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    • 42. 发明申请
    • PROCESS OF EMBEDDED CIRCUIT STRUCTURE
    • 嵌入式电路结构的过程
    • US20080280032A1
    • 2008-11-13
    • US11934500
    • 2007-11-02
    • Tsung-Yuan ChenChun-Chien Chen
    • Tsung-Yuan ChenChun-Chien Chen
    • B28B19/00
    • H05K3/205H05K3/382H05K2201/0355H05K2203/1536H05K2203/1572
    • A process of an embedded circuit structure is provided. A complex metal layer, a prepreg, a supporting board, another prepreg and another complex metal layer are laminated together, wherein each of the complex metal layers has an inner metal layer and an outer metal layer stacked on the inner metal layer, the roughness of the outer surfaces of the inner metal layers is less than the roughness of the second outer surfaces of the outer metal layers, and the outer surfaces of the outer metal layers after laminating are exposed outwards. Each of two patterned photoresist layers is respectively formed on the outer surfaces of the outer metal layers. A metal material is created on portions of the outer surfaces of the outer metal layers not covered by the patterned photoresist layers to form two patterned circuit layers. The patterned photoresist layers are then removed to form a laminating structure.
    • 提供了一种嵌入式电路结构的过程。 将复合金属层,预浸料坯,支撑基板,其他预浸料坯和另一复合金属层层压在一起,其中,每个复合金属层具有堆叠在内金属层上的内金属层和外金属层,粗糙度 内金属层的外表面小于外金属层的第二外表面的粗糙度,层压后的外金属层的外表面向外露出。 两个图案化的光致抗蚀剂层中的每一个分别形成在外部金属层的外表面上。 在不被图案化的光致抗蚀剂层覆盖的外部金属层的外表面的部分上形成金属材料,以形成两个图案化的电路层。 然后去除图案化的光致抗蚀剂层以形成层压结构。
    • 44. 发明授权
    • Process of embedded circuit structure
    • 嵌入式电路结构的过程
    • US07931818B2
    • 2011-04-26
    • US11934500
    • 2007-11-02
    • Tsung-Yuan ChenChun-Chien Chen
    • Tsung-Yuan ChenChun-Chien Chen
    • H01B13/00
    • H05K3/205H05K3/382H05K2201/0355H05K2203/1536H05K2203/1572
    • A process of an embedded circuit structure is provided. A complex metal layer, a prepreg, a supporting board, another prepreg and another complex metal layer are laminated together, wherein each of the complex metal layers has an inner metal layer and an outer metal layer stacked on the inner metal layer, the roughness of the outer surfaces of the inner metal layers is less than the roughness of the second outer surfaces of the outer metal layers, and the outer surfaces of the outer metal layers after laminating are exposed outwards. Each of two patterned photoresist layers is respectively formed on the outer surfaces of the outer metal layers. A metal material is created on portions of the outer surfaces of the outer metal layers not covered by the patterned photoresist layers to form two patterned circuit layers. The patterned photoresist layers are then removed to form a laminating structure.
    • 提供了一种嵌入式电路结构的过程。 将复合金属层,预浸料坯,支撑基板,其他预浸料坯和另一复合金属层层压在一起,其中每个复合金属层具有层叠在内金属层上的内金属层和外金属层,其粗糙度 内金属层的外表面小于外金属层的第二外表面的粗糙度,层压后的外金属层的外表面向外露出。 两个图案化的光致抗蚀剂层中的每一个分别形成在外部金属层的外表面上。 在不被图案化的光致抗蚀剂层覆盖的外部金属层的外表面的部分上形成金属材料,以形成两个图案化的电路层。 然后去除图案化的光致抗蚀剂层以形成层压结构。