bus 352; a memory; and a CPU.
    • 一种监视装置,其将路由器中的数据捕获到监视装置中,以应对使用路由器,调制解调器和网络的监视系统中的通信异常。 监视装置包括用于输入来自被监视对象303的信号的输入模块343,345; 用于处理来自输入模块343,345的信号的CPU模块341; 通信模块342; 数据总线352; 和电源模块340.通信模块具有连接到网络的两个连接器204,206或更多个; 连接到电源总线351的连接端子; 连接到数据总线352的连接终端; 记忆 和一个CPU。
    • 56. 发明授权
    • Heater unit for chemical vapor deposition systems
    • 化学气相沉积系统加热装置
    • US6106628A
    • 2000-08-22
    • US280891
    • 1999-03-29
    • Ichiro Takahashi
    • Ichiro Takahashi
    • C23C16/44C23C16/455C23C16/458C23C16/46H01L21/00H01L21/205C23C16/00
    • C23C16/45508C23C16/4588C23C16/46H01L21/67115
    • In a chemical vapor deposition system, a pair of turntables are vertically disposed opposite to each other, and a plurality of wafers to be processed are arranged circumferentially on opposing surfaces of the turntables. Heater units are arranged behind the turntables, each of the heater units comprising a plurality of concentric grooves defined in a surface of a base behind the corresponding one of the turntables, a heating element received in each of the grooves, a cover plate placed over the grooves so as to seal the interior of the grooves from the exterior of the grooves, and a conduit connected to a vacuum pump for maintaining a higher level of vacuum in the grooves than outside cover plate. Thus, the interior of the grooves is effectively sealed, and intrusion of contaminants into the heater unit can be avoided.
    • 在化学气相沉积系统中,一对转盘垂直设置成彼此相对,并且待处理的多个晶片周向布置在转台的相对表面上。 加热器单元布置在转盘的后面,每个加热器单元包括多个同心槽,该多个同心槽限定在相应一个转盘后面的基座的表面中,加热元件容纳在每个槽中,盖板放置在 凹槽,以便从凹槽的外部密封凹槽的内部,以及连接到真空泵的导管,用于在凹槽中保持比外盖板更高的真空度。 因此,槽的内部被有效地密封,并且可以避免污染物进入加热器单元的侵入。