专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US09003952B2 Swash plate type liquid-pressure rotating device 有权
标题翻译：斜盘式液压旋转装置
公开(公告)号：US09003952B2
公开(公告)日：2015-04-14
申请号：US13054455
申请日：2009-03-13
申请人： Takashi Mori , Hideki Tamashima
发明人： Takashi Mori , Hideki Tamashima
IPC分类号： F04B1/12 , F04B1/20 , F04B1/32
CPC分类号： F04B1/128 , F04B1/2014 , F04B1/2085 , F04B1/324 , F05C2251/10 , F05C2253/24
摘要： To improve productivity and increase seizing resistance and abrasion resistance of a sliding surface of a tilt adjustment cylinder, a plurality of pistons are arranged cirumferentially in a cylinder block configured to rotate with a rotating shaft. Tip end portions of the pistons slide along the swash plate, and the pistons reciprocate. The swash plate is supported to tilt with respect to the rotating shaft. Further, a tilt adjustment driving portion is included. The tilt adjustment driving portion includes tilt adjustment large- and small-diameter cylinder chambers and tilt adjustment large- and small-diameter pistons configured to slide in the cylinder chambers to change the tilt angle of the swash plate. A sliding surface of the inner peripheral surface of each of the cylinder chambers includes a quenched portion formed by quenching using laser light, the sliding surface being a surface on which the tilt adjustment piston slides.
摘要翻译：为了提高倾斜调节滚筒的滑动面的生产率和提高耐咬合性和耐磨性，多个活塞被圆周地布置在构造成与旋转轴一起旋转的气缸体中。活塞的尖端部沿着斜盘滑动，活塞往复运动。支撑斜盘相对于旋转轴倾斜。此外，还包括倾斜调节驱动部。倾斜调节驱动部分包括倾斜调整大直径和小直径的气缸室和倾斜调整的大直径和小直径的活塞，其构造成在气缸室中滑动以改变斜盘的倾斜角。每个气缸室的内周面的滑动表面包括通过使用激光骤冷而形成的淬火部，该滑动表面是倾斜调节活塞在其上滑动的表面。

52. 发明申请

US20140299253A1 PREPREG PRODUCTION METHOD 有权
标题翻译： PREPREG生产方法
公开(公告)号：US20140299253A1
公开(公告)日：2014-10-09
申请号：US14354443
申请日：2012-08-28
申请人： Daiki Minamida , Koichi Kawase , Osamu Kuramata , Takashi Mori , Keita Oe
发明人： Daiki Minamida , Koichi Kawase , Osamu Kuramata , Takashi Mori , Keita Oe
IPC分类号： B32B41/00
CPC分类号： B32B41/00 , B29C70/506 , B29C70/54 , B32B7/06 , B32B29/02 , B32B2041/04 , B32B2250/40 , B32B2255/12 , B32B2255/26 , B32B2262/106 , B32B2305/076 , B32B2305/08 , B32B2305/22 , B32B2307/738 , B32B2307/748 , B32B2313/04 , B32B2363/00 , B32B2377/00 , C08J5/24 , G01N21/8422 , G01N21/88 , G01N21/8806 , G01N21/89 , G01N21/8914 , G01N21/892 , G01N21/8921 , G01N21/898 , G01N21/94 , G01N2021/8472 , G01N2021/8841 , G01N2021/8854 , G01N2021/8861 , G01N2021/8874 , G01N2021/888 , G01N2021/8908 , G01N2021/8925
摘要： Provided is a method of producing prepreg including: inspecting, with an optical device, in a resin sheet made of a release paper and a resin film which is formed by coating the release paper with a resin to be impregnated into a carbon fiber bundle, the surface of the resin film, detecting a defect in the surface of the resin film which would be the cause of a defect in the prepreg to be produced, and judging the type of the detected defect; or inspecting, with an optical device, the surface of the prepreg after the release paper is separated from the prepreg sheet which is formed by impregnating a resin forming the resin film into the carbon fiber bundle, detecting defects in the surface of the prepreg, and judging the type of the detected defect.
摘要翻译：本发明提供一种预浸料坯的制造方法，其特征在于，包括：用光学元件检查由剥离纸制成的树脂片和树脂膜，所述树脂片是通过用浸渍在碳纤维束中的树脂涂布所述剥离纸形成的，树脂膜的表面，检测树脂膜的表面的缺陷，这将导致要生产的预浸料坯的缺陷，并判断检测到的缺陷的类型; 或者在将剥离纸与通过将形成树脂膜的树脂浸渍到碳纤维束中而形成的预浸料片分离后，使用光学装置检查预浸料的表面，检测预浸料坯的表面的缺陷，以及判断检测到的缺陷的类型。

