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    • 52. 发明授权
    • Multi beam exposing device and exposing method using the same
    • 多光束曝光装置及使用其的曝光方法
    • US07248338B2
    • 2007-07-24
    • US11090150
    • 2005-03-28
    • Takeshi Fukuda
    • Takeshi Fukuda
    • G03B27/54G03B27/72
    • G03B27/72G03B21/13G03F7/70275G03F7/70291G03F7/70358
    • An exposing device including means which has a plurality of pixels and modulates, per pixel, an optical beam irradiated from a light source, for exposing a plotted image on an exposure surface by modulating, per pixel, the plurality of pixels of the modulating means based on image data, the multi beam exposing device comprising: beam position detecting means for detecting exposure point positional information pertaining to an optical beam irradiated on the exposure surface from predetermined pixels to be measured of the modulating means; and positional deviation calculating means for calculating a relative positional deviation between positional information pertaining to the pixels to be measured of the modulating means and exposure point positional information pertaining to each of the optical beams projected at the exposure surface from each of the pixels to be measured detected by the use of the beam position detecting means, based on the two positional informations.
    • 一种曝光装置,包括具有多个像素并且每像素调制从光源照射的光束的装置,用于通过每像素调制调制装置的多个像素来曝光曝光表面上的绘制图像 所述多光束曝光装置包括:光束位置检测装置,用于从所述调制装置的待测定的像素检测与照射在所述曝光表面上的光束有关的曝光点位置信息; 以及位置偏差计算装置,用于计算与待测量的像素相关的位置信息与调制装置的每个被测量的投影在曝光表面上的每个光束的曝光点位置信息之间的相对位置偏差 通过使用光束位置检测装置,基于两个位置信息来检测。
    • 58. 发明授权
    • Alumina particles having high dispersibility and plasticity
    • 氧化铝颗粒具有高分散性和可塑性
    • US06015456A
    • 2000-01-18
    • US697470
    • 1996-08-23
    • Takeshi FukudaRyuichi Shido
    • Takeshi FukudaRyuichi Shido
    • C01F7/02C01F7/44C09C1/40C09C3/06C09D1/00
    • B82Y30/00C01F7/026C01F7/448C09C1/407C09C3/063C01P2002/72C01P2004/03C01P2004/20C01P2004/22C01P2004/32C01P2004/50C01P2004/54C01P2004/61C01P2004/62C01P2006/22Y10T428/2991
    • Alumina particles having high dispersibility and plasticity, at least on the surface of which a phosphoric acid or phosphate is present and suitable for use as a material for pigments for paints, precision abrasives or ceramics. The alumina particles are produced by adding a crystallization inhibitor containing at least phosphate ion to aluminum hydroxide or alumina hydrate and then conducting a hydrothermal synthesis treatment. The amount of the phosphate ion to be added is in the range of 3.0.times.10.sup.-3 to 2.5.times.10.sup.-2 mol per mol of aluminum hydroxide or alumina hydrate. The particle size of aluminum hydroxide or alumina hydrate is 0.1 to 5.0 .mu.m. The hydrothermal synthesis is preferably conducted at 350.degree. C. or above under a pressure of 50 to 200 atm and at a temperature elevation rate of 50.degree. C./min to 0.3.degree. C./min. The thus obtained alumina is .alpha.-alumina in the form of hexagonal plate single crystal having a particle size of 0.2 to 15 .mu.m, an aspect ratio of 15 to 50 and an isoelectric point at which the zeta-potential is 0 of pH 4 to 8.
    • 氧化铝颗粒具有高分散性和可塑性,至少在其表面上存在磷酸或磷酸盐,并且适合用作涂料,精密磨料或陶瓷颜料的材料。 氧化铝颗粒通过向氢氧化铝或氧化铝水合物中加入至少含有磷酸根离子的结晶抑制剂,然后进行水热合成处理来制备。 磷酸根离子的添加​​量相对于每摩尔氢氧化铝或氧化铝水合物为3.0×10 -3〜2.5×10 -2摩尔。 氢氧化铝或氧化铝水合物的粒径为0.1〜5.0μm。 水热合成优选在50〜200atm的压力和50℃/分钟〜0.3℃/分钟的升温速度下在350℃以上进行。 由此获得的氧化铝是粒径为0.2至15μm,纵横比为15至50的六方板单晶形式的α-氧化铝,ζ电位为0的等电点为pH4至 8。