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    • 44. 发明申请
    • Exposing method and semiconductor device fabricated by the exposing method
    • 曝光方法和通过曝光方法制造的半导体器件
    • US20030152190A1
    • 2003-08-14
    • US10211309
    • 2002-08-05
    • Mitsubishi Denki Kabushiki Kaisha
    • Hiroshi WatanabeToyoki KitayamaKouji Kise
    • G21K005/00
    • G21K5/02G21K1/06
    • In an exposing method reflecting synchrotron radiation, having a critical wavelength of 8.46 null, emitted from a radiation generator (SR device) having a deflecting magnetic field of 4.5 T and electron acceleration energy of 0.7 GeV twice through rhodium mirrors having an oblique-incidence angle of 1null, transmitting the light through a beryllium window of 20 nullm and through an X-ray mask prepared by forming an X-ray absorber pattern on a diamond mask substrate of 2 nullm in thickness and thereafter irradiating a resist surface provided on a substrate with the light, the resist has a main absorption waveband in the wave range of at least 3 null and not more than 13 null and contains an element generating Auger electrons having energy in the range of at least about 0.51 KeV and not more than 2.6 KeV upon exposure.
    • 在从具有4.5T的偏转磁场和0.7GeV的电子加速能量的辐射发生器(SR装置)发射的具有临时波长8.46的反射同步辐射的曝光方法中,通过具有倾斜入射角 1,将光通过20um的铍窗,并通过在2μm的金刚石掩模基板上形成X射线吸收体图案而制备的X射线掩模,然后将设置在基板上的抗蚀剂表面照射 光,抗蚀剂在至少3并且不大于13的波长范围内具有主吸收波段,并且包含产生具有在暴露后至少约0.51KeV且不超过2.6KeV范围内的能量的俄歇电子的元件
    • 45. 发明授权
    • Charged-particle-beam microlithography methods for exposing a segmented reticle
    • 用于曝光分段掩模版的带电粒子束微光刻法
    • US06573014B2
    • 2003-06-03
    • US09749962
    • 2000-12-27
    • Takeshi YamaguchiShinichi Kojima
    • Takeshi YamaguchiShinichi Kojima
    • G03C500
    • B82Y10/00B82Y40/00G03F7/2037G21K5/02H01J37/3174H01J2237/31764Y10S430/143
    • Charged-particle-beam (CPB) microlithography apparatus and methods are disclosed that employ a segmented reticle in which the pattern defined by the reticle is divided into multiple subfields, and each subfield is subdivided into multiple subregions each constituting a respective “group” of subregions. During exposure of the pattern from the reticle to a sensitive substrate using a charged particle beam, a charged-particle illumination beam is directed in sequence to each of the groups. At each group, the illumination beam is directed to expose the respective subregions in the group in a predetermined order before directing the illumination beam to a subsequent group. Direction of the illumination from one group to the next can be performed using a first deflector, and direction of the illumination beam from one subregion to the next in a group can be performed using a second deflector.
    • 公开了带电粒子束(CPB)微光刻设备和方法,其采用分割的掩模版,其中由掩模版定义的图案被划分为多个子场,并且每个子场被细分成多个子区域,每个子区域构成各个子区域的“组” 。 在使用带电粒子束将图案从掩模版曝光到敏感基板时,带电粒子照射光束依次指向每个组。 在每个组中,照射光束被引导以在将照明光束引导到后续组之前以预定顺序暴露组中的各个子区域。 可以使用第一偏转器执行从一组到下一组的照明方向,并且可以使用第二偏转器来执行从一个子区域到下一个组的照明光束的方向。
    • 46. 发明授权
    • Particulate curing system
    • 颗粒固化体系
    • US06528800B1
    • 2003-03-04
    • US09517772
    • 2000-03-03
    • Jerome A. DzwierzynskiChad RhodesDaniel G. Swanson
    • Jerome A. DzwierzynskiChad RhodesDaniel G. Swanson
    • H01J3720
    • G21K5/02
    • A conveying system (22) transports loose particulate material past a radiation source (200). A feed system (20) discharges particulate material onto the conveying system (22). A pneumatic system with an inlet manifold (14) and tubes (16) provides air through which the particulate material is fluidly transported to the feed system (20). A receiving hopper (24) receives the particulate matter from the conveying system (22). A dump hopper (10) dumps the particulate material into the pneumatic system. A discharge manifold (18) separates the particulate material from air. A metering gate (70) is located at a base of a hopper (69), which controls the layer of particulate material deposited onto said conveyor. A second inlet manifold (26) and tubes (28) adjacent the receiving hopper entrains the particulate material in air. A receiving station (32) receives the particulate material from a second discharge manifold (30).
