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    • 45. 发明授权
    • Glasses and glass ceramics including a metal oxide concentration gradient
    • 玻璃和玻璃陶瓷包括金属氧化物浓度梯度
    • US09593042B2
    • 2017-03-14
    • US14878597
    • 2015-10-08
    • CORNING INCORPORATED
    • Guangli HuCharlene Marie SmithZhongzhi TangSteven Alvin Tietje
    • C03C10/00C03C3/093C03C3/097C03C21/00C03C3/091C03C23/00
    • C03C21/002C03C3/091C03C3/093C03C3/097C03C10/00C03C10/0027C03C23/007
    • Embodiments of a glass-based article including a first surface and a second surface opposing the first surface defining a thickness (t) of about 3 millimeters or less (e.g., about 1 millimeter or less), and a stress profile, wherein all points of the stress profile between a thickness range from about 0·t up to 0.3·t and from greater than 0.7·t, comprise a tangent that is less than about −0.1 MPa/micrometers or greater than about 0.1 MPa/micrometers, are disclosed. In some embodiments, the glass-based article includes a non-zero metal oxide concentration that varies along at least a portion of the thickness (e.g., 0·t to about 0.3·t). In some embodiments, the concentration of metal oxide or alkali metal oxide decreases from the first surface to a point between the first surface and the second surface and increases from the point to the second surface. The concentration of the metal oxide may be about 0.05 mol % or greater or about 0.5 mol % or greater throughout the thickness. Methods for forming such glass-based articles are also disclosed.
    • 玻璃基制品的实施方案包括第一表面和与第一表面相对的第二表面,所述第一表面和第二表面限定了约3毫米或更小(例如,约1毫米或更小)的厚度(t)和应力分布,其中所有点 公开了从约0·t到0.3·t和大于0.7·t的厚度范围内的应力分布包括小于约-0.1MPa /微米或大于约0.1MPa /微米的切线。 在一些实施方案中,玻璃基制品包括沿着厚度的至少一部分(例如,0·t至约0.3·t)变化的非零金属氧化物浓度。 在一些实施方案中,金属氧化物或碱金属氧化物的浓度从第一表面减小到第一表面和第二表面之间的点,并且从点增加到第二表面。 金属氧化物的浓度在整个厚度上可以为约0.05mol%或更大或约0.5mol%或更大。 还公开了形成这种玻璃基制品的方法。
    • 48. 发明授权
    • Glass substrate for flat panel display and method for manufacturing same
    • 平板显示器用玻璃基板及其制造方法
    • US09580352B2
    • 2017-02-28
    • US14685953
    • 2015-04-14
    • AvanStrate Inc.
    • Akihiro KoyamaSatoshi AmiManabu Ichikawa
    • C03C3/091C03B25/00
    • C03C3/091C03B25/00
    • A substrate for p-Si TFT flat panel displays made of a glass having a high low-temperature-viscosity characteristic temperature and manufactured while avoiding erosion/wear of a melting tank during melting through direct electrical heating. The glass substrate comprises 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-20 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-0.8 mass % of R2O, wherein R2O is total amount of Li2O, Na2O, and K2O, and 0-0.3 mass % of Sb2O3, and substantially does not comprise As2O3, wherein the mass ratio CaO/RO is equal to or greater than 0.65, the mass ratio (SiO2+Al2O3)/B2O3 is in a range of 7-30, and the mass ratio (SiO2+Al2O3)/RO is equal to or greater than 5. A related method involves melting glass raw materials blended to provide the glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
    • 一种由具有高低温粘度特性温度的玻璃制成的p-Si TFT平板显示器基板,并且在通过直接电加热熔化期间避免熔化槽的侵蚀/磨损而制造。 所述玻璃基板包含52-78质量%的SiO 2,3-25质量%的Al 2 O 3,3-15质量%的B 2 O 3,3-20质量%的RO,其中RO是MgO,CaO,SrO和BaO的总量 ,0.01-0.8质量%的R 2 O,其中,R 2 O为Li 2 O,Na 2 O,K 2 O的总量,Sb 2 O 3为0〜0.3质量%,基本上不包含As 2 O 3,CaO / (SiO2 + Al2O3)/ B2O3的质量比(SiO 2 + Al 2 O 3)/ B 2 O 3在7〜30的范围内,质量比(SiO 2 + Al 2 O 3)/ RO等于或大于5.相关方法包括将玻璃原料混合 提供玻璃组成; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。