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    • 53. 发明授权
    • Printed antenna and applications thereof
    • 印刷天线及其应用
    • US06753825B2
    • 2004-06-22
    • US10128192
    • 2002-04-23
    • Hung Yu David YangJesus A Castaneda
    • Hung Yu David YangJesus A Castaneda
    • H01Q928
    • H01Q9/285H01Q1/38
    • A printed antenna includes a 1st dipole section and a 2nd dipole section. The 1st dipole section includes a 1st radiation section and a 1st frequency section. The 2nd dipole antenna section includes a 2nd radiation section and a 2nd frequency section. The 1st and 2nd dipole antenna sections are electrically coupled together such that the currents flowing through the 1st and 2nd frequency sections substantially cancel and the current flowing through the 1st and 2nd radiation sections are substantially cumulative for a ½ wavelength antenna. For a full wavelength antenna, 1st and 2nd dipole antenna sections are electrically coupled together such that the currents flowing through the 1st and 2nd frequency sections are substantially cumulative and the current flowing through the 1st and 2nd radiation sections substantially cancel.
    • 印刷天线包括第1偶极子部分和第2个偶极子部分。 第1个偶极子部分包括第1个辐射部分和1个频率部分。 第二二极天线部分包括第二辐射部分和第二频率部分。 第1和第2个偶极天线部分电耦合在一起,使得流过第1和第2频率部分的电流基本上消除,并且流过第1和第2频率部分的电流基本上消失, 辐射部分对于1/2波长天线基本上是累积的。 对于全波长天线,第1和第2个偶极天线部分电耦合在一起,使得流过第1和第2频率部分的电流基本上是累积的,并且流过1 第一和第二辐射段基本上消除。
    • 57. 发明授权
    • Serial analog-to-digital converter using successive comparisons
    • 使用连续比较的串行模数转换器
    • US5801657A
    • 1998-09-01
    • US795497
    • 1997-02-05
    • Boyd FowlerDavid YangAbbas El Gamal
    • Boyd FowlerDavid YangAbbas El Gamal
    • H03M1/12H03M1/46H03M1/38
    • H03M1/123H03M1/46
    • A method for simultaneously performing bit serial analog to digital conversion (ADC) for a potentially very large number of signals is described. The method is ideally suited for performing on chip ADC in area image sensors. In one embodiment, to achieve N-bit precision, the method employs a one-bit comparator per channel (or set of multiplexed channels) and an N-bit DAC. To achieve N bits of precision, 2.sup.N -1 comparisons are sequentially performed. Each comparison is performed by first setting the DAC output to the desired value and then simultaneously comparing each of the pixel values to that value. If a pixel value is greater than the DAC output value, its comparator outputs a one, otherwise it outputs a zero. By appropriately choosing the sequence of comparison values, the pixel values are sequentially generated. In another embodiment, the DAC is omitted and a continuous ramp signal is generated for comparison with the analog input.
    • 描述了用于同时执行位串行模数转换(ADC)用于潜在非常大量信号的方法。 该方法非常适合在区域图像传感器中执行片上ADC。 在一个实施例中,为了实现N位精度,该方法采用每通道(或多路复用通道组)和N位DAC的一位比较器。 为了实现N位精度,依次执行2N-1比较。 通过首先将DAC输出设置为期望值,然后同时将每个像素值与该值进行比较来执行每个比较。 如果像素值大于DAC输出值,则其比较器输出1,否则输出零。 通过适当地选择比较值的顺序,依次生成像素值。 在另一个实施例中,省略了DAC,并且生成连续的斜坡信号以与模拟输入进行比较。
    • 60. 发明授权
    • Organic line width roughness with H2 plasma treatment
    • 有机线宽粗糙度与H2等离子体处理
    • US08298958B2
    • 2012-10-30
    • US12175153
    • 2008-07-17
    • Yoko Y. AdamsDavid Yang
    • Yoko Y. AdamsDavid Yang
    • H01L21/302
    • H01L21/3065H01J37/321H01J37/32449H01L21/0273H01L21/32139
    • A method for reducing very low frequency line width roughness (LWR) in forming etched features in an etch layer disposed below a patterned organic mask is provided. The patterned organic mask is treated to reduce very low frequency line width roughness of the patterned organic mask, comprising flowing a treatment gas comprising H2, wherein the treatment gas has a flow rate and H2 has a flow rate that is at least 50% of the flow rate of the treatment gas, forming a plasma from the treatment gas, and stopping the flow of the treatment gas. The etch layer is etched through the treated patterned organic mask with the reduced very low LWR.
    • 提供了一种在设置在图案化有机掩模下方的蚀刻层中形成蚀刻特征的方法,用于降低极低频线宽粗糙度(LWR)。 图案化的有机掩模被处理以降低图案化的有机掩模的非常低的线宽粗糙度,包括使包含H 2的处理气体流动,其中处理气体具有流速,H 2具有至少50% 处理气体的流量,从处理气体形成等离子体,停止处理气体的流动。 通过经处理的图案化有机掩模蚀刻蚀刻层,其具有降低的非常低的LWR。