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    • 48. 发明申请
    • SILICON EPITAXIAL WAFER AND MANUFACTURING METHOD THEREOF
    • 硅外延波形及其制造方法
    • US20100327415A1
    • 2010-12-30
    • US12866946
    • 2009-02-27
    • Takeshi Arai
    • Takeshi Arai
    • H01L29/30H01L21/20
    • H01L21/02532C30B25/20C30B29/06H01L21/02381H01L21/02658H01L21/68735
    • Provided is a method for manufacturing a silicon epitaxial wafer by growing an epitaxial layer by placing a silicon substrate on a susceptor. The method includes at least a step of forming a silicon oxide film entirely on the rear surface of the silicon substrate; a step of removing the silicon oxide film formed at least on an edge section of the silicon substrate; and a step of placing the silicon substrate on the susceptor with the silicon oxide film in between. An epitaxial layer is grown on the silicon substrate, while holding the silicon substrate by the susceptor with the silicon oxide film in between. Thus, the silicon epitaxial wafer by which generation of particles can be reduced in a device manufacturing process and a method for manufacturing such silicon epitaxial wafer are provided.
    • 提供了通过将硅衬底放置在基座上来生长外延层来制造硅外延晶片的方法。 该方法至少包括在硅衬底的后表面上整体形成氧化硅膜的步骤; 去除形成在硅衬底的至少边缘部分上的氧化硅膜的步骤; 以及将硅衬底放置在基座上的步骤,其间具有氧化硅膜。 在硅衬底上生长外延层,同时通过感受器保持硅衬底之间的氧化硅膜。 因此,提供了在器件制造工艺中可以减少颗粒的产生的硅外延晶片和制造这种硅外延晶片的方法。
    • 50. 发明授权
    • Dust collector
    • 除尘器
    • US07559982B2
    • 2009-07-14
    • US10508344
    • 2003-03-26
    • Takeshi Arai
    • Takeshi Arai
    • B01D47/00
    • B01D45/12B01D50/006B01D50/008B04C5/23B04C9/00B04C2009/004
    • A dust collector (10) has a main body (12), the interior of which is divided by a tubular partition wall (26) into a central filtration chamber (30) and an outwardly-located annular cyclone chamber (32). At the upper part of the cyclone chamber (32), there is provided a water supply pipe (36) having radially directed nozzles (38) adapted to form a water film flowing down along the inner circumferential surface of the main body (12) and the-outer circumferential surface of the partition wall (26), respectively. Air to be treated is drawn under suction through an air intake (34) into the cyclone chamber (32) and swirling air is brought into contact with the water film whereby dust and particles are preliminarily collected while retaining an explosion-proof function. The cyclone chamber (32) and the filtration chamber (30) are communicated with each other at the lower portion thereof to permit the thus pretreated air to be drawn into the filtration chamber (30). Filters (44) are arranged in the filtration chamber (30) so as to further collect dust and particles by filtration. A small and compact dust collector capable of effectively collecting fine particles and small in air-flow resistance and pressure drop and having an excellent explosion-proof capability can be provided.
    • 集尘器(10)具有主体(12),其内部被管状分隔壁(26)分成中心过滤室(30)和向外定位的环形旋风室(32)。 在旋风室(32)的上部设有供水管(36),该供水管具有径向喷嘴(38),适于形成沿着主体(12)的内圆周表面向下流动的水膜,以及 分隔壁(26)的外周面。 待处理的空气通过进气口(34)被抽吸到旋风室(32)中,涡旋空气与水膜接触,从而在保持防爆功能的同时预先收集灰尘和颗粒。 旋风室(32)和过滤室(30)在其下部彼此连通,以便将这样预处理的空气吸入过滤室(30)。 过滤器(44)布置在过滤室(30)中,以便通过过滤进一步收集灰尘和颗粒。 可以提供能够有效地收集细小颗粒并且具有小的气流阻力和压降并且具有优异的防爆能力的小型紧凑型集尘器。