    • 输送系统(22)将松散的颗粒材料输送通过辐射源(200)。 进料系统(20)将颗粒材料排放到输送系统(22)上。 具有入口歧管(14)和管(16)的气动系统提供空气,通过该空气将颗粒材料流体输送到进料系统(20)。 接收料斗(24)从输送系统(22)接收颗粒物质。 倾倒料斗(10)将颗粒材料倒入气动系统中。 排出歧管(18)将颗粒材料与空气分离。 计量门(70)位于料斗(69)的底部,该料斗控制沉积在所述输送机上的颗粒材料层。 邻近接收料斗的第二入口歧管(26)和管(28)将颗粒材料夹带在空气中。 接收站(32)从第二排放歧管(30)接收颗粒物质。
    • 47. 发明授权
    • Charged particle beam irradiation apparatus and method of irradiation
with charged particle beam
    • 带电粒子束照射装置及带电粒子束照射的方法
    • US06034377A
    • 2000-03-07
    • US69944
    • 1998-04-30
    • Yuehu Pu
    • Yuehu Pu
    • G21K1/093A61N5/10G21K5/02G21K5/04G21K5/10A61N5/00
    • A61N5/1043G21K5/02G21K5/10A61N2005/1087A61N2005/1095
    • A charged particle beam irradiation apparatus includes two electromagnets arranged in series along a direction of an incident axis of a charged particle beam, for deflecting the charged particle beam in opposite directions, an energy modulator including a cylindrical member having a length and a distribution of wall thickness in a circumferential direction, a first rotational drive for rotating the cylindrical member around a rotation axis, and a detector for detecting the angular position of the cylindrical member. The energy modulator is disposed at a downstream side of the scanning electromagnets so that the deflected charged particle beam passes through the rotation axis. The apparatus includes an energy degrader for limiting energy of the charged particle beam, and a second rotational drive for rotating the scanning electromagnets and the energy modulator together around the incident axis of the charged particle beam.
    • 带电粒子束照射装置包括沿着带电粒子束的入射轴的方向串联布置的两个电磁体,用于使带电粒子束沿相反方向偏转,能量调制器包括具有长度和壁分布的圆柱形构件 在圆周方向上的厚度,用于使圆筒形构件围绕旋转轴线旋转的第一旋转驱动器和用于检测圆柱形构件的角位置的检测器。 能量调制器设置在扫描电磁体的下游侧,使得偏转的带电粒子束通过旋转轴。 该装置包括用于限制带电粒子束的能量的能量降解器,以及用于围绕带电粒子束的入射轴旋转扫描电磁体和能量调制器的第二旋转驱动器。
    • 49. 发明授权
    • Apparatus for irradiating flowable material
    • 用于照射可流动材料的装置
    • US3952202A
    • 1976-04-20
    • US479115
    • 1974-06-13
    • Ernst Bosshard
    • Ernst Bosshard
    • G21K5/10C02F1/30G21K5/02H01J37/00
    • G21K5/02C02F1/30
    • The radiation sources of the mobile irradiation apparatus are mounted in a carrier which is mounted at the top of the irradiation chamber. A screening cover is disposed over the carrier and has a load-unloading passage which can be moved into alignment with a selected radiation-source containing passage in the carrier for loading and unloading purposes. The cover is secured in a closed position relative to the carrier via screws so that the load-unload passage is sealed with a passage in the carrier. The carrier is also movable relative to the cover via unloosening of the screws so that the cover can be brought to an open position in which the cover can rotate to bring the load-unload passage into alignment with a different passage in the carrier.
    • 移动照射装置的辐射源安装在安装在照射室顶部的载体中。 屏蔽盖设置在载体上并且具有装载 - 卸载通道,该装载卸载通道可以与载体中的选定的辐射源容纳通道移动成对准以用于装载和卸载目的。 盖通过螺钉相对于托架固定在关闭位置,使得卸载通道用载体中的通道密封。 载体也可以通过螺丝的旋开而相对于盖移动,使得盖可以进入打开位置,在该位置盖可以旋转,以使卸载通道与载体中的不同通道对齐。
    • 50. 发明授权
    • Radiation treatment method and apparatus for decontamination of polluted fluid
    • 污染物去污的辐射处理方法及装置
    • US3904882A
    • 1975-09-09
    • US3739870
    • 1970-05-11
    • ENERGY SYSTEMS INC
    • LUND NORMANBIALY KAROL JMANN LELAND AWOODBRIDGE DR DAVID D
    • C02F1/30G21K5/02G01N21/26
    • G21K5/02C02F1/30
    • A radiation treatment method and apparatus for the safe disinfection and decontamination of liquid waste, such as sewage. Liquid waste is processed by removing some solids from the effluent, irradiating the effluent less some solids, with a gamma radiation field and percolating the disinfected effluent, or discharging the disinfected liquid into sewage conduits or into streams or other bodies of water. The disinfecting chamber is a box constructed of concrete or other compatible material, having a radiation shielding cover, and having an inlet at one end and an exit at the other end. Baffles located in the box produce desired distribution and turbulence of flow. Sources of ionizing radiation, usually gamma radiation, are placed in the chamber in such a manner as to provide a relatively uniform radiation field in the effluent passing through the system.
    • 一种放射线处理方法和设备,用于对废液(如污水)进行安全消毒和去污。 通过从流出物中除去一些固体,用γ辐射场辐射出一些固体,渗滤消毒的流出物,或将消毒的液体排放到污水管道或流入其它水体中来处理液体废物。 消毒室是由混凝土或其他相容材料构成的箱体,其具有辐射屏蔽罩,并且在一端具有入口,在另一端具有出口。 箱子中的挡板产生所需的流动分布和湍流。 电离辐射源(通常为γ辐射)以这样的方式被放置在腔室中,以便在通过系统的流出物中提供相对均匀的辐射场。