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    • 48. 发明申请
    • METHOD FOR FORMING AN ALUMINOSILICATE-ZEOLITE LAYER ON A METAL SUBSTRATE, THE COATED SUBSTRATE AND THE USE THEREOF
    • US20120108415A1
    • 2012-05-03
    • US13254057
    • 2010-03-01
    • Ralph HerrmannWilhelm SchwiegerJurgen Bauer
    • Ralph HerrmannWilhelm SchwiegerJurgen Bauer
    • B01J20/18B01J20/32B01J29/08B01J37/08B01J29/06B01J29/18
    • C23C18/1212B01J20/165B01J20/3238B01J29/06C23C18/1241C23C22/66
    • A method is described for forming an aluminosilicate-zeolite layer on an aluminium-containing substrate which is transferred into an aqueous reaction dispersion containing silicon and optionally aluminium as network-forming elements, wherein, irrespective of whether or not aluminium is present in the aqueous reaction dispersion, the molar ratio of the aluminium in the aqueous reaction dispersion, optionally 0, to the sum of the designated network-forming elements contained in the aqueous reaction dispersion ranges between 0 and about 0.4, the aqueous reaction dispersion containing the aluminium-containing substrate is heated, and aluminium is extracted from the aluminium-containing substrate for the aluminosilicate-zeolite formation process, and the layer of an aluminosilicate-zeolite is formed on the aluminium-containing substrate by in situ direct crystallization. This method is characterized in that a layer of an aluminium-rich aluminosilicate-zeolite having an Si/Al ratio of lower than 5 is formed on the aluminium-containing substrate by introducing into the aqueous reaction dispersion a Si source in an amount sufficient for forming the Si/Al ratio of lower than 5, and an Al source that meets the requirement of the molar substoichiometric value, and the aluminium-containing metal substrate, wherein the pH value of the aqueous reaction dispersion is alkalinized and the layer of the aluminium-rich aluminosilicate-zeolite is crystallized onto the aluminium-containing metal substrate.Advantageous coatings of an aluminium-rich aluminosilicate-zeolite on an aluminium-containing metal substrate are obtained by this method. This product can be provided for advantageous applications, especially in sorption-based fields of application, such as for heterogeneous catalysis, in separation and cleaning processes, in sorption heat pumps, in conjunction with immobilized catalysts and in microreaction technology.