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41. 发明授权

US07327438B2 Lithographic apparatus and method of a manufacturing device 有权
标题翻译：制造装置的平版印刷装置和方法
公开(公告)号：US07327438B2
公开(公告)日：2008-02-05
申请号：US10840797
申请日：2004-05-07
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Joost Jeroen Ottens
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Joost Jeroen Ottens
IPC分类号： G03B27/60 , G03B27/42 , G03B27/58 , H01T23/00
CPC分类号： G03F7/707 , G03F7/70783
摘要： A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.
摘要翻译：一种光刻投影装置，具有用于提供投影射线束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望图案对投影光束进行图案化; 用于保持基板的基板保持器，所述基板保持器设置有提供用于将基板压靠在基板保持器上的保持力; 释放结构，其被构造和布置成抵抗所述保持力从所述保持器中弹出所述基板; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。光刻投影装置可以包括控制器，用于控制释放结构，以便以最终释放之前减小的释放力将基板从保持器释放。

42. 发明授权

US07161662B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07161662B2
公开(公告)日：2007-01-09
申请号：US10890379
申请日：2004-07-14
申请人： Joost Jeroen Ottens , Tjarko Adriaan Rudolf Van Empel , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Tjarko Adriaan Rudolf Van Empel , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/58 , G03B27/62 , G23B5/22 , G23B31/28
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783 , Y10T279/23
摘要： A lithographic projection apparatus includes a radiation system for providing a beam of radiation, and a substrate holder. The substrate holder includes a plurality of protrusions for providing a substantially flat plane of support for supporting a substrate in a beam path of the beam of radiation, at least one clamping electrode for generating an electric field for clamping the substrate against the substrate holder, and a peripheral supporting edge arranged to contact the substrate. The electrode extends beyond the peripheral supporting edge for providing a torsion load to level the substrate near the edges of the substrate.
摘要翻译：光刻投影装置包括用于提供辐射束的辐射系统和衬底保持器。衬底保持器包括多个突起，用于提供基本上平坦的支撑平面，用于在辐射束的光束路径中支撑衬底;至少一个夹持电极，用于产生用于将衬底夹持在衬底保持器上的电场;以及布置成接触所述基板的外围支撑边缘。电极延伸超过外围支撑边缘，以提供扭转负载以使基板在基板的边缘附近平坦化。

43. 发明授权

US07113262B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07113262B2
公开(公告)日：2006-09-26
申请号：US10872774
申请日：2004-06-22
申请人： Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Koen Jacobus Johannes Maria Zaal , Ton Aantjes
发明人： Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Koen Jacobus Johannes Maria Zaal , Ton Aantjes
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/707
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.
摘要翻译：公开了一种光刻投影装置。该装置包括用于提供辐射束的辐射系统和用于支撑放置在辐射束的光束路径中的衬底的衬底保持器。衬底保持器包括多个第一突起，其远端限定用于接触衬底的第一接触表面和多个第二突起，其远端限定用于支撑衬底的第二接触表面。第二突起被布置成用于在释放夹持压力期间防止基板粘附到第一接触表面，使得（1）当基板被夹持在基板保持器上时，基板接触第一和第二接触表面，以及（2）当基板未被夹紧时，基板由第二接触表面支撑并与第一接触表面分开。

44. 发明授权

US07110085B2 Lithographic apparatus, substrate holder and method of manufacturing 有权
标题翻译：平版印刷设备，基板支架和制造方法
公开(公告)号：US07110085B2
公开(公告)日：2006-09-19
申请号：US10839720
申请日：2004-05-06
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Joost Jeroen Ottens
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Joost Jeroen Ottens
IPC分类号： G03B27/42 , G03B27/58 , G03B27/60 , B25B11/00
CPC分类号： G03F7/707 , G03F7/70783
摘要： A lithographic projection apparatus including a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder having a plurality of protrusions, the extremities thereof defining a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder provided with the ability to provide a pressing force for pressing the substrate against the extremities of the protrusions, the protrusions in an edge zone of the substrate holder arranged to provide a substantially flat overhanging of the substrate in relation to the pressing force of the pressing means; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus is characterized in that the protrusions in an off-edge zone of the substrate holder are distributed so as to provide a substantial equal supporting area for each protrusion of the plurality of protrusions, the supporting areas being defined by a Voronoi diagram distribution associated to the protrusions. The lithographic apparatus offers a substrate holder with a reduced overlay and focus error.
摘要翻译：一种光刻投影装置，包括用于提供投影辐射束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望图案对投影光束进行图案化; 具有多个突起的衬底保持器，其末端限定用于支撑基本上平坦的衬底的基本平坦的支撑平面，衬底保持器具有提供用于将衬底压靠突起的末端的按压力的能力，衬底保持器的边缘区域中的突起被布置成相对于按压装置的按压力提供基板的基本平坦的伸出; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。光刻投影装置的特征在于，衬底保持器的偏离边缘区域中的突起被分布成为多个突起中的每个突起提供基本相等的支撑区域，支撑区域由Voronoi图分布与突起相关联。光刻设备提供具有减小的覆盖和聚焦误差的衬底保持器。

45. 发明申请

US20060158638A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
公开(公告)号：US20060158638A1
公开(公告)日：2006-07-20
申请号：US11312654
申请日：2005-12-21
申请人： Koen Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Meijer , Joost Ottens , Marco Kluse , Jan Hopman
发明人： Koen Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Meijer , Joost Ottens , Marco Kluse , Jan Hopman
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

46. 发明授权

US06933513B2 Gas flushing system for use in lithographic apparatus 失效
标题翻译：用于光刻设备的气体冲洗系统
公开(公告)号：US06933513B2
公开(公告)日：2005-08-23
申请号：US10140437
申请日：2002-05-08
申请人： Tjarko Adriaan Rudolf Van Empel , Raymond Laurentius Johannes Schrijver , Johannes Andreas Henricus Maria Jacobs , Nicolaas Rudolf Kemper , Nicolaas Franciscus Koppelaars
发明人： Tjarko Adriaan Rudolf Van Empel , Raymond Laurentius Johannes Schrijver , Johannes Andreas Henricus Maria Jacobs , Nicolaas Rudolf Kemper , Nicolaas Franciscus Koppelaars
IPC分类号： G03F7/20 , G21G5/00 , G03B27/42 , G03B27/52 , G21G4/00
CPC分类号： G03F7/70983 , G03F7/70716 , G03F7/70858 , G03F7/70866 , G03F7/70933
摘要： In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.
摘要翻译：在使用相对较短波长的曝光辐射的光刻设备中，例如， 157或126nm，在设备的移动部件中或与其邻近的横梁的横跨两部分提供了N 2层的流动。可以使用各种结构来提供层流，包括筛网，沉降室，成角度的入口和具有增加的横截面积的流动路径。

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