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    • 52. 发明申请
    • Charged particle beam equipment and charged particle microscopy
    • 带电粒子束设备和带电粒子显微镜
    • US20060151697A1
    • 2006-07-13
    • US11302323
    • 2005-12-14
    • Hiromi InadaMitsugu SatoAtsushi Takane
    • Hiromi InadaMitsugu SatoAtsushi Takane
    • G21K7/00
    • H01J37/28H01J37/222H01J37/265H01J2237/223H01J2237/2826H01J2237/3045
    • On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.
    • 基于从包括通过使带电粒子束偏转预定量而记录的视野的位移的第一标本图像提取的带电粒子束的偏转之前和之后的视场位移的基础上, 通过在通过使用样本的样本放大图像作为放大标准校准的第一倍率捕获样本图像的图像中的光束偏转器,以及在充电的偏转之前和之后的视场位移 从第二标本图像中提取出的粒子束,包括通过使带电粒子束在第二放大倍数下拍摄样本图像的图像中的光束偏转器偏转预定量而记录的视野的位移, 校准第二放大倍数。