53. 发明申请

US20140233008A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE PRODUCTION METHOD, AND LIGHT POLARIZATION UNIT 有权
标题翻译：照明光学系统，曝光装置，装置生产方法和光偏振装置
公开(公告)号：US20140233008A1
公开(公告)日：2014-08-21
申请号：US14124034
申请日：2011-11-25
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kinya Kato , Takashi Mori
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kinya Kato , Takashi Mori
IPC分类号： G03F7/20 , G02B26/08 , G02B27/28
CPC分类号： G03F7/70191 , G02B26/0816 , G02B26/0833 , G02B27/286 , G03F7/0007 , G03F7/70116 , G03F7/70566
摘要： An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.
摘要翻译：照明光学系统，其利用来自光源的光照射照明物镜表面。照明光学系统包括：空间光调制器，其包括布置在预定平面内的多个光学元件，并分别控制，并且在照明光学系统的照明光瞳中形成光强度分布; 以及偏振单元，其布置在与所述预定平面光学共轭的位置，并且使具有第一和第二部分光束的入射光束偏振到所述偏振单元中，使得所述第一和第二部分光束具有偏振状态彼此不同，并且发射偏振入射光束作为输出光束，其中偏振单元在出射光束的横截面中改变第一和第二部分光束的横截面积之间的比率。

54. 发明授权

US08592508B2 Top coat composition 有权
标题翻译：上衣组合
公开(公告)号：US08592508B2
公开(公告)日：2013-11-26
申请号：US13139641
申请日：2009-12-11
申请人： Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
发明人： Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
IPC分类号： C09D133/16
CPC分类号： G03F7/11 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/2041
摘要： Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R2 or R3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.
摘要翻译：公开了光致抗蚀剂的面漆组合物，其特征在于含有具有由通式（5）表示的重复单元的含氟聚合物。在该式中，R 1表示氢原子，甲基，氟原子或三氟甲基; n表示0或1; m表示1〜（3 + n）的整数。 R 2或R 3表示氢原子或保护基。面漆组合物在显影液中具有适度的溶解度。

55. 发明申请

US20130219674A1 Fastener Stringer, Slide Fastener, and Method for Manufacturing Fastener Stringer 有权
标题翻译：紧固件连接器，滑动紧固件和制造紧固件连接器的方法
公开(公告)号：US20130219674A1
公开(公告)日：2013-08-29
申请号：US13884311
申请日：2010-11-10
申请人： Yoshimichi Yamakita , Takashi Mori , Tadahiro Inomata
发明人： Yoshimichi Yamakita , Takashi Mori , Tadahiro Inomata
IPC分类号： A44B19/34
CPC分类号： A44B19/34 , A44B19/12 , B29D5/02 , D01D5/253 , Y10T24/25 , Y10T24/2518
摘要： In a fastener stringer, a continuous fastener element includes a plurality of fine projections disposed on a circumferential surface of a monofilament continuously along a length direction of the monofilament. Moreover, at least the projections disposed on the upper and lower leg parts are twisted with respect to an extension direction of the upper and lower leg parts, and a plurality of the projections disposed on the upper leg part or the lower leg part a twisted state face the same direction. Due to this, a larger number of projections can appear on an exposed surface of the fastener element, light can be diffused and reflected from these projections, and the luster of the monofilament can be stably reduced or removed. Moreover, it is possible to prevent the strength of the monofilament from locally decreasing and to prevent deterioration of the operability of a slider.
摘要翻译：在紧固件纵梁中，连续的紧固件包括沿着单丝的长度方向连续设置在单丝的圆周表面上的多个细小突起。此外，至少设置在上下腿部上的突起相对于上腿部和下腿部的延伸方向扭转，并且设置在上腿部或小腿部的多个突起为扭转状态面向同一个方向。由此，在拉链元件的暴露表面上可能出现更多的突起，因此可以从这些突起扩散和反射光，并且可以稳定地减少或去除单丝的光泽。此外，可以防止单丝的强度局部减小，并且防止滑块的可操作性的劣化。

56. 发明申请

US20130177734A1 Woven Tape for Slide Fastener 有权
标题翻译：滑轨紧固件编织带
公开(公告)号：US20130177734A1
公开(公告)日：2013-07-11
申请号：US13824455
申请日：2010-09-28
申请人： Takayuki Hasegawa , Takahiro Asami , Takashi Mori , Tutomu Hamatani , Hideki Sato
发明人： Takayuki Hasegawa , Takahiro Asami , Takashi Mori , Tutomu Hamatani , Hideki Sato
IPC分类号： D03D1/00 , A44B19/34
CPC分类号： D03D1/00 , A44B19/34 , A44B19/346 , D10B2501/0631 , Y10T24/25 , Y10T428/24008 , Y10T428/24479 , Y10T442/30
摘要： A woven tape for a slide fastener comprising an element mounting portion and a tape main portion, wherein the tape portion includes warp having a fineness of 30-100 dTex and a weaving density of 100-220 yarns/inch (2.54 cm), weft having a fineness of 60-180 dTex and a weaving density of 30-80 yarns/inch (2.54 cm), and a ratio of the number of yarns in the warp constituting a plain weave structure to the total number of yarns in the warp in the tape main portion is at least 40%. The woven tape for a slide fastener has a low weight and yet a high strength.
摘要翻译：一种用于拉链的编织带，包括元件安装部分和带主体部分，其中带部分包括细度为30-100dTex的经纱，织造密度为100-220纱/英寸（2.54cm），纬纱具有细度为60-180dTex，织造密度为30-80纱/英寸（2.54cm），构成平纹结构的经纱中的纱线数与纱线中的纱线总数之比胶带主要部分至少为40％。用于拉链的编织带具有较低的重量并且还具有高的强度。

57. 发明申请

US20120294690A1 TOOL CUTTING APPARATUS AND TOOL CUTTING METHOD FOR WORKPIECE 有权
标题翻译：工具切割设备和工具切割方法
公开(公告)号：US20120294690A1
公开(公告)日：2012-11-22
申请号：US13469367
申请日：2012-05-11
申请人： Masayuki Kawase , Takashi Mori , Ryoji Tanimoto
发明人： Masayuki Kawase , Takashi Mori , Ryoji Tanimoto
IPC分类号： B23D7/00 , B23D5/00
CPC分类号： B23C3/00 , B23B2222/44 , B23B2222/84 , B23B2226/31 , B23B2250/12 , B23C2222/84 , B23C2226/31 , B23C2250/12 , B23Q11/1061 , H01L21/67092 , Y10T409/50082 , Y10T409/500984
摘要： A tool cutting apparatus includes a chuck table for holding a workpiece, and rotatable cutting means having a cutting tip for cutting the front side of the workpiece. Pure water and an additive are mixed to prepare a cutting fluid, and a cutting fluid nozzle supplies the cutting fluid to the cutting tip and the workpiece held on the chuck table.
摘要翻译：刀具切割装置包括用于保持工件的卡盘台和具有用于切割工件前侧的切削刀片的可旋转切割装置。混合纯水和添加剂以制备切削液，并且切削液喷嘴将切削液供应到切割尖端和保持在卡盘台上的工件。

58. 发明申请

US20120244678A1 SEMICONDUCTOR DEVICE WAFER BONDING METHOD 审中-公开
标题翻译：半导体器件波形焊接方法
公开(公告)号：US20120244678A1
公开(公告)日：2012-09-27
申请号：US13423477
申请日：2012-03-19
申请人： Takashi Mori
发明人： Takashi Mori
IPC分类号： H01L21/762
CPC分类号： H01L24/29 , H01L23/481 , H01L24/11 , H01L24/75 , H01L24/83 , H01L24/94 , H01L25/0657 , H01L25/50 , H01L2224/1184 , H01L2224/16145 , H01L2224/2919 , H01L2224/2929 , H01L2224/73104 , H01L2224/75315 , H01L2224/83101 , H01L2224/83191 , H01L2224/83192 , H01L2224/83193 , H01L2224/83203 , H01L2224/94 , H01L2225/06513 , H01L2225/06541 , H01L2924/07802 , H01L2924/0781 , H01L2924/07811 , H01L2224/81 , H01L2924/00 , H01L2924/0665 , H01L2224/83 , H01L2224/11
摘要： A semiconductor device wafer bonding method bonds a first semiconductor device wafer having a plurality of semiconductor devices with a plurality of projecting electrodes to a second semiconductor device wafer having a plurality of electrodes respectively corresponding to the projecting electrodes of the first semiconductor device wafer. An insulator is applied and fills the spacing between adjacent projecting electrodes. The first semiconductor device wafer is planarized to expose the end surfaces of the projecting electrodes, and the first semiconductor device wafer is bonded to the second semiconductor device wafer with an anisotropic conductor interposed between the projecting electrodes of the first semiconductor device wafer and the electrodes of the second semiconductor device wafer, to thereby respectively connect the electrodes through the anisotropic conductor.
摘要翻译：半导体器件晶片接合方法将具有多个半导体器件的第一半导体器件晶片与多个突起电极接合到具有分别对应于第一半导体器件晶片的突出电极的多个电极的第二半导体器件晶片。施加绝缘体并填充相邻突出电极之间的间隔。第一半导体器件晶片被平坦化以暴露突出电极的端面，并且第一半导体器件晶片被接合到第二半导体器件晶片，其中各向异性导体插入在第一半导体器件晶片的突出电极和电极之间第二半导体器件晶片，从而分别通过各向异性导体连接电极。

59. 发明申请

US20110245395A1 Top Coat Composition 有权
标题翻译：顶层组合
公开(公告)号：US20110245395A1
公开(公告)日：2011-10-06
申请号：US13139641
申请日：2009-12-11
申请人： Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
发明人： Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
IPC分类号： C09D133/16 , C08K5/05
CPC分类号： G03F7/11 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/2041
摘要： Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R2 or R3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.
摘要翻译：公开了光致抗蚀剂的面漆组合物，其特征在于含有具有由通式（5）表示的重复单元的含氟聚合物。在该式中，R 1表示氢原子，甲基，氟原子或三氟甲基; n表示0或1; m表示1〜（3 + n）的整数。 R 2或R 3表示氢原子或保护基。面漆组合物在显影液中具有适度的溶解度。

60. 发明授权

US08025553B2 Back grinding method for wafer 有权
标题翻译：晶圆背磨法
公开(公告)号：US08025553B2
公开(公告)日：2011-09-27
申请号：US12175197
申请日：2008-07-17
申请人： Kazuma Sekiya , Yusuke Kimura , Takashi Mori , Toshiharu Daii
发明人： Kazuma Sekiya , Yusuke Kimura , Takashi Mori , Toshiharu Daii
IPC分类号： B24B1/00
CPC分类号： B24B7/228
摘要： A back grinding method for a wafer includes covering a face-side surface of the wafer with a resin film, and cutting the surface of the resin film to form a flat surface parallel to the face-side surface of the wafer. The wafer is held with the surface of the resin film in contact with a suction surface of a chuck table in a grinding apparatus, and the exposed back-side surface of the wafer is ground. Unevenness in thickness of the resin film is suppressed, whereby the thickness of the wafer subjected to back grinding is made to be uniform.
摘要翻译：用于晶片的背面磨削方法包括用树脂膜覆盖晶片的表面表面，并且切割树脂膜的表面以形成平行于晶片的表面侧表面的平坦表面。将晶片保持在树脂膜的表面与研磨装置中的夹盘的吸入面接触，并且将晶片的暴露的背面表面研磨。抑制树脂膜的厚度不匀，进行后磨削的晶片的厚度均匀。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式