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    • 42. 发明授权
    • Four-fingers RFQ linac structure
    • 四指RFQ线性加速器结构
    • US5113141A
    • 1992-05-12
    • US554797
    • 1990-07-18
    • Donald A. Swenson
    • Donald A. Swenson
    • H01J23/083H05H7/18H05H9/00
    • H05H9/00H01J23/083H05H7/18
    • A new RFQ linac structure extends the useful range of beam velocity by a factor of 2 to 4 and beam energy by a factor of 4 to 16. Four-finger electrodes extend into each accelerating cell and provide quadrupole focusing of beam particles along a beam axis. The finger electrodes of adjacent cells also provide quadrupole acceleration of the beam particles along the beam axis. The finger of adjacent cells are oriented in accordance with a prescribed pattern. The pattern orientation of the fingers provides an additional degree of freedom that allows the periodcity of the focal structure to be independent of the periodicity of the accelerating structure. This makes it possible to double the rf frequency periodically to enhance the acceleration rate while holding the focusing strength constant.
    • 新的RFQ直线加速器结构将光束速度的有用范围扩大了2至4倍,光束能量增加了4至16倍。四指电极延伸到每个加速电池中,并提供沿着光束轴的光束粒子的四极聚焦 。 相邻电池的指状电极还提供沿着光束轴的光束粒子的四极加速度。 相邻单元的手指根据规定的图案取向。 手指的图案取向提供了额外的自由度,其允许焦点结构的周期性与加速结构的周期性无关。 这使得可以周期性地加倍rf频率,以在保持聚焦强度恒定的同时增强加速度。
    • 43. 发明授权
    • Electron discharge devices
    • 电子放电装置
    • US3683235A
    • 1972-08-08
    • US3683235D
    • 1970-07-17
    • EMI LTD
    • PHILLIPS GRAHAMPERRING DUDLEY
    • H01J23/083H01J25/20H01J23/08
    • H01J23/083H01J25/20
    • An electron discharge device includes a cathode for producing electrons, a target for collecting said electrons and an electron focusing system for focusing the electrons from said cathode into a beam directed to said target. The focusing system includes a member having an aperture for the passage of the beam and a charge retaining surface surrounding said aperture on which in operation of the tube unfocused electrons from said cathode impinge, said surface having such a coefficient of secondaryelectron emission for the energy of the cathode electrons under the rated operated conditions of the device that unfocused electrons tend to cause said surface to charge to a potential which will focus said electrons to pass through said aperture.
    • 电子放电装置包括用于产生电子的阴极,用于收集所述电子的靶和用于将来自所述阴极的电子聚焦到指向所述靶的光束的电子聚焦系统。 聚焦系统包括具有用于光束通过的孔的构件和围绕所述孔的电荷保持表面,其中在管的操作中,未将来自所述阴极的电子聚焦,所述表面具有这样的二次电子发射系数 在未被聚焦的电子的器件的额定工作条件下阴极电子的能量倾向于使所述表面充电到将使所述电子聚焦通过所述孔的电